DE69727016D1 - Belichtungsapparat - Google Patents

Belichtungsapparat

Info

Publication number
DE69727016D1
DE69727016D1 DE69727016T DE69727016T DE69727016D1 DE 69727016 D1 DE69727016 D1 DE 69727016D1 DE 69727016 T DE69727016 T DE 69727016T DE 69727016 T DE69727016 T DE 69727016T DE 69727016 D1 DE69727016 D1 DE 69727016D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69727016T
Other languages
English (en)
Other versions
DE69727016T2 (de
Inventor
Kazuhiro Takahashi
Kazunori Iwamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69727016D1 publication Critical patent/DE69727016D1/de
Application granted granted Critical
Publication of DE69727016T2 publication Critical patent/DE69727016T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69727016T 1996-10-02 1997-10-01 Belichtungsapparat Expired - Lifetime DE69727016T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27985496A JP3283767B2 (ja) 1996-10-02 1996-10-02 露光装置およびデバイス製造方法
JP27985496 1996-10-02

Publications (2)

Publication Number Publication Date
DE69727016D1 true DE69727016D1 (de) 2004-02-05
DE69727016T2 DE69727016T2 (de) 2004-11-25

Family

ID=17616876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69727016T Expired - Lifetime DE69727016T2 (de) 1996-10-02 1997-10-01 Belichtungsapparat

Country Status (6)

Country Link
US (1) US6008885A (de)
EP (1) EP0834772B1 (de)
JP (1) JP3283767B2 (de)
KR (1) KR100276796B1 (de)
DE (1) DE69727016T2 (de)
TW (1) TW420842B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027570A1 (fr) * 1997-11-25 1999-06-03 Nikon Corporation Dispositif d'exposition par projection
WO1999063585A1 (fr) 1998-06-02 1999-12-09 Nikon Corporation Organe d'alignement de balayage, son procede de fabrication et procede de fabrication de dispositif
US6765647B1 (en) * 1998-11-18 2004-07-20 Nikon Corporation Exposure method and device
US6727981B2 (en) 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
JP2001148341A (ja) * 1999-11-19 2001-05-29 Nikon Corp 露光装置
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP3728180B2 (ja) 2000-06-01 2005-12-21 キヤノン株式会社 干渉計搭載ステージ
US6774981B1 (en) * 2000-09-08 2004-08-10 Nikon Corporation Modular exposure apparatus with removable optical device and improved isolation of the optical device
JP2004514943A (ja) * 2000-11-28 2004-05-20 カール・ツアイス・エスエムテイ・アーゲー １５７ｎｍリソグラフィ用の反射屈折投影系
JP2002289515A (ja) 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
JP3495992B2 (ja) * 2001-01-26 2004-02-09 キヤノン株式会社 補正装置、露光装置、デバイス製造方法及びデバイス
WO2002103766A1 (fr) * 2001-06-13 2002-12-27 Nikon Corporation Procede et systeme d'exposition au balayage, et procede de production d'un dispositif associe
JP4595320B2 (ja) * 2002-12-10 2010-12-08 株式会社ニコン 露光装置、及びデバイス製造方法
WO2004053956A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及び露光方法、デバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
KR102015401B1 (ko) * 2012-12-21 2019-08-29 삼성디스플레이 주식회사 광학계 및 기판 밀봉 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5999722A (ja) * 1982-11-29 1984-06-08 Canon Inc 半導体焼付露光制御方法
DE3588012T2 (de) * 1984-06-21 1995-09-14 At & T Corp Lithographie im fernen UV-Gebiet.
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
JP2728898B2 (ja) * 1988-10-05 1998-03-18 キヤノン株式会社 露光装置
FR2663130B1 (fr) * 1990-06-08 1994-12-09 Nippon Seiko Kk Dispositif d'exposition par projection.
JP3182158B2 (ja) * 1991-02-25 2001-07-03 キヤノン株式会社 露光装置用のステージ支持装置
JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5281996A (en) * 1992-09-04 1994-01-25 General Signal Corporation Photolithographic reduction imaging of extended field
JPH06302491A (ja) * 1993-04-15 1994-10-28 Nikon Corp 露光量制御装置
JP3255312B2 (ja) * 1993-04-28 2002-02-12 株式会社ニコン 投影露光装置
JPH07211620A (ja) * 1994-01-25 1995-08-11 Sony Corp 半導体露光装置
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
US5508518A (en) * 1995-05-03 1996-04-16 International Business Machines Corporation Lithography tool with vibration isolation
US5739899A (en) * 1995-05-19 1998-04-14 Nikon Corporation Projection exposure apparatus correcting tilt of telecentricity
US5721606A (en) * 1995-09-07 1998-02-24 Jain; Kanti Large-area, high-throughput, high-resolution, scan-and-repeat, projection patterning system employing sub-full mask
US5798838A (en) * 1996-02-28 1998-08-25 Nikon Corporation Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same

Also Published As

Publication number Publication date
JPH10106940A (ja) 1998-04-24
JP3283767B2 (ja) 2002-05-20
TW420842B (en) 2001-02-01
EP0834772A2 (de) 1998-04-08
EP0834772A3 (de) 1998-12-23
EP0834772B1 (de) 2004-01-02
US6008885A (en) 1999-12-28
KR100276796B1 (ko) 2001-01-15
DE69727016T2 (de) 2004-11-25
KR19980032469A (ko) 1998-07-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition