JP2011514689A5 - - Google Patents
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- JP2011514689A5 JP2011514689A5 JP2011500766A JP2011500766A JP2011514689A5 JP 2011514689 A5 JP2011514689 A5 JP 2011514689A5 JP 2011500766 A JP2011500766 A JP 2011500766A JP 2011500766 A JP2011500766 A JP 2011500766A JP 2011514689 A5 JP2011514689 A5 JP 2011514689A5
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- JP
- Japan
- Prior art keywords
- nitride
- type
- ion
- layer
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000004767 nitrides Chemical class 0.000 claims 52
- 230000004888 barrier function Effects 0.000 claims 15
- 238000000034 method Methods 0.000 claims 6
- 150000002500 ions Chemical class 0.000 claims 4
- 230000005533 two-dimensional electron gas Effects 0.000 claims 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 230000005669 field effect Effects 0.000 claims 1
- 238000010897 surface acoustic wave method Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/051,303 | 2008-03-19 | ||
| US12/051,303 US7898047B2 (en) | 2003-03-03 | 2008-03-19 | Integrated nitride and silicon carbide-based devices and methods of fabricating integrated nitride-based devices |
| PCT/US2009/000802 WO2009117045A1 (en) | 2008-03-19 | 2009-02-09 | Integrated nitride and silicon carbide-based devices and methods of fabricating integrated nitride-based devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011514689A JP2011514689A (ja) | 2011-05-06 |
| JP2011514689A5 true JP2011514689A5 (https=) | 2012-05-24 |
| JP5479446B2 JP5479446B2 (ja) | 2014-04-23 |
Family
ID=40638004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011500766A Active JP5479446B2 (ja) | 2008-03-19 | 2009-02-09 | 窒化物および炭化シリコンをベースとする集積デバイス、および窒化物をベースとする集積デバイスを製造する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7898047B2 (https=) |
| EP (2) | EP2495759B1 (https=) |
| JP (1) | JP5479446B2 (https=) |
| KR (1) | KR101645740B1 (https=) |
| CN (1) | CN101978489B (https=) |
| WO (1) | WO2009117045A1 (https=) |
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- 2009-02-09 WO PCT/US2009/000802 patent/WO2009117045A1/en not_active Ceased
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