DE60036844D1 - Lithographischer Apparat mit einer Maskenklemmvorrichtung - Google Patents

Lithographischer Apparat mit einer Maskenklemmvorrichtung

Info

Publication number
DE60036844D1
DE60036844D1 DE60036844T DE60036844T DE60036844D1 DE 60036844 D1 DE60036844 D1 DE 60036844D1 DE 60036844 T DE60036844 T DE 60036844T DE 60036844 T DE60036844 T DE 60036844T DE 60036844 D1 DE60036844 D1 DE 60036844D1
Authority
DE
Germany
Prior art keywords
clamping device
lithographic apparatus
mask clamping
mask
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60036844T
Other languages
English (en)
Other versions
DE60036844T2 (de
Inventor
Sjoerd Nicolaas Lamber Donders
Empel Tjarko Adriaan Rudol Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60036844D1 publication Critical patent/DE60036844D1/de
Application granted granted Critical
Publication of DE60036844T2 publication Critical patent/DE60036844T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60036844T 1999-12-03 2000-11-16 Lithographischer Apparat mit einer Maskenklemmvorrichtung Expired - Fee Related DE60036844T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99204103 1999-12-03
EP99204103 1999-12-03

Publications (2)

Publication Number Publication Date
DE60036844D1 true DE60036844D1 (de) 2007-12-06
DE60036844T2 DE60036844T2 (de) 2008-07-31

Family

ID=8240965

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60036844T Expired - Fee Related DE60036844T2 (de) 1999-12-03 2000-11-16 Lithographischer Apparat mit einer Maskenklemmvorrichtung

Country Status (6)

Country Link
US (2) US6480260B1 (de)
EP (1) EP1107066B1 (de)
JP (1) JP3983471B2 (de)
KR (1) KR100632890B1 (de)
DE (1) DE60036844T2 (de)
TW (1) TW504605B (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4148627B2 (ja) * 2000-03-30 2008-09-10 株式会社東芝 荷電粒子ビーム装置及び荷電粒子ビーム装置用試料室
US6653639B1 (en) * 2000-10-17 2003-11-25 Nikon Corporation Chuck for mounting reticle to a reticle stage
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
US20030151118A1 (en) * 2002-02-14 2003-08-14 3M Innovative Properties Company Aperture masks for circuit fabrication
US6885436B1 (en) * 2002-09-13 2005-04-26 Lsi Logic Corporation Optical error minimization in a semiconductor manufacturing apparatus
TWI254841B (en) * 2002-12-23 2006-05-11 Asml Netherlands Bv Lithographic apparatus
DE602004019835D1 (de) * 2003-04-22 2009-04-23 Asml Netherlands Bv Träger und Verfahren zur Herstellung eines Trägers
SG118242A1 (en) * 2003-04-30 2006-01-27 Asml Netherlands Bv Lithographic apparatus device manufacturing methods mask and method of characterising a mask and/or pellicle
US20060011137A1 (en) * 2004-07-16 2006-01-19 Applied Materials, Inc. Shadow frame with mask panels
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006068461A1 (en) * 2004-12-23 2006-06-29 Asml Netherlands B.V. Support structure and lithographic apparatus
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7239376B2 (en) * 2005-07-27 2007-07-03 International Business Machines Corporation Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices
US7352438B2 (en) * 2006-02-14 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200807171A (en) * 2006-05-19 2008-02-01 Nikon Corp Kinematic chucks for reticles and other planar bodies
US20070268476A1 (en) * 2006-05-19 2007-11-22 Nikon Corporation Kinematic chucks for reticles and other planar bodies
JPWO2007135998A1 (ja) * 2006-05-24 2009-10-01 株式会社ニコン 保持装置及び露光装置
US20070292245A1 (en) * 2006-05-25 2007-12-20 Nikon Corporation Stage assembly with secure device holder
KR100738996B1 (ko) * 2006-06-21 2007-07-12 오에프티 주식회사 노광장치
US7675607B2 (en) * 2006-07-14 2010-03-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7933000B2 (en) * 2006-11-16 2011-04-26 Asml Netherlands B.V. Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
US7564556B2 (en) * 2007-04-02 2009-07-21 Taiwan Semiconductor Manufacturing Company Method and apparatus for lens contamination control
US8284379B2 (en) * 2007-04-06 2012-10-09 Nikon Corporation Devices and methods for reducing residual reticle chucking forces
US20090033907A1 (en) * 2007-07-05 2009-02-05 Nikon Corporation Devices and methods for decreasing residual chucking forces
KR101494493B1 (ko) * 2009-08-07 2015-02-17 가부시키가이샤 니콘 이동체 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP6093006B2 (ja) 2012-04-27 2017-03-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
CN103268057B (zh) * 2013-04-28 2014-12-17 京东方科技集团股份有限公司 掩模系统、掩模方法、曝光系统和曝光方法
US9070535B2 (en) * 2013-06-25 2015-06-30 Varian Semiconductor Equipment Associates, Inc. Proximity mask for ion implantation with improved resistance to thermal deformation
DE102016107001A1 (de) * 2016-04-15 2017-10-19 Ist Metz Gmbh Vorrichtung zur Belichtung eines Substrats
CN205856592U (zh) * 2016-08-08 2017-01-04 合肥鑫晟光电科技有限公司 掩膜板和蒸镀装置
KR20190116413A (ko) 2017-02-10 2019-10-14 에이에스엠엘 홀딩 엔.브이. 레티클 클램핑 디바이스
EP3667696A1 (de) * 2018-12-14 2020-06-17 ASML Netherlands B.V. Für elektronenstrahlinspektionsvorrichtung geeignete stufenvorrichtung
CN112415856B (zh) * 2019-08-23 2022-04-22 上海微电子装备（集团）股份有限公司 柔性吸附装置及光刻设备

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3110341C2 (de) * 1980-03-19 1983-11-17 Hitachi, Ltd., Tokyo Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes
US4549843A (en) * 1983-03-15 1985-10-29 Micronix Partners Mask loading apparatus, method and cassette
JPH0620091B2 (ja) * 1985-01-31 1994-03-16 株式会社ニコン 基板の搬送装置
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
DE3752314T2 (de) * 1986-07-11 2000-09-14 Canon Kk Verkleinerndes Projektionsbelichtungssystem des Reflexionstyps für Röntgenstrahlung
US4986007A (en) * 1987-03-25 1991-01-22 Svg Lithography Systems, Inc. Reticle frame assembly
JP2554894B2 (ja) * 1987-09-21 1996-11-20 東芝機械株式会社 被処理材の固定装置
JPH03198320A (ja) * 1989-12-27 1991-08-29 Nikon Corp 投影光学装置
US5094536A (en) * 1990-11-05 1992-03-10 Litel Instruments Deformable wafer chuck
JPH05218180A (ja) * 1992-02-05 1993-08-27 Seiko Epson Corp 基板保持装置
JPH07136885A (ja) * 1993-06-30 1995-05-30 Toshiba Corp 真空チャック
US6118515A (en) * 1993-12-08 2000-09-12 Nikon Corporation Scanning exposure method
JP3349572B2 (ja) 1993-12-27 2002-11-25 東芝機械株式会社 薄板固定装置
US5536559A (en) * 1994-11-22 1996-07-16 Wisconsin Alumni Research Foundation Stress-free mount for imaging mask
JPH08167553A (ja) 1994-12-14 1996-06-25 Toshiba Mach Co Ltd 被処理材の固定装置
US5532903A (en) * 1995-05-03 1996-07-02 International Business Machines Corporation Membrane electrostatic chuck
JPH09126717A (ja) * 1995-11-02 1997-05-16 Nikon Corp パターン位置測定方法及び装置
JP3327784B2 (ja) * 1996-09-25 2002-09-24 キヤノン株式会社 マスク構造体、マスク保持方法、ならびにデバイス生産方法
US5750003A (en) * 1996-05-20 1998-05-12 Taiwan Semiconductor Manufacturing Company, Ltd. Chuck for holding semiconductor photolithography masks
JP3634539B2 (ja) * 1997-02-28 2005-03-30 キヤノン株式会社 マスク保持装置、露光装置、デバイス製造方法、及びマスク構造体

Also Published As

Publication number Publication date
TW504605B (en) 2002-10-01
KR20010061974A (ko) 2001-07-07
US6480260B1 (en) 2002-11-12
EP1107066A2 (de) 2001-06-13
DE60036844T2 (de) 2008-07-31
USRE41307E1 (en) 2010-05-04
KR100632890B1 (ko) 2006-10-11
EP1107066B1 (de) 2007-10-24
JP2001196303A (ja) 2001-07-19
JP3983471B2 (ja) 2007-09-26
EP1107066A3 (de) 2004-12-15

Similar Documents

Publication Publication Date Title
DE60036844D1 (de) Lithographischer Apparat mit einer Maskenklemmvorrichtung
DE60036771D1 (de) Lithographischer Apparat mit einem ausbalancierten Positionierungssystem
DE60033773D1 (de) Lithographischer Apparat mit einem ausbalancierten Positionierungssystem
DE69827608D1 (de) Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung
DE60017962D1 (de) Klemmvorrichtung zum Festklemmen einer Leitung
DE69931690D1 (de) Lithographischer Apparat
DE69817491D1 (de) Lithographisches belichtungsgerät mit einer ausserhalb der belichtungsachse liegenden ausrichtungsvorrichtung
DE60134922D1 (de) Lithographischer Apparat
DE69704998T2 (de) Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung
DE60129377D1 (de) Lithographischer Projektionsapparat mit einer Stützanordnung
DE60024211D1 (de) Lithographischer Projektionsapparat mit kollisionsvermeidender Vorrichtung
DE60020638D1 (de) Lithographischer Projektionsapparat
DE60020620D1 (de) Lithographischer Projektionsapparat
DE60026461D1 (de) Lithographischer Projektionsapparat
DE60116967D1 (de) Lithographischer Apparat
DE69921944D1 (de) Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem
DE60017258D1 (de) Stentanbringungskatheter mit vorrichtung zum trennen einer hülle
DE69530717D1 (de) Vorrichtung zum Einstellen einer Zoomlinse
DE69933918D1 (de) Lithographischer Projektionsapparat
DE69938885D1 (de) Lithographischer Apparat
IT1294995B1 (it) Dispositivo allargatore perfezionato per tessuti a maglia tubolare
ATE240880T1 (de) Abgabeeinrichtung einer zusammensetzung mit konzentrationsgradienten
DE60025303D1 (de) Lithographischer Projektionsapparat
DE60030204D1 (de) Lithographischer Projektionsapparat
DE60039332D1 (de) Vorrichtung zum Verschieben einer Linse

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee