JP2010541159A5 - - Google Patents

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Publication number
JP2010541159A5
JP2010541159A5 JP2010526900A JP2010526900A JP2010541159A5 JP 2010541159 A5 JP2010541159 A5 JP 2010541159A5 JP 2010526900 A JP2010526900 A JP 2010526900A JP 2010526900 A JP2010526900 A JP 2010526900A JP 2010541159 A5 JP2010541159 A5 JP 2010541159A5
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JP
Japan
Prior art keywords
reactive gas
substrate
deposition
gas material
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010526900A
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English (en)
Japanese (ja)
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JP2010541159A (ja
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Publication date
Priority claimed from US11/861,519 external-priority patent/US20090081356A1/en
Application filed filed Critical
Publication of JP2010541159A publication Critical patent/JP2010541159A/ja
Publication of JP2010541159A5 publication Critical patent/JP2010541159A5/ja
Pending legal-status Critical Current

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JP2010526900A 2007-09-26 2008-09-17 薄膜封止層を形成する方法 Pending JP2010541159A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/861,519 US20090081356A1 (en) 2007-09-26 2007-09-26 Process for forming thin film encapsulation layers
PCT/US2008/010804 WO2009042052A2 (en) 2007-09-26 2008-09-17 Process for forming thin film encapsulation layers

Publications (2)

Publication Number Publication Date
JP2010541159A JP2010541159A (ja) 2010-12-24
JP2010541159A5 true JP2010541159A5 (enExample) 2011-11-10

Family

ID=40351857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010526900A Pending JP2010541159A (ja) 2007-09-26 2008-09-17 薄膜封止層を形成する方法

Country Status (5)

Country Link
US (2) US20090081356A1 (enExample)
EP (1) EP2193219A2 (enExample)
JP (1) JP2010541159A (enExample)
CN (1) CN101809188B (enExample)
WO (1) WO2009042052A2 (enExample)

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