DE3888876D1 - Belichtungsvorrichtung. - Google Patents

Belichtungsvorrichtung.

Info

Publication number
DE3888876D1
DE3888876D1 DE88305405T DE3888876T DE3888876D1 DE 3888876 D1 DE3888876 D1 DE 3888876D1 DE 88305405 T DE88305405 T DE 88305405T DE 3888876 T DE3888876 T DE 3888876T DE 3888876 D1 DE3888876 D1 DE 3888876D1
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE88305405T
Other languages
English (en)
Other versions
DE3888876T2 (de
Inventor
Makoto Torigoe
Akiyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62245244A external-priority patent/JPH0654750B2/ja
Priority claimed from JP62271388A external-priority patent/JPH0654751B2/ja
Priority claimed from JP62329722A external-priority patent/JPH0650717B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3888876D1 publication Critical patent/DE3888876D1/de
Application granted granted Critical
Publication of DE3888876T2 publication Critical patent/DE3888876T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE3888876T 1987-06-15 1988-06-14 Belichtungsvorrichtung. Expired - Lifetime DE3888876T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP14700587 1987-06-15
JP62245244A JPH0654750B2 (ja) 1987-09-29 1987-09-29 投影光学系の特性検出方法及びそれを用いた露光方法
JP62271388A JPH0654751B2 (ja) 1987-10-27 1987-10-27 焦点検出方法
JP62329722A JPH0650717B2 (ja) 1987-06-15 1987-12-28 露光装置

Publications (2)

Publication Number Publication Date
DE3888876D1 true DE3888876D1 (de) 1994-05-11
DE3888876T2 DE3888876T2 (de) 1994-10-27

Family

ID=27472756

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3888876T Expired - Lifetime DE3888876T2 (de) 1987-06-15 1988-06-14 Belichtungsvorrichtung.

Country Status (3)

Country Link
US (1) US4875076A (de)
EP (1) EP0295860B1 (de)
DE (1) DE3888876T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01284793A (ja) * 1988-05-11 1989-11-16 Canon Inc 基板支持装置
JPH0652705B2 (ja) * 1988-05-12 1994-07-06 キヤノン株式会社 露光装置
EP0342061B1 (de) * 1988-05-13 1995-11-02 Canon Kabushiki Kaisha Projektionsbelichtungsvorrichtung
JP2606285B2 (ja) * 1988-06-07 1997-04-30 株式会社ニコン 露光装置および位置合わせ方法
US5162867A (en) * 1990-01-26 1992-11-10 Canon Kabushiki Kaisha Surface condition inspection method and apparatus using image transfer
JPH03241727A (ja) * 1990-02-20 1991-10-28 Canon Inc ダミーウエハ
JP2860578B2 (ja) * 1990-03-02 1999-02-24 キヤノン株式会社 露光装置
DE69128655T2 (de) * 1990-03-02 1998-05-07 Canon K.K., Tokio/Tokyo Belichtungsgerät
US5361122A (en) * 1990-09-06 1994-11-01 Canon Kabushiki Kaisha Autofocusing device and projection exposure apparatus with the same
US5331371A (en) * 1990-09-26 1994-07-19 Canon Kabushiki Kaisha Alignment and exposure method
JP3109852B2 (ja) * 1991-04-16 2000-11-20 キヤノン株式会社 投影露光装置
JP2924344B2 (ja) * 1991-08-09 1999-07-26 キヤノン株式会社 投影露光装置
JP3303436B2 (ja) * 1993-05-14 2002-07-22 キヤノン株式会社 投影露光装置及び半導体素子の製造方法
JPH07220988A (ja) * 1994-01-27 1995-08-18 Canon Inc 投影露光方法及び装置及びこれを用いたデバイス製造方法
WO1995034025A1 (en) * 1994-06-02 1995-12-14 Philips Electronics N.V. Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
US5614990A (en) * 1994-08-31 1997-03-25 International Business Machines Corporation Illumination tailoring system using photochromic filter
JPH09266167A (ja) * 1996-03-28 1997-10-07 Nikon Corp 環境制御チヤンバ
US5729512A (en) * 1996-07-03 1998-03-17 Zen Research N.V. Magnification and tracking error correction system for multiple track optical disk reader
US5959953A (en) * 1996-07-03 1999-09-28 Zen Research Nv Methods and apparatus for performing cross-talk correction in a multi-track optical disk reader based on magnification error
US6430125B1 (en) 1996-07-03 2002-08-06 Zen Research (Ireland), Ltd. Methods and apparatus for detecting and correcting magnification error in a multi-beam optical disk drive
JPH10199782A (ja) * 1997-01-14 1998-07-31 Canon Inc 投影露光装置
US6639650B2 (en) * 1999-12-21 2003-10-28 Shin-Etsu Chemical Co., Ltd. Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
JP3862497B2 (ja) * 2000-11-10 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
US20140240705A1 (en) * 2013-02-27 2014-08-28 Kabushiki Kaisha Toshiba Semiconductor device, reticle method for checking position misalignment and method for manufacturing position misalignment checking mark
CN108594607A (zh) * 2018-04-26 2018-09-28 京东方科技集团股份有限公司 一种光刻胶以及曝光方法
CN113985703B (zh) * 2021-09-28 2023-11-03 深圳市麓邦技术有限公司 光学系统

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414749A (en) * 1979-07-02 1983-11-15 Optimetrix Corporation Alignment and exposure system with an indicium of an axis of motion of the system
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
JPS59100805A (ja) * 1982-12-01 1984-06-11 Canon Inc 物体観察装置
JPH114529A (ja) * 1997-04-15 1999-01-06 Toray Monofilament Co Ltd ケーブル架設用チェーンコイル

Also Published As

Publication number Publication date
EP0295860A2 (de) 1988-12-21
EP0295860B1 (de) 1994-04-06
DE3888876T2 (de) 1994-10-27
EP0295860A3 (en) 1989-08-16
US4875076A (en) 1989-10-17

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Legal Events

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