JP2005518674A5 - - Google Patents

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Publication number
JP2005518674A5
JP2005518674A5 JP2003572077A JP2003572077A JP2005518674A5 JP 2005518674 A5 JP2005518674 A5 JP 2005518674A5 JP 2003572077 A JP2003572077 A JP 2003572077A JP 2003572077 A JP2003572077 A JP 2003572077A JP 2005518674 A5 JP2005518674 A5 JP 2005518674A5
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JP
Japan
Prior art keywords
substrate
axis
support
pushing member
edge
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JP2003572077A
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English (en)
Japanese (ja)
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JP4290561B2 (ja
JP2005518674A (ja
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Priority claimed from US10/084,762 external-priority patent/US6824343B2/en
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Publication of JP2005518674A publication Critical patent/JP2005518674A/ja
Publication of JP2005518674A5 publication Critical patent/JP2005518674A5/ja
Application granted granted Critical
Publication of JP4290561B2 publication Critical patent/JP4290561B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003572077A 2002-02-22 2003-02-18 基板支持体 Expired - Lifetime JP4290561B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/084,762 US6824343B2 (en) 2002-02-22 2002-02-22 Substrate support
PCT/US2003/004885 WO2003073479A1 (en) 2002-02-22 2003-02-18 Substrate support

Publications (3)

Publication Number Publication Date
JP2005518674A JP2005518674A (ja) 2005-06-23
JP2005518674A5 true JP2005518674A5 (enExample) 2006-01-05
JP4290561B2 JP4290561B2 (ja) 2009-07-08

Family

ID=27753531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003572077A Expired - Lifetime JP4290561B2 (ja) 2002-02-22 2003-02-18 基板支持体

Country Status (7)

Country Link
US (2) US6824343B2 (enExample)
EP (1) EP1485946B1 (enExample)
JP (1) JP4290561B2 (enExample)
KR (1) KR100636491B1 (enExample)
CN (1) CN100413017C (enExample)
TW (1) TWI279876B (enExample)
WO (1) WO2003073479A1 (enExample)

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CN107841727A (zh) * 2017-12-15 2018-03-27 北京创昱科技有限公司 一种冷却构件及真空镀膜设备
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