NL194951B - Projectiebelichtingssysteem. - Google Patents

Projectiebelichtingssysteem.

Info

Publication number
NL194951B
NL194951B NL9301972A NL9301972A NL194951B NL 194951 B NL194951 B NL 194951B NL 9301972 A NL9301972 A NL 9301972A NL 9301972 A NL9301972 A NL 9301972A NL 194951 B NL194951 B NL 194951B
Authority
NL
Netherlands
Prior art keywords
projection exposure
exposure system
projection
exposure
Prior art date
Application number
NL9301972A
Other languages
English (en)
Other versions
NL9301972A (nl
NL194951C (nl
Inventor
Ho-Young Kang
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of NL9301972A publication Critical patent/NL9301972A/nl
Publication of NL194951B publication Critical patent/NL194951B/nl
Application granted granted Critical
Publication of NL194951C publication Critical patent/NL194951C/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL9301972A 1992-11-21 1993-11-16 Projectiebelichtingssysteem. NL194951C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019920021977A KR100234357B1 (ko) 1992-11-21 1992-11-21 투영노광장치
KR920021977 1992-11-21

Publications (3)

Publication Number Publication Date
NL9301972A NL9301972A (nl) 1994-06-16
NL194951B true NL194951B (nl) 2003-04-01
NL194951C NL194951C (nl) 2003-08-04

Family

ID=19343606

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9301972A NL194951C (nl) 1992-11-21 1993-11-16 Projectiebelichtingssysteem.

Country Status (4)

Country Link
US (1) US5386266A (nl)
JP (1) JP2875143B2 (nl)
KR (1) KR100234357B1 (nl)
NL (1) NL194951C (nl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL194929C (nl) * 1992-10-20 2003-07-04 Samsung Electronics Co Ltd Projectiebelichtingssysteem.
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE19520563A1 (de) * 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
CN1791839A (zh) * 2001-11-07 2006-06-21 应用材料有限公司 光点格栅阵列光刻机
WO2003040829A2 (en) 2001-11-07 2003-05-15 Applied Materials, Inc. Maskless printer using photoelectric conversion of a light beam array
JP5296382B2 (ja) * 2004-12-01 2013-09-25 トムソン ライセンシング 光学システム
FR2887038A1 (fr) * 2005-06-13 2006-12-15 Thomson Licensing Sa Systeme optique et element optique correspondant
KR100733137B1 (ko) * 2006-06-14 2007-06-28 삼성전자주식회사 웨이퍼 에지 노광 장치
JP6598833B2 (ja) * 2017-09-11 2019-10-30 キヤノン株式会社 照明光学系、露光装置、および物品の製造方法
CN113126188A (zh) * 2021-04-26 2021-07-16 中国科学院长春光学精密机械与物理研究所 一种曲面复眼透镜及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58147708A (ja) * 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
USRE34634E (en) * 1982-02-26 1994-06-07 Nippon Kogaku Kabushiki Kaisha Light illumination device
JPS59160134A (ja) * 1983-03-04 1984-09-10 Canon Inc 照明光学系
US4619508A (en) * 1984-04-28 1986-10-28 Nippon Kogaku K. K. Illumination optical arrangement
US4867514A (en) * 1985-11-12 1989-09-19 Hydro Fuels, Inc. Systems for deviating and (optionally) converging radiation
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
JPH0264501A (ja) * 1988-08-30 1990-03-05 Sharp Corp マイクロレンズアレイ及びその製造方法
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JP2893778B2 (ja) * 1990-01-17 1999-05-24 キヤノン株式会社 露光装置
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
JPH05217855A (ja) * 1992-02-01 1993-08-27 Nikon Corp 露光用照明装置
US5311249A (en) * 1992-02-13 1994-05-10 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
JP3075381B2 (ja) * 1992-02-17 2000-08-14 株式会社ニコン 投影露光装置及び転写方法
US5309198A (en) * 1992-02-25 1994-05-03 Nikon Corporation Light exposure system

Also Published As

Publication number Publication date
JP2875143B2 (ja) 1999-03-24
NL9301972A (nl) 1994-06-16
KR940012508A (ko) 1994-06-23
US5386266A (en) 1995-01-31
NL194951C (nl) 2003-08-04
JPH0774086A (ja) 1995-03-17
KR100234357B1 (ko) 1999-12-15

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Legal Events

Date Code Title Description
A1B A search report has been drawn up
BC A request for examination has been filed
V1 Lapsed because of non-payment of the annual fee

Effective date: 20090601