DE69928328D1 - Lithographischer Projektionsapparat - Google Patents

Lithographischer Projektionsapparat

Info

Publication number
DE69928328D1
DE69928328D1 DE69928328T DE69928328T DE69928328D1 DE 69928328 D1 DE69928328 D1 DE 69928328D1 DE 69928328 T DE69928328 T DE 69928328T DE 69928328 T DE69928328 T DE 69928328T DE 69928328 D1 DE69928328 D1 DE 69928328D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
lithographic
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69928328T
Other languages
English (en)
Other versions
DE69928328T2 (de
Inventor
Hans Butler
Thomas Petrus Hendri Warmerdam
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69928328D1 publication Critical patent/DE69928328D1/de
Application granted granted Critical
Publication of DE69928328T2 publication Critical patent/DE69928328T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69928328T 1998-06-23 1999-06-17 Lithographischer Projektionsapparat Expired - Fee Related DE69928328T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98202084 1998-06-23
EP98202084 1998-06-23

Publications (2)

Publication Number Publication Date
DE69928328D1 true DE69928328D1 (de) 2005-12-22
DE69928328T2 DE69928328T2 (de) 2006-06-29

Family

ID=8233838

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69928328T Expired - Fee Related DE69928328T2 (de) 1998-06-23 1999-06-17 Lithographischer Projektionsapparat

Country Status (5)

Country Link
US (1) US6373072B1 (de)
JP (1) JP4160207B2 (de)
KR (1) KR100585208B1 (de)
DE (1) DE69928328T2 (de)
TW (1) TW394862B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1265104A1 (de) * 2001-06-06 2002-12-11 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und dabei erzeugter Artikel
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7505114B2 (en) * 2005-12-22 2009-03-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7847919B2 (en) * 2007-03-29 2010-12-07 Asml Netherlands B.V. Lithographic apparatus having feedthrough control system
NL1036511A1 (nl) * 2008-02-13 2009-08-14 Asml Netherlands Bv Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
JP5319167B2 (ja) * 2008-06-06 2013-10-16 株式会社ミツトヨ 制御装置
NL2007633A (en) 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
EP3084525B1 (de) 2013-12-20 2019-04-17 ASML Netherlands B.V. Lithographischer apparat und verfahren zur herstellung einer vorrichtung
CN110546573B (zh) 2017-04-11 2022-10-04 Asml荷兰有限公司 光刻设备

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPH06151274A (ja) * 1992-11-11 1994-05-31 Hitachi Ltd 半導体集積回路パターンの位置合わせ方法および装置
JP3282751B2 (ja) * 1993-07-14 2002-05-20 株式会社ニコン 走査型露光装置、及び該装置を用いる素子製造方法
JPH08293459A (ja) 1995-04-21 1996-11-05 Nikon Corp ステージ駆動制御方法及びその装置
JP3352286B2 (ja) 1995-07-13 2002-12-03 キヤノン株式会社 位置制御方法及び装置並びにそれを使用した半導体製造装置
US5940789A (en) * 1996-05-17 1999-08-17 Nikon Corporation Stage control method and apparatus with varying stage controller parameter

Also Published As

Publication number Publication date
US6373072B1 (en) 2002-04-16
DE69928328T2 (de) 2006-06-29
TW394862B (en) 2000-06-21
KR100585208B1 (ko) 2006-05-30
KR20000006321A (ko) 2000-01-25
JP4160207B2 (ja) 2008-10-01
JP2000031049A (ja) 2000-01-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee