DE69915401D1 - Lithographischer Projektionsapparat mit Substrathalter - Google Patents

Lithographischer Projektionsapparat mit Substrathalter

Info

Publication number
DE69915401D1
DE69915401D1 DE69915401T DE69915401T DE69915401D1 DE 69915401 D1 DE69915401 D1 DE 69915401D1 DE 69915401 T DE69915401 T DE 69915401T DE 69915401 T DE69915401 T DE 69915401T DE 69915401 D1 DE69915401 D1 DE 69915401D1
Authority
DE
Germany
Prior art keywords
substrate holder
projection apparatus
lithographic projection
lithographic
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69915401T
Other languages
English (en)
Other versions
DE69915401T2 (de
Inventor
Empel Tjarko Adriaan Rudol Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE69915401D1 publication Critical patent/DE69915401D1/de
Publication of DE69915401T2 publication Critical patent/DE69915401T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69915401T 1998-03-31 1999-03-29 Lithographischer Projektionsapparat mit Substrathalter Expired - Fee Related DE69915401T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98201004 1998-03-31
EP98201004 1998-03-31

Publications (2)

Publication Number Publication Date
DE69915401D1 true DE69915401D1 (de) 2004-04-15
DE69915401T2 DE69915401T2 (de) 2005-05-04

Family

ID=8233536

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69915401T Expired - Fee Related DE69915401T2 (de) 1998-03-31 1999-03-29 Lithographischer Projektionsapparat mit Substrathalter

Country Status (5)

Country Link
US (1) US6232615B1 (de)
JP (1) JP2000068198A (de)
KR (1) KR100528265B1 (de)
DE (1) DE69915401T2 (de)
TW (1) TW535034B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW513617B (en) * 1999-04-21 2002-12-11 Asml Corp Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
US20050233770A1 (en) * 2002-02-06 2005-10-20 Ramsey Craig C Wireless substrate-like sensor
US20050224899A1 (en) * 2002-02-06 2005-10-13 Ramsey Craig C Wireless substrate-like sensor
US7289230B2 (en) * 2002-02-06 2007-10-30 Cyberoptics Semiconductors, Inc. Wireless substrate-like sensor
EP1359466A1 (de) * 2002-05-01 2003-11-05 ASML Netherlands B.V. Halter, lithographischer Projektionsapparat, Verfahren zur Herstellung eines Halters und Verfahren zur Herstellung einer Vorrichtung
EP1431825A1 (de) * 2002-12-20 2004-06-23 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter
EP1475666A1 (de) * 2003-05-06 2004-11-10 ASML Netherlands B.V. Substrathalter für einen lithographischen Apparat
TWI254188B (en) * 2003-07-23 2006-05-01 Asml Netherlands Bv Lithographic projection apparatus and article holder therefor
DE602004032100D1 (de) * 2003-11-05 2011-05-19 Asml Netherlands Bv Lithographischer Apparat und Vorrichtungs-Halteverfahren
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009527764A (ja) 2006-02-21 2009-07-30 サイバーオプティクス セミコンダクタ インコーポレイテッド 半導体加工ツールにおける静電容量距離検出
US7893697B2 (en) * 2006-02-21 2011-02-22 Cyberoptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
US8823933B2 (en) * 2006-09-29 2014-09-02 Cyberoptics Corporation Substrate-like particle sensor
US7778793B2 (en) * 2007-03-12 2010-08-17 Cyberoptics Semiconductor, Inc. Wireless sensor for semiconductor processing systems
TW200849444A (en) * 2007-04-05 2008-12-16 Cyberoptics Semiconductor Inc Semiconductor processing system with integrated showerhead distance measuring device
US20090015268A1 (en) * 2007-07-13 2009-01-15 Gardner Delrae H Device and method for compensating a capacitive sensor measurement for variations caused by environmental conditions in a semiconductor processing environment
JP2009212345A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
JP2009212344A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
CN111465901A (zh) * 2017-12-13 2020-07-28 Asml荷兰有限公司 用于光刻设备中的衬底保持器
US10831110B2 (en) * 2018-05-29 2020-11-10 Taiwan Semiconductor Manufacturing Company Ltd. Lithographic overlay correction and lithographic process

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4213698A (en) * 1978-12-01 1980-07-22 Bell Telephone Laboratories, Incorporated Apparatus and method for holding and planarizing thin workpieces
EP0456426B1 (de) * 1990-05-07 2004-09-15 Canon Kabushiki Kaisha Substratträger des Vakuumtyps
KR960015613U (ko) * 1994-10-07 1996-05-17 웨이퍼 척
US5923408A (en) * 1996-01-31 1999-07-13 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
KR200205150Y1 (ko) * 1997-12-08 2001-01-15 김영환 반도체 노광장비의 웨이퍼 척

Also Published As

Publication number Publication date
TW535034B (en) 2003-06-01
US6232615B1 (en) 2001-05-15
DE69915401T2 (de) 2005-05-04
JP2000068198A (ja) 2000-03-03
KR19990078346A (ko) 1999-10-25
KR100528265B1 (ko) 2005-11-15

Similar Documents

Publication Publication Date Title
DE69915401D1 (de) Lithographischer Projektionsapparat mit Substrathalter
DE60020638D1 (de) Lithographischer Projektionsapparat
DE60020620D1 (de) Lithographischer Projektionsapparat
DE69931690D1 (de) Lithographischer Apparat
DE60026461D1 (de) Lithographischer Projektionsapparat
DE69735016D1 (de) Lithographisches Gerät mit zwei Objekthaltern
DE69933257D1 (de) Lithographische Vorrichtung
DE60024211D1 (de) Lithographischer Projektionsapparat mit kollisionsvermeidender Vorrichtung
DE69921944D1 (de) Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem
DE69920823D1 (de) Photographisches Gerät
DE69943295D1 (de) Block-resistenter film
DE69933918D1 (de) Lithographischer Projektionsapparat
DE69919278D1 (de) Bildprojektionsvorrichtung
DE69901014T2 (de) Keilantriebsvorrichtung
DE69934067D1 (de) Übertragungsvorrichtung für Beschichtungsfilm
DE69925691D1 (de) Beschichteter Film
PT1078349E (pt) Dispositivo de exposicao
DE69938885D1 (de) Lithographischer Apparat
DE69914679D1 (de) Druckvorrichtung
DE69902709D1 (de) Schablonendruckvorrichtung
DE69822004D1 (de) Belichtungsvorrichtung
DE60025303D1 (de) Lithographischer Projektionsapparat
DE60030204D1 (de) Lithographischer Projektionsapparat
DE69928328D1 (de) Lithographischer Projektionsapparat
NO982776D0 (no) Plateholder

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee