JP2008275995A - 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 - Google Patents
微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 Download PDFInfo
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- JP2008275995A JP2008275995A JP2007120833A JP2007120833A JP2008275995A JP 2008275995 A JP2008275995 A JP 2008275995A JP 2007120833 A JP2007120833 A JP 2007120833A JP 2007120833 A JP2007120833 A JP 2007120833A JP 2008275995 A JP2008275995 A JP 2008275995A
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- 238000002156 mixing Methods 0.000 claims abstract description 30
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- 230000008569 process Effects 0.000 claims abstract description 24
- 125000003277 amino group Chemical group 0.000 claims abstract description 22
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- -1 —OH Chemical group 0.000 claims description 25
- 229920001577 copolymer Polymers 0.000 claims description 18
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- 239000000758 substrate Substances 0.000 claims description 18
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 16
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 13
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- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
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- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
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Abstract
【解決手段】本発明の微細化パターン形成用水溶性樹脂組成物は、水溶性ビニル樹脂、分子内に少なくとも2個のアミノ基を有する化合物、溶剤および必要に応じ界面活性剤などの添加剤からなる。
【選択図】図1
Description
で表される基を有する化合物が挙げられる。前記一般式(2)の2つのアミノ基は、1級アミノ基、2級アミノ基、3級アミノ基のいずれであってもよい。
AZ−EM社製のビニルピロリドンモノマーとビニルイミダゾールモノマーとの共重合体(質量比2:1)10gを純水90gに溶解した溶液に2−(2−アミノエチルアミノ)エタノール5gを添加し、よく攪拌した後に、0.05ミクロンのフィルターを通してろ過して、微細化パターン形成用の水溶性樹脂組成物を調製した。
AZ−EM社製のビニルピロリドンモノマーとビニルイミダゾールモノマーとの共重合体(質量比1:1)10gを純水90gに溶解した溶液に2−(2−アミノエチルアミノ)プロパノール4gを添加し、ろ過することにより微細化パターン形成用の水溶性樹脂組成物を調製した。
AZ−EM社製のビニルピロリドンモノマーとビニルイミダゾールモノマーとの共重合体(質量比1:2)10gを純水90gに溶解した溶液に2−(2―アミノ−1,1−ジメチルエチルアミノ)エタノール3gを添加し、よく攪拌してからろ過することにより微細化パターン形成用の水溶性樹脂組成物を調製した。
ビニルピロリドンモノマーとビニルイミダゾールモノマー並びにメタアクリレートモノマーのなかから10重量%の水酸化ナトリウム水溶液で重合禁止剤を抽出洗浄し、重合開始剤である0.9gのAIBN(アゾビスイソブチロニトリル)を100gのイソプロパノールに溶解させた溶液が65℃になった後に、12gのビニルピロリドンモノマーと8gのビニルイミダゾールモノマー並びに2gのメタアクリレートモノマーをそれぞれビュレットで同時にゆっくり滴下する。5時間の重合反応の後、反応溶液を常温で冷却させ、減圧蒸留し、濃縮させた溶液をジエチルエーテルに沈殿させた。更に沈殿物をイソプロパノールに溶解させてからジエチルエーテルに沈殿させて精製した。このようにして得られたビニルピロリドンモノマーとビニルイミダゾールモノマー並びにメタアクリレートモノマーとの3元共重合体(質量比6:4:1)10gを純水90gに溶解してから、1−(2−ヒドロキシメチル)−イミダゾリジノン7gを添加し、よく攪拌してからろ過することにより微細化パターン形成用の水溶性樹脂組成物を調製した。
ラジカル重合により得られたビニルピロリドンモノマーとビニルイミダゾールモノマー並びにヒドロキシエチルアクリレートモノマーとの三元共重合体(質量比2:2:1)10gを純水80gに溶解した溶液に、2−(2−アミノエチルアミノ)エタノール5gを添加し、良く混合させたあと、ろ過することにより、微細化パターン形成用の水溶性樹脂組成物を調製した。
実施例2において、レジストパターンが形成された基板上に2−(2−アミノエチルアミノ)プロパノールの代わりに架橋剤を含むAZ−EM社製の水溶性樹脂組成物を塗布処理して実施例1と全く同一の工程を行ったところ、パターン寸法は80nmから65nmに変化したが、微細化パターンにはミクロブリッジが発生した。
2 レジストパターン
3 水溶性樹脂組成物膜
4 水不溶化層
Claims (11)
- (A)水溶性ビニル樹脂、(B)分子内に少なくとも2個のアミノ基を有する化合物、および(C)溶剤からなる微細化パターン形成用水溶性樹脂組成物。
- 請求項1記載の微細化パターン形成用水溶性樹脂組成物において、水溶性ビニル樹脂(A)が、窒素原子を含有するビニルモノマーの単一重合体、窒素原子を含有するビニルモノマーの2種以上からなる共重合体、または窒素原子を含有するビニルモノマーの少なくとも1種と窒素原子を含有しないビニルモノマーの少なくとも1種からなる共重合体であることを特徴とする微細化パターン形成用水溶性樹脂組成物。
- 請求項2記載の微細化パターン形成用水溶性樹脂組成物において、窒素原子を含有するビニルモノマーが、アリルアミン、アクリルアミド、ビニルピロリドン、ビニルカプロラクタムまたはビニルイミダゾールであり、窒素原子を含有しないビニルモノマーが、(メタ)アクリル酸、(メタ)アクリル酸アルキルエステルまたはヒドロキシアルキル(メタ)アクリレートであることを特徴とする微細化パターン形成用水溶性樹脂組成物。
- 請求項2記載の微細化パターン形成用水溶性樹脂組成物において、水溶性ビニル樹脂(A)が、ビニルピロリドンとビニルイミダゾールの共重合体であることを特徴とする微細化パターン形成用水溶性樹脂組成物。
- 請求項6記載の微細化パターン形成用水溶性樹脂組成物において、一般式(2)で表される基を分子内に有する化合物が、下記一般式(3)で表される化合物であることを特徴とする微細化パターン形成用水溶性樹脂組成物。
一般式(3):
- 請求項1〜7のいずれかに記載の微細化パターン形成用組成物において、水溶性ビニル樹脂(A)と分子内に少なくとも2個のアミノ基を有する化合物(B)の重量比(A):(B)が、70:30〜99.9:0.1であることを特徴とする微細化パターン形成用水溶性樹脂組成物。
- 請求項1〜8のいずれかに記載の微細化パターン形成用水溶性樹脂組成物において、該微細化パターン形成用水溶性樹脂組成物がさらに界面活性剤を含有することを特徴とする微細化パターン形成用水溶性樹脂組成物。
- リソグラフィー工程で下地基板上に形成されたレジストパターンの上に、請求項1〜9のいずれかに記載の微細化パターン形成用水溶性樹脂組成物を塗布して水溶性樹脂組成物膜を形成した後、レジスト膜と水溶性樹脂組成物膜とをミキシングさせ、次いで前記水溶性樹脂組成物膜を水洗して除去する工程からなる微細化されたパターンの形成方法。
- 請求項10記載の微細化されたパターンの形成方法において、ミキシングが加熱により行われることを特徴とする微細化されたパターンの形成方法。
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JP2007120833A JP5069494B2 (ja) | 2007-05-01 | 2007-05-01 | 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 |
TW097115646A TW200916523A (en) | 2007-05-01 | 2008-04-29 | Fine pattern forming aqueous resin composition and fine pattern forming method using the same |
KR1020097025070A KR101426320B1 (ko) | 2007-05-01 | 2008-05-01 | 미세화 패턴 형성용 수용성 수지 조성물 및 이를 사용한 미세 패턴 형성 방법 |
PCT/JP2008/058341 WO2008136499A1 (ja) | 2007-05-01 | 2008-05-01 | 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 |
CN2008800143173A CN101675390B (zh) | 2007-05-01 | 2008-05-01 | 用于形成精细图案的水溶性树脂组合物及使用该组合物形成精细图案的方法 |
US12/451,150 US20100119717A1 (en) | 2007-05-01 | 2008-05-01 | Water-soluble resin composition for the formation of micropatterns and method for the formation of micropatterns with the same |
EP08752271.0A EP2146250B1 (en) | 2007-05-01 | 2008-05-01 | Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same |
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JP2007120833A Active JP5069494B2 (ja) | 2007-05-01 | 2007-05-01 | 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 |
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US (1) | US20100119717A1 (ja) |
EP (1) | EP2146250B1 (ja) |
JP (1) | JP5069494B2 (ja) |
KR (1) | KR101426320B1 (ja) |
CN (1) | CN101675390B (ja) |
TW (1) | TW200916523A (ja) |
WO (1) | WO2008136499A1 (ja) |
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Publication number | Publication date |
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EP2146250B1 (en) | 2017-08-23 |
CN101675390B (zh) | 2012-07-18 |
WO2008136499A1 (ja) | 2008-11-13 |
CN101675390A (zh) | 2010-03-17 |
KR101426320B1 (ko) | 2014-08-06 |
JP5069494B2 (ja) | 2012-11-07 |
EP2146250A4 (en) | 2011-07-06 |
KR20100027120A (ko) | 2010-03-10 |
EP2146250A1 (en) | 2010-01-20 |
EP2146250A8 (en) | 2010-03-03 |
TW200916523A (en) | 2009-04-16 |
US20100119717A1 (en) | 2010-05-13 |
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