DE69933918D1 - Lithographischer Projektionsapparat - Google Patents

Lithographischer Projektionsapparat

Info

Publication number
DE69933918D1
DE69933918D1 DE69933918T DE69933918T DE69933918D1 DE 69933918 D1 DE69933918 D1 DE 69933918D1 DE 69933918 T DE69933918 T DE 69933918T DE 69933918 T DE69933918 T DE 69933918T DE 69933918 D1 DE69933918 D1 DE 69933918D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
lithographic
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69933918T
Other languages
English (en)
Other versions
DE69933918T2 (de
Inventor
Der Veen Paul Van
Oscar Franciscus Joze Noordman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE69933918D1 publication Critical patent/DE69933918D1/de
Publication of DE69933918T2 publication Critical patent/DE69933918T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69933918T 1998-12-16 1999-12-08 Lithographischer Projektionsapparat Expired - Lifetime DE69933918T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98204268 1998-12-16
EP98204268 1998-12-16

Publications (2)

Publication Number Publication Date
DE69933918D1 true DE69933918D1 (de) 2006-12-21
DE69933918T2 DE69933918T2 (de) 2007-06-14

Family

ID=8234471

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69933918T Expired - Lifetime DE69933918T2 (de) 1998-12-16 1999-12-08 Lithographischer Projektionsapparat

Country Status (5)

Country Link
US (1) US6455862B1 (de)
JP (1) JP3843197B2 (de)
KR (1) KR100554894B1 (de)
DE (1) DE69933918T2 (de)
TW (1) TW460755B (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001196293A (ja) * 2000-01-14 2001-07-19 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US6618403B2 (en) * 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
US7508487B2 (en) * 2000-06-01 2009-03-24 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US7026955B2 (en) * 2001-07-12 2006-04-11 Scott Kauffman Apparatus and method for activating an inductance loop vehicle detection system
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6995908B2 (en) * 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US6842223B2 (en) * 2003-04-11 2005-01-11 Nikon Precision Inc. Enhanced illuminator for use in photolithographic systems
US7315351B2 (en) * 2004-10-28 2008-01-01 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured therewith
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7532308B2 (en) * 2005-09-13 2009-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880151B2 (en) * 2008-02-28 2011-02-01 Fei Company Beam positioning for beam processing
NL2004770A (nl) * 2009-05-29 2010-11-30 Asml Holding Nv Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation.
NL2006625A (en) * 2010-05-26 2011-11-29 Asml Netherlands Bv Illumination system and lithographic apparatus.
NL2008322A (en) 2011-04-13 2012-10-16 Asml Holding Nv Double euv illumination uniformity correction system and method.
EP2610889A3 (de) 2011-12-27 2015-05-06 Fei Company Kontrolle der Drift in einem Strahlsystem geladener Teilchen
CN114945872A (zh) * 2020-01-14 2022-08-26 Asml荷兰有限公司 用于漂移补偿的光刻装置和方法
CN117716296A (zh) * 2021-07-13 2024-03-15 西默有限公司 用于光源的预测装置和方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5138368A (en) * 1988-10-25 1992-08-11 Greyhawk Systems, Inc. Fabrication of printed wiring boards by projection imaging
EP0737330B1 (de) * 1994-06-02 1999-03-10 Koninklijke Philips Electronics N.V. Verfahren zur wiederholten abbildung eines maskenmusters auf einem substrat und vorrichtung zur durchführung des verfahrens
JP3918200B2 (ja) * 1995-11-16 2007-05-23 株式会社ニコン リソグラフィ装置の製造方法及びリソグラフィ装置
JP3241628B2 (ja) * 1997-03-21 2001-12-25 シャープ株式会社 半導体装置の製造装置
EP1014429A4 (de) 1997-04-18 2000-07-19 Nikon Corp Verfahren und vorrichtung zur belichtungssteuerung, verfahren und vorrichtung zur belichtung, und verfahren zur herstellung dieser vorrichtung
US6014252A (en) * 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
US6015644A (en) * 1998-02-20 2000-01-18 Lucent Technologies Inc. Process for device fabrication using a variable transmission aperture
US5973826A (en) * 1998-02-20 1999-10-26 Regents Of The University Of California Reflective optical imaging system with balanced distortion
US6226346B1 (en) * 1998-06-09 2001-05-01 The Regents Of The University Of California Reflective optical imaging systems with balanced distortion
JPH11251226A (ja) * 1998-03-05 1999-09-17 Nikon Corp Ｘ線投影露光装置
US6280906B1 (en) * 1998-12-22 2001-08-28 U.S. Philips Corporation Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method
US6218057B1 (en) * 1999-04-16 2001-04-17 Lucent Technologies Inc. Lithographic process having sub-wavelength resolution

Also Published As

Publication number Publication date
JP2000182954A (ja) 2000-06-30
DE69933918T2 (de) 2007-06-14
TW460755B (en) 2001-10-21
US6455862B1 (en) 2002-09-24
JP3843197B2 (ja) 2006-11-08
KR100554894B1 (ko) 2006-02-24
KR20000057055A (ko) 2000-09-15

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Legal Events

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