DE69023186D1 - Belichtungsvorrichtung. - Google Patents

Belichtungsvorrichtung.

Info

Publication number
DE69023186D1
DE69023186D1 DE69023186T DE69023186T DE69023186D1 DE 69023186 D1 DE69023186 D1 DE 69023186D1 DE 69023186 T DE69023186 T DE 69023186T DE 69023186 T DE69023186 T DE 69023186T DE 69023186 D1 DE69023186 D1 DE 69023186D1
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69023186T
Other languages
English (en)
Other versions
DE69023186T2 (de
Inventor
Hiroshi Kurosawa
Koji Uda
Kunitaka Ozawa
Shunichi Uzawa
Nobutoshi Mizusawa
Shiegeyuki Suda
Noriyuki Nose
Takao Kariya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1202775A external-priority patent/JP2829636B2/ja
Priority claimed from JP1223293A external-priority patent/JP2632416B2/ja
Priority claimed from JP1257077A external-priority patent/JP2868546B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69023186D1 publication Critical patent/DE69023186D1/de
Publication of DE69023186T2 publication Critical patent/DE69023186T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69023186T 1989-08-07 1990-08-06 Belichtungsvorrichtung. Expired - Fee Related DE69023186T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1202775A JP2829636B2 (ja) 1989-08-07 1989-08-07 露光装置
JP1223293A JP2632416B2 (ja) 1989-08-31 1989-08-31 露光装置
JP1257077A JP2868546B2 (ja) 1989-10-03 1989-10-03 露光装置

Publications (2)

Publication Number Publication Date
DE69023186D1 true DE69023186D1 (de) 1995-11-30
DE69023186T2 DE69023186T2 (de) 1996-03-28

Family

ID=27328145

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69023186T Expired - Fee Related DE69023186T2 (de) 1989-08-07 1990-08-06 Belichtungsvorrichtung.

Country Status (3)

Country Link
US (1) US5182615A (de)
EP (1) EP0412756B1 (de)
DE (1) DE69023186T2 (de)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0824225A3 (de) * 1989-09-26 1998-03-04 Canon Kabushiki Kaisha Ausrichtverfahren
JPH0734116B2 (ja) * 1991-05-29 1995-04-12 株式会社オーク製作所 自動露光装置におけるワークの位置決め方法
JP3244783B2 (ja) * 1992-07-17 2002-01-07 キヤノン株式会社 位置合わせ装置及び方法、並びにこれを用いた露光装置と半導体デバイス製造方法
US5337151A (en) * 1992-07-28 1994-08-09 Optical Radiation Corporation Double-sided circuit board exposure machine and method with optical registration and material variation compensation
JPH06137830A (ja) * 1992-10-23 1994-05-20 Canon Inc 干渉計測方法及び干渉計測装置
US5585923A (en) * 1992-11-14 1996-12-17 Canon Kabushiki Kaisha Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means
JP3002351B2 (ja) * 1993-02-25 2000-01-24 キヤノン株式会社 位置合わせ方法および装置
JPH0786121A (ja) * 1993-06-30 1995-03-31 Canon Inc ずれ測定方法及びそれを用いた位置検出装置
JPH0737786A (ja) * 1993-07-21 1995-02-07 Canon Inc ステージ位置決め制御方法
JP3308063B2 (ja) * 1993-09-21 2002-07-29 株式会社ニコン 投影露光方法及び装置
US5593800A (en) * 1994-01-06 1997-01-14 Canon Kabushiki Kaisha Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
JPH07321024A (ja) * 1994-05-25 1995-12-08 Canon Inc 位置決め方法およびその装置ならびにこれらを用いた露光装置
JP3402750B2 (ja) * 1994-05-25 2003-05-06 キヤノン株式会社 位置合わせ方法及びそれを用いた素子の製造方法
EP1091256A1 (de) * 1994-11-29 2001-04-11 Canon Kabushiki Kaisha Ausrichtungsverfahren und Halbleiterbelichtungsverfahren
JP3391940B2 (ja) * 1995-06-26 2003-03-31 キヤノン株式会社 照明装置及び露光装置
JP3320262B2 (ja) * 1995-07-07 2002-09-03 キヤノン株式会社 走査露光装置及び方法並びにそれを用いたデバイス製造方法
US5751404A (en) * 1995-07-24 1998-05-12 Canon Kabushiki Kaisha Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
JPH09129550A (ja) 1995-08-30 1997-05-16 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US5883701A (en) * 1995-09-21 1999-03-16 Canon Kabushiki Kaisha Scanning projection exposure method and apparatus
EP0766298A3 (de) * 1995-09-27 1998-09-16 Shin-Etsu Handotai Co., Ltd. Methode und Apparat zur Feststellung von Restbeschädigungen an Scheibenränden
JP3634487B2 (ja) * 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
US5627378A (en) * 1996-02-28 1997-05-06 Orc Electronic Products, A Divison Of Benson Eyecare Corporation Die set for automatic UV exposure system
TW341719B (en) * 1996-03-01 1998-10-01 Canon Kk Surface position detecting method and scanning exposure method using the same
US5784166A (en) * 1996-04-03 1998-07-21 Nikon Corporation Position resolution of an interferometrially controlled moving stage by regression analysis
US6559465B1 (en) 1996-08-02 2003-05-06 Canon Kabushiki Kaisha Surface position detecting method having a detection timing determination
JP3337921B2 (ja) 1996-08-23 2002-10-28 キヤノン株式会社 投影露光装置および位置合せ方法
JP3907252B2 (ja) * 1996-12-05 2007-04-18 キヤノン株式会社 露光装置およびデバイス製造方法ならびにステージ装置および原点出し方法
US6151100A (en) * 1996-12-12 2000-11-21 Canon Kabushiki Kaisha Positioning system
US6411387B1 (en) 1996-12-16 2002-06-25 Nikon Corporation Stage apparatus, projection optical apparatus and exposure method
JP3683370B2 (ja) * 1997-01-10 2005-08-17 富士通株式会社 電子ビーム露光装置
US6509953B1 (en) 1998-02-09 2003-01-21 Nikon Corporation Apparatus for exposing a pattern onto an object with controlled scanning
US6260282B1 (en) 1998-03-27 2001-07-17 Nikon Corporation Stage control with reduced synchronization error and settling time
JP2000021738A (ja) * 1998-06-26 2000-01-21 Nikon Corp 位置検出装置及び該装置を用いた位置検出方法
JP3301387B2 (ja) * 1998-07-09 2002-07-15 ウシオ電機株式会社 プロキシミティ露光におけるマスクとワークのギャップ制御方法およびプロキシミティ露光装置
JP2000228355A (ja) * 1998-12-04 2000-08-15 Canon Inc 半導体露光装置およびデバイス製造方法
JP4585649B2 (ja) * 2000-05-19 2010-11-24 キヤノン株式会社 露光装置およびデバイス製造方法
US6459473B1 (en) * 2000-07-27 2002-10-01 National Science Council Drive of a wafer stepper
JP2002222760A (ja) 2001-01-29 2002-08-09 Canon Inc 露光方法及び露光装置並びにデバイスの製造方法
US6621553B2 (en) 2001-03-30 2003-09-16 Perkinelmer, Inc. Apparatus and method for exposing substrates
US6771372B1 (en) * 2001-11-01 2004-08-03 Therma-Wave, Inc. Rotational stage with vertical axis adjustment
FR2831966A1 (fr) * 2001-11-06 2003-05-09 Louis Vervoort Appareil de photolithographie incorporant un dispositif de deplacement actionne par un element piezoelectrique et procede de photolithographie comprenant un deplacement de regions exposees
JP3907497B2 (ja) * 2002-03-01 2007-04-18 キヤノン株式会社 位置決め装置及びその制御方法、並びに露光装置、並びにその制御方法により制御される露光装置により半導体デバイスを製造する製造方法
US7071480B2 (en) * 2003-06-13 2006-07-04 Voith Paper Patent Gmbh Sensor with alignment self compensation
JP4447872B2 (ja) * 2003-09-17 2010-04-07 キヤノン株式会社 ステージ装置、該ステージ装置を用いた露光装置および該露光装置を用いたデバイス製造方法
JP2005129674A (ja) * 2003-10-23 2005-05-19 Canon Inc 走査露光装置およびデバイス製造方法
US7321418B2 (en) * 2004-10-14 2008-01-22 Canon Kabushiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
WO2008075404A1 (ja) * 2006-12-19 2008-06-26 Systemv Management Inc., 半導体製造システム
JP5556774B2 (ja) * 2011-09-16 2014-07-23 ウシオ電機株式会社 露光装置
EP2696590B1 (de) * 2012-08-06 2014-09-24 Axis AB Bildsensorpositionierungsvorrichtung und -verfahren
WO2014029601A1 (en) * 2012-08-23 2014-02-27 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and displacement measurement system
CN112230524B (zh) * 2020-10-26 2023-04-07 上海华力集成电路制造有限公司 一种晶圆曝光前预对准高度调节的系统及其使用方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
JPS59101830A (ja) * 1982-12-01 1984-06-12 Canon Inc 転写装置
US4676630A (en) * 1985-04-25 1987-06-30 Canon Kabushiki Kaisha Exposure apparatus
JPH0622192B2 (ja) * 1985-04-25 1994-03-23 キヤノン株式会社 表示パネル製造方法
US4748477A (en) * 1985-04-30 1988-05-31 Canon Kabushiki Kaisha Exposure apparatus
US4662754A (en) * 1985-12-20 1987-05-05 The Perkin-Elmer Corporation Method for facilitating the alignment of a photomask with individual fields on the surfaces of a number of wafers
US4704033A (en) * 1986-03-06 1987-11-03 Micronix Corporation Multiple wavelength linear zone plate alignment apparatus and method

Also Published As

Publication number Publication date
DE69023186T2 (de) 1996-03-28
EP0412756B1 (de) 1995-10-25
EP0412756A2 (de) 1991-02-13
EP0412756A3 (en) 1992-01-02
US5182615A (en) 1993-01-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee