DE3588012T2 - Lithographie im fernen UV-Gebiet. - Google Patents
Lithographie im fernen UV-Gebiet.Info
- Publication number
- DE3588012T2 DE3588012T2 DE3588012T DE3588012T DE3588012T2 DE 3588012 T2 DE3588012 T2 DE 3588012T2 DE 3588012 T DE3588012 T DE 3588012T DE 3588012 T DE3588012 T DE 3588012T DE 3588012 T2 DE3588012 T2 DE 3588012T2
- Authority
- DE
- Germany
- Prior art keywords
- lithography
- far
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62324784A | 1984-06-21 | 1984-06-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3588012D1 DE3588012D1 (de) | 1995-05-24 |
DE3588012T2 true DE3588012T2 (de) | 1995-09-14 |
Family
ID=24497338
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3588012T Expired - Lifetime DE3588012T2 (de) | 1984-06-21 | 1985-06-12 | Lithographie im fernen UV-Gebiet. |
DE8585903153T Revoked DE3583924D1 (de) | 1984-06-21 | 1985-06-12 | Lithographie im fernen uv-gebiet. |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585903153T Revoked DE3583924D1 (de) | 1984-06-21 | 1985-06-12 | Lithographie im fernen uv-gebiet. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4703166A (de) |
EP (1) | EP0183827B1 (de) |
JP (2) | JPS61502507A (de) |
CA (1) | CA1232373A (de) |
DE (2) | DE3588012T2 (de) |
WO (1) | WO1986000427A1 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2153543B (en) * | 1983-12-28 | 1988-09-01 | Canon Kk | A projection exposure apparatus |
US5171965A (en) * | 1984-02-01 | 1992-12-15 | Canon Kabushiki Kaisha | Exposure method and apparatus |
US5091744A (en) * | 1984-02-13 | 1992-02-25 | Canon Kabushiki Kaisha | Illumination optical system |
US4811055A (en) * | 1984-02-27 | 1989-03-07 | Canon Kabushiki Kaisha | Projection exposure apparatus |
US4713518A (en) * | 1984-06-08 | 1987-12-15 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device manufacturing methods |
US4856018A (en) * | 1986-01-22 | 1989-08-08 | Kabushiki Kaisha Komatsu Seisakusho | Light source for reduced projection |
JP2650895B2 (ja) * | 1986-07-02 | 1997-09-10 | 松下電器産業株式会社 | 露光装置および露光方法 |
JPH0670957B2 (ja) * | 1986-12-01 | 1994-09-07 | キヤノン株式会社 | 露光装置 |
JPS63193130A (ja) * | 1987-02-05 | 1988-08-10 | Canon Inc | 光量制御装置 |
JP2571054B2 (ja) * | 1987-04-28 | 1997-01-16 | キヤノン株式会社 | 露光装置及び素子製造方法 |
JPS63280483A (ja) * | 1987-05-13 | 1988-11-17 | Canon Inc | レーザ光の波長検出方法 |
JPS6482527A (en) * | 1987-09-25 | 1989-03-28 | Nikon Corp | Exposure device |
JPH0628227B2 (ja) * | 1987-10-06 | 1994-04-13 | 株式会社日立製作所 | 半導体露光装置 |
DE3733823A1 (de) * | 1987-10-07 | 1989-04-20 | Zeiss Carl Fa | Verfahren zur kompensation des einflusses von umweltparametern auf die abbildungseigenschaften eines optischen systems |
JPH01106426A (ja) * | 1987-10-19 | 1989-04-24 | Canon Inc | 露光装置 |
JPH01119020A (ja) * | 1987-10-30 | 1989-05-11 | Canon Inc | 露光装置 |
US4851656A (en) * | 1988-01-11 | 1989-07-25 | The Gerber Scientific Instrument Company | Method and apparatus for enhancing optical photoplotter accuracy |
US5276725A (en) * | 1988-05-10 | 1994-01-04 | Canon Kabushiki Kaisha | Exposure system |
US4847479A (en) * | 1988-06-06 | 1989-07-11 | Trw Inc. | System for controlling the wavelength and colinearity of multiplexed laser beams |
JP2631395B2 (ja) * | 1988-09-09 | 1997-07-16 | キヤノン株式会社 | 露光装置の制御方法 |
DE69219370T2 (de) * | 1991-01-17 | 1997-11-06 | United Distillers Plc | Dynamische Lasermarkierung |
US5274420A (en) * | 1992-04-20 | 1993-12-28 | International Business Machines Corporation | Beamsplitter type lens elements with pupil-plane stops for lithographic systems |
US5737122A (en) * | 1992-05-01 | 1998-04-07 | Electro Scientific Industries, Inc. | Illumination system for OCR of indicia on a substrate |
US5231536A (en) * | 1992-05-01 | 1993-07-27 | Xrl, Inc. | Robust, LED illumination system for OCR of indicia on a substrate |
US5851725A (en) * | 1993-01-26 | 1998-12-22 | The United States Of America As Represented By The Secretary Of Commerce | Exposure of lithographic resists by metastable rare gas atoms |
US5355306A (en) * | 1993-09-30 | 1994-10-11 | Motorola, Inc. | Alignment system and method of alignment by symmetrical and asymmetrical analysis |
JP3283767B2 (ja) * | 1996-10-02 | 2002-05-20 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US5982475A (en) * | 1997-09-30 | 1999-11-09 | Tropel Corporation | Raster-scan photolithographic reduction system |
US6089525A (en) * | 1997-10-07 | 2000-07-18 | Ultratech Stepper, Inc. | Six axis active vibration isolation and payload reaction force compensation system |
DE19959742A1 (de) * | 1999-12-10 | 2001-06-13 | Zeiss Carl | System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes |
US6791592B2 (en) | 2000-04-18 | 2004-09-14 | Laserink | Printing a code on a product |
JP4497650B2 (ja) | 2000-04-26 | 2010-07-07 | キヤノン株式会社 | レーザ発振装置、露光装置および半導体デバイス製造方法 |
DE10143385C2 (de) * | 2001-09-05 | 2003-07-17 | Zeiss Carl | Projektionsbelichtungsanlage |
US7046267B2 (en) | 2003-12-19 | 2006-05-16 | Markem Corporation | Striping and clipping correction |
US7394479B2 (en) | 2005-03-02 | 2008-07-01 | Marken Corporation | Pulsed laser printing |
US10096967B2 (en) | 2016-12-07 | 2018-10-09 | Cymer, Llc | Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light source |
CN111095111A (zh) * | 2017-09-11 | 2020-05-01 | Asml荷兰有限公司 | 光刻装置和方法 |
WO2019137725A1 (en) * | 2018-01-11 | 2019-07-18 | Asml Netherlands B.V. | Lithographic method and apparatus |
US10583668B2 (en) | 2018-08-07 | 2020-03-10 | Markem-Imaje Corporation | Symbol grouping and striping for wide field matrix laser marking |
WO2023196087A1 (en) * | 2022-04-08 | 2023-10-12 | Cymer, Llc | Apparatus for and method of vibration cancellation for laser wavelength and bandwidth stability |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3689159A (en) * | 1970-06-11 | 1972-09-05 | Mitsubishi Electric Corp | Laser processing apparatus |
US4408885A (en) * | 1971-03-22 | 1983-10-11 | Kasper Instruments, Inc. | Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask |
US3902036A (en) * | 1974-05-02 | 1975-08-26 | Western Electric Co | Control system using multiplexed laser beams |
US3947688A (en) * | 1974-08-26 | 1976-03-30 | Oregon Graduate Center For Study And Research | Method of generating tunable coherent ultraviolet light at wavelengths below 2500 A |
FR2406236A1 (fr) * | 1976-12-10 | 1979-05-11 | Thomson Csf | Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures |
DE2905636C2 (de) * | 1979-02-14 | 1985-06-20 | Censor Patent- Und Versuchs-Anstalt, Vaduz | Verfahren zum Kopieren von Masken auf ein Werkstück |
FR2455298A1 (fr) * | 1979-04-23 | 1980-11-21 | Thomson Csf | Dispositif illuminateur destine a fournir un faisceau d'eclairement divergent a partir d'une zone predeterminee d'un plan et systeme de transfert de motifs comprenant un tel dispositif |
US4304467A (en) * | 1979-05-29 | 1981-12-08 | International Business Machines Corporation | Focussed laser beam optical system |
US4240746A (en) * | 1979-08-06 | 1980-12-23 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of National Defense | System for transmitter frequency control in coherent ladar |
JPS5628868A (en) * | 1979-08-16 | 1981-03-23 | Fuji Photo Film Co Ltd | Form slide displacement accomodation device in light beam recording device |
JPS57198631A (en) * | 1981-05-29 | 1982-12-06 | Ibm | Exposing method and device |
JPS5831305A (ja) * | 1981-08-20 | 1983-02-24 | Toshiba Corp | レ−ザ光のパタ−ン成形装置 |
DE3147355C2 (de) * | 1981-11-30 | 1986-05-07 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Justieren des Bezugssystems eines vorprogrammierbaren Strahlenablenksystems eines im Riesenimpulsbetrieb arbeitenden Lasergerätes |
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
DE3318978A1 (de) * | 1983-05-25 | 1984-11-29 | Werner Dr. Vaduz Tabarelli | Einrichtung zum projektionskopieren von masken auf ein werkstueck |
US4532402A (en) * | 1983-09-02 | 1985-07-30 | Xrl, Inc. | Method and apparatus for positioning a focused beam on an integrated circuit |
JPS60117735A (ja) * | 1983-11-30 | 1985-06-25 | Fujitsu Ltd | パタ−ン転写方法 |
JPS60140310A (ja) * | 1983-12-28 | 1985-07-25 | Canon Inc | 投影レンズ |
DE3406677A1 (de) * | 1984-02-24 | 1985-09-05 | Fa. Carl Zeiss, 7920 Heidenheim | Einrichtung zur kompensation der auswanderung eines laserstrahls |
JPS60242421A (ja) * | 1984-05-17 | 1985-12-02 | Canon Inc | 露光装置 |
JPS60257521A (ja) * | 1984-06-04 | 1985-12-19 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成用露光装置 |
US4540867A (en) * | 1984-06-25 | 1985-09-10 | Motorola, Inc. | Linearized scanning system and method for an energy beam |
-
1985
- 1985-06-12 EP EP85903153A patent/EP0183827B1/de not_active Expired - Lifetime
- 1985-06-12 DE DE3588012T patent/DE3588012T2/de not_active Expired - Lifetime
- 1985-06-12 JP JP60502662A patent/JPS61502507A/ja active Pending
- 1985-06-12 DE DE8585903153T patent/DE3583924D1/de not_active Revoked
- 1985-06-12 WO PCT/US1985/001110 patent/WO1986000427A1/en not_active Application Discontinuation
- 1985-06-20 CA CA000484658A patent/CA1232373A/en not_active Expired
-
1986
- 1986-05-12 US US06/862,475 patent/US4703166A/en not_active Expired - Lifetime
-
1993
- 1993-11-17 JP JP5287158A patent/JP2760740B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0750253A (ja) | 1995-02-21 |
EP0183827B1 (de) | 1991-08-28 |
DE3583924D1 (de) | 1991-10-02 |
US4703166A (en) | 1987-10-27 |
EP0183827A1 (de) | 1986-06-11 |
JPS61502507A (ja) | 1986-10-30 |
CA1232373A (en) | 1988-02-02 |
DE3588012D1 (de) | 1995-05-24 |
WO1986000427A1 (en) | 1986-01-16 |
CA1252228C (de) | 1989-04-04 |
JP2760740B2 (ja) | 1998-06-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3588012T2 (de) | Lithographie im fernen UV-Gebiet. | |
ES516520A0 (es) | "perfeccionamientos en las valvulas mezcladoras". | |
ES513472A0 (es) | Perfeccionamientos en mecanismos posicionadores de asientos. | |
DE3576587D1 (de) | In wechselwirkung stehende abdruckverbesserungstechniken. | |
DE69021799D1 (de) | Druckfilm. | |
DE68915148D1 (de) | Fotoresist-zusammensetzung. | |
FI893127A0 (fi) | Komposition som bildar en vattenavstoetande film. | |
DE3577124D1 (de) | Foliendrucklager. | |
ES508782A0 (es) | Perfeccionamientos en las valvulas de retencion. | |
FI924075A0 (fi) | Elektrokemisk process. | |
DE3853694T2 (de) | Photolackzusammensetzung. | |
DE3583480D1 (de) | Waschraum. | |
NO912846D0 (no) | Astaxantin-genererende gjaerceller. | |
ES516338A0 (es) | "mejoras en cardas". | |
DE59004056D1 (de) | Spundfass. | |
DE3869329D1 (de) | Lithographische tinten-zusammensetzung. | |
FI880876A (fi) | Foerbaettringar i anordningar foer att injektera aemnen in i vaetskor. | |
ES516683A0 (es) | "perfeccionamientos en tacografos". | |
DE69108760D1 (de) | Befeuchtungseinrichtung. | |
DE3675281D1 (de) | Im pikosekundenbereich schaltendes photoempfindliches bauelement. | |
FI893456A (fi) | Text-tv-dekoder. | |
DE69023605T2 (de) | Positive Fotolackzusammensetzung. | |
FI874394A0 (fi) | Anordning foer att hindra isbildning i dagvattenbrunnar. | |
ES518787A0 (es) | Perfeccionamientos en telemanipuladores. | |
ES515065A0 (es) | "perfeccionamientos en los aparatos de extraccion-filtracion". |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |