JP2005020030A5 - - Google Patents

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Publication number
JP2005020030A5
JP2005020030A5 JP2004298625A JP2004298625A JP2005020030A5 JP 2005020030 A5 JP2005020030 A5 JP 2005020030A5 JP 2004298625 A JP2004298625 A JP 2004298625A JP 2004298625 A JP2004298625 A JP 2004298625A JP 2005020030 A5 JP2005020030 A5 JP 2005020030A5
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JP
Japan
Prior art keywords
measuring
mirror
projection apparatus
lithographic projection
substrate
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JP2004298625A
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English (en)
Japanese (ja)
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JP2005020030A (ja
JP4332486B2 (ja
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Publication of JP2005020030A5 publication Critical patent/JP2005020030A5/ja
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JP2004298625A 1997-12-22 2004-10-13 時間を節約する高さ測定を用いた、基板にマスク・パターンを繰り返し投影する方法および装置 Expired - Fee Related JP4332486B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97204054 1997-12-22

Related Parent Applications (1)

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JP53327199A Division JP3631766B2 (ja) 1997-12-22 1998-12-11 時間を節約する高さ測定を用いた、基板にマスク・パターンを繰り返し投影する方法および装置

Publications (3)

Publication Number Publication Date
JP2005020030A JP2005020030A (ja) 2005-01-20
JP2005020030A5 true JP2005020030A5 (https=) 2006-01-19
JP4332486B2 JP4332486B2 (ja) 2009-09-16

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP53327199A Expired - Fee Related JP3631766B2 (ja) 1997-12-22 1998-12-11 時間を節約する高さ測定を用いた、基板にマスク・パターンを繰り返し投影する方法および装置
JP2004298625A Expired - Fee Related JP4332486B2 (ja) 1997-12-22 2004-10-13 時間を節約する高さ測定を用いた、基板にマスク・パターンを繰り返し投影する方法および装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP53327199A Expired - Fee Related JP3631766B2 (ja) 1997-12-22 1998-12-11 時間を節約する高さ測定を用いた、基板にマスク・パターンを繰り返し投影する方法および装置

Country Status (7)

Country Link
US (1) US6208407B1 (https=)
EP (1) EP0961954B1 (https=)
JP (2) JP3631766B2 (https=)
KR (1) KR100632427B1 (https=)
DE (1) DE69839069T2 (https=)
TW (1) TW399145B (https=)
WO (1) WO1999032940A1 (https=)

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