JP2007536725A5 - - Google Patents
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- JP2007536725A5 JP2007536725A5 JP2007510978A JP2007510978A JP2007536725A5 JP 2007536725 A5 JP2007536725 A5 JP 2007536725A5 JP 2007510978 A JP2007510978 A JP 2007510978A JP 2007510978 A JP2007510978 A JP 2007510978A JP 2007536725 A5 JP2007536725 A5 JP 2007536725A5
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- Prior art keywords
- layer
- plating
- alloy
- hour
- wafer
- Prior art date
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- 239000010410 layer Substances 0.000 description 16
- 238000007747 plating Methods 0.000 description 9
- 239000010949 copper Substances 0.000 description 8
- 229910000881 Cu alloy Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56632204P | 2004-04-28 | 2004-04-28 | |
| US60/566,322 | 2004-04-28 | ||
| PCT/US2005/014634 WO2005104780A2 (en) | 2004-04-28 | 2005-04-27 | Vertical structure semiconductor devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007536725A JP2007536725A (ja) | 2007-12-13 |
| JP2007536725A5 true JP2007536725A5 (enExample) | 2013-03-14 |
| JP5336075B2 JP5336075B2 (ja) | 2013-11-06 |
Family
ID=35242177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007510978A Expired - Fee Related JP5336075B2 (ja) | 2004-04-28 | 2005-04-27 | 縦構造半導体装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7465592B2 (enExample) |
| EP (1) | EP1749308A4 (enExample) |
| JP (1) | JP5336075B2 (enExample) |
| KR (2) | KR101254539B1 (enExample) |
| CN (2) | CN101901858B (enExample) |
| TW (1) | TWI385816B (enExample) |
| WO (1) | WO2005104780A2 (enExample) |
Families Citing this family (114)
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- 2005-04-27 CN CN2005800210066A patent/CN101366121B/zh not_active Expired - Fee Related
- 2005-04-27 EP EP05758731A patent/EP1749308A4/en not_active Withdrawn
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