MY153444A - Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale - Google Patents

Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Info

Publication number
MY153444A
MY153444A MYPI2011000500A MYPI20110500A MY153444A MY 153444 A MY153444 A MY 153444A MY PI2011000500 A MYPI2011000500 A MY PI2011000500A MY PI20110500 A MYPI20110500 A MY PI20110500A MY 153444 A MY153444 A MY 153444A
Authority
MY
Malaysia
Prior art keywords
template
lithography
aspect ratio
nanoscale
perforating
Prior art date
Application number
MYPI2011000500A
Other languages
English (en)
Inventor
Muhammad Amin Saleem
Brud David
Berg Jonas
Kabir Mohammad Shafiqul
Desmaris Vincent
Original Assignee
Smoltek Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Smoltek Ab filed Critical Smoltek Ab
Publication of MY153444A publication Critical patent/MY153444A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Catalysts (AREA)
MYPI2011000500A 2008-08-05 2009-07-23 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale MY153444A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0801770 2008-08-05

Publications (1)

Publication Number Publication Date
MY153444A true MY153444A (en) 2015-02-13

Family

ID=41226229

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011000500A MY153444A (en) 2008-08-05 2009-07-23 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Country Status (7)

Country Link
US (1) US9028242B2 (enExample)
EP (1) EP2307928A2 (enExample)
JP (1) JP5405574B2 (enExample)
KR (1) KR20110055586A (enExample)
CN (1) CN102119363B (enExample)
MY (1) MY153444A (enExample)
WO (1) WO2010015333A2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9104948B2 (en) * 2008-09-16 2015-08-11 Ramot At Tel-Aviv University Ltd. System and a method for nano imprinting
US9991407B1 (en) * 2010-06-22 2018-06-05 Banpil Photonics Inc. Process for creating high efficiency photovoltaic cells
CN101937871A (zh) * 2010-08-16 2011-01-05 复旦大学 一种构造低介电常数介质材料表面形貌的方法
JP5458036B2 (ja) * 2011-02-09 2014-04-02 株式会社東芝 ナノインプリント用スタンパ及びその製造方法
US9081460B2 (en) * 2011-05-20 2015-07-14 Gwangju Institute Of Science And Technology Electronic device, method for manufacturing the same and touch panel including the same
EP2720772A2 (en) * 2011-06-17 2014-04-23 Battelle Memorial Institute Forward osmosis, reverse osmosis, and nano/micro filtration membrane structures
RU2476917C1 (ru) * 2011-08-12 2013-02-27 Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" Способ изготовления штампа для наноимпринт литографии
TWM429700U (en) * 2012-01-19 2012-05-21 Benq Materials Corp Engraving device
CN105378562B (zh) * 2013-06-20 2019-11-05 Ev 集团 E·索尔纳有限责任公司 具有印模结构的印模及其制造装置和方法
KR102130688B1 (ko) * 2015-11-03 2020-07-07 삼성디스플레이 주식회사 레이저 결정화 방법
CN107175939B (zh) * 2016-03-09 2020-02-28 华邦电子股份有限公司 用于印刷线路制程的印章及其制造方法以及印刷线路制程
US9955584B2 (en) 2016-04-25 2018-04-24 Winbond Electronics Corp. Stamp for printed circuit process and method of fabricating the same and printed circuit process
US11261085B2 (en) 2017-05-03 2022-03-01 Nanotech Security Corp. Methods for micro and nano fabrication by selective template removal
US10679110B2 (en) 2018-04-01 2020-06-09 Ramot At Tel-Aviv University Ltd. Nanotags for authentication
KR102267904B1 (ko) * 2020-04-01 2021-06-22 한국기계연구원 유리전이온도를 이용한 미세구조체 전사방법 및 이를 이용하여 제작된 미세구조체 소자
US11543584B2 (en) * 2020-07-14 2023-01-03 Meta Platforms Technologies, Llc Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon
CN112960641B (zh) * 2020-10-12 2024-01-23 重庆康佳光电科技有限公司 转移构件、其制备方法及具有其的转移头

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6814897B2 (en) * 1998-03-27 2004-11-09 Discovision Associates Method for manufacturing a molding tool used for substrate molding
US7115305B2 (en) * 2002-02-01 2006-10-03 California Institute Of Technology Method of producing regular arrays of nano-scale objects using nano-structured block-copolymeric materials
US6755984B2 (en) * 2002-10-24 2004-06-29 Hewlett-Packard Development Company, L.P. Micro-casted silicon carbide nano-imprinting stamp
US7507293B2 (en) * 2002-10-28 2009-03-24 Hewlett-Packard Development Company, L.P. Photonic crystals with nanowire-based fabrication
US7378347B2 (en) * 2002-10-28 2008-05-27 Hewlett-Packard Development Company, L.P. Method of forming catalyst nanoparticles for nanowire growth and other applications
WO2004086471A1 (en) * 2003-03-27 2004-10-07 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
JP4383796B2 (ja) * 2003-08-07 2009-12-16 キヤノン株式会社 ナノ構造体、及びその製造方法
US8030833B2 (en) * 2003-09-19 2011-10-04 The Board Of Trustees Of The University Of Illinois Electron emission device incorporating free standing monocrystalline nanowires
JP2005268686A (ja) * 2004-03-22 2005-09-29 Nippon Telegr & Teleph Corp <Ntt> 金属パターン形成方法
CN100582033C (zh) * 2004-08-04 2010-01-20 鸿富锦精密工业（深圳）有限公司 陶瓷模仁
JP2006108649A (ja) * 2004-09-09 2006-04-20 Masaru Hori ナノインプリント用金型、ナノパターンの形成方法及び樹脂成型物
US20060081557A1 (en) * 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US7459013B2 (en) * 2004-11-19 2008-12-02 International Business Machines Corporation Chemical and particulate filters containing chemically modified carbon nanotube structures
US7592255B2 (en) * 2004-12-22 2009-09-22 Hewlett-Packard Development Company, L.P. Fabricating arrays of metallic nanostructures
US8178165B2 (en) * 2005-01-21 2012-05-15 The Regents Of The University Of California Method for fabricating a long-range ordered periodic array of nano-features, and articles comprising same
US7591641B2 (en) * 2005-03-22 2009-09-22 Canon Kabushiki Kaisha Mold and process of production thereof
US7687876B2 (en) * 2005-04-25 2010-03-30 Smoltek Ab Controlled growth of a nanostructure on a substrate
US20090304992A1 (en) * 2005-08-08 2009-12-10 Desimone Joseph M Micro and Nano-Structure Metrology
JP2007069604A (ja) 2005-08-10 2007-03-22 Toray Ind Inc パターン形成方法、パターン形成用シート、およびそれを用いて形成される光学機能性シート
JP4905634B2 (ja) 2005-08-11 2012-03-28 株式会社カネカ ナノインプリント用金型の製造方法
AU2005337438B2 (en) * 2005-10-20 2010-02-18 Agency For Science, Technology And Research Hierarchical nanopatterns by nanoimprint lithography
US20090045720A1 (en) * 2005-11-10 2009-02-19 Eun Kyung Lee Method for producing nanowires using porous glass template, and multi-probe, field emission tip and devices employing the nanowires
US7690910B2 (en) * 2006-02-01 2010-04-06 Canon Kabushiki Kaisha Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
KR101530379B1 (ko) * 2006-03-29 2015-06-22 삼성전자주식회사 다공성 글래스 템플릿을 이용한 실리콘 나노 와이어의제조방법 및 이에 의해 형성된 실리콘 나노 와이어를포함하는 소자
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
US8318407B2 (en) * 2006-11-01 2012-11-27 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
JP5188192B2 (ja) * 2007-02-20 2013-04-24 キヤノン株式会社 モールド、モールドの製造方法、インプリント装置及びインプリント方法、インプリント方法を用いた構造体の製造方法
US20080315430A1 (en) * 2007-06-22 2008-12-25 Qimonda Ag Nanowire vias
CN101910942B (zh) * 2007-11-01 2013-11-20 3M创新有限公司 复制母模的方法
JP5065880B2 (ja) * 2007-12-27 2012-11-07 株式会社日立産機システム 微細構造転写装置および微細構造転写方法
US7696837B2 (en) * 2008-01-30 2010-04-13 Motorola, Inc. RF system having a one-dimensional nanostructure multi-port coupler
US20100109205A1 (en) * 2008-11-04 2010-05-06 Molecular Imprints, Inc. Photocatalytic reactions in nano-imprint lithography processes
US20140021444A1 (en) * 2010-05-31 2014-01-23 Snu R&Db Foundation Electronic device and manufacturing method thereof
KR101271827B1 (ko) * 2010-07-22 2013-06-07 포항공과대학교 산학협력단 탄소 박막 제조 방법
JP5909046B2 (ja) * 2011-03-09 2016-04-26 株式会社東芝 近接場露光方法
KR20130002527A (ko) * 2011-06-29 2013-01-08 엘지이노텍 주식회사 나노와이어 제조방법
JP5971927B2 (ja) * 2011-11-29 2016-08-17 デクセリアルズ株式会社 光学体、窓材、建具、日射遮蔽装置および建築物

Also Published As

Publication number Publication date
JP5405574B2 (ja) 2014-02-05
KR20110055586A (ko) 2011-05-25
CN102119363B (zh) 2015-10-21
WO2010015333A2 (en) 2010-02-11
US20110195141A1 (en) 2011-08-11
EP2307928A2 (en) 2011-04-13
JP2011530803A (ja) 2011-12-22
CN102119363A (zh) 2011-07-06
US9028242B2 (en) 2015-05-12
WO2010015333A3 (en) 2010-05-27

Similar Documents

Publication Publication Date Title
MY153444A (en) Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale
JP2011530803A5 (enExample)
WO2012106121A3 (en) Forming a template with discrete domains
EP1816518A3 (en) Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
WO2005045524A3 (en) A method of forming a patterned layer on a substrate
WO2005094231A3 (en) Methods for fabrication of positional and compositionally controlled nanostructures on substrate
WO2006023088A3 (en) Light emitting device processes
TW200607753A (en) Nanostructures and method of making the same
WO2010056933A3 (en) Hydrophobic surface coating systems and methods for metals
WO2004040049A3 (en) A method of forming catalyst nanoparticles for nanowire growth and other applications
SG162673A1 (en) Process and method for modifying polymer film surface interaction
BR112013000040A2 (pt) material de manta e método para produção do mesmo
DE602006010307D1 (de) Verfahren zur Herstellung eines Stempel für Mikro/Nano Imprint-Lithographie
DE60142393D1 (de) Verfahren zur herstellung einer schablone
SI1911574T1 (sl) Papirnat material z vtiskanim vzorcem in postopekproizvodnje le tega
ATE513867T1 (de) Verfahren zur herstellung von carbonylperfluorpolyethern
ATE551165T1 (de) Vorrichtung zur dekoration keramischer artikel
WO2008034204A3 (en) Growth of carbon nanotubes using metal-free nanoparticles
DE602007004589D1 (de) Verfahren zur Herstellung von Wasserstoffgas und Kohlenstoffnanoröhrchen aus dem katalytischen Abbau von Ethanol
EP2026131A3 (en) Lithography meandering order
TW200616776A (en) Manufacture of mold core used in nanoimprint
TW200702479A (en) Synthesis of a self assembled hybrid of ultrananocrystalline diamond and carbon nanotubes
WO2007047949A3 (en) Methods for growing carbon nanotubes on single crystal substrates
ATE501308T1 (de) Transferplatte zur herstellung von platten- und tafelprodukten
TW200704583A (en) Composition for forming mold