DE69709584T2 - Lithographisches gerät zur step-und-scan übertragung eines maskenmusters - Google Patents

Lithographisches gerät zur step-und-scan übertragung eines maskenmusters

Info

Publication number
DE69709584T2
DE69709584T2 DE69709584T DE69709584T DE69709584T2 DE 69709584 T2 DE69709584 T2 DE 69709584T2 DE 69709584 T DE69709584 T DE 69709584T DE 69709584 T DE69709584 T DE 69709584T DE 69709584 T2 DE69709584 T2 DE 69709584T2
Authority
DE
Germany
Prior art keywords
mask pattern
lithographic device
scan transfer
scan
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69709584T
Other languages
English (en)
Other versions
DE69709584D1 (de
Inventor
Den Brink Aart Van
Alexander Straaijer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69709584D1 publication Critical patent/DE69709584D1/de
Application granted granted Critical
Publication of DE69709584T2 publication Critical patent/DE69709584T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69709584T 1996-03-04 1997-02-25 Lithographisches gerät zur step-und-scan übertragung eines maskenmusters Expired - Fee Related DE69709584T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP96200575 1996-03-04
PCT/IB1997/000160 WO1997033204A1 (en) 1996-03-04 1997-02-25 Lithopraphic apparatus for step-and-scan imaging of a mask pattern

Publications (2)

Publication Number Publication Date
DE69709584D1 DE69709584D1 (de) 2002-02-21
DE69709584T2 true DE69709584T2 (de) 2002-06-13

Family

ID=8223744

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69709584T Expired - Fee Related DE69709584T2 (de) 1996-03-04 1997-02-25 Lithographisches gerät zur step-und-scan übertragung eines maskenmusters

Country Status (6)

Country Link
US (1) US6084673A (de)
EP (1) EP0823977B1 (de)
JP (1) JPH11504770A (de)
DE (1) DE69709584T2 (de)
TW (1) TW335505B (de)
WO (1) WO1997033204A1 (de)

Cited By (1)

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DE102005036256B4 (de) * 2004-08-03 2010-04-22 Samsung Electronics Co., Ltd. Belichtungsvorrichtung mit der Fähigkeit zum räumlichen Vorgeben der Lichtpolarisation und Verfahren zum Herstellen einer Halbleitervorrichtung mit der Belichtungsvorrichtung

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US6199991B1 (en) 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
EP1089327A4 (de) 1998-03-06 2003-01-02 Nikon Corp Belichtungsvorrichtung und verfahren zur herstellung einer halbleitervorrichtung
WO1999066542A1 (fr) 1998-06-17 1999-12-23 Nikon Corporation Procede et dispositif d'exposition
US6486955B1 (en) 1998-10-14 2002-11-26 Nikon Corporation Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
TW526630B (en) 1998-11-10 2003-04-01 Asml Netherlands Bv Actuator and transducer
EP1001512A3 (de) * 1998-11-10 2001-02-14 Asm Lithography B.V. Betätiger und Wandler
WO2000036471A1 (en) 1998-12-14 2000-06-22 Koninklijke Philips Electronics N.V. Euv illumination system
US6280906B1 (en) 1998-12-22 2001-08-28 U.S. Philips Corporation Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method
AU1554901A (en) * 1999-12-16 2001-06-25 Nikon Corporation Exposure method and exposure apparatus
TWI231405B (en) * 1999-12-22 2005-04-21 Asml Netherlands Bv Lithographic projection apparatus, position detection device, and method of manufacturing a device using a lithographic projection apparatus
US6538257B2 (en) 1999-12-23 2003-03-25 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
US6304630B1 (en) 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
US6493423B1 (en) 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
DE10039337A1 (de) * 2000-08-04 2002-02-28 Infineon Technologies Ag Kombination von abtastenden und abbildenden Methoden bei der Überprüfung von Photomasken
US6876451B1 (en) 2000-08-25 2005-04-05 Zygo Corporation Monolithic multiaxis interferometer
WO2002046691A1 (en) * 2000-12-08 2002-06-13 Zygo Corporation Monolithic corrector plate
TWI266959B (en) * 2001-06-20 2006-11-21 Asml Netherlands Bv Device manufacturing method, device manufactured thereby and a mask for use in the method
WO2003004962A2 (en) * 2001-07-06 2003-01-16 Zygo Corporation Multi-axis interferometer
US6617555B1 (en) * 2001-08-06 2003-09-09 Ultratech Stepper, Inc. Imaging stabilization apparatus and method for high-performance optical systems
US20040145751A1 (en) * 2003-01-28 2004-07-29 Binnard Michael B. Square wafer chuck with mirror
US6917412B2 (en) * 2003-02-26 2005-07-12 Nikon Corporation Modular stage with reaction force cancellation
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
EP1482373A1 (de) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US7565219B2 (en) * 2003-12-09 2009-07-21 Asml Netherlands B.V. Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
WO2006051689A1 (ja) 2004-11-10 2006-05-18 Nikon Corporation 投影光学系、露光装置、および露光方法
NL2003347A (en) * 2008-09-11 2010-03-16 Asml Netherlands Bv Imprint lithography.
KR101373380B1 (ko) * 2009-07-17 2014-03-13 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치 및 그에 포함된 광학 표면에 관한 파라미터의 측정 방법
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US8810785B2 (en) * 2011-08-26 2014-08-19 United Microelectronics Corp. Mask inspecting method
CN111183501B (zh) * 2017-10-04 2022-11-25 Asml荷兰有限公司 干涉测量台定位装置
US11561080B2 (en) 2021-03-26 2023-01-24 Arun Anath Aiyer Optical sensor for surface inspection and metrology
US11703461B2 (en) 2021-03-26 2023-07-18 Arun Anath Aiyer Optical sensor for surface inspection and metrology
IL307209B1 (en) * 2021-03-26 2024-05-01 Arun Anath Aiyer Optical sensor for surface inspection and metrology
DE102021114059B3 (de) 2021-05-31 2022-10-27 Akmira Optronics Gmbh Optische bildgebende Vorrichtung

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005036256B4 (de) * 2004-08-03 2010-04-22 Samsung Electronics Co., Ltd. Belichtungsvorrichtung mit der Fähigkeit zum räumlichen Vorgeben der Lichtpolarisation und Verfahren zum Herstellen einer Halbleitervorrichtung mit der Belichtungsvorrichtung
US7903530B2 (en) 2004-08-03 2011-03-08 Samsung Electronics Co., Ltd. Optical system for spatially controlling light polarization and method for manufacturing the same

Also Published As

Publication number Publication date
DE69709584D1 (de) 2002-02-21
EP0823977B1 (de) 2002-01-16
TW335505B (en) 1998-07-01
EP0823977A1 (de) 1998-02-18
JPH11504770A (ja) 1999-04-27
WO1997033204A1 (en) 1997-09-12
US6084673A (en) 2000-07-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee