DE69127479D1 - Belichtungssystem - Google Patents

Belichtungssystem

Info

Publication number
DE69127479D1
DE69127479D1 DE69127479T DE69127479T DE69127479D1 DE 69127479 D1 DE69127479 D1 DE 69127479D1 DE 69127479 T DE69127479 T DE 69127479T DE 69127479 T DE69127479 T DE 69127479T DE 69127479 D1 DE69127479 D1 DE 69127479D1
Authority
DE
Germany
Prior art keywords
exposure system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69127479T
Other languages
English (en)
Other versions
DE69127479T2 (de
Inventor
Yoshito Nakanishi
Takeo Sato
Nobuaki Furuya
Takeo Miyata
Shinichi Mizuguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69127479D1 publication Critical patent/DE69127479D1/de
Publication of DE69127479T2 publication Critical patent/DE69127479T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
DE69127479T 1990-01-18 1991-01-16 Belichtungssystem Expired - Fee Related DE69127479T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008650A JPH03212925A (ja) 1990-01-18 1990-01-18 露光装置

Publications (2)

Publication Number Publication Date
DE69127479D1 true DE69127479D1 (de) 1997-10-09
DE69127479T2 DE69127479T2 (de) 1998-01-08

Family

ID=11698817

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69127479T Expired - Fee Related DE69127479T2 (de) 1990-01-18 1991-01-16 Belichtungssystem

Country Status (4)

Country Link
US (1) US5227838A (de)
EP (1) EP0439052B1 (de)
JP (1) JPH03212925A (de)
DE (1) DE69127479T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5592259A (en) * 1991-08-09 1997-01-07 Nikon Corporation Photomask, an exposure method and a projection exposure apparatus
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
US5285236A (en) * 1992-09-30 1994-02-08 Kanti Jain Large-area, high-throughput, high-resolution projection imaging system
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3477838B2 (ja) 1993-11-11 2003-12-10 株式会社ニコン 走査型露光装置及び露光方法
USRE37762E1 (en) 1994-04-12 2002-06-25 Nikon Corporation Scanning exposure apparatus and exposure method
US6556949B1 (en) * 1999-05-18 2003-04-29 Applied Materials, Inc. Semiconductor processing techniques
JP2001060544A (ja) 1999-08-20 2001-03-06 Oki Electric Ind Co Ltd 被処理体の位置合わせ方法及び被処理体の位置合わせシステム
JP2001308003A (ja) 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2002353099A (ja) * 2001-05-22 2002-12-06 Canon Inc 位置検出方法及び装置及び露光装置及びデバイス製造方法
US6950194B2 (en) 2001-12-07 2005-09-27 Micronic Laser Systems Ab Alignment sensor
US7615424B2 (en) * 2004-03-25 2009-11-10 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus and method for manufacturing semiconductor device using the laser irradiation apparatus
US7684014B2 (en) * 2006-12-01 2010-03-23 Asml Holding B.V. Lithographic apparatus and device manufacturing method
US8610986B2 (en) * 2009-04-06 2013-12-17 The Board Of Trustees Of The University Of Illinois Mirror arrays for maskless photolithography and image display
NL2004256A (en) 2009-05-13 2010-11-18 Asml Netherlands Bv Enhancing alignment in lithographic apparatus device manufacture.
JP5523207B2 (ja) * 2010-06-01 2014-06-18 株式会社トプコン 露光装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1516152A (fr) * 1967-01-25 1968-03-08 Thomson Houston Comp Francaise Perfectionnements aux bancs photographiques répétiteurs
US4669867A (en) * 1984-02-20 1987-06-02 Canon Kabushiki Kaisha Alignment and exposure apparatus
JPH0616479B2 (ja) * 1984-03-06 1994-03-02 株式会社ニコン 露光装置の位置合せ装置
US4699515A (en) * 1984-02-28 1987-10-13 Nippon Kogaku K. K. Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween
US4843563A (en) * 1985-03-25 1989-06-27 Canon Kabushiki Kaisha Step-and-repeat alignment and exposure method and apparatus
JP2650895B2 (ja) * 1986-07-02 1997-09-10 松下電器産業株式会社 露光装置および露光方法
JPH07123103B2 (ja) * 1986-11-26 1995-12-25 株式会社ニコン 位置合わせ装置
US4884101A (en) * 1987-02-03 1989-11-28 Nikon Corporation Apparatus capable of adjusting the light amount
JP2694868B2 (ja) * 1987-08-31 1997-12-24 株式会社ニコン 位置検出方法及び装置

Also Published As

Publication number Publication date
DE69127479T2 (de) 1998-01-08
JPH03212925A (ja) 1991-09-18
US5227838A (en) 1993-07-13
EP0439052A1 (de) 1991-07-31
EP0439052B1 (de) 1997-09-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee