DE68924667D1 - Projektionsbelichtungsvorrichtung. - Google Patents

Projektionsbelichtungsvorrichtung.

Info

Publication number
DE68924667D1
DE68924667D1 DE68924667T DE68924667T DE68924667D1 DE 68924667 D1 DE68924667 D1 DE 68924667D1 DE 68924667 T DE68924667 T DE 68924667T DE 68924667 T DE68924667 T DE 68924667T DE 68924667 D1 DE68924667 D1 DE 68924667D1
Authority
DE
Germany
Prior art keywords
exposure device
projection exposure
projection
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68924667T
Other languages
English (en)
Other versions
DE68924667T2 (de
Inventor
Haruna Kawashima
Akiyoshi Suzuki
Masato Muraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63116455A external-priority patent/JPH0652706B2/ja
Priority claimed from JP63258555A external-priority patent/JP2821148B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE68924667D1 publication Critical patent/DE68924667D1/de
Publication of DE68924667T2 publication Critical patent/DE68924667T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE68924667T 1988-05-13 1989-05-12 Projektionsbelichtungsvorrichtung. Expired - Lifetime DE68924667T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63116455A JPH0652706B2 (ja) 1988-05-13 1988-05-13 投影露光装置
JP63258555A JP2821148B2 (ja) 1988-10-14 1988-10-14 投影露光装置

Publications (2)

Publication Number Publication Date
DE68924667D1 true DE68924667D1 (de) 1995-12-07
DE68924667T2 DE68924667T2 (de) 1996-03-28

Family

ID=26454784

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68924667T Expired - Lifetime DE68924667T2 (de) 1988-05-13 1989-05-12 Projektionsbelichtungsvorrichtung.

Country Status (3)

Country Link
US (1) US5489966A (de)
EP (1) EP0342061B1 (de)
DE (1) DE68924667T2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2886957B2 (ja) * 1990-09-06 1999-04-26 キヤノン株式会社 自動焦点合せ装置
USRE39662E1 (en) * 1991-12-25 2007-05-29 Nikon Corporation Projection exposure apparatus
US5654553A (en) * 1993-06-10 1997-08-05 Nikon Corporation Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate
JP3395798B2 (ja) * 1993-12-22 2003-04-14 株式会社ニコン 位置検出方法及び装置、並びに露光方法及び装置
KR0156800B1 (ko) * 1995-02-10 1998-12-15 이대원 레이저 다이오드를 이용한 자동 초점 조절 장치
US5883704A (en) * 1995-08-07 1999-03-16 Nikon Corporation Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
US5796468A (en) * 1995-11-02 1998-08-18 Lg Semicon Co., Ltd. Apparatus used to align and mark wafers
US5883703A (en) * 1996-02-08 1999-03-16 Megapanel Corporation Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
JPH09283427A (ja) * 1996-04-10 1997-10-31 Nikon Corp 露光方法及び投影露光装置
US6043475A (en) * 1996-04-16 2000-03-28 Olympus Optical Co., Ltd. Focal point adjustment apparatus and method applied to microscopes
KR100242983B1 (ko) * 1996-10-28 2000-02-01 김영환 2중 반사를 이용한 오토포커싱시스템
JP3259657B2 (ja) 1997-04-30 2002-02-25 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
DE19724903A1 (de) * 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
JP3441930B2 (ja) * 1997-07-22 2003-09-02 キヤノン株式会社 走査型露光装置およびデバイス製造方法
JP3380754B2 (ja) * 1997-10-17 2003-02-24 富士写真フイルム株式会社 原稿キャリア及び画像読取装置
JPH11251229A (ja) * 1998-02-27 1999-09-17 Canon Inc 露光装置およびデバイス製造方法
JP3937580B2 (ja) 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
US6696223B2 (en) 1999-02-19 2004-02-24 Agilent Technologies, Inc. Method for performing photolithography
JP4267122B2 (ja) * 1999-02-19 2009-05-27 アバゴ・テクノロジーズ・イーシービーユー・アイピー（シンガポール）プライベート・リミテッド フォトリソグラフィ方法及びフォトリソグラフィを行うための装置構成
JP2002217084A (ja) 2001-01-15 2002-08-02 Semiconductor Leading Edge Technologies Inc ウェハ周辺露光装置およびウェハ周辺露光方法
AU2002365049A1 (en) * 2002-12-20 2004-07-22 Yamatake Corporation System and method for detecting and correcting position deviations of an object having a curved surface
US7333217B2 (en) * 2002-12-20 2008-02-19 Yamatake Corporation System and method for detecting and correcting position deviations of an object having a curved surface
DE10335816B4 (de) * 2003-08-05 2007-07-12 Infineon Technologies Ag Verfahren zur Justage eines Substrates vor der Durchführung eines Projektionsschrittes in einem Belichtungsgerät
US6942223B2 (en) 2003-09-05 2005-09-13 Gkn Driveline North America, Inc. Dual layer roll boot
JP2005175383A (ja) * 2003-12-15 2005-06-30 Canon Inc 露光装置、アライメント方法、及び、デバイスの製造方法
US7136149B2 (en) * 2004-12-20 2006-11-14 Asml Netherlands B.V. Lithographic apparatus with autofocus system
JP2007036193A (ja) * 2005-06-23 2007-02-08 Canon Inc 露光装置
CN101218482B (zh) * 2005-07-08 2015-10-21 株式会社尼康 面位置检测装置、曝光装置及曝光方法
JP4923541B2 (ja) * 2005-11-30 2012-04-25 株式会社ニコン 顕微鏡
DE102008002247A1 (de) * 2008-06-05 2009-12-10 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Systems
CN102566287B (zh) * 2010-12-16 2014-02-19 上海微电子装备有限公司 光刻机的垂向控制装置及方法
CN102540752B (zh) * 2010-12-28 2014-02-19 上海微电子装备有限公司 一种光刻照明系统
TW201830168A (zh) 2016-12-08 2018-08-16 美商精微超科技公司 用於重構晶圓之微影製程之對焦控制的掃描方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
US4650983A (en) * 1983-11-07 1987-03-17 Nippon Kogaku K. K. Focusing apparatus for projection optical system
JPS6119129A (ja) * 1984-07-05 1986-01-28 Nippon Kogaku Kk <Nikon> 投影光学装置
JPS6134941A (ja) * 1984-07-26 1986-02-19 Canon Inc 合焦検知装置
JPS6216526A (ja) * 1985-07-15 1987-01-24 Canon Inc 投影露光装置及びそれを用いたデバイス製造方法
US5114223A (en) * 1985-07-15 1992-05-19 Canon Kabushiki Kaisha Exposure method and apparatus
JPH0782981B2 (ja) * 1986-02-07 1995-09-06 株式会社ニコン 投影露光方法及び装置
US5148214A (en) * 1986-05-09 1992-09-15 Canon Kabushiki Kaisha Alignment and exposure apparatus
JPS62262426A (ja) * 1986-05-09 1987-11-14 Canon Inc 露光装置
US4814829A (en) * 1986-06-12 1989-03-21 Canon Kabushiki Kaisha Projection exposure apparatus
JPH0821531B2 (ja) * 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
US4874954A (en) * 1987-02-02 1989-10-17 Canon Kabushiki Kaisha Projection exposure apparatus
JPS63220521A (ja) * 1987-03-10 1988-09-13 Canon Inc 焦点合せ装置
US4875076A (en) * 1987-06-15 1989-10-17 Canon Kabushiki Kaisha Exposure apparatus
JP2694868B2 (ja) * 1987-08-31 1997-12-24 株式会社ニコン 位置検出方法及び装置
US5117254A (en) * 1988-05-13 1992-05-26 Canon Kabushiki Kaisha Projection exposure apparatus
JP2893778B2 (ja) * 1990-01-17 1999-05-24 キヤノン株式会社 露光装置
JPH03225815A (ja) * 1990-01-31 1991-10-04 Canon Inc 露光装置
US5117255A (en) * 1990-09-19 1992-05-26 Nikon Corporation Projection exposure apparatus
US5101226A (en) * 1990-10-22 1992-03-31 General Signal Corporation Distance and tilt sensing apparatus

Also Published As

Publication number Publication date
EP0342061A3 (en) 1990-06-13
EP0342061B1 (de) 1995-11-02
US5489966A (en) 1996-02-06
DE68924667T2 (de) 1996-03-28
EP0342061A2 (de) 1989-11-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition