JP2011530803A5 - - Google Patents
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- JP2011530803A5 JP2011530803A5 JP2011521455A JP2011521455A JP2011530803A5 JP 2011530803 A5 JP2011530803 A5 JP 2011530803A5 JP 2011521455 A JP2011521455 A JP 2011521455A JP 2011521455 A JP2011521455 A JP 2011521455A JP 2011530803 A5 JP2011530803 A5 JP 2011530803A5
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- JP
- Japan
- Prior art keywords
- template
- nanostructures
- template according
- base substrate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE0801770 | 2008-08-05 | ||
| SE0801770-9 | 2008-08-05 | ||
| PCT/EP2009/005340 WO2010015333A2 (en) | 2008-08-05 | 2009-07-23 | Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011530803A JP2011530803A (ja) | 2011-12-22 |
| JP2011530803A5 true JP2011530803A5 (enExample) | 2012-11-15 |
| JP5405574B2 JP5405574B2 (ja) | 2014-02-05 |
Family
ID=41226229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011521455A Expired - Fee Related JP5405574B2 (ja) | 2008-08-05 | 2009-07-23 | テンプレート、およびリソグラフィ用高アスペクト比テンプレートを製造する方法、ならびにナノスケールで基板を穿孔するためのテンプレートの使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9028242B2 (enExample) |
| EP (1) | EP2307928A2 (enExample) |
| JP (1) | JP5405574B2 (enExample) |
| KR (1) | KR20110055586A (enExample) |
| CN (1) | CN102119363B (enExample) |
| MY (1) | MY153444A (enExample) |
| WO (1) | WO2010015333A2 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9104948B2 (en) * | 2008-09-16 | 2015-08-11 | Ramot At Tel-Aviv University Ltd. | System and a method for nano imprinting |
| US9991407B1 (en) * | 2010-06-22 | 2018-06-05 | Banpil Photonics Inc. | Process for creating high efficiency photovoltaic cells |
| CN101937871A (zh) * | 2010-08-16 | 2011-01-05 | 复旦大学 | 一种构造低介电常数介质材料表面形貌的方法 |
| JP5458036B2 (ja) * | 2011-02-09 | 2014-04-02 | 株式会社東芝 | ナノインプリント用スタンパ及びその製造方法 |
| US9081460B2 (en) * | 2011-05-20 | 2015-07-14 | Gwangju Institute Of Science And Technology | Electronic device, method for manufacturing the same and touch panel including the same |
| EP2720772A2 (en) * | 2011-06-17 | 2014-04-23 | Battelle Memorial Institute | Forward osmosis, reverse osmosis, and nano/micro filtration membrane structures |
| RU2476917C1 (ru) * | 2011-08-12 | 2013-02-27 | Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" | Способ изготовления штампа для наноимпринт литографии |
| TWM429700U (en) * | 2012-01-19 | 2012-05-21 | Benq Materials Corp | Engraving device |
| CN105378562B (zh) * | 2013-06-20 | 2019-11-05 | Ev 集团 E·索尔纳有限责任公司 | 具有印模结构的印模及其制造装置和方法 |
| KR102130688B1 (ko) * | 2015-11-03 | 2020-07-07 | 삼성디스플레이 주식회사 | 레이저 결정화 방법 |
| CN107175939B (zh) * | 2016-03-09 | 2020-02-28 | 华邦电子股份有限公司 | 用于印刷线路制程的印章及其制造方法以及印刷线路制程 |
| US9955584B2 (en) | 2016-04-25 | 2018-04-24 | Winbond Electronics Corp. | Stamp for printed circuit process and method of fabricating the same and printed circuit process |
| US11261085B2 (en) | 2017-05-03 | 2022-03-01 | Nanotech Security Corp. | Methods for micro and nano fabrication by selective template removal |
| US10679110B2 (en) | 2018-04-01 | 2020-06-09 | Ramot At Tel-Aviv University Ltd. | Nanotags for authentication |
| KR102267904B1 (ko) * | 2020-04-01 | 2021-06-22 | 한국기계연구원 | 유리전이온도를 이용한 미세구조체 전사방법 및 이를 이용하여 제작된 미세구조체 소자 |
| US11543584B2 (en) * | 2020-07-14 | 2023-01-03 | Meta Platforms Technologies, Llc | Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon |
| CN112960641B (zh) * | 2020-10-12 | 2024-01-23 | 重庆康佳光电科技有限公司 | 转移构件、其制备方法及具有其的转移头 |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6309580B1 (en) * | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| US6814897B2 (en) * | 1998-03-27 | 2004-11-09 | Discovision Associates | Method for manufacturing a molding tool used for substrate molding |
| US7115305B2 (en) * | 2002-02-01 | 2006-10-03 | California Institute Of Technology | Method of producing regular arrays of nano-scale objects using nano-structured block-copolymeric materials |
| US6755984B2 (en) * | 2002-10-24 | 2004-06-29 | Hewlett-Packard Development Company, L.P. | Micro-casted silicon carbide nano-imprinting stamp |
| US7507293B2 (en) * | 2002-10-28 | 2009-03-24 | Hewlett-Packard Development Company, L.P. | Photonic crystals with nanowire-based fabrication |
| US7378347B2 (en) * | 2002-10-28 | 2008-05-27 | Hewlett-Packard Development Company, L.P. | Method of forming catalyst nanoparticles for nanowire growth and other applications |
| WO2004086471A1 (en) * | 2003-03-27 | 2004-10-07 | Korea Institute Of Machinery & Materials | Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
| JP4383796B2 (ja) * | 2003-08-07 | 2009-12-16 | キヤノン株式会社 | ナノ構造体、及びその製造方法 |
| US8030833B2 (en) * | 2003-09-19 | 2011-10-04 | The Board Of Trustees Of The University Of Illinois | Electron emission device incorporating free standing monocrystalline nanowires |
| JP2005268686A (ja) * | 2004-03-22 | 2005-09-29 | Nippon Telegr & Teleph Corp <Ntt> | 金属パターン形成方法 |
| CN100582033C (zh) * | 2004-08-04 | 2010-01-20 | 鸿富锦精密工业(深圳)有限公司 | 陶瓷模仁 |
| JP2006108649A (ja) * | 2004-09-09 | 2006-04-20 | Masaru Hori | ナノインプリント用金型、ナノパターンの形成方法及び樹脂成型物 |
| US20060081557A1 (en) * | 2004-10-18 | 2006-04-20 | Molecular Imprints, Inc. | Low-k dielectric functional imprinting materials |
| US7459013B2 (en) * | 2004-11-19 | 2008-12-02 | International Business Machines Corporation | Chemical and particulate filters containing chemically modified carbon nanotube structures |
| US7592255B2 (en) * | 2004-12-22 | 2009-09-22 | Hewlett-Packard Development Company, L.P. | Fabricating arrays of metallic nanostructures |
| US8178165B2 (en) * | 2005-01-21 | 2012-05-15 | The Regents Of The University Of California | Method for fabricating a long-range ordered periodic array of nano-features, and articles comprising same |
| US7591641B2 (en) * | 2005-03-22 | 2009-09-22 | Canon Kabushiki Kaisha | Mold and process of production thereof |
| US7687876B2 (en) * | 2005-04-25 | 2010-03-30 | Smoltek Ab | Controlled growth of a nanostructure on a substrate |
| US20090304992A1 (en) * | 2005-08-08 | 2009-12-10 | Desimone Joseph M | Micro and Nano-Structure Metrology |
| JP2007069604A (ja) | 2005-08-10 | 2007-03-22 | Toray Ind Inc | パターン形成方法、パターン形成用シート、およびそれを用いて形成される光学機能性シート |
| JP4905634B2 (ja) | 2005-08-11 | 2012-03-28 | 株式会社カネカ | ナノインプリント用金型の製造方法 |
| AU2005337438B2 (en) * | 2005-10-20 | 2010-02-18 | Agency For Science, Technology And Research | Hierarchical nanopatterns by nanoimprint lithography |
| US20090045720A1 (en) * | 2005-11-10 | 2009-02-19 | Eun Kyung Lee | Method for producing nanowires using porous glass template, and multi-probe, field emission tip and devices employing the nanowires |
| US7690910B2 (en) * | 2006-02-01 | 2010-04-06 | Canon Kabushiki Kaisha | Mold for imprint, process for producing minute structure using the mold, and process for producing the mold |
| KR101530379B1 (ko) * | 2006-03-29 | 2015-06-22 | 삼성전자주식회사 | 다공성 글래스 템플릿을 이용한 실리콘 나노 와이어의제조방법 및 이에 의해 형성된 실리콘 나노 와이어를포함하는 소자 |
| US8707890B2 (en) * | 2006-07-18 | 2014-04-29 | Asml Netherlands B.V. | Imprint lithography |
| US8318407B2 (en) * | 2006-11-01 | 2012-11-27 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture |
| JP5188192B2 (ja) * | 2007-02-20 | 2013-04-24 | キヤノン株式会社 | モールド、モールドの製造方法、インプリント装置及びインプリント方法、インプリント方法を用いた構造体の製造方法 |
| US20080315430A1 (en) * | 2007-06-22 | 2008-12-25 | Qimonda Ag | Nanowire vias |
| CN101910942B (zh) * | 2007-11-01 | 2013-11-20 | 3M创新有限公司 | 复制母模的方法 |
| JP5065880B2 (ja) * | 2007-12-27 | 2012-11-07 | 株式会社日立産機システム | 微細構造転写装置および微細構造転写方法 |
| US7696837B2 (en) * | 2008-01-30 | 2010-04-13 | Motorola, Inc. | RF system having a one-dimensional nanostructure multi-port coupler |
| US20100109205A1 (en) * | 2008-11-04 | 2010-05-06 | Molecular Imprints, Inc. | Photocatalytic reactions in nano-imprint lithography processes |
| US20140021444A1 (en) * | 2010-05-31 | 2014-01-23 | Snu R&Db Foundation | Electronic device and manufacturing method thereof |
| KR101271827B1 (ko) * | 2010-07-22 | 2013-06-07 | 포항공과대학교 산학협력단 | 탄소 박막 제조 방법 |
| JP5909046B2 (ja) * | 2011-03-09 | 2016-04-26 | 株式会社東芝 | 近接場露光方法 |
| KR20130002527A (ko) * | 2011-06-29 | 2013-01-08 | 엘지이노텍 주식회사 | 나노와이어 제조방법 |
| JP5971927B2 (ja) * | 2011-11-29 | 2016-08-17 | デクセリアルズ株式会社 | 光学体、窓材、建具、日射遮蔽装置および建築物 |
-
2009
- 2009-07-23 MY MYPI2011000500A patent/MY153444A/en unknown
- 2009-07-23 CN CN200980131624.4A patent/CN102119363B/zh not_active Expired - Fee Related
- 2009-07-23 JP JP2011521455A patent/JP5405574B2/ja not_active Expired - Fee Related
- 2009-07-23 US US13/057,508 patent/US9028242B2/en active Active
- 2009-07-23 WO PCT/EP2009/005340 patent/WO2010015333A2/en not_active Ceased
- 2009-07-23 EP EP20090777381 patent/EP2307928A2/en not_active Withdrawn
- 2009-07-23 KR KR20117004711A patent/KR20110055586A/ko not_active Ceased
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