IT1393401B1 - Metodo per la fabbricazione in linea di strati sottili di zno b trasparente conduttivo e testurizzato su larga area e relativo apparato - Google Patents

Metodo per la fabbricazione in linea di strati sottili di zno b trasparente conduttivo e testurizzato su larga area e relativo apparato

Info

Publication number
IT1393401B1
IT1393401B1 ITRM2008A000405A ITRM20080405A IT1393401B1 IT 1393401 B1 IT1393401 B1 IT 1393401B1 IT RM2008A000405 A ITRM2008A000405 A IT RM2008A000405A IT RM20080405 A ITRM20080405 A IT RM20080405A IT 1393401 B1 IT1393401 B1 IT 1393401B1
Authority
IT
Italy
Prior art keywords
textured
zno
manufacturing
line
wide area
Prior art date
Application number
ITRM2008A000405A
Other languages
English (en)
Inventor
Maria Luisa Addonizio
Alessadro Antonaia
Original Assignee
Enea Ente Per Le Nuova Tecnologie L En E L Ambiente
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enea Ente Per Le Nuova Tecnologie L En E L Ambiente filed Critical Enea Ente Per Le Nuova Tecnologie L En E L Ambiente
Priority to ITRM2008A000405A priority Critical patent/IT1393401B1/it
Publication of ITRM20080405A1 publication Critical patent/ITRM20080405A1/it
Application granted granted Critical
Publication of IT1393401B1 publication Critical patent/IT1393401B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45574—Nozzles for more than one gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing Of Electric Cables (AREA)
ITRM2008A000405A 2008-07-28 2008-07-28 Metodo per la fabbricazione in linea di strati sottili di zno b trasparente conduttivo e testurizzato su larga area e relativo apparato IT1393401B1 (it)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ITRM2008A000405A IT1393401B1 (it) 2008-07-28 2008-07-28 Metodo per la fabbricazione in linea di strati sottili di zno b trasparente conduttivo e testurizzato su larga area e relativo apparato

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITRM2008A000405A IT1393401B1 (it) 2008-07-28 2008-07-28 Metodo per la fabbricazione in linea di strati sottili di zno b trasparente conduttivo e testurizzato su larga area e relativo apparato

Publications (2)

Publication Number Publication Date
ITRM20080405A1 ITRM20080405A1 (it) 2010-01-29
IT1393401B1 true IT1393401B1 (it) 2012-04-20

Family

ID=40756787

Family Applications (1)

Application Number Title Priority Date Filing Date
ITRM2008A000405A IT1393401B1 (it) 2008-07-28 2008-07-28 Metodo per la fabbricazione in linea di strati sottili di zno b trasparente conduttivo e testurizzato su larga area e relativo apparato

Country Status (1)

Country Link
IT (1) IT1393401B1 (it)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6268019B1 (en) * 1998-06-04 2001-07-31 Atofina Chemicals, Inc. Preparation of fluorine modified, low haze, titanium dioxide films
US20070248515A1 (en) * 2003-12-01 2007-10-25 Tompa Gary S System and Method for Forming Multi-Component Films
WO2005081269A1 (ja) * 2004-02-20 2005-09-01 Kaneka Corporation 透明導電膜を形成する方法と装置
US7413982B2 (en) * 2006-03-29 2008-08-19 Eastman Kodak Company Process for atomic layer deposition
MX2009002176A (es) * 2006-08-29 2009-04-22 Pilkington Group Ltd Metodo para la fabricacion de articulo de vidrio recubierto con oxido de zinc impurificado, de baja resistividad y articulo de vidrio recubierto fabricado mediante el mismo.
MX2009002461A (es) * 2006-09-08 2009-03-20 Pilkington Group Ltd Metodo a baja temperatura para la fabricacion de articulo recubierto con oxido de zinc y articulo recubierto fabricado mediante el mismo.

Also Published As

Publication number Publication date
ITRM20080405A1 (it) 2010-01-29

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