DE69128655T2 - Belichtungsgerät - Google Patents

Belichtungsgerät

Info

Publication number
DE69128655T2
DE69128655T2 DE69128655T DE69128655T DE69128655T2 DE 69128655 T2 DE69128655 T2 DE 69128655T2 DE 69128655 T DE69128655 T DE 69128655T DE 69128655 T DE69128655 T DE 69128655T DE 69128655 T2 DE69128655 T2 DE 69128655T2
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69128655T
Other languages
English (en)
Other versions
DE69128655D1 (de
Inventor
Ryuichi Ebinuma
Nobutoshi Mizusawa
Takao Kariya
Shigeyuki Suda
Shunichi Uzawa
Takayuki Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2049583A external-priority patent/JP2860578B2/ja
Priority claimed from JP2118680A external-priority patent/JP2820310B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69128655D1 publication Critical patent/DE69128655D1/de
Publication of DE69128655T2 publication Critical patent/DE69128655T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69128655T 1990-03-02 1991-02-28 Belichtungsgerät Expired - Fee Related DE69128655T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2049583A JP2860578B2 (ja) 1990-03-02 1990-03-02 露光装置
JP2118680A JP2820310B2 (ja) 1990-05-10 1990-05-10 露光装置

Publications (2)

Publication Number Publication Date
DE69128655D1 DE69128655D1 (de) 1998-02-19
DE69128655T2 true DE69128655T2 (de) 1998-05-07

Family

ID=26390002

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128655T Expired - Fee Related DE69128655T2 (de) 1990-03-02 1991-02-28 Belichtungsgerät

Country Status (3)

Country Link
US (1) US5317615A (de)
EP (1) EP0444937B1 (de)
DE (1) DE69128655T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0139039B1 (ko) * 1993-06-30 1998-06-01 미타라이 하지메 노광장치와 이것을 이용한 디바이스 제조방법
JP3101473B2 (ja) * 1993-11-05 2000-10-23 キヤノン株式会社 露光方法及び該露光方法を用いるデバイス製造方法
EP0677787B1 (de) * 1994-03-15 1998-10-21 Canon Kabushiki Kaisha Maske und Maskenträger
JP3291408B2 (ja) * 1994-04-04 2002-06-10 キヤノン株式会社 露光装置および集積回路の製造方法
JPH07335524A (ja) * 1994-06-06 1995-12-22 Canon Inc 位置合わせ方法
JPH08115872A (ja) * 1994-10-13 1996-05-07 Nikon Corp 露光装置
EP1091256A1 (de) * 1994-11-29 2001-04-11 Canon Kabushiki Kaisha Ausrichtungsverfahren und Halbleiterbelichtungsverfahren
JP3261948B2 (ja) * 1995-03-28 2002-03-04 キヤノン株式会社 Ｘ線露光用マスク及びそれを用いた半導体素子の製造方法
JPH0926176A (ja) * 1995-07-07 1997-01-28 Canon Inc 処理システムとこれを用いたデバイス生産方法
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
JP3634487B2 (ja) * 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
TW341719B (en) * 1996-03-01 1998-10-01 Canon Kk Surface position detecting method and scanning exposure method using the same
US5930324A (en) * 1996-04-03 1999-07-27 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
JP3337921B2 (ja) 1996-08-23 2002-10-28 キヤノン株式会社 投影露光装置および位置合せ方法
US5917580A (en) * 1996-08-29 1999-06-29 Canon Kabushiki Kaisha Scan exposure method and apparatus
JP3286184B2 (ja) * 1996-09-25 2002-05-27 キヤノン株式会社 走査露光装置および方法
JP3377165B2 (ja) * 1997-05-19 2003-02-17 キヤノン株式会社 半導体露光装置
DE69933903T2 (de) 1998-04-14 2007-05-24 Asml Netherlands B.V. Lithograpischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
JP4418665B2 (ja) * 2003-11-28 2010-02-17 キヤノン株式会社 測定装置、並びに、それを利用した露光装置
US6980281B2 (en) * 2004-01-23 2005-12-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN107450271B (zh) * 2016-05-31 2019-10-25 上海微电子装备（集团）股份有限公司 光刻机刀口组、大视场光刻机和曝光方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5390873A (en) * 1977-01-21 1978-08-10 Canon Inc Printing device
JPS6045252A (ja) * 1983-08-23 1985-03-11 Canon Inc 投影露光装置の照明系
JPS6055624A (ja) * 1983-09-07 1985-03-30 Hitachi Ltd Ｘ線露光装置
JPH0715869B2 (ja) * 1983-09-30 1995-02-22 株式会社日立製作所 軟ｘ線露光装置
JPS62262428A (ja) * 1986-05-08 1987-11-14 Canon Inc リソグラフイ−用マスク
US4875076A (en) * 1987-06-15 1989-10-17 Canon Kabushiki Kaisha Exposure apparatus
EP0336537B1 (de) * 1988-02-16 1995-12-20 Canon Kabushiki Kaisha Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten
JP2744245B2 (ja) * 1988-03-25 1998-04-28 キヤノン株式会社 露光装置と露光方法
DE68922945T2 (de) * 1988-09-09 1995-11-16 Canon K.K., Tokio/Tokyo Belichtungsvorrichtung.
JP2770960B2 (ja) * 1988-10-06 1998-07-02 キヤノン株式会社 Ｓｏｒ−ｘ線露光装置
JP2805220B2 (ja) * 1989-09-21 1998-09-30 キヤノン株式会社 露光装置

Also Published As

Publication number Publication date
EP0444937A3 (en) 1991-12-11
EP0444937A2 (de) 1991-09-04
DE69128655D1 (de) 1998-02-19
US5317615A (en) 1994-05-31
EP0444937B1 (de) 1998-01-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee