DE69921944D1 - Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem - Google Patents
Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystemInfo
- Publication number
- DE69921944D1 DE69921944D1 DE69921944T DE69921944T DE69921944D1 DE 69921944 D1 DE69921944 D1 DE 69921944D1 DE 69921944 T DE69921944 T DE 69921944T DE 69921944 T DE69921944 T DE 69921944T DE 69921944 D1 DE69921944 D1 DE 69921944D1
- Authority
- DE
- Germany
- Prior art keywords
- projection system
- lithographic device
- mirror projection
- suitable mirror
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP98201483 | 1998-05-06 | ||
EP98201483 | 1998-05-06 | ||
PCT/IB1999/000730 WO1999057596A1 (en) | 1998-05-06 | 1999-04-22 | Lithographic apparatus comprising a dedicated mirror projection system |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69921944D1 true DE69921944D1 (de) | 2004-12-23 |
DE69921944T2 DE69921944T2 (de) | 2006-02-09 |
Family
ID=8233689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69921944T Expired - Lifetime DE69921944T2 (de) | 1998-05-06 | 1999-04-22 | Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem |
Country Status (6)
Country | Link |
---|---|
US (2) | US6396067B1 (de) |
EP (1) | EP1005664B1 (de) |
JP (1) | JP3949178B2 (de) |
DE (1) | DE69921944T2 (de) |
TW (1) | TW412642B (de) |
WO (1) | WO1999057596A1 (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6396067B1 (en) * | 1998-05-06 | 2002-05-28 | Koninklijke Philips Electronics N.V. | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
US7151592B2 (en) | 1999-02-15 | 2006-12-19 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
US6985210B2 (en) * | 1999-02-15 | 2006-01-10 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
TW498184B (en) | 1999-06-04 | 2002-08-11 | Asm Lithography Bv | Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method |
EP1093021A3 (de) | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren |
TW490598B (en) * | 1999-11-30 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus |
TWI232356B (en) | 2000-09-04 | 2005-05-11 | Asml Netherlands Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
EP1679550A1 (de) | 2000-11-07 | 2006-07-12 | ASML Netherlands B.V. | Lithografische Vorrichtung und Herstellungsverfahren dafür |
TW573234B (en) | 2000-11-07 | 2004-01-21 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit device manufacturing method |
DE60206908T2 (de) * | 2001-01-09 | 2006-07-20 | Carl Zeiss Smt Ag | Projektionssystem für die extrem-ultraviolettlithographie |
EP1615076A1 (de) * | 2001-01-09 | 2006-01-11 | Carl Zeiss SMT AG | Projektionssystem für die extrem-ultraviolettlithographie |
JP2004158786A (ja) * | 2002-11-08 | 2004-06-03 | Canon Inc | 投影光学系及び露光装置 |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
EP1678558A1 (de) * | 2003-10-29 | 2006-07-12 | Carl Zeiss SMT AG | Blendenwechsler |
US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
CN100483174C (zh) | 2004-05-17 | 2009-04-29 | 卡尔蔡司Smt股份公司 | 具有中间图像的反射折射投影物镜 |
US8064041B2 (en) | 2004-06-10 | 2011-11-22 | Carl Zeiss Smt Gmbh | Projection objective for a microlithographic projection exposure apparatus |
US7472797B2 (en) * | 2004-07-28 | 2009-01-06 | Capitol Vial Inc. | Container for collecting and storing breast milk |
US7476491B2 (en) | 2004-09-15 | 2009-01-13 | Asml Netherlands B.V. | Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby |
DE102005042005A1 (de) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
WO2006069725A1 (de) * | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges objektiv mit obskurierter pupille |
EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
CN103076723A (zh) | 2005-09-13 | 2013-05-01 | 卡尔蔡司Smt有限责任公司 | 微光刻投影光学系统 |
JP5068271B2 (ja) | 2006-02-17 | 2012-11-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ照明システム、及びこの種の照明システムを含む投影露光装置 |
DE102006014380A1 (de) | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
DE102007033967A1 (de) * | 2007-07-19 | 2009-01-29 | Carl Zeiss Smt Ag | Projektionsobjektiv |
DE102008033342A1 (de) | 2008-07-16 | 2010-01-21 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Mikrolithographie |
DE102008000800A1 (de) | 2008-03-20 | 2009-09-24 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Mikrolithographie |
CN102819196B (zh) | 2008-03-20 | 2016-03-09 | 卡尔蔡司Smt有限责任公司 | 用于微光刻的投射物镜 |
CN102422225B (zh) | 2009-03-06 | 2014-07-09 | 卡尔蔡司Smt有限责任公司 | 用于微光刻的照明光学系统与光学系统 |
KR101535230B1 (ko) * | 2009-06-03 | 2015-07-09 | 삼성전자주식회사 | Euv 마스크용 공간 영상 측정 장치 및 방법 |
DE102012212753A1 (de) | 2012-07-20 | 2014-01-23 | Carl Zeiss Smt Gmbh | Projektionsoptik |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW318255B (de) * | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
US5805365A (en) * | 1995-10-12 | 1998-09-08 | Sandia Corporation | Ringfield lithographic camera |
US5815310A (en) | 1995-12-12 | 1998-09-29 | Svg Lithography Systems, Inc. | High numerical aperture ring field optical reduction system |
US5686728A (en) * | 1996-05-01 | 1997-11-11 | Lucent Technologies Inc | Projection lithography system and method using all-reflective optical elements |
US6199991B1 (en) * | 1997-11-13 | 2001-03-13 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
US5973826A (en) * | 1998-02-20 | 1999-10-26 | Regents Of The University Of California | Reflective optical imaging system with balanced distortion |
US6014252A (en) * | 1998-02-20 | 2000-01-11 | The Regents Of The University Of California | Reflective optical imaging system |
US6255661B1 (en) * | 1998-05-06 | 2001-07-03 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
US6396067B1 (en) * | 1998-05-06 | 2002-05-28 | Koninklijke Philips Electronics N.V. | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
US6072852A (en) * | 1998-06-09 | 2000-06-06 | The Regents Of The University Of California | High numerical aperture projection system for extreme ultraviolet projection lithography |
US6118577A (en) * | 1998-08-06 | 2000-09-12 | Euv, L.L.C | Diffractive element in extreme-UV lithography condenser |
US6368763B2 (en) * | 1998-11-23 | 2002-04-09 | U.S. Philips Corporation | Method of detecting aberrations of an optical imaging system |
DE19910724A1 (de) * | 1999-03-11 | 2000-09-14 | Zeiss Carl Fa | Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
US6033079A (en) * | 1999-03-15 | 2000-03-07 | Hudyma; Russell | High numerical aperture ring field projection system for extreme ultraviolet lithography |
JP3770542B2 (ja) * | 1999-07-22 | 2006-04-26 | コーニング インコーポレイテッド | 遠紫外軟x線投影リソグラフィー法およびマスク装置 |
TW573234B (en) * | 2000-11-07 | 2004-01-21 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit device manufacturing method |
-
1998
- 1998-10-13 US US09/170,466 patent/US6396067B1/en not_active Expired - Lifetime
- 1998-10-15 TW TW087117127A patent/TW412642B/zh not_active IP Right Cessation
-
1999
- 1999-04-22 WO PCT/IB1999/000730 patent/WO1999057596A1/en active IP Right Grant
- 1999-04-22 EP EP99914692A patent/EP1005664B1/de not_active Expired - Lifetime
- 1999-04-22 DE DE69921944T patent/DE69921944T2/de not_active Expired - Lifetime
- 1999-04-22 JP JP55511899A patent/JP3949178B2/ja not_active Expired - Lifetime
-
2002
- 2002-05-08 US US10/140,666 patent/US6800861B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2002509653A (ja) | 2002-03-26 |
EP1005664B1 (de) | 2004-11-17 |
WO1999057596A1 (en) | 1999-11-11 |
DE69921944T2 (de) | 2006-02-09 |
EP1005664A1 (de) | 2000-06-07 |
US20020171048A1 (en) | 2002-11-21 |
US6800861B2 (en) | 2004-10-05 |
US6396067B1 (en) | 2002-05-28 |
JP3949178B2 (ja) | 2007-07-25 |
TW412642B (en) | 2000-11-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8320 | Willingness to grant licences declared (paragraph 23) | ||
8332 | No legal effect for de | ||
8370 | Indication related to discontinuation of the patent is to be deleted | ||
8364 | No opposition during term of opposition |