JP2008526669A - ジルコニア粒子 - Google Patents
ジルコニア粒子 Download PDFInfo
- Publication number
- JP2008526669A JP2008526669A JP2007549461A JP2007549461A JP2008526669A JP 2008526669 A JP2008526669 A JP 2008526669A JP 2007549461 A JP2007549461 A JP 2007549461A JP 2007549461 A JP2007549461 A JP 2007549461A JP 2008526669 A JP2008526669 A JP 2008526669A
- Authority
- JP
- Japan
- Prior art keywords
- zirconia
- zirconia particles
- zirconium
- particle size
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 title claims abstract description 514
- 239000002245 particle Substances 0.000 title claims abstract description 220
- 238000010335 hydrothermal treatment Methods 0.000 claims abstract description 60
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- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 22
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052726 zirconium Inorganic materials 0.000 claims description 103
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 101
- 239000000543 intermediate Substances 0.000 claims description 41
- 239000011159 matrix material Substances 0.000 claims description 40
- 239000011164 primary particle Substances 0.000 claims description 37
- 239000002243 precursor Substances 0.000 claims description 34
- 238000006243 chemical reaction Methods 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 31
- 229920000570 polyether Polymers 0.000 claims description 30
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 29
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 29
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- YHBWXWLDOKIVCJ-UHFFFAOYSA-M 2-[2-(2-methoxyethoxy)ethoxy]acetate Chemical compound COCCOCCOCC([O-])=O YHBWXWLDOKIVCJ-UHFFFAOYSA-M 0.000 claims 1
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- 230000003287 optical effect Effects 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
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- JRKVGRAQLBXGQB-UHFFFAOYSA-K yttrium(3+);triacetate;hydrate Chemical compound O.[Y+3].CC([O-])=O.CC([O-])=O.CC([O-])=O JRKVGRAQLBXGQB-UHFFFAOYSA-K 0.000 description 3
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- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
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- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
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- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- DYFMAHYLCRSUHA-UHFFFAOYSA-N ethenyl-tris(2-methylpropoxy)silane Chemical compound CC(C)CO[Si](OCC(C)C)(OCC(C)C)C=C DYFMAHYLCRSUHA-UHFFFAOYSA-N 0.000 description 1
- GBFVZTUQONJGSL-UHFFFAOYSA-N ethenyl-tris(prop-1-en-2-yloxy)silane Chemical class CC(=C)O[Si](OC(C)=C)(OC(C)=C)C=C GBFVZTUQONJGSL-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012067 mathematical method Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- PADYPAQRESYCQZ-UHFFFAOYSA-N triethoxy-(4-methylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(C)C=C1 PADYPAQRESYCQZ-UHFFFAOYSA-N 0.000 description 1
- UWSYCPWEBZRZNJ-UHFFFAOYSA-N trimethoxy(2,4,4-trimethylpentyl)silane Chemical compound CO[Si](OC)(OC)CC(C)CC(C)(C)C UWSYCPWEBZRZNJ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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Abstract
