MY153444A - Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale - Google Patents

Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Info

Publication number
MY153444A
MY153444A MYPI2011000500A MYPI20110500A MY153444A MY 153444 A MY153444 A MY 153444A MY PI2011000500 A MYPI2011000500 A MY PI2011000500A MY PI20110500 A MYPI20110500 A MY PI20110500A MY 153444 A MY153444 A MY 153444A
Authority
MY
Malaysia
Prior art keywords
template
lithography
aspect ratio
nanoscale
perforating
Prior art date
Application number
MYPI2011000500A
Other languages
English (en)
Inventor
Muhammad Amin Saleem
Brud David
Berg Jonas
Kabir Mohammad Shafiqul
Desmaris Vincent
Original Assignee
Smoltek Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Smoltek Ab filed Critical Smoltek Ab
Publication of MY153444A publication Critical patent/MY153444A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0027—Devices or apparatus characterised by pressure means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Catalysts (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
MYPI2011000500A 2008-08-05 2009-07-23 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale MY153444A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0801770 2008-08-05

Publications (1)

Publication Number Publication Date
MY153444A true MY153444A (en) 2015-02-13

Family

ID=41226229

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011000500A MY153444A (en) 2008-08-05 2009-07-23 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Country Status (7)

Country Link
US (1) US9028242B2 (enExample)
EP (1) EP2307928A2 (enExample)
JP (1) JP5405574B2 (enExample)
KR (1) KR20110055586A (enExample)
CN (1) CN102119363B (enExample)
MY (1) MY153444A (enExample)
WO (1) WO2010015333A2 (enExample)

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CN107175939B (zh) * 2016-03-09 2020-02-28 华邦电子股份有限公司 用于印刷线路制程的印章及其制造方法以及印刷线路制程
US9955584B2 (en) 2016-04-25 2018-04-24 Winbond Electronics Corp. Stamp for printed circuit process and method of fabricating the same and printed circuit process
US11261085B2 (en) 2017-05-03 2022-03-01 Nanotech Security Corp. Methods for micro and nano fabrication by selective template removal
US10679110B2 (en) 2018-04-01 2020-06-09 Ramot At Tel-Aviv University Ltd. Nanotags for authentication
KR102267904B1 (ko) * 2020-04-01 2021-06-22 한국기계연구원 유리전이온도를 이용한 미세구조체 전사방법 및 이를 이용하여 제작된 미세구조체 소자
US11543584B2 (en) * 2020-07-14 2023-01-03 Meta Platforms Technologies, Llc Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon
CN112960641B (zh) * 2020-10-12 2024-01-23 重庆康佳光电科技有限公司 转移构件、其制备方法及具有其的转移头
KR102889959B1 (ko) * 2024-01-31 2025-11-24 동국대학교 산학협력단 희생층이 도입된 탐침 기반 리소그래피 방법, 금속 나노 홀 구조체, 하이브리드 플라즈모닉 구조체 제조 방법 및 하이브리드 플라즈모닉 구조체

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Also Published As

Publication number Publication date
WO2010015333A3 (en) 2010-05-27
CN102119363B (zh) 2015-10-21
JP2011530803A (ja) 2011-12-22
JP5405574B2 (ja) 2014-02-05
CN102119363A (zh) 2011-07-06
EP2307928A2 (en) 2011-04-13
KR20110055586A (ko) 2011-05-25
US9028242B2 (en) 2015-05-12
US20110195141A1 (en) 2011-08-11
WO2010015333A2 (en) 2010-02-11

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