JP2009531549A5 - - Google Patents

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JP2009531549A5
JP2009531549A5 JP2009502830A JP2009502830A JP2009531549A5 JP 2009531549 A5 JP2009531549 A5 JP 2009531549A5 JP 2009502830 A JP2009502830 A JP 2009502830A JP 2009502830 A JP2009502830 A JP 2009502830A JP 2009531549 A5 JP2009531549 A5 JP 2009531549A5
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substrate
gas phase
output
phase material
output channel
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JP2009502830A
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JP5149272B2 (ja
JP2009531549A (ja
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Priority claimed from US11/392,007 external-priority patent/US7413982B2/en
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JP2009502830A 2006-03-29 2007-03-14 原子層堆積法 Expired - Fee Related JP5149272B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/392,007 US7413982B2 (en) 2006-03-29 2006-03-29 Process for atomic layer deposition
US11/392,007 2006-03-29
PCT/US2007/006415 WO2007126585A2 (en) 2006-03-29 2007-03-14 Process for atomic layer deposition

Publications (3)

Publication Number Publication Date
JP2009531549A JP2009531549A (ja) 2009-09-03
JP2009531549A5 true JP2009531549A5 (enExample) 2011-04-21
JP5149272B2 JP5149272B2 (ja) 2013-02-20

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JP2009502830A Expired - Fee Related JP5149272B2 (ja) 2006-03-29 2007-03-14 原子層堆積法

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US (1) US7413982B2 (enExample)
EP (1) EP1999295B1 (enExample)
JP (1) JP5149272B2 (enExample)
KR (1) KR20080109002A (enExample)
CN (1) CN101415860A (enExample)
TW (1) TWI396768B (enExample)
WO (1) WO2007126585A2 (enExample)

Families Citing this family (178)

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