DE602004019835D1 - Träger und Verfahren zur Herstellung eines Trägers - Google Patents
Träger und Verfahren zur Herstellung eines TrägersInfo
- Publication number
- DE602004019835D1 DE602004019835D1 DE602004019835T DE602004019835T DE602004019835D1 DE 602004019835 D1 DE602004019835 D1 DE 602004019835D1 DE 602004019835 T DE602004019835 T DE 602004019835T DE 602004019835 T DE602004019835 T DE 602004019835T DE 602004019835 D1 DE602004019835 D1 DE 602004019835D1
- Authority
- DE
- Germany
- Prior art keywords
- carrier
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0084—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours provided with safety means
- B01D46/0091—Including arrangements for environmental or personal protection
- B01D46/0093—Including arrangements for environmental or personal protection against fire or explosion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62C—FIRE-FIGHTING
- A62C35/00—Permanently-installed equipment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62C—FIRE-FIGHTING
- A62C3/00—Fire prevention, containment or extinguishing specially adapted for particular objects or places
- A62C3/06—Fire prevention, containment or extinguishing specially adapted for particular objects or places of highly inflammable material, e.g. light metals, petroleum products
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62C—FIRE-FIGHTING
- A62C3/00—Fire prevention, containment or extinguishing specially adapted for particular objects or places
- A62C3/16—Fire prevention, containment or extinguishing specially adapted for particular objects or places in electrical installations, e.g. cableways
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Emergency Management (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Business, Economics & Management (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03076171 | 2003-04-22 | ||
EP03077038 | 2003-06-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004019835D1 true DE602004019835D1 (de) | 2009-04-23 |
Family
ID=33542555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004019835T Expired - Lifetime DE602004019835D1 (de) | 2003-04-22 | 2004-04-20 | Träger und Verfahren zur Herstellung eines Trägers |
Country Status (7)
Country | Link |
---|---|
US (1) | US7064808B1 (de) |
JP (1) | JP4032040B2 (de) |
KR (1) | KR100585467B1 (de) |
CN (1) | CN100451834C (de) |
DE (1) | DE602004019835D1 (de) |
SG (1) | SG115678A1 (de) |
TW (1) | TWI280935B (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4738829B2 (ja) * | 2005-02-09 | 2011-08-03 | キヤノン株式会社 | 位置決め装置 |
JP4791110B2 (ja) * | 2005-09-02 | 2011-10-12 | 東京エレクトロン株式会社 | 真空チャンバおよび真空処理装置 |
JP2007201177A (ja) * | 2006-01-26 | 2007-08-09 | Canon Inc | 天板、位置決め装置、露光装置及びデバイス製造方法 |
NL1036843A1 (nl) * | 2008-05-23 | 2009-11-24 | Asml Netherlands Bv | Support structure, lithographic apparatus and method. |
US8997996B2 (en) * | 2013-03-18 | 2015-04-07 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Drawer type cushioning packaging device for liquid crystal glass |
WO2015153774A1 (en) * | 2014-04-02 | 2015-10-08 | Zygo Corporation | Photo-masks for lithography |
JP6658790B2 (ja) * | 2018-04-19 | 2020-03-04 | 大日本印刷株式会社 | 蒸着マスク、フレーム付き蒸着マスク、蒸着マスク準備体、蒸着マスクの製造方法、有機半導体素子の製造方法、有機elディスプレイの製造方法、及びパターンの形成方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
US5296891A (en) | 1990-05-02 | 1994-03-22 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Illumination device |
JP2677913B2 (ja) * | 1991-05-13 | 1997-11-17 | 三菱電機株式会社 | 半導体製造装置のシール機構および半導体装置の製造方法 |
US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
EP0824722B1 (de) | 1996-03-06 | 2001-07-25 | Asm Lithography B.V. | Differential-interferometer-system und lithographischer "step and scan" apparat ausgestattet mit diesem system |
JPH1050584A (ja) * | 1996-08-07 | 1998-02-20 | Nikon Corp | マスク保持装置 |
DE69717975T2 (de) | 1996-12-24 | 2003-05-28 | Asml Netherlands Bv | In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät |
DE69711929T2 (de) | 1997-01-29 | 2002-09-05 | Micronic Laser Systems Ab Taeb | Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl |
SE509062C2 (sv) | 1997-02-28 | 1998-11-30 | Micronic Laser Systems Ab | Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster |
USRE40043E1 (en) | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
JPH11142555A (ja) * | 1997-11-11 | 1999-05-28 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
JP3483452B2 (ja) * | 1998-02-04 | 2004-01-06 | キヤノン株式会社 | ステージ装置および露光装置、ならびにデバイス製造方法 |
DE19805875C1 (de) | 1998-02-13 | 1999-04-08 | Schott Glas | Trägertisch für eine Photomaske in einer Vorrichtung zur Mikrochip-Herstellung |
US6188150B1 (en) | 1999-06-16 | 2001-02-13 | Euv, Llc | Light weight high-stiffness stage platen |
US6353271B1 (en) | 1999-10-29 | 2002-03-05 | Euv, Llc | Extreme-UV scanning wafer and reticle stages |
TW504605B (en) * | 1999-12-03 | 2002-10-01 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the same, the device and mask |
JP2002305138A (ja) * | 2001-04-05 | 2002-10-18 | Nikon Corp | 露光装置および露光方法 |
US20020159046A1 (en) * | 2001-04-27 | 2002-10-31 | Nikon Corporation | Base assembly for a stage chamber of a wafer manufacturing system |
US7034924B2 (en) * | 2004-01-12 | 2006-04-25 | Aslm Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7012264B2 (en) * | 2004-06-04 | 2006-03-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2004
- 2004-04-20 SG SG200402166A patent/SG115678A1/en unknown
- 2004-04-20 DE DE602004019835T patent/DE602004019835D1/de not_active Expired - Lifetime
- 2004-04-21 JP JP2004125677A patent/JP4032040B2/ja not_active Expired - Lifetime
- 2004-04-21 TW TW093111037A patent/TWI280935B/zh active
- 2004-04-21 KR KR1020040027501A patent/KR100585467B1/ko active IP Right Grant
- 2004-04-22 US US10/829,462 patent/US7064808B1/en not_active Expired - Lifetime
- 2004-04-22 CN CNB2004100451958A patent/CN100451834C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1540446A (zh) | 2004-10-27 |
SG115678A1 (en) | 2005-10-28 |
US7064808B1 (en) | 2006-06-20 |
JP2004343097A (ja) | 2004-12-02 |
TWI280935B (en) | 2007-05-11 |
TW200424106A (en) | 2004-11-16 |
KR100585467B1 (ko) | 2006-06-07 |
JP4032040B2 (ja) | 2008-01-16 |
KR20040093408A (ko) | 2004-11-05 |
CN100451834C (zh) | 2009-01-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |