JP2011501877A5 - - Google Patents

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Publication number
JP2011501877A5
JP2011501877A5 JP2010526931A JP2010526931A JP2011501877A5 JP 2011501877 A5 JP2011501877 A5 JP 2011501877A5 JP 2010526931 A JP2010526931 A JP 2010526931A JP 2010526931 A JP2010526931 A JP 2010526931A JP 2011501877 A5 JP2011501877 A5 JP 2011501877A5
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JP
Japan
Prior art keywords
deposition
thin film
substrate
gas
gas material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010526931A
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English (en)
Japanese (ja)
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JP2011501877A (ja
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Publication date
Priority claimed from US11/861,455 external-priority patent/US7972898B2/en
Application filed filed Critical
Publication of JP2011501877A publication Critical patent/JP2011501877A/ja
Publication of JP2011501877A5 publication Critical patent/JP2011501877A5/ja
Pending legal-status Critical Current

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JP2010526931A 2007-09-26 2008-09-24 ドープ型酸化亜鉛の形成方法 Pending JP2011501877A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/861,455 US7972898B2 (en) 2007-09-26 2007-09-26 Process for making doped zinc oxide
PCT/US2008/011062 WO2009042144A2 (en) 2007-09-26 2008-09-24 Process for making doped zinc oxide

Publications (2)

Publication Number Publication Date
JP2011501877A JP2011501877A (ja) 2011-01-13
JP2011501877A5 true JP2011501877A5 (enExample) 2012-11-29

Family

ID=40130580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010526931A Pending JP2011501877A (ja) 2007-09-26 2008-09-24 ドープ型酸化亜鉛の形成方法

Country Status (6)

Country Link
US (1) US7972898B2 (enExample)
EP (1) EP2191499B1 (enExample)
JP (1) JP2011501877A (enExample)
CN (1) CN102017104B (enExample)
TW (1) TW200924061A (enExample)
WO (1) WO2009042144A2 (enExample)

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