JP2007310334A - ハーフトーン露光法を用いた液晶表示装置の製造法 - Google Patents
ハーフトーン露光法を用いた液晶表示装置の製造法 Download PDFInfo
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0231—Manufacture or treatment of multiple TFTs using masks, e.g. half-tone masks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
- G02F1/136236—Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13625—Patterning using multi-mask exposure
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Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006166674A JP2007310334A (ja) | 2006-05-19 | 2006-05-19 | ハーフトーン露光法を用いた液晶表示装置の製造法 |
| TW096106310A TW200744216A (en) | 2006-05-19 | 2007-02-16 | Method of manufacturing LCD apparatus by using halftone exposure method |
| CN2007100937512A CN101075584B (zh) | 2006-05-19 | 2007-04-11 | 使用半色调曝光法的液晶显示装置的制造法 |
| KR1020070042053A KR100934590B1 (ko) | 2006-05-19 | 2007-04-30 | 하프톤 노광법을 사용한 액정표시장치의 제조법 |
| GB0709203A GB2438490A (en) | 2006-05-19 | 2007-05-14 | Method of manufacturing LCD apparatus by using a halftone exposure method |
| US11/749,190 US7602456B2 (en) | 2006-05-19 | 2007-05-16 | Method of manufacturing LCD apparatus by using halftone exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| JP2006166674A JP2007310334A (ja) | 2006-05-19 | 2006-05-19 | ハーフトーン露光法を用いた液晶表示装置の製造法 |
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| US (1) | US7602456B2 (enExample) |
| JP (1) | JP2007310334A (enExample) |
| KR (1) | KR100934590B1 (enExample) |
| CN (1) | CN101075584B (enExample) |
| GB (1) | GB2438490A (enExample) |
| TW (1) | TW200744216A (enExample) |
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- 2007-04-11 CN CN2007100937512A patent/CN101075584B/zh not_active Expired - Fee Related
- 2007-04-30 KR KR1020070042053A patent/KR100934590B1/ko not_active Expired - Fee Related
- 2007-05-14 GB GB0709203A patent/GB2438490A/en not_active Withdrawn
- 2007-05-16 US US11/749,190 patent/US7602456B2/en not_active Expired - Fee Related
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| US8879015B2 (en) | 2009-01-05 | 2014-11-04 | Japan Display West Inc. | Liquid crystal display device having a switch device connected to a shield electrode and an interconnection and electronic apparatus |
| JP2010156903A (ja) * | 2009-01-05 | 2010-07-15 | Epson Imaging Devices Corp | 液晶表示装置および電子機器 |
| JP2010282173A (ja) * | 2009-06-02 | 2010-12-16 | Lg Display Co Ltd | 薄膜トランジスタを備えた表示素子及びその製造方法 |
| JP2012118199A (ja) * | 2010-11-30 | 2012-06-21 | Panasonic Liquid Crystal Display Co Ltd | 液晶パネル、液晶表示装置、及びその製造方法 |
| US8917370B2 (en) | 2010-11-30 | 2014-12-23 | Panasonic Liquid Crystal Display Co., Ltd. | Liquid crystal panel, liquid crystal display device, and manufacturing method thereof |
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| US9064750B2 (en) | 2012-12-10 | 2015-06-23 | Samasung Display Co., Ltd. | Display substrate and method of manufacturing the same |
| JP2016520205A (ja) * | 2013-04-28 | 2016-07-11 | 京東方科技集團股▲ふん▼有限公司Boe Technology Group Co.,Ltd. | アレイ基板およびその製作方法、当該アレイ基板を備える表示装置 |
| JP2018180241A (ja) * | 2017-04-12 | 2018-11-15 | Jnc株式会社 | 液晶表示素子 |
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Also Published As
| Publication number | Publication date |
|---|---|
| GB2438490A (en) | 2007-11-28 |
| KR100934590B1 (ko) | 2009-12-31 |
| GB0709203D0 (en) | 2007-06-20 |
| KR20070111975A (ko) | 2007-11-22 |
| CN101075584A (zh) | 2007-11-21 |
| TW200744216A (en) | 2007-12-01 |
| CN101075584B (zh) | 2012-12-26 |
| US7602456B2 (en) | 2009-10-13 |
| US20070269936A1 (en) | 2007-11-22 |
| TWI333280B (enExample) | 2010-11-11 |
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