Description
本明細書において用いられているように、「1つの(a)(an)」および「その(the)」という用語は、記載されている要素の1またはそれ以上を意味するために、「少なくとも1つの」と同義的に用いられる。
ジルコニア粒子は、水熱技術を用いて調製することができる。より具体的には、ジルコニウム塩を含有する第一供給原料は、第一水熱処理へ付され、ジルコニウム含有中間体および副生物を形成する。第二供給原料は、第一水熱処理の間に形成された副生物の少なくとも一部分を除去することによって調製される。第二供給原料はついで、第二水熱処理へ付され、ジルコニア粒子を含有するジルコニアゾルを形成する。
転化率%=100(A−B)/(A−C)
(ここで、Aは、第一供給原料の減量パーセントであり、Bは、ジルコニウム含有中間体の減量パーセントであり、Cは、ジルコニアゾルの減量パーセントである)。第一供給原料、中間体、およびジルコニアゾルについての減量パーセントは、分析前に120℃で30分間各サンプルを乾燥することによって決定される。熱重量測定分析器における85℃での平衡後、各サンプルは20℃/分の率で200℃まで加熱される。温度は、20分間200℃に保持され、20℃/分の率で900℃まで増加され、20分間900℃に保持される。減量パーセントは、第一供給原料、ジルコニウム含有中間体、およびジルコニアゾルについて、次の方程式から計算することができる:
減量%=100(重量200C−重量900C)/重量900C
減量パーセントは、乾燥されたサンプルの各々における無機酸化物でないものに相当する。
別の態様において、ジルコニア粒子中の無機酸化物(例えばY2O3およびZrO2)の重量を基準にして0.1〜8wt%の量でイットリウムを含有するジルコニア粒子が提供される。これらのジルコニア粒子は、50ナノメートル以下の平均一次粒度、1〜3の分散指数、3.0以下の強度平均粒度対容積平均粒度比、および少なくとも70%立方、正方、またはこれらの組み合わせである結晶構造を有する。
透過率%=100(I/Io)
(ここで、Iは、サンプルを通過する光強度であり、Ioは、サンプル上への入射光強度である)。光の透過は、1cm経路長を有する600ナノメートルの波長に設定された紫外線/可視分光光度計を用いて決定することができる。
さらに別の態様において、有機マトリックス中に分散されたジルコニア粒子を含む複合材料が提供される。有機マトリックス材料は、モノマー、オリゴマー、ポリマー、コポリマー、またはこれらの組み合わせを含んでいてもよい。これらのジルコニア粒子は、有機マトリックス材料と組み合わされて、透明または半透明複合材料を提供しうる。有機マトリックス材料と比較して、この複合材料は、増加した屈折率、X線への増加した不透過度、またはこれらの組み合わせを有しうる。
フォトン相関分光法(PCS)
容積平均粒度は、マルバーン・シリーズ4700粒度分析器(マサチューセッツ州サウスボローのマルバーン・インストルメンツ社(Malvern Instruments Inc.)から入手しうる)を用いたフォトン相関分光法(PCS)によって決定した。希釈ジルコニアゾルサンプルが、シリンジ加圧を用いて0.2μmフィルターを通して濾過されてガラスキュベットへ入れられ、これはついでカバーされた。データ収集に先立って、サンプルチャンバの温度が25℃で平衡させられた。90°の角度でコンチン(CONTIN)分析を行なうために、供給されたソフトウエアが用いられた。コンチンは、一般的な逆変換(inverse transformation)問題の分析のために広く用いられている数学的方法であり、これはさらに、S.W.プロベンチャー(Provencher)、Comput.Phys.Commun.,27,229(1982年)に記載されている。この分析は、24データビンを用いて実施された。次の値は、これらの計算に用いられた:1.333に等しい水の屈折率、0.890センチポアズに等しい水の粘度、および1.9に等しいジルコニア粒子の屈折率。
乾燥ジルコニアサンプルの粒度は、瑪瑙乳鉢および乳棒を用いた、手による摩砕によって減少された。たっぷりした量のサンプルが、二重コーティングされたテープの1断片が接着されているガラス顕微鏡スライドへ、スパチュラで塗布された。このサンプルは、スパチュラブレードでテープに対してサンプルを押し付けることによって、テープ上の接着剤中に押し入れられた。過剰なサンプルは、スパチュラブレードのエッジでサンプル区域をこすり取って除去され、接着剤へ接着された粒子の薄層が残された。こすり取った後に残留するゆるく接着された材料は、硬質表面に対して顕微鏡スライドを力強く叩くことによって除去された。同様な方法で、コランダム(リンデ(Linde)1.0μmアルミナ研磨粉末、ロット番号C062、インディアナ州インディアナポリスのユニオン・カーバイド(Union Carbide))が調製され、機器拡大(instrumental broadening)のための回折計を較正するために用いられた。
立方/正方(C/T):(111)
単斜晶系(M):(−111)、および(111)
クリスタライトサイズ(D)=Kλ/β(cosθ)
K=形状因数(ここでは0.9);
λ=波長(1.540598Å);
β=機器拡大についての修正後の計算されたピーク幅(ラジアン)=[計算されたピークFWHM−機器幅](ラジアンへ転換された)、ここでFWHMは、半最大における全幅である;および
θ=1/2ピーク位置(散乱角度)。
立方/正方平均クリスタライトサイズ=
[D(111)area1+D(111)area2+D(111)area3]/3
単斜晶系平均クリスタライトサイズ=
[D(−111)area1+D(−111)area2+D(−111)area3+
D(111)area1+D(111)area2+D(111)area3]/6
重量平均=[(%C/T)(C/Tサイズ)+(%M)(Mサイズ)]/100
C/T%=ZrO2粒子の立方および正方クリスタライト含量によって寄与された結晶度パーセント;
C/Tサイズ=立方および正方クリスタライトのサイズ;
M%=ZrO2粒子の単斜晶系クリスタライト含量によって寄与された結晶度パーセント;および
Mサイズ=単斜晶系クリスタライトのサイズ
分散指数は、PCSによって測定された容積平均サイズを、XRDによって測定された重量平均クリスタライトサイズによって割ったものに等しい。
固体重量パーセントは、3〜6gの重さのサンプルを120℃で30分間乾燥することによって決定された。固体パーセントは、湿潤サンプルの重量(すなわち乾燥前の重量、重量wet)および乾燥サンプルの重量(すなわち、乾燥後の重量、重量dry)から、次の方程式を用いて計算することができる。
固体wt%=100(重量dry)/重量wet
ジルコニウム含有中間体の転化率パーセントおよび無機酸化物重量パーセントは、TAインストルメンツ(デラウエア州ニューキャッスル)からのモデル2950TGAを用いた熱重量測定分析によって決定された。
減量%=100(重量200C%−重量900C%)/重量900C%
重量200C%=100(重量200C)/重量dry
重量900C%=100(重量900C)/重量dry
転化率%=100(A−B)/(A−C)
(ここで、Aは、第一供給原料の減量パーセントであり、Bは、ジルコニウム含有中間体の減量パーセントであり、Cは、ジルコニアゾルの減量パーセントである)。
無機酸化物wt%=(固体wt%)(重量900C%)/100
屈折率は、ミルトン・ロイ社(Milton Roy Co.)(ペンシルベニア州アイビーランド)から商業的に入手しうるアッベ回折計を用いて測定された。
ガラス容器において、MEEAA(130.55g)が、ジルコニウムアセテート溶液(735g)中に溶解された。この混合物(すなわち水性前駆体溶液)は、大きい平らなガラストレーに入れられ、75℃〜85℃で強制空気オーブンで一晩乾燥させられると、322gの乾燥混合塩(すなわち濃縮前駆体)を生じた。
ガラス容器において、MEEAA(130.55g)が、ジルコニウムアセテート溶液(735g)中に溶解された。この混合物は、大きい平らなガラストレーに入れられ、75℃〜85℃で強制空気オーブンで一晩乾燥させられると、322gの乾燥混合塩を生じた。
ガラス容器において、MEEAA(26.46g)が、ジルコニウムアセテート溶液(735g)中に溶解された。この混合物は、大きい平らなガラストレーに入れられ、75℃〜85℃で強制空気オーブンで一晩乾燥させられると、乾燥混合塩を生じた。
ジルコニウムアセテート溶液が、大きい平らなガラストレーに入れられ、75℃〜85℃で強制空気オーブンで一晩乾燥させられると、乾燥塩を生じた。
ガラス容器において、イットリウムアセテート水和物(19.275g)が、ジルコニウムアセテート溶液(750g)中に溶解され、この溶液が乾燥された。この固体は、12.5wt%溶液を生じるのに十分な脱イオン水中に溶解された(第一供給原料)。
ガラス容器において、イットリウムアセテート水和物(51.4g)が、ジルコニウムアセテート溶液(2,000g)中に溶解され、この溶液は、回転蒸発器を用いて60%固体へ濃縮された。この濃縮物は、12.5wt%溶液を生じるのに十分な脱イオン水で希釈された(すなわち第一供給原料)。
容器において、イットリウムアセテート水和物(12.7g)が、ジルコニウムアセテート溶液(2,000g)中に溶解され、この溶液が乾燥された。この固体(388g)は、12.5wt%溶液を生じるのに十分な脱イオン水中に溶解された(すなわち第一供給原料)。
実施例5において調製されたジルコニアゾルが、回転蒸発によって濃縮された。この濃縮されたゾルは、36.16wt%無機酸化物であった。PEAとトリブロモフェノキシエチルアクリレートとの50/50重量比の樹脂混合物が調製された(1.5466に等しい屈折率)。1−メトキシ−2−プロパノール(60g)、MEEAA(2.32g)、ベータ−CEA(1.26g)、プロスタッブ(PROSTABB)5198(2重量%固体で0.01g)、およびこの樹脂混合物(12.46g)が、ガラス容器に入れられ、この濃縮されたジルコニアゾルが、攪拌しつつ添加され、揮発性物質が回転蒸発によって除去された。その結果生じた材料は、53.00重量%無機酸化物を有する半透明で幾分粘性の硬化性(例えば未硬化)組成物であった。この未硬化組成物の屈折率は、1.6522に等しかった。
実施例6において調製されたジルコニアゾルが、回転蒸発によって濃縮された。この濃縮されたジルコニアゾル(280.12g、40.05wt%固体、36.02wt%無機酸化物)は、ガラス容器に入れられ、脱イオン水(150g)が、攪拌しつつ添加された。1−メトキシ−2−プロパノール(456g)、アクリルオキシプロピルトリメトキシシラン(26.26g)、およびシルクエストA1230(17.75g)の混合物が、このジルコニアゾルと混合された。容器が密閉され、4時間90℃へ加熱された。加熱後、この混合物が回転蒸発器によって濃縮されると、359.4gの表面変性された材料を生じた。
Claims (20)
- ジルコニア粒子の製造方法であって、
ジルコニウム塩を含む第一供給原料を調製する工程と;
前記第一供給原料を第一水熱処理に付して、ジルコニウム含有中間体および副生物を形成する工程と;
前記第一水熱処理の副生物の少なくとも一部分を除去することによって、第二供給原料を形成する工程と;
前記第二供給原料を第二水熱処理に付して、ジルコニア粒子を含むジルコニアゾルを形成する工程とを含む方法。 - 前記ジルコニウム塩が、4以下の炭素原子を有するカルボキシレートを含むアニオンを有する、請求項1に記載の方法。
- 前記ジルコニウム塩が、4以下の炭素原子を有する第一カルボキシレートアニオン、およびポリエーテルカルボキシレートアニオンである第二カルボキシレートアニオンを含むカルボキシレートを含むアニオンを有し、前記カルボキシレートアニオンの少なくとも50モル%が、4以下の炭素原子を有する、請求項1に記載の方法。
- 前記ポリエーテルカルボキシレートアニオンが、2−[2−(2−メトキシエトキシ)エトキシ]アセテート、2−(2−メトキシエトキシ)アセテート、またはこれらの組み合わせである、請求項3に記載の方法。
- 前記カルボキシレートアニオンが、アセテートである、請求項2に記載の方法。
- 前記第一供給原料が、イットリウム塩をさらに含む、請求項1に記載の方法。
- 前記第一供給原料の調製工程が、ジルコニウム塩を含む前駆体溶液を調製する工程と、前記前駆体溶液中のジルコニウム塩のアニオンの少なくとも一部分を除去する工程とを含む、請求項1に記載の方法。
- 除去工程が、前記前駆体溶液を加熱して、ジルコニウム塩のアニオンから形成された酸を揮発させる工程を含む、請求項7に記載の方法。
- 除去工程が、前記前駆体溶液を少なくとも一部乾燥させて、残渣を形成する工程と;この残渣を水中に分散する工程とを含む、請求項7に記載の方法。
- 前記ジルコニウム含有中間体が、40〜75%の転化率パーセントを有する、請求項1に記載の方法。
- 第二供給原料の形成工程が、前記第一水熱処理の間に形成された酸性副生物を除去する工程を含む、請求項1に記載の方法。
- 前記酸性副生物が、4以下の炭素原子を有するカルボン酸を含む、請求項11に記載の方法。
- 除去工程が、ジルコニウム含有中間体を少なくとも一部乾燥させて、中間体残渣を形成する工程と;前記中間体残渣を水で希釈する工程とを含む、請求項1に記載の方法。
- 前記ジルコニアゾルから液相を除去する工程、前記ジルコニア粒子の表面を変性する工程、またはこれらの組み合わせをさらに含む、請求項1に記載の方法。
- 前記ジルコニア粒子中の無機酸化物の重量を基準にして0.1〜8wt%のイットリウムを含むジルコニア粒子であって、30ナノメートル以下の平均一次粒度、1〜3の分散指数、3.0以下の強度平均粒度対容積平均粒度比、および少なくとも70%立方、正方、またはこれらの組み合わせである結晶構造を有するジルコニア粒子。
- カルボン酸を含む水性媒質中に分散されたジルコニア粒子を含むジルコニアゾルであって、前記カルボン酸が、4以下の炭素原子を有し、かつポリエーテルカルボン酸を実質的に含まず、前記ジルコニア粒子が、30ナノメートル以下の平均一次粒度、1〜5の分散指数、3.0以下の強度平均粒度対容積平均粒度比、および少なくとも50%立方、正方、またはこれらの組み合わせである結晶構造を有するジルコニアゾル。
- 前記ジルコニア粒子が、前記ジルコニア粒子中の無機酸化物の重量を基準にして0.1〜8wt%のイットリウムを含み、前記ジルコニア粒子が、少なくとも70%立方、正方、またはこれらの組み合わせである結晶構造を有する、請求項16に記載のジルコニアゾル。
- 有機マトリックス中に分散されたジルコニア粒子を含む複合材料であって、前記ジルコニア粒子が、前記ジルコニア粒子中の無機酸化物の重量を基準にして0.1〜8wt%のイットリウムを含み、前記ジルコニア粒子が、30ナノメートル以下の平均一次粒度、1〜3の分散指数、3.0以下の強度平均粒度対容積平均粒度比、および少なくとも70%立方、正方、またはこれらの組み合わせである結晶構造を有する複合材料。
- 複合材料の製造方法であって、
ジルコニウム塩を含む第一供給原料を調製する工程、
前記第一供給原料を第一水熱処理に付して、ジルコニウム含有中間体および副生物を形成する工程、
前記第一水熱処理の副生物の少なくとも一部分を除去することによって、第二供給原料を形成する工程、および
前記第二供給原料を第二水熱処理に付して、ジルコニア粒子を含むジルコニアゾルを形成する工程
を含むジルコニアゾルを形成する工程と;
有機マトリックス材料を添加する工程と;
前記ジルコニアゾルから液相の少なくとも一部分を除去する工程とを含む方法。 - 複合材料の製造方法であって、
カルボン酸を含む水性媒質中に分散されたジルコニア粒子を含むジルコニアゾルを供給する工程であって、前記カルボン酸が、4以下の炭素原子を有し、かつポリエーテルカルボン酸を実質的に含まず、前記ジルコニア粒子が、30ナノメートル以下の平均一次粒度、1〜5の分散指数、3.0以下の強度平均粒度対容積平均粒度比、および少なくとも50%立方、正方、またはこれらの組み合わせである結晶構造を有する工程と;
有機マトリックス材料を添加する工程と;
前記ジルコニアゾルから水性媒質の少なくとも一部分を除去する工程とを含む方法。
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011508721A (ja) * | 2007-12-28 | 2011-03-17 | スリーエム イノベイティブ プロパティズ カンパニー | ジルコニア含有ナノ粒子の製造方法 |
JP2013512850A (ja) * | 2009-12-02 | 2013-04-18 | スリーエム イノベイティブ プロパティズ カンパニー | 官能化ジルコニアナノ粒子及びそれから作製される高屈折率膜 |
WO2013085062A1 (ja) * | 2011-12-09 | 2013-06-13 | 株式会社日本触媒 | 化合物、金属酸化物粒子及びそれらの製造方法と用途 |
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Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2984628A (en) * | 1956-11-29 | 1961-05-16 | Du Pont | Concentrated zirconia and hafnia aquasols and their preparation |
JPS6197134A (ja) * | 1984-10-16 | 1986-05-15 | Etsuro Kato | ジルコニア系凝集粒子粉末および製造方法 |
JPS62162626A (ja) * | 1986-01-14 | 1987-07-18 | Etsuro Kato | 単斜ジルコニア超微結晶の高分散ゾルまたはゲルおよび製造方法 |
JPS62223018A (ja) * | 1985-12-10 | 1987-10-01 | Etsuro Kato | 薄板状含水ジルコニア微結晶および製造方法 |
JPS6328437A (ja) * | 1986-07-18 | 1988-02-06 | セラミック デザイン インターナショナル ホールディング ビイ.ブイ. | 反応生成物を製造する方法及び装置 |
WO1990009350A1 (en) * | 1989-02-10 | 1990-08-23 | Nippon Shokubai Kagaku Kogyo Co., Ltd. | Zirconia sol, preparation thereof, slurry for use in the production of porous ceramic, and porous ceramic produced from said slurry |
US5037579A (en) * | 1990-02-12 | 1991-08-06 | Nalco Chemical Company | Hydrothermal process for producing zirconia sol |
JPH04187519A (ja) * | 1990-11-21 | 1992-07-06 | Tosoh Corp | 水和ジルコニアゾルの製造方法 |
JPH06321541A (ja) * | 1993-05-18 | 1994-11-22 | Etsuro Kato | ジルコニア単分散球状超微粒子粉末の製造方法 |
JPH08277194A (ja) * | 1995-03-31 | 1996-10-22 | Etsuro Kato | 薄片状単斜ジルコニア微結晶の製造方法 |
JP2003512287A (ja) * | 1999-10-28 | 2003-04-02 | スリーエム イノベイティブ プロパティズ カンパニー | ジルコニアゾル及びその製造方法 |
JP2005035860A (ja) * | 2003-07-18 | 2005-02-10 | Asahi Kasei Corp | 多孔質結晶性ジルコニア材料 |
JP2005219934A (ja) * | 2004-02-03 | 2005-08-18 | Dowa Mining Co Ltd | 酸化ジルコニウム微粒子懸濁液およびその製造方法 |
JP2005255450A (ja) * | 2004-03-10 | 2005-09-22 | National Institute Of Advanced Industrial & Technology | 酸化ジルコニウム結晶粒子とその製造方法 |
Family Cites Families (87)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US704558A (en) * | 1902-03-17 | 1902-07-15 | James Thomas Miller | Package for carbon or other thin paper. |
JPS59107969A (ja) | 1982-12-08 | 1984-06-22 | 加藤 悦朗 | ジルコニア系固溶体単結晶超微粒子の分散したゾルおよび製造方法 |
JPS60176920A (ja) | 1984-02-21 | 1985-09-11 | Etsuro Kato | ジルコニア系単結晶超微粒子の分散したゾルおよび製造方法 |
JPS60251465A (ja) | 1984-05-28 | 1985-12-12 | Fujitsu Ltd | 文字編集処理方式 |
EP0176874A3 (en) | 1984-09-19 | 1988-02-10 | Toray Industries, Inc. | A highly-refractive plastic lens |
US4812032A (en) | 1984-09-19 | 1989-03-14 | Toray Industries, Inc. | Highly-refractive plastic lens |
US4568445A (en) | 1984-12-21 | 1986-02-04 | Honeywell Inc. | Electrode system for an electro-chemical sensor for measuring vapor concentrations |
US4619817A (en) | 1985-03-27 | 1986-10-28 | Battelle Memorial Institute | Hydrothermal method for producing stabilized zirconia |
US4845056A (en) | 1987-10-09 | 1989-07-04 | Allied-Signal Inc. | Continuous process for production of fine particulate ceramics |
IT1217414B (it) | 1988-04-14 | 1990-03-22 | Istituto Guido Donegami S P A | Processo per la preparazione di polveri submicroniche di ossido di zirconio stabilizzato con ossido i ittrio |
US5234870A (en) * | 1988-07-21 | 1993-08-10 | Nippon Shokubai Kagaku Kogyo Co., Ltd. | Zirconia sol and method for production thereof |
US5223176A (en) * | 1988-09-30 | 1993-06-29 | Nissan Chemical Industries, Ltd. | Zirconia sol and method for making the same |
US5047174A (en) * | 1988-11-21 | 1991-09-10 | Akzo America Inc. | Production of stable metal oxide sols |
US5453262A (en) | 1988-12-09 | 1995-09-26 | Battelle Memorial Institute | Continuous process for production of ceramic powders with controlled morphology |
US5175030A (en) | 1989-02-10 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Microstructure-bearing composite plastic articles and method of making |
US5183597A (en) | 1989-02-10 | 1993-02-02 | Minnesota Mining And Manufacturing Company | Method of molding microstructure bearing composite plastic articles |
US5486949A (en) | 1989-06-20 | 1996-01-23 | The Dow Chemical Company | Birefringent interference polarizer |
US5068868A (en) * | 1990-05-21 | 1991-11-26 | At&T Bell Laboratories | Vertical cavity surface emitting lasers with electrically conducting mirrors |
US5523691A (en) * | 1990-07-26 | 1996-06-04 | Unison Industries Limited Partnership | Diagnostic device for gas turbine ignition system |
GB9200891D0 (en) * | 1992-01-16 | 1992-03-11 | Mann Stephen P | Formulation of microorganisms |
JP3133131B2 (ja) * | 1992-02-27 | 2001-02-05 | 旭化成工業株式会社 | 複合シート |
JP3155327B2 (ja) | 1992-03-27 | 2001-04-09 | 三菱化学株式会社 | 高屈折率光学材料およびその製造法 |
US5652192A (en) | 1992-07-10 | 1997-07-29 | Battelle Memorial Institute | Catalyst material and method of making |
WO1994001361A1 (en) | 1992-07-10 | 1994-01-20 | Battelle Memorial Institute | Method and apparatus for making nanometer sized particles |
US5828488A (en) | 1993-12-21 | 1998-10-27 | Minnesota Mining And Manufacturing Co. | Reflective polarizer display |
US5882774A (en) | 1993-12-21 | 1999-03-16 | Minnesota Mining And Manufacturing Company | Optical film |
JPH07226566A (ja) * | 1994-02-10 | 1995-08-22 | Nec Corp | 量子井戸半導体レーザおよびその製造方法 |
US5937274A (en) * | 1995-01-31 | 1999-08-10 | Hitachi, Ltd. | Fabrication method for AlGaIn NPAsSb based devices |
US5698483A (en) | 1995-03-17 | 1997-12-16 | Institute Of Gas Technology | Process for preparing nanosized powder |
CN1146091C (zh) * | 1995-03-31 | 2004-04-14 | 松下电器产业株式会社 | 半导体激光装置和采用它的光盘设备 |
DE19515820A1 (de) | 1995-04-29 | 1996-10-31 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung schwach agglomerierter nanoskaliger Teilchen |
US5638392A (en) * | 1995-05-15 | 1997-06-10 | Motorola | Short wavelength VCSEL |
WO1997010527A1 (en) | 1995-09-14 | 1997-03-20 | The Regents Of The University Of California | Structured index optics and ophthalmic lenses for vision correction |
US5917664A (en) | 1996-02-05 | 1999-06-29 | 3M Innovative Properties Company | Brightness enhancement film with soft cutoff |
US5757830A (en) * | 1996-02-07 | 1998-05-26 | Massachusetts Institute Of Technology | Compact micro-optical edge-emitting semiconductor laser assembly |
US5783120A (en) | 1996-02-29 | 1998-07-21 | Minnesota Mining And Manufacturing Company | Method for making an optical film |
US5825543A (en) | 1996-02-29 | 1998-10-20 | Minnesota Mining And Manufacturing Company | Diffusely reflecting polarizing element including a first birefringent phase and a second phase |
JPH09283857A (ja) * | 1996-04-11 | 1997-10-31 | Ricoh Co Ltd | 半導体の製造方法及び半導体素子 |
US5919551A (en) | 1996-04-12 | 1999-07-06 | 3M Innovative Properties Company | Variable pitch structured optical film |
JP2905739B2 (ja) * | 1996-04-24 | 1999-06-14 | 株式会社エイ・ティ・アール光電波通信研究所 | 全光型半導体画像記憶装置とその画像記憶及び消去方法、及び全光型半導体論理演算装置とその論理演算方法 |
US5908874A (en) | 1996-06-18 | 1999-06-01 | 3M Innovative Properties Company | Polymerizable compositions containing fluorochemicals to reduce melting temperature |
US6233264B1 (en) * | 1996-08-27 | 2001-05-15 | Ricoh Company, Ltd. | Optical semiconductor device having an active layer containing N |
US5936929A (en) * | 1997-05-02 | 1999-08-10 | Motorola, Inc. | Optical submodule and method for making |
US5932626A (en) | 1997-05-09 | 1999-08-03 | Minnesota Mining And Manufacturing Company | Optical product prepared from high index of refraction brominated monomers |
US6280063B1 (en) | 1997-05-09 | 2001-08-28 | 3M Innovative Properties Company | Brightness enhancement article |
US6107364A (en) | 1997-05-09 | 2000-08-22 | 3M Innovative Properties Company | Methyl styrene as a high index of refraction monomer |
US6355754B1 (en) | 1997-05-09 | 2002-03-12 | 3M Innovative Properties Company | High refractive index chemical composition and polymers and polymeric material derived therefrom |
DE19746265A1 (de) * | 1997-10-20 | 1999-04-22 | Bayer Ag | Verbunde aus Polyurethan und einem thermoplastischen Material |
US6329058B1 (en) | 1998-07-30 | 2001-12-11 | 3M Innovative Properties Company | Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers |
EP1014113A3 (en) | 1998-12-21 | 2001-05-09 | Dsm N.V. | Photo curable resin composition and optical parts |
SG76636A1 (en) * | 1998-12-22 | 2000-11-21 | Medinol Ltd | Apparatus and method for securing a stent on a balloon |
US6247986B1 (en) | 1998-12-23 | 2001-06-19 | 3M Innovative Properties Company | Method for precise molding and alignment of structures on a substrate using a stretchable mold |
NL1014465C2 (nl) | 1999-03-01 | 2002-01-29 | Ciba Sc Holding Ag | Stabilisatorcombinatie voor het rotomoldingproces. |
JP4524463B2 (ja) * | 1999-07-27 | 2010-08-18 | 三井化学株式会社 | ガスバリア性ポリウレタン樹脂及びこれを含むガスバリア性フィルム |
US6356391B1 (en) | 1999-10-08 | 2002-03-12 | 3M Innovative Properties Company | Optical film with variable angle prisms |
US6663978B1 (en) | 2000-06-28 | 2003-12-16 | 3M Innovative Properties Company | High refractive index pressure-sensitive adhesives |
US6387981B1 (en) | 1999-10-28 | 2002-05-14 | 3M Innovative Properties Company | Radiopaque dental materials with nano-sized particles |
JP2004508261A (ja) | 2000-09-05 | 2004-03-18 | アルテア ナノマテリアルズ インコーポレイテッド | 混合した金属酸化物及び金属酸化物のコンパウンドの製造方法 |
US6752979B1 (en) | 2000-11-21 | 2004-06-22 | Very Small Particle Company Pty Ltd | Production of metal oxide particles with nano-sized grains |
US6541591B2 (en) | 2000-12-21 | 2003-04-01 | 3M Innovative Properties Company | High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers |
AR032424A1 (es) | 2001-01-30 | 2003-11-05 | Procter & Gamble | Composiciones de recubrimiento para modificar superficies. |
US6656990B2 (en) | 2001-07-11 | 2003-12-02 | Corning Incorporated | Curable high refractive index compositions |
CN1168785C (zh) * | 2001-09-13 | 2004-09-29 | 湖北葛店开发区地大纳米材料制造有限公司 | 纳米氧化锆粉体的制备方法 |
US6982073B2 (en) | 2001-11-02 | 2006-01-03 | Altair Nanomaterials Inc. | Process for making nano-sized stabilized zirconia |
US6962946B2 (en) | 2001-11-21 | 2005-11-08 | 3M Innovative Properties Company | Nanoparticles having a rutile-like crystalline phase and method of preparing same |
US6703334B2 (en) | 2001-12-17 | 2004-03-09 | Praxair S.T. Technology, Inc. | Method for manufacturing stabilized zirconia |
US20050256219A1 (en) | 2002-03-11 | 2005-11-17 | Hideaki Takase | Photocurable resin composition and optical component |
US6833176B2 (en) | 2003-01-06 | 2004-12-21 | General Electric Company | Radiation curable microstructure-bearing articles |
US6844950B2 (en) | 2003-01-07 | 2005-01-18 | General Electric Company | Microstructure-bearing articles of high refractive index |
KR100544628B1 (ko) | 2003-03-07 | 2006-01-23 | 한국화학연구원 | 지르코니아 수화물 나노입자 졸의 연속 제조방법 |
TWI252215B (en) | 2003-03-27 | 2006-04-01 | Univ Nat Central | Zirconia sol and method of preparing the same |
US6846089B2 (en) | 2003-05-16 | 2005-01-25 | 3M Innovative Properties Company | Method for stacking surface structured optical films |
US7046439B2 (en) | 2003-05-22 | 2006-05-16 | Eastman Kodak Company | Optical element with nanoparticles |
US6833391B1 (en) | 2003-05-27 | 2004-12-21 | General Electric Company | Curable (meth)acrylate compositions |
US7584001B2 (en) * | 2003-07-17 | 2009-09-01 | Beck Kent F | Electrical epidermal stimulation device |
US7169375B2 (en) | 2003-08-29 | 2007-01-30 | General Electric Company | Metal oxide nanoparticles, methods of making, and methods of use |
US7045558B2 (en) | 2003-08-29 | 2006-05-16 | General Electric Company | Method of making a high refractive index optical management coating and the coating |
US7289202B2 (en) | 2004-09-10 | 2007-10-30 | 3M Innovative Properties Company | Methods for testing durable optical elements |
US7282272B2 (en) * | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
US20050148735A1 (en) | 2003-12-30 | 2005-07-07 | Olson David B. | Polymerizable composition for optical articles |
US20050147838A1 (en) | 2003-12-30 | 2005-07-07 | 3M Innovative Properties Company | Polymerizable compositions for optical articles |
US20060017702A1 (en) | 2004-07-23 | 2006-01-26 | Chung-Yi Shen | Touch control type character input method and control module thereof |
TWI317444B (en) | 2004-09-03 | 2009-11-21 | Eternal Chemical Co Ltd | Optical film having high hardness and use thereof |
US7241437B2 (en) | 2004-12-30 | 2007-07-10 | 3M Innovative Properties Company | Zirconia particles |
US7491441B2 (en) * | 2004-12-30 | 2009-02-17 | 3M Innovative Properties Company | High refractive index, durable hard coats |
US20060204676A1 (en) * | 2005-03-11 | 2006-09-14 | Jones Clinton L | Polymerizable composition comprising low molecular weight organic component |
-
2004
- 2004-12-30 US US11/027,426 patent/US7241437B2/en active Active
-
2005
- 2005-12-16 CN CN2005800488512A patent/CN101132989B/zh active Active
- 2005-12-16 WO PCT/US2005/046006 patent/WO2006073783A1/en active Application Filing
- 2005-12-16 JP JP2007549461A patent/JP5015801B2/ja active Active
- 2005-12-16 EP EP05854675.5A patent/EP1836128B1/en active Active
-
2007
- 2007-06-07 US US11/759,520 patent/US7429422B2/en active Active
-
2008
- 2008-08-19 US US12/194,183 patent/US7674523B2/en active Active
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2984628A (en) * | 1956-11-29 | 1961-05-16 | Du Pont | Concentrated zirconia and hafnia aquasols and their preparation |
JPS6197134A (ja) * | 1984-10-16 | 1986-05-15 | Etsuro Kato | ジルコニア系凝集粒子粉末および製造方法 |
JPS62223018A (ja) * | 1985-12-10 | 1987-10-01 | Etsuro Kato | 薄板状含水ジルコニア微結晶および製造方法 |
JPS62162626A (ja) * | 1986-01-14 | 1987-07-18 | Etsuro Kato | 単斜ジルコニア超微結晶の高分散ゾルまたはゲルおよび製造方法 |
JPS6328437A (ja) * | 1986-07-18 | 1988-02-06 | セラミック デザイン インターナショナル ホールディング ビイ.ブイ. | 反応生成物を製造する方法及び装置 |
WO1990009350A1 (en) * | 1989-02-10 | 1990-08-23 | Nippon Shokubai Kagaku Kogyo Co., Ltd. | Zirconia sol, preparation thereof, slurry for use in the production of porous ceramic, and porous ceramic produced from said slurry |
US5037579A (en) * | 1990-02-12 | 1991-08-06 | Nalco Chemical Company | Hydrothermal process for producing zirconia sol |
JPH04187519A (ja) * | 1990-11-21 | 1992-07-06 | Tosoh Corp | 水和ジルコニアゾルの製造方法 |
JPH06321541A (ja) * | 1993-05-18 | 1994-11-22 | Etsuro Kato | ジルコニア単分散球状超微粒子粉末の製造方法 |
JPH08277194A (ja) * | 1995-03-31 | 1996-10-22 | Etsuro Kato | 薄片状単斜ジルコニア微結晶の製造方法 |
JP2003512287A (ja) * | 1999-10-28 | 2003-04-02 | スリーエム イノベイティブ プロパティズ カンパニー | ジルコニアゾル及びその製造方法 |
JP2005035860A (ja) * | 2003-07-18 | 2005-02-10 | Asahi Kasei Corp | 多孔質結晶性ジルコニア材料 |
JP2005219934A (ja) * | 2004-02-03 | 2005-08-18 | Dowa Mining Co Ltd | 酸化ジルコニウム微粒子懸濁液およびその製造方法 |
JP2005255450A (ja) * | 2004-03-10 | 2005-09-22 | National Institute Of Advanced Industrial & Technology | 酸化ジルコニウム結晶粒子とその製造方法 |
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JP2013512850A (ja) * | 2009-12-02 | 2013-04-18 | スリーエム イノベイティブ プロパティズ カンパニー | 官能化ジルコニアナノ粒子及びそれから作製される高屈折率膜 |
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US7674523B2 (en) | 2010-03-09 |
CN101132989A (zh) | 2008-02-27 |
JP5015801B2 (ja) | 2012-08-29 |
EP1836128A1 (en) | 2007-09-26 |
CN101132989B (zh) | 2012-10-03 |
US7429422B2 (en) | 2008-09-30 |
US20070232705A1 (en) | 2007-10-04 |
US20080305943A1 (en) | 2008-12-11 |
US7241437B2 (en) | 2007-07-10 |
WO2006073783A1 (en) | 2006-07-13 |
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US20060148950A1 (en) | 2006-07-06 |
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