DE69127479D1 - Belichtungssystem - Google Patents
BelichtungssystemInfo
- Publication number
- DE69127479D1 DE69127479D1 DE69127479T DE69127479T DE69127479D1 DE 69127479 D1 DE69127479 D1 DE 69127479D1 DE 69127479 T DE69127479 T DE 69127479T DE 69127479 T DE69127479 T DE 69127479T DE 69127479 D1 DE69127479 D1 DE 69127479D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure system
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008650A JPH03212925A (ja) | 1990-01-18 | 1990-01-18 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69127479D1 true DE69127479D1 (de) | 1997-10-09 |
DE69127479T2 DE69127479T2 (de) | 1998-01-08 |
Family
ID=11698817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69127479T Expired - Fee Related DE69127479T2 (de) | 1990-01-18 | 1991-01-16 | Belichtungssystem |
Country Status (4)
Country | Link |
---|---|
US (1) | US5227838A (de) |
EP (1) | EP0439052B1 (de) |
JP (1) | JPH03212925A (de) |
DE (1) | DE69127479T2 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5592259A (en) * | 1991-08-09 | 1997-01-07 | Nikon Corporation | Photomask, an exposure method and a projection exposure apparatus |
US5684856A (en) * | 1991-09-18 | 1997-11-04 | Canon Kabushiki Kaisha | Stage device and pattern transfer system using the same |
US5285236A (en) * | 1992-09-30 | 1994-02-08 | Kanti Jain | Large-area, high-throughput, high-resolution projection imaging system |
US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JP3477838B2 (ja) | 1993-11-11 | 2003-12-10 | 株式会社ニコン | 走査型露光装置及び露光方法 |
USRE37762E1 (en) | 1994-04-12 | 2002-06-25 | Nikon Corporation | Scanning exposure apparatus and exposure method |
US6556949B1 (en) * | 1999-05-18 | 2003-04-29 | Applied Materials, Inc. | Semiconductor processing techniques |
JP2001060544A (ja) | 1999-08-20 | 2001-03-06 | Oki Electric Ind Co Ltd | 被処理体の位置合わせ方法及び被処理体の位置合わせシステム |
JP2001308003A (ja) | 2000-02-15 | 2001-11-02 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP2002353099A (ja) * | 2001-05-22 | 2002-12-06 | Canon Inc | 位置検出方法及び装置及び露光装置及びデバイス製造方法 |
US6950194B2 (en) | 2001-12-07 | 2005-09-27 | Micronic Laser Systems Ab | Alignment sensor |
US7615424B2 (en) * | 2004-03-25 | 2009-11-10 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and method for manufacturing semiconductor device using the laser irradiation apparatus |
US7684014B2 (en) * | 2006-12-01 | 2010-03-23 | Asml Holding B.V. | Lithographic apparatus and device manufacturing method |
US8610986B2 (en) * | 2009-04-06 | 2013-12-17 | The Board Of Trustees Of The University Of Illinois | Mirror arrays for maskless photolithography and image display |
NL2004256A (en) | 2009-05-13 | 2010-11-18 | Asml Netherlands Bv | Enhancing alignment in lithographic apparatus device manufacture. |
JP5523207B2 (ja) * | 2010-06-01 | 2014-06-18 | 株式会社トプコン | 露光装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1516152A (fr) * | 1967-01-25 | 1968-03-08 | Thomson Houston Comp Francaise | Perfectionnements aux bancs photographiques répétiteurs |
US4669867A (en) * | 1984-02-20 | 1987-06-02 | Canon Kabushiki Kaisha | Alignment and exposure apparatus |
JPH0616479B2 (ja) * | 1984-03-06 | 1994-03-02 | 株式会社ニコン | 露光装置の位置合せ装置 |
US4699515A (en) * | 1984-02-28 | 1987-10-13 | Nippon Kogaku K. K. | Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween |
US4843563A (en) * | 1985-03-25 | 1989-06-27 | Canon Kabushiki Kaisha | Step-and-repeat alignment and exposure method and apparatus |
JP2650895B2 (ja) * | 1986-07-02 | 1997-09-10 | 松下電器産業株式会社 | 露光装置および露光方法 |
JPH07123103B2 (ja) * | 1986-11-26 | 1995-12-25 | 株式会社ニコン | 位置合わせ装置 |
US4884101A (en) * | 1987-02-03 | 1989-11-28 | Nikon Corporation | Apparatus capable of adjusting the light amount |
JP2694868B2 (ja) * | 1987-08-31 | 1997-12-24 | 株式会社ニコン | 位置検出方法及び装置 |
-
1990
- 1990-01-18 JP JP2008650A patent/JPH03212925A/ja active Pending
-
1991
- 1991-01-16 EP EP91100474A patent/EP0439052B1/de not_active Expired - Lifetime
- 1991-01-16 DE DE69127479T patent/DE69127479T2/de not_active Expired - Fee Related
- 1991-01-16 US US07/641,944 patent/US5227838A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69127479T2 (de) | 1998-01-08 |
JPH03212925A (ja) | 1991-09-18 |
US5227838A (en) | 1993-07-13 |
EP0439052A1 (de) | 1991-07-31 |
EP0439052B1 (de) | 1997-09-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |