DE60030204D1 - Lithographischer Projektionsapparat - Google Patents

Lithographischer Projektionsapparat

Info

Publication number
DE60030204D1
DE60030204D1 DE60030204T DE60030204T DE60030204D1 DE 60030204 D1 DE60030204 D1 DE 60030204D1 DE 60030204 T DE60030204 T DE 60030204T DE 60030204 T DE60030204 T DE 60030204T DE 60030204 D1 DE60030204 D1 DE 60030204D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
lithographic
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60030204T
Other languages
English (en)
Other versions
DE60030204T2 (de
Inventor
Empel Tjarko Adriaan Rudol Van
Hans Jansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60030204D1 publication Critical patent/DE60030204D1/de
Publication of DE60030204T2 publication Critical patent/DE60030204T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60030204T 1999-06-11 2000-06-01 Lithographischer Projektionsapparat Expired - Lifetime DE60030204T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99201861 1999-06-11
EP99201861 1999-06-11

Publications (2)

Publication Number Publication Date
DE60030204D1 true DE60030204D1 (de) 2006-10-05
DE60030204T2 DE60030204T2 (de) 2007-07-12

Family

ID=8240302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60030204T Expired - Lifetime DE60030204T2 (de) 1999-06-11 2000-06-01 Lithographischer Projektionsapparat

Country Status (5)

Country Link
US (1) US6413701B1 (de)
JP (1) JP4151934B2 (de)
KR (1) KR100563769B1 (de)
DE (1) DE60030204T2 (de)
TW (1) TW594426B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100579603B1 (ko) * 2001-01-15 2006-05-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
EP1280188B1 (de) * 2001-07-26 2007-01-17 Canon Kabushiki Kaisha Substrathalter und ein Belichtungsapparat
EP1491953A1 (de) * 2003-06-23 2004-12-29 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel
EP1491962B1 (de) * 2003-06-23 2008-02-13 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und damit erzeugte Vorrichtung
KR100763532B1 (ko) * 2006-08-17 2007-10-05 삼성전자주식회사 웨이퍼 지지장치, 웨이퍼 노광 장치 및 웨이퍼 지지방법
WO2012103967A1 (en) * 2011-02-01 2012-08-09 Asml Netherlands B.V. Substrate table, lithographic apparatus and device manufacturing method
EP2490073B1 (de) 2011-02-18 2015-09-23 ASML Netherlands BV Substrathalter, lithografische Vorrichtung und Verfahren zur Herstellung eines Substrathalters
EP3683627A1 (de) 2012-02-03 2020-07-22 ASML Netherlands B.V. Substrathalter und lithografische vorrichtung
EP2927947B1 (de) * 2012-11-28 2020-05-06 Kyocera Corporation Platzierungselement und verfahren zur herstellung davon
EP3073521B1 (de) * 2013-11-22 2022-04-20 Kyocera Corporation Elektrostatisches futter
WO2020160938A1 (en) * 2019-02-08 2020-08-13 Asml Netherlands B.V. Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0521584A (ja) 1991-07-16 1993-01-29 Nikon Corp 保持装置

Also Published As

Publication number Publication date
US6413701B1 (en) 2002-07-02
JP2001028333A (ja) 2001-01-30
KR100563769B1 (ko) 2006-03-24
DE60030204T2 (de) 2007-07-12
TW594426B (en) 2004-06-21
JP4151934B2 (ja) 2008-09-17
KR20010029788A (ko) 2001-04-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition