DE69839069T2 - Wiederholte projektion eines maskenmusters unter verwendung einer zeitsparenden höhenmessung - Google Patents

Wiederholte projektion eines maskenmusters unter verwendung einer zeitsparenden höhenmessung Download PDF

Info

Publication number
DE69839069T2
DE69839069T2 DE69839069T DE69839069T DE69839069T2 DE 69839069 T2 DE69839069 T2 DE 69839069T2 DE 69839069 T DE69839069 T DE 69839069T DE 69839069 T DE69839069 T DE 69839069T DE 69839069 T2 DE69839069 T2 DE 69839069T2
Authority
DE
Germany
Prior art keywords
substrate
measuring
height
projection
substrate holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69839069T
Other languages
German (de)
English (en)
Other versions
DE69839069D1 (de
Inventor
Erik Roelof Loopstra
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE69839069D1 publication Critical patent/DE69839069D1/de
Publication of DE69839069T2 publication Critical patent/DE69839069T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69839069T 1997-12-22 1998-12-11 Wiederholte projektion eines maskenmusters unter verwendung einer zeitsparenden höhenmessung Expired - Lifetime DE69839069T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97204054 1997-12-22
EP97204054 1997-12-22
PCT/EP1998/008090 WO1999032940A1 (en) 1997-12-22 1998-12-11 Repetitively projecting a mask pattern using a time-saving height measurement

Publications (2)

Publication Number Publication Date
DE69839069D1 DE69839069D1 (de) 2008-03-20
DE69839069T2 true DE69839069T2 (de) 2009-01-22

Family

ID=8229101

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69839069T Expired - Lifetime DE69839069T2 (de) 1997-12-22 1998-12-11 Wiederholte projektion eines maskenmusters unter verwendung einer zeitsparenden höhenmessung

Country Status (7)

Country Link
US (1) US6208407B1 (https=)
EP (1) EP0961954B1 (https=)
JP (2) JP3631766B2 (https=)
KR (1) KR100632427B1 (https=)
DE (1) DE69839069T2 (https=)
TW (1) TW399145B (https=)
WO (1) WO1999032940A1 (https=)

Families Citing this family (356)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW396395B (en) * 1998-01-07 2000-07-01 Nikon Corp Exposure method and scanning-type aligner
PL195600B1 (pl) 1998-05-15 2007-10-31 Astrazeneca Ab Pochodne benzamidowe, sposób ich wytwarzania, zawierające je kompozycje farmaceutyczne oraz ich zastosowanie do wytwarzania leku do leczenia stanów medycznych powstających za pośrednictwem cytokin
EP1134793A4 (en) * 1998-06-17 2006-07-26 Nikon Corp EXPOSURE METHOD AND DEVICE
US6924884B2 (en) 1999-03-08 2005-08-02 Asml Netherlands B.V. Off-axis leveling in lithographic projection apparatus
EP1037117A3 (en) * 1999-03-08 2003-11-12 ASML Netherlands B.V. Off-axis levelling in lithographic projection apparatus
US7116401B2 (en) * 1999-03-08 2006-10-03 Asml Netherlands B.V. Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
TW490596B (en) * 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
JP2001015420A (ja) * 1999-06-30 2001-01-19 Toshiba Corp 半導体ウエハのパターン露光方法およびパターン露光装置
JP2001160535A (ja) * 1999-09-20 2001-06-12 Nikon Corp 露光装置、及び該装置を用いるデバイス製造方法
US6525802B1 (en) * 1999-11-05 2003-02-25 Nikon Corporation Kinematic mounted reference mirror with provision for stable mounting of alignment optics
JP2001160530A (ja) 1999-12-01 2001-06-12 Nikon Corp ステージ装置及び露光装置
JP2001332490A (ja) * 2000-03-14 2001-11-30 Nikon Corp 位置合わせ方法、露光方法、露光装置、及びデバイス製造方法
US6717159B2 (en) 2000-10-18 2004-04-06 Nikon Corporation Low distortion kinematic reticle support
US6859260B2 (en) * 2001-04-25 2005-02-22 Asml Holding N.V. Method and system for improving focus accuracy in a lithography system
DE10136387A1 (de) * 2001-07-26 2003-02-13 Zeiss Carl Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie
US6678038B2 (en) 2001-08-03 2004-01-13 Nikon Corporation Apparatus and methods for detecting tool-induced shift in microlithography apparatus
US6674512B2 (en) 2001-08-07 2004-01-06 Nikon Corporation Interferometer system for a semiconductor exposure system
US6785005B2 (en) 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
US6665054B2 (en) 2001-10-22 2003-12-16 Nikon Corporation Two stage method
JP3780221B2 (ja) * 2002-03-26 2006-05-31 キヤノン株式会社 露光方法及び装置
DE10219514A1 (de) * 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
US6757110B2 (en) 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
US7170075B2 (en) * 2002-07-18 2007-01-30 Rudolph Technologies, Inc. Inspection tool with a 3D point sensor to develop a focus map
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
KR101157002B1 (ko) 2002-12-10 2012-06-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4645027B2 (ja) * 2002-12-10 2011-03-09 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
DE10261775A1 (de) * 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
EP2466621B1 (en) 2003-02-26 2015-04-01 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
SG123601A1 (en) * 2003-03-10 2006-07-26 Asml Netherlands Bv Focus spot monitoring in a lithographic projectionapparatus
KR20170018113A (ko) * 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101159564B1 (ko) * 2003-04-11 2012-06-25 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법
KR20170016014A (ko) * 2003-04-11 2017-02-10 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
JPWO2004094940A1 (ja) 2003-04-23 2006-07-13 株式会社ニコン 干渉計システム、干渉計システムにおける信号処理方法、該信号処理方法を用いるステージ
TWI237307B (en) * 2003-05-01 2005-08-01 Nikon Corp Optical projection system, light exposing apparatus and light exposing method
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI421911B (zh) 2003-05-23 2014-01-01 尼康股份有限公司 An exposure method, an exposure apparatus, and an element manufacturing method
TWI424470B (zh) * 2003-05-23 2014-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
CN100541717C (zh) 2003-05-28 2009-09-16 株式会社尼康 曝光方法、曝光装置以及器件制造方法
KR101520591B1 (ko) 2003-06-13 2015-05-14 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
TWI515770B (zh) 2003-06-19 2016-01-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
ATE513309T1 (de) * 2003-07-09 2011-07-15 Nikon Corp Belichtungsvorrichtung und verfahren zur bauelementeherstellung
WO2005006416A1 (ja) * 2003-07-09 2005-01-20 Nikon Corporation 結合装置、露光装置、及びデバイス製造方法
WO2005006418A1 (ja) * 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
US7196300B2 (en) * 2003-07-18 2007-03-27 Rudolph Technologies, Inc. Dynamic focusing method and apparatus
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
CN102043350B (zh) 2003-07-28 2014-01-29 株式会社尼康 曝光装置、器件制造方法、及曝光装置的控制方法
KR101664642B1 (ko) * 2003-09-29 2016-10-11 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
WO2005031824A1 (ja) * 2003-09-29 2005-04-07 Nikon Corporation 投影露光装置、投影露光方法およびデバイス製造方法
CN1860585B (zh) * 2003-09-29 2010-04-28 株式会社尼康 液浸型透镜系统和投影曝光装置
WO2005036621A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
TWI598934B (zh) 2003-10-09 2017-09-11 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
WO2005048325A1 (ja) * 2003-11-17 2005-05-26 Nikon Corporation ステージ駆動方法及びステージ装置並びに露光装置
TW201809801A (zh) * 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
EP2717295B1 (en) 2003-12-03 2018-07-18 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
US20050134865A1 (en) * 2003-12-17 2005-06-23 Asml Netherlands B.V. Method for determining a map, device manufacturing method, and lithographic apparatus
US7265917B2 (en) 2003-12-23 2007-09-04 Carl Zeiss Smt Ag Replacement apparatus for an optical element
US6955074B2 (en) * 2003-12-29 2005-10-18 Asml Netherlands, B.V. Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
EP3376523A1 (en) * 2004-01-05 2018-09-19 Nikon Corporation Exposure apparatus, exposure method, and device producing method
CN1902733A (zh) * 2004-01-06 2007-01-24 株式会社尼康 曝光方法和装置以及器件制造方法
US7072024B2 (en) * 2004-01-20 2006-07-04 Nikon Corporation Lithographic projection method and apparatus
US6980279B2 (en) * 2004-01-22 2005-12-27 Nikon Corporation Interferometer system for measuring a height of wafer stage
US7697110B2 (en) * 2004-01-26 2010-04-13 Nikon Corporation Exposure apparatus and device manufacturing method
TWI395068B (zh) * 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
EP1713114B1 (en) 2004-02-03 2018-09-19 Nikon Corporation Exposure apparatus and device manufacturing method
TW200537255A (en) * 2004-02-04 2005-11-16 Nikon Corp Exposure equipment and method, position control method and device manufacturing method
EP1713115B1 (en) 2004-02-04 2016-05-04 Nikon Corporation Exposure apparatus, exposure method, and device producing method
TWI389174B (zh) 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
KR101166007B1 (ko) 2004-02-10 2012-07-17 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 메인터넌스 방법 및노광 방법
US7113256B2 (en) * 2004-02-18 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with feed-forward focus control
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
US7362447B2 (en) * 2004-02-20 2008-04-22 Agilent Technologies, Inc. Low walk-off interferometer
KR101106497B1 (ko) * 2004-02-20 2012-01-20 가부시키가이샤 니콘 노광 장치, 공급 방법 및 회수 방법, 노광 방법, 및디바이스 제조 방법
US7130056B2 (en) * 2004-02-20 2006-10-31 Agilent Technologies, Inc. System and method of using a side-mounted interferometer to acquire position information
US7034917B2 (en) * 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US6975407B1 (en) * 2004-05-19 2005-12-13 Taiwan Semiconductor Manufacturing Co, Ltd. Method of wafer height mapping
US7158236B2 (en) 2004-05-21 2007-01-02 Agilent Technologies, Inc. Heterodyne laser interferometer for measuring wafer stage translation
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1774405B1 (en) 2004-06-04 2014-08-06 Carl Zeiss SMT GmbH System for measuring the image quality of an optical imaging system
CN1954408B (zh) * 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
SG186621A1 (en) 2004-06-09 2013-01-30 Nikon Corp Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
WO2005122218A1 (ja) * 2004-06-09 2005-12-22 Nikon Corporation 露光装置及びデバイス製造方法
US8508713B2 (en) * 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8717533B2 (en) * 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20070026603A (ko) 2004-06-10 2007-03-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
US8373843B2 (en) * 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20180072867A (ko) 2004-06-10 2018-06-29 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
WO2006007167A2 (en) * 2004-06-17 2006-01-19 Nikon Corporation Magnetic levitation lithography apparatus and method
US7463330B2 (en) * 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101433491B1 (ko) * 2004-07-12 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN102998910A (zh) 2004-08-03 2013-03-27 株式会社尼康 曝光装置的控制方法、曝光方法及组件制造方法
TW200615716A (en) * 2004-08-05 2006-05-16 Nikon Corp Stage device and exposure device
US20060038972A1 (en) * 2004-08-17 2006-02-23 Nikon Corporation Lithographic system with separated isolation structures
KR20070048164A (ko) * 2004-08-18 2007-05-08 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7706074B2 (en) * 2004-09-13 2010-04-27 Nikon Corporation Projection optical system, method of manufacturing projection optical system, exposure apparatus, and exposure method
KR101700547B1 (ko) 2004-09-17 2017-01-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101151575B1 (ko) * 2004-10-01 2012-06-01 가부시키가이샤 니콘 리니어 모터, 스테이지 장치 및 노광 장치
EP1806771A4 (en) * 2004-10-08 2008-06-18 Nikon Corp EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
US7852456B2 (en) * 2004-10-13 2010-12-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20070068340A (ko) * 2004-10-13 2007-06-29 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP2426700B1 (en) * 2004-10-15 2018-01-10 Nikon Corporation Exposure apparatus and device manufacturing method
WO2006043434A1 (ja) * 2004-10-18 2006-04-27 Nikon Corporation 軸受装置及びステージ装置並びに露光装置
TWI405041B (zh) 2004-12-01 2013-08-11 尼康股份有限公司 Stage device and exposure device
TW200625026A (en) * 2004-12-06 2006-07-16 Nikon Corp Substrate processing method, method of exposure, exposure device and device manufacturing method
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US20060139595A1 (en) * 2004-12-27 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
TWI453796B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 偏光變更單元以及元件製造方法
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
WO2006080516A1 (ja) * 2005-01-31 2006-08-03 Nikon Corporation 露光装置及びデバイス製造方法
JP4738829B2 (ja) * 2005-02-09 2011-08-03 キヤノン株式会社 位置決め装置
US20070258068A1 (en) * 2005-02-17 2007-11-08 Hiroto Horikawa Exposure Apparatus, Exposure Method, and Device Fabricating Method
US7342641B2 (en) * 2005-02-22 2008-03-11 Nikon Corporation Autofocus methods and devices for lithography
WO2006101024A1 (ja) * 2005-03-18 2006-09-28 Nikon Corporation 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法
TWI424260B (zh) * 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
EP3159738B1 (en) 2005-03-25 2018-12-12 Nikon Corporation Method of determining distortion of a projection optical system
US20090226846A1 (en) * 2005-03-30 2009-09-10 Nikon Corporation Exposure Apparatus, Exposure Method, and Device Manufacturing Method
US9239524B2 (en) * 2005-03-30 2016-01-19 Nikon Corporation Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion region
US20070132976A1 (en) * 2005-03-31 2007-06-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
TW200644079A (en) * 2005-03-31 2006-12-16 Nikon Corp Exposure apparatus, exposure method, and device production method
EP1873816A4 (en) 2005-04-18 2010-11-24 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENTS MANUFACTURING METHOD
US7405811B2 (en) * 2005-04-20 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and positioning apparatus
US7349069B2 (en) * 2005-04-20 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and positioning apparatus
US20090135382A1 (en) * 2005-04-28 2009-05-28 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8236467B2 (en) 2005-04-28 2012-08-07 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8253924B2 (en) * 2005-05-24 2012-08-28 Nikon Corporation Exposure method, exposure apparatus and device manufacturing method
US20070085989A1 (en) * 2005-06-21 2007-04-19 Nikon Corporation Exposure apparatus and exposure method, maintenance method, and device manufacturing method
KR20080018158A (ko) 2005-06-21 2008-02-27 가부시키가이샤 니콘 노광 장치 및 노광 방법, 메인터넌스 방법과 디바이스 제조방법
US7924416B2 (en) * 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US8693006B2 (en) * 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
WO2007000995A1 (ja) * 2005-06-28 2007-01-04 Nikon Corporation 露光装置及び方法、並びにデバイス製造方法
US8179517B2 (en) * 2005-06-30 2012-05-15 Nikon Corporation Exposure apparatus and method, maintenance method for exposure apparatus, and device manufacturing method
TW200710616A (en) * 2005-07-11 2007-03-16 Nikon Corp Exposure apparatus and method for manufacturing device
EP1918983A4 (en) * 2005-08-05 2010-03-31 Nikon Corp STAGE EQUIPMENT AND EXPOSURE DEVICE
US7355719B2 (en) * 2005-08-16 2008-04-08 Agilent Technologies, Inc. Interferometer for measuring perpendicular translations
KR101449055B1 (ko) 2005-08-23 2014-10-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
CN101258581B (zh) 2005-09-09 2011-05-11 株式会社尼康 曝光装置及曝光方法以及设备制造方法
US8111374B2 (en) * 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
US20070070323A1 (en) * 2005-09-21 2007-03-29 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
EP1936665A4 (en) 2005-09-21 2010-03-31 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
US7948675B2 (en) * 2005-10-11 2011-05-24 Nikon Corporation Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods
US8681314B2 (en) * 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
US20070095739A1 (en) * 2005-10-24 2007-05-03 Nikon Corporation Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method
US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
EP1950795A4 (en) 2005-11-01 2010-06-02 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US20070127002A1 (en) * 2005-11-09 2007-06-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
JPWO2007055199A1 (ja) 2005-11-09 2009-04-30 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
WO2007055237A1 (ja) 2005-11-09 2007-05-18 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
WO2007058188A1 (ja) * 2005-11-15 2007-05-24 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
KR20080068820A (ko) 2005-11-16 2008-07-24 가부시키가이샤 니콘 기판 처리 방법, 포토마스크의 제조 방법 및 포토마스크,그리고 디바이스 제조 방법
KR20080071552A (ko) 2005-12-06 2008-08-04 가부시키가이샤 니콘 노광 방법, 노광 장치 및 디바이스 제조 방법
EP2768016B1 (en) 2005-12-08 2017-10-25 Nikon Corporation Exposure apparatus and method
TWI457977B (zh) 2005-12-28 2014-10-21 尼康股份有限公司 A pattern forming method and a pattern forming apparatus, and an element manufacturing method
US8411271B2 (en) * 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200801833A (en) 2006-02-16 2008-01-01 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
CN101980084B (zh) 2006-02-21 2013-01-23 株式会社尼康 曝光装置、曝光方法及组件制造方法
EP3267258A1 (en) 2006-02-21 2018-01-10 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
CN101385120B (zh) 2006-02-21 2012-09-05 株式会社尼康 测定装置及方法、处理装置及方法、图案形成装置及方法、曝光装置及方法、以及元件制造方法
JP4973652B2 (ja) 2006-03-03 2012-07-11 株式会社ニコン 露光装置及びデバイス製造方法
US7253875B1 (en) * 2006-03-03 2007-08-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007102484A1 (ja) * 2006-03-07 2007-09-13 Nikon Corporation デバイス製造方法、デバイス製造システム及び測定検査装置
EP1832933B1 (en) * 2006-03-08 2008-10-01 Erich Thallner Device manufacturing method and substrate processing apparatus, and substrate support structure
US9478501B2 (en) * 2006-03-08 2016-10-25 Erich Thallner Substrate processing and alignment
CN100590173C (zh) * 2006-03-24 2010-02-17 北京有色金属研究总院 一种荧光粉及其制造方法和所制成的电光源
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2037486A4 (en) * 2006-05-18 2012-01-11 Nikon Corp EXPOSURE METHOD AND DEVICE, MAINTENANCE METHOD AND COMPONENT MANUFACTURING METHOD
US20080024749A1 (en) * 2006-05-18 2008-01-31 Nikon Corporation Low mass six degree of freedom stage for lithography tools
US7728462B2 (en) * 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
US20070267995A1 (en) * 2006-05-18 2007-11-22 Nikon Corporation Six Degree-of-Freedom Stage Apparatus
TW200818256A (en) * 2006-05-22 2008-04-16 Nikon Corp Exposure method and apparatus, maintenance method, and device manufacturing method
EP2034515A4 (en) * 2006-05-23 2012-01-18 Nikon Corp MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE AND COMPONENT MANUFACTURING METHOD
KR20090023545A (ko) 2006-05-31 2009-03-05 가부시키가이샤 니콘 노광 장치 및 노광 방법
EP2037488A4 (en) 2006-06-09 2011-11-23 Nikon Corp STRUCTURAL FORMING METHOD, STRUCTURAL FORMING DEVICE, EXPOSURE METHOD, EXPOSURE DEVICE AND MANUFACTURING METHOD THEREFOR
CN101479832B (zh) * 2006-06-09 2011-05-11 株式会社尼康 移动体装置、曝光装置和曝光方法以及元件制造方法
KR20090029686A (ko) 2006-06-16 2009-03-23 가부시키가이샤 니콘 가변슬릿장치, 조명장치, 노광장치, 노광방법 및 디바이스 제조방법
WO2008001871A1 (en) 2006-06-30 2008-01-03 Nikon Corporation Maintenance method, exposure method and apparatus and device manufacturing method
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
US7872730B2 (en) * 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7999918B2 (en) * 2006-09-29 2011-08-16 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
KR101419196B1 (ko) 2006-09-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US20080100575A1 (en) * 2006-11-01 2008-05-01 Sehat Sutardja Low power optical mouse
WO2008056735A1 (en) * 2006-11-09 2008-05-15 Nikon Corporation Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method
WO2008059916A1 (en) * 2006-11-15 2008-05-22 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US20080158531A1 (en) * 2006-11-15 2008-07-03 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US20080212047A1 (en) * 2006-12-28 2008-09-04 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US8004651B2 (en) * 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
TW200846838A (en) * 2007-01-26 2008-12-01 Nikon Corp Support structure and exposure apparatus
JP2010519722A (ja) * 2007-02-23 2010-06-03 株式会社ニコン 露光方法、露光装置、デバイス製造方法、及び液浸露光用基板
KR101531426B1 (ko) * 2007-03-01 2015-06-24 가부시키가이샤 니콘 펠리클 프레임 장치, 마스크, 노광 방법, 노광 장치, 및 디바이스의 제조 방법
US20080225261A1 (en) * 2007-03-13 2008-09-18 Noriyuki Hirayanagi Exposure apparatus and device manufacturing method
US7830046B2 (en) * 2007-03-16 2010-11-09 Nikon Corporation Damper for a stage assembly
US8497980B2 (en) * 2007-03-19 2013-07-30 Nikon Corporation Holding apparatus, exposure apparatus, exposure method, and device manufacturing method
US8134685B2 (en) * 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US7903866B2 (en) * 2007-03-29 2011-03-08 Asml Netherlands B.V. Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
US20080246941A1 (en) * 2007-04-06 2008-10-09 Katsura Otaki Wavefront aberration measuring device, projection exposure apparatus, method for manufacturing projection optical system, and method for manufacturing device
US8194322B2 (en) * 2007-04-23 2012-06-05 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
US20080266651A1 (en) * 2007-04-24 2008-10-30 Katsuhiko Murakami Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and device
US8300207B2 (en) * 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20080285004A1 (en) * 2007-05-18 2008-11-20 Nikon Corporation Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus
US20090122282A1 (en) * 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
WO2008147175A1 (en) * 2007-05-25 2008-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20100031694A (ko) * 2007-05-28 2010-03-24 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법, 세정 장치, 및 클리닝 방법 그리고 노광 방법
US8164736B2 (en) * 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8098362B2 (en) * 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US20090015806A1 (en) * 2007-06-04 2009-01-15 Nikon Corporation Environmental control apparatus, stage apparatus, exposure apparatus and device manufacturing method
JP4968335B2 (ja) * 2007-06-11 2012-07-04 株式会社ニコン 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法
US8243257B2 (en) 2007-07-24 2012-08-14 Nikon Corporation Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
US8194232B2 (en) * 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
JP5177449B2 (ja) 2007-07-24 2013-04-03 株式会社ニコン 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法
US8547527B2 (en) * 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US9025126B2 (en) * 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
US8867022B2 (en) * 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US9304412B2 (en) * 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US20090051895A1 (en) * 2007-08-24 2009-02-26 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
US8023106B2 (en) * 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8218129B2 (en) * 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
WO2009031656A1 (ja) * 2007-09-07 2009-03-12 Nikon Corporation 吊り下げ装置及び露光装置
CN101855705A (zh) * 2007-09-07 2010-10-06 国立大学法人横滨国立大学 驱动控制方法、驱动控制装置、载台控制方法、载台控制装置、曝光方法、曝光装置以及计测装置
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20090201484A1 (en) * 2007-10-29 2009-08-13 Nikon Corporation Utilities supply member connection apparatus, stage apparatus, projection optical system support apparatus and exposure apparatus
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
WO2009060585A1 (ja) * 2007-11-07 2009-05-14 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US20090147228A1 (en) * 2007-12-11 2009-06-11 Nikon Corporation Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus
CN101680746B (zh) * 2007-12-11 2013-11-20 株式会社尼康 移动体装置、曝光装置及图案形成装置、以及器件制造方法
US20090174873A1 (en) * 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
SG183058A1 (en) * 2007-12-17 2012-08-30 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
KR101477833B1 (ko) * 2007-12-28 2014-12-30 가부시키가이샤 니콘 노광 장치, 이동체 구동 시스템, 패턴 형성 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP5369443B2 (ja) 2008-02-05 2013-12-18 株式会社ニコン ステージ装置、露光装置、露光方法、及びデバイス製造方法
WO2009098891A1 (ja) * 2008-02-08 2009-08-13 Nikon Corporation 位置計測システム及び位置計測方法、移動体装置、移動体駆動方法、露光装置及び露光方法、パターン形成装置、並びにデバイス製造方法
US20090218743A1 (en) * 2008-02-29 2009-09-03 Nikon Corporation Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
JP5256790B2 (ja) * 2008-03-11 2013-08-07 富士通セミコンダクター株式会社 固体撮像装置、固体撮像装置の製造方法、及びカメラモジュールの製造方法
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
DE102008000967B4 (de) * 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
JPWO2009125867A1 (ja) * 2008-04-11 2011-08-04 株式会社ニコン ステージ装置、露光装置、及びデバイス製造方法
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
TW200951640A (en) * 2008-04-30 2009-12-16 Nikon Corp Exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US7940374B2 (en) * 2008-06-30 2011-05-10 Asml Holding N.V. Parallel process focus compensation
TW201003053A (en) * 2008-07-10 2010-01-16 Nikon Corp Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method
KR100947640B1 (ko) 2008-07-18 2010-03-12 (주)비노시스 노광 장치
TW201009895A (en) * 2008-08-11 2010-03-01 Nikon Corp Exposure apparatus, maintaining method and device fabricating method
JP5131094B2 (ja) * 2008-08-29 2013-01-30 東京エレクトロン株式会社 熱処理装置及び熱処理方法並びに記憶媒体
US8435723B2 (en) * 2008-09-11 2013-05-07 Nikon Corporation Pattern forming method and device production method
US20100302526A1 (en) * 2008-11-13 2010-12-02 Nikon Corporation Drive control method for moving body, exposure method, robot control method, drive control apparatus, exposure apparatus and robot apparatus
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20100196832A1 (en) 2009-01-30 2010-08-05 Nikon Corporation Exposure apparatus, exposing method, liquid immersion member and device fabricating method
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
JP5482784B2 (ja) 2009-03-10 2014-05-07 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US8739383B2 (en) * 2009-04-20 2014-06-03 Nikon Corporation Method and apparatus for aligning mirror blocks of a multi-element mirror assembly
US8953143B2 (en) * 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member
US8202671B2 (en) 2009-04-28 2012-06-19 Nikon Corporation Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
US20100296074A1 (en) * 2009-04-30 2010-11-25 Nikon Corporation Exposure method, and device manufacturing method
US20110085152A1 (en) * 2009-05-07 2011-04-14 Hideaki Nishino Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
TW201115280A (en) * 2009-05-15 2011-05-01 Nikon Corp Exposure apparatus and device manufacturing method
US20100323303A1 (en) * 2009-05-15 2010-12-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
US8970820B2 (en) 2009-05-20 2015-03-03 Nikon Corporation Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
US8792084B2 (en) 2009-05-20 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8619231B2 (en) 2009-05-21 2013-12-31 Nikon Corporation Cleaning method, exposure method, and device manufacturing method
US9312159B2 (en) 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus
NL2004735A (en) * 2009-07-06 2011-01-10 Asml Netherlands Bv Imprint lithography apparatus and method.
TWI512405B (zh) * 2009-08-07 2015-12-11 尼康股份有限公司 A moving body device, an exposure apparatus, and an element manufacturing method
JP5618261B2 (ja) * 2009-08-07 2014-11-05 株式会社ニコン 露光装置及びデバイス製造方法
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
WO2011052703A1 (en) 2009-10-30 2011-05-05 Nikon Corporation Exposure apparatus and device manufacturing method
KR101733257B1 (ko) * 2009-11-05 2017-05-24 가부시키가이샤 니콘 포커스 테스트 마스크, 포커스 계측 방법, 노광 장치, 및 노광 방법
TWI643027B (zh) 2009-11-09 2018-12-01 尼康股份有限公司 曝光裝置、曝光方法、曝光裝置之維修方法、曝光裝置之調整方法、以及元件製造方法
US20110134400A1 (en) * 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
US8488106B2 (en) 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
WO2011081062A1 (ja) 2009-12-28 2011-07-07 株式会社ニコン 液浸部材、液浸部材の製造方法、露光装置、及びデバイス製造方法
KR20120113238A (ko) 2010-01-08 2012-10-12 가부시키가이샤 니콘 액침 부재, 노광 장치, 노광 방법, 및 디바이스 제조 방법
US8841065B2 (en) 2010-02-12 2014-09-23 Nikon Corporation Manufacturing method of exposure apparatus and device manufacturing method
WO2011102109A1 (ja) 2010-02-20 2011-08-25 株式会社ニコン 光源最適化方法、露光方法、デバイス製造方法、プログラム、露光装置、リソグラフィシステム、及び光源評価方法、並びに光源変調方法
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US20110222031A1 (en) 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013864A1 (en) 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US8937703B2 (en) 2010-07-14 2015-01-20 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013863A1 (en) 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120012191A1 (en) 2010-07-16 2012-01-19 Nikon Corporation Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120019803A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120019804A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, cleaning apparatus, device fabricating method, program, and storage medium
US20120019802A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120162619A1 (en) 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
US20120188521A1 (en) 2010-12-27 2012-07-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program and storage medium
WO2012115002A1 (ja) 2011-02-22 2012-08-30 株式会社ニコン 保持装置、露光装置、及びデバイスの製造方法
CN102692195B (zh) * 2011-03-21 2015-05-13 上海微电子装备有限公司 一种转角测量装置
US20130016329A1 (en) 2011-07-12 2013-01-17 Nikon Corporation Exposure apparatus, exposure method, measurement method, and device manufacturing method
US9329496B2 (en) 2011-07-21 2016-05-03 Nikon Corporation Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
US9256137B2 (en) 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130050666A1 (en) 2011-08-26 2013-02-28 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130135594A1 (en) 2011-11-25 2013-05-30 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposure method, device manufacturing method, program, and recording medium
US20130169944A1 (en) 2011-12-28 2013-07-04 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, program, and recording medium
CN103197506B (zh) * 2012-01-10 2015-11-18 上海微电子装备有限公司 一种采用镜像硅片台的光刻机
DE102012201393A1 (de) * 2012-02-01 2013-08-01 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung mit mehreren Positionsmesseinrichtungen
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
WO2013175835A1 (ja) 2012-05-21 2013-11-28 株式会社ニコン 反射鏡、投影光学系、露光装置、及びデバイス製造方法
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
EP3866184B1 (en) 2012-11-30 2024-10-09 Nikon Corporation Carrier system, exposure apparatus and carry-in method
WO2014084229A1 (ja) 2012-11-30 2014-06-05 株式会社ニコン 搬送システム、露光装置、搬送方法、露光方法及びデバイス製造方法、並びに吸引装置
JP6119242B2 (ja) 2012-12-27 2017-04-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9057955B2 (en) 2013-01-22 2015-06-16 Nikon Corporation Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
US9352073B2 (en) 2013-01-22 2016-05-31 Niko Corporation Functional film
WO2014132923A1 (ja) 2013-02-28 2014-09-04 株式会社ニコン 摺動膜、摺動膜が形成された部材、及びその製造方法
KR20160003140A (ko) 2013-05-09 2016-01-08 가부시키가이샤 니콘 광학 소자, 투영 광학계, 노광 장치 및 디바이스 제조 방법
WO2015001805A1 (ja) 2013-07-05 2015-01-08 株式会社ニコン 多層膜反射鏡、多層膜反射鏡の製造方法、投影光学系、露光装置、デバイスの製造方法
JP6369472B2 (ja) 2013-10-08 2018-08-08 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
KR102746062B1 (ko) 2013-10-30 2024-12-23 가부시키가이샤 니콘 기판 유지 장치, 노광 장치 및 디바이스 제조 방법
CN104777715B (zh) * 2014-01-10 2017-03-29 上海微电子装备有限公司 一种测量光刻机垂向测量系统反射镜面形的方法
JP6380412B2 (ja) 2014-01-16 2018-08-29 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN111176083B (zh) 2015-02-23 2023-07-28 株式会社尼康 测量装置、光刻系统、曝光装置、测量方法以及曝光方法
KR102552792B1 (ko) 2015-02-23 2023-07-06 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법
CN111948912A (zh) 2015-02-23 2020-11-17 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
TWI703402B (zh) 2015-03-25 2020-09-01 日商尼康股份有限公司 布局方法、標記檢測方法、曝光方法、測量裝置、曝光裝置、以及元件製造方法
CN119414655A (zh) 2016-08-24 2025-02-11 株式会社 尼康 基板处理系统、以及元件制造方法
KR102556130B1 (ko) 2016-09-27 2023-07-14 가부시키가이샤 니콘 결정 방법 및 장치, 프로그램, 정보 기록 매체, 노광 장치, 레이아웃 정보 제공 방법, 레이아웃 방법, 마크 검출 방법, 노광 방법, 그리고 디바이스 제조 방법
KR102625369B1 (ko) 2016-09-30 2024-01-15 가부시키가이샤 니콘 계측 시스템 및 기판 처리 시스템, 그리고 디바이스 제조 방법
EP3583450A1 (en) 2017-02-20 2019-12-25 3M Innovative Properties Company Optical articles and systems interacting with the same
EP3598236A4 (en) 2017-03-16 2021-01-20 Nikon Corporation CONTROL DEVICE AND CONTROL METHOD, EXPOSURE DEVICE AND EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, DATA GENERATING METHOD AND PROGRAM
KR20200061370A (ko) 2017-09-27 2020-06-02 쓰리엠 이노베이티브 프로퍼티즈 캄파니 장비 및 안전 모니터링을 위하여 광학 패턴들을 이용하는 개인 보호 장비 관리 시스템
US10600614B2 (en) * 2017-09-29 2020-03-24 Hitachi High-Technologies Corporation Stage device and charged particle beam device
JP7200234B2 (ja) * 2017-10-04 2023-01-06 エーエスエムエル ネザーランズ ビー．ブイ． 干渉計ステージ位置決めデバイス
JP7132042B2 (ja) * 2018-09-10 2022-09-06 株式会社ディスコ 加工装置
KR20210145153A (ko) 2019-04-01 2021-12-01 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 그와 관련된 방법
CN114096916A (zh) * 2019-07-11 2022-02-25 Asml荷兰有限公司 用于测量衬底高度的设备和方法
CN111089539B (zh) * 2019-11-29 2022-02-25 中国科学院微电子研究所 晶圆轮廓图的构造方法
WO2022248217A1 (en) * 2021-05-25 2022-12-01 Asml Netherlands B.V. Determining mask rule check violations and mask design
WO2025222074A1 (en) * 2024-04-19 2025-10-23 Brooks Automation Us, Llc Vision based position feedback for substrate handlers

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57183031A (en) 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof
JPS57204547A (en) 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS61196532A (ja) 1985-02-26 1986-08-30 Canon Inc 露光装置
JPH0228312A (ja) * 1988-07-18 1990-01-30 Nikon Corp 露光装置
US5416562A (en) * 1992-03-06 1995-05-16 Nikon Corporation Method of detecting a position and apparatus therefor
US5715064A (en) 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
US5920398A (en) 1996-03-01 1999-07-06 Canon Kabushiki Kaisha Surface position detecting method and scanning exposure method using the same
US5917580A (en) * 1996-08-29 1999-06-29 Canon Kabushiki Kaisha Scan exposure method and apparatus

Also Published As

Publication number Publication date
JP3631766B2 (ja) 2005-03-23
JP2001513267A (ja) 2001-08-28
DE69839069D1 (de) 2008-03-20
KR20000075541A (ko) 2000-12-15
US6208407B1 (en) 2001-03-27
JP2005020030A (ja) 2005-01-20
WO1999032940A1 (en) 1999-07-01
JP4332486B2 (ja) 2009-09-16
EP0961954B1 (en) 2008-01-30
EP0961954A1 (en) 1999-12-08
TW399145B (en) 2000-07-21
KR100632427B1 (ko) 2006-10-09

Similar Documents

Publication Publication Date Title
DE69839069T2 (de) Wiederholte projektion eines maskenmusters unter verwendung einer zeitsparenden höhenmessung
DE69133544T2 (de) Vorrichtung zur Projektion eines Maskenmusters auf ein Substrat
DE69631260T2 (de) Abtastbelichtungsapparat, Belichtungsverfahren unter Verwendung desselben und Verfahren zur Herstellung der Vorrichtung
DE69813519T2 (de) Interferometrisches system mit zwei wellenlängen, und lithographischer apparat versehen mit so einem system
DE69817491T2 (de) Lithographisches belichtungsgerät mit einer ausserhalb der belichtungsachse liegenden ausrichtungsvorrichtung
DE60314484T2 (de) Untersuchungsverfahren und Verfahren zur Herstellung einer Vorrichtung
DE69033499T2 (de) Belichtungsvorrichtung
DE68928192T2 (de) Vorrichtung und Verfahren zur Positionsdetektion
DE69922132T2 (de) Spiegelprojektionssystem für einen lithographischen abtast-projektionsapparat sowie lithographischer apparat mit einen solchen system
DE69709584T2 (de) Lithographisches gerät zur step-und-scan übertragung eines maskenmusters
DE1919991C3 (de) Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten
DE68925665T2 (de) Ausrichtvorrichtung
DE69329611T2 (de) Verfahren zur Registrierung mittels eines projizierenden optischen System, Belichtungsapparat zu dessen Durchführung und sowie Halbleiter-Herstellungsverfahren das diesen Belichtungsapparat verwendet
DE69717516T2 (de) Verfahren zur Detektion einer Oberflächenlage und Abtastbelichtungsverfahren unter Verwendung desselben
DE69126719T2 (de) Belichtungsvorrichtung
DE3785891T2 (de) Umgekehrtes dunkelfeld-ausrichtsystem fuer einen lithographischen ausrichtscanner.
WO2017153165A1 (de) Verfahren zum herstellen eines beleuchtungssystems für eine euv-projektionsbelichtungsanlage und beleuchtungssystem
DE69701934T2 (de) Methode zur bestimmung der strahlungsmenge in einem lithographischen gerät; test-maske und gerät ihrer durchführung
DE68901933T2 (de) Vorrichtung zur lagefeststellung.
DE102008017645A1 (de) Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
DE2802416A1 (de) Optische vorrichtung
EP0002668A2 (de) Einrichtung zur optischen Abstandsmessung
DE69222382T2 (de) Verfahren und Vorrichtung zur Messung von Lageabweichungen
DE60120000T2 (de) Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes
DE69527682T2 (de) Belichtungsapparat und Belichtungsverfahren

Legal Events

Date Code Title Description
8364 No opposition during term of opposition