DE68922945T2 - Belichtungsvorrichtung. - Google Patents

Belichtungsvorrichtung.

Info

Publication number
DE68922945T2
DE68922945T2 DE68922945T DE68922945T DE68922945T2 DE 68922945 T2 DE68922945 T2 DE 68922945T2 DE 68922945 T DE68922945 T DE 68922945T DE 68922945 T DE68922945 T DE 68922945T DE 68922945 T2 DE68922945 T2 DE 68922945T2
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68922945T
Other languages
English (en)
Other versions
DE68922945D1 (de
Inventor
Nobutoshi Mizusawa
Ryuichi Ebinuma
Takao Kariya
Shunichi Uzawa
Isamu Shimoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63224713A external-priority patent/JP2743182B2/ja
Priority claimed from JP63224712A external-priority patent/JPH0273617A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68922945D1 publication Critical patent/DE68922945D1/de
Application granted granted Critical
Publication of DE68922945T2 publication Critical patent/DE68922945T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE68922945T 1988-09-09 1989-09-08 Belichtungsvorrichtung. Expired - Fee Related DE68922945T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63224713A JP2743182B2 (ja) 1988-09-09 1988-09-09 露光装置
JP63224712A JPH0273617A (ja) 1988-09-09 1988-09-09 露光装置

Publications (2)

Publication Number Publication Date
DE68922945D1 DE68922945D1 (de) 1995-07-13
DE68922945T2 true DE68922945T2 (de) 1995-11-16

Family

ID=26526216

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68922945T Expired - Fee Related DE68922945T2 (de) 1988-09-09 1989-09-08 Belichtungsvorrichtung.

Country Status (3)

Country Link
US (1) US5390227A (de)
EP (1) EP0358521B1 (de)
DE (1) DE68922945T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2805220B2 (ja) * 1989-09-21 1998-09-30 キヤノン株式会社 露光装置
EP0444937B1 (de) * 1990-03-02 1998-01-14 Canon Kabushiki Kaisha Belichtungsgerät
JP2860578B2 (ja) * 1990-03-02 1999-02-24 キヤノン株式会社 露光装置
JP3291408B2 (ja) * 1994-04-04 2002-06-10 キヤノン株式会社 露光装置および集積回路の製造方法
KR100197885B1 (ko) * 1996-12-23 1999-06-15 윤종용 노광설비의 기준마크 보호장치
US6445439B1 (en) * 1999-12-27 2002-09-03 Svg Lithography Systems, Inc. EUV reticle thermal management
EP1482363A1 (de) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat
EP1491960B1 (de) * 2003-05-30 2012-04-25 ASML Netherlands B.V. Lithographischer Apparat
CN107450271B (zh) * 2016-05-31 2019-10-25 上海微电子装备（集团）股份有限公司 光刻机刀口组、大视场光刻机和曝光方法
US11221564B2 (en) * 2018-10-31 2022-01-11 Taiwan Semiconductor Manufacturing Company Ltd. Method for improving exposure performance and apparatus thereof
TWI683087B (zh) * 2018-11-09 2020-01-21 志聖工業股份有限公司 曝光光角量測設備

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2667588A (en) * 1951-03-10 1954-01-26 Hartford Nat Bank & Trust Co Beam-limiting diaphragm for x-ray tubes
US2905827A (en) * 1957-11-26 1959-09-22 Picker X Ray Corp X-ray apparatus
JPS57169242A (en) * 1981-04-13 1982-10-18 Hitachi Ltd X-ray transferring device
DE3136806A1 (de) * 1981-09-16 1983-03-31 Siemens AG, 1000 Berlin und 8000 München Roentgenuntersuchungsgeraet
JPS59101833A (ja) * 1982-12-03 1984-06-12 Hitachi Ltd Ｘ線露光装置
JPS6030132A (ja) * 1983-07-29 1985-02-15 Hitachi Ltd フオトリソグラフイ−装置
JPH0715869B2 (ja) * 1983-09-30 1995-02-22 株式会社日立製作所 軟ｘ線露光装置
JPS6151824A (ja) * 1984-08-21 1986-03-14 Hitachi Ltd Ｘ線露光方法及びその装置
JPS6197918A (ja) * 1984-10-19 1986-05-16 Hitachi Ltd Ｘ線露光装置
JPS62160724A (ja) * 1986-01-10 1987-07-16 Fujitsu Ltd Ｘ線露光方法
EP0253283A3 (de) * 1986-07-15 1988-07-20 Siemens Aktiengesellschaft Anordnung zur Belichtung von Halbleiterscheiben mittels Synchrotronstrahlung in einem Lithographiegerät
US4803712A (en) * 1987-01-20 1989-02-07 Hitachi, Ltd. X-ray exposure system

Also Published As

Publication number Publication date
US5390227A (en) 1995-02-14
EP0358521A2 (de) 1990-03-14
DE68922945D1 (de) 1995-07-13
EP0358521B1 (de) 1995-06-07
EP0358521A3 (en) 1990-11-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee