DE59406271D1 - Beleuchtungseinrichtung für eine Projektions-Mikrolithographie-Belichtungsanlage - Google Patents
Beleuchtungseinrichtung für eine Projektions-Mikrolithographie-BelichtungsanlageInfo
- Publication number
- DE59406271D1 DE59406271D1 DE59406271T DE59406271T DE59406271D1 DE 59406271 D1 DE59406271 D1 DE 59406271D1 DE 59406271 T DE59406271 T DE 59406271T DE 59406271 T DE59406271 T DE 59406271T DE 59406271 D1 DE59406271 D1 DE 59406271D1
- Authority
- DE
- Germany
- Prior art keywords
- illumination device
- exposure system
- microlithography exposure
- projection microlithography
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4342424A DE4342424A1 (de) | 1993-12-13 | 1993-12-13 | Beleuchtungseinrichtung für eine Projektions-Mikrolithographie- Belichtungsanlage |
DE9409744U DE9409744U1 (de) | 1993-12-13 | 1994-06-17 | Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Markierungssystem |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59406271D1 true DE59406271D1 (de) | 1998-07-23 |
Family
ID=6504852
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE4342424A Ceased DE4342424A1 (de) | 1992-12-13 | 1993-12-13 | Beleuchtungseinrichtung für eine Projektions-Mikrolithographie- Belichtungsanlage |
DE9409744U Expired - Lifetime DE9409744U1 (de) | 1992-12-13 | 1994-06-17 | Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Markierungssystem |
DE59407337T Expired - Fee Related DE59407337D1 (de) | 1993-12-13 | 1994-10-22 | Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem |
DE59406271T Expired - Fee Related DE59406271D1 (de) | 1993-12-13 | 1994-10-22 | Beleuchtungseinrichtung für eine Projektions-Mikrolithographie-Belichtungsanlage |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE4342424A Ceased DE4342424A1 (de) | 1992-12-13 | 1993-12-13 | Beleuchtungseinrichtung für eine Projektions-Mikrolithographie- Belichtungsanlage |
DE9409744U Expired - Lifetime DE9409744U1 (de) | 1992-12-13 | 1994-06-17 | Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Markierungssystem |
DE59407337T Expired - Fee Related DE59407337D1 (de) | 1993-12-13 | 1994-10-22 | Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem |
Country Status (3)
Country | Link |
---|---|
KR (2) | KR100333566B1 (de) |
DE (4) | DE4342424A1 (de) |
TW (2) | TW300282B (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6285443B1 (en) | 1993-12-13 | 2001-09-04 | Carl-Zeiss-Stiftung | Illuminating arrangement for a projection microlithographic apparatus |
DE19520563A1 (de) * | 1995-06-06 | 1996-12-12 | Zeiss Carl Fa | Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät |
DE19548805A1 (de) | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
US7130129B2 (en) | 1996-12-21 | 2006-10-31 | Carl Zeiss Smt Ag | Reticle-masking objective with aspherical lenses |
DE10132988B4 (de) * | 2001-07-06 | 2005-07-28 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage |
DE10251087A1 (de) * | 2002-10-29 | 2004-05-19 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung für eine Mikrolithographie-Projektionsbelichtungsanlage |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3750174T2 (de) * | 1986-10-30 | 1994-11-17 | Canon Kk | Belichtungseinrichtung. |
NL8801348A (nl) * | 1988-05-26 | 1989-12-18 | Philips Nv | Belichtingsstelsel. |
US5305054A (en) * | 1991-02-22 | 1994-04-19 | Canon Kabushiki Kaisha | Imaging method for manufacture of microdevices |
-
1993
- 1993-12-13 DE DE4342424A patent/DE4342424A1/de not_active Ceased
-
1994
- 1994-06-17 DE DE9409744U patent/DE9409744U1/de not_active Expired - Lifetime
- 1994-10-22 DE DE59407337T patent/DE59407337D1/de not_active Expired - Fee Related
- 1994-10-22 DE DE59406271T patent/DE59406271D1/de not_active Expired - Fee Related
- 1994-11-14 KR KR1019940029833A patent/KR100333566B1/ko not_active IP Right Cessation
- 1994-11-14 KR KR1019940029834A patent/KR100334147B1/ko not_active IP Right Cessation
- 1994-11-25 TW TW083110967A patent/TW300282B/zh not_active IP Right Cessation
- 1994-11-25 TW TW083110968A patent/TW311182B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR100334147B1 (ko) | 2002-11-23 |
TW300282B (de) | 1997-03-11 |
KR950019951A (ko) | 1995-07-24 |
DE9409744U1 (de) | 1994-09-15 |
TW311182B (de) | 1997-07-21 |
DE59407337D1 (de) | 1999-01-07 |
DE4342424A1 (de) | 1995-06-14 |
KR100333566B1 (ko) | 2002-11-30 |
KR950019950A (ko) | 1995-07-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT AG, 73447 OBERKOCHEN, DE |
|
8339 | Ceased/non-payment of the annual fee |