DE3850159D1 - Belichtungsvorrichtung. - Google Patents
Belichtungsvorrichtung.Info
- Publication number
- DE3850159D1 DE3850159D1 DE3850159T DE3850159T DE3850159D1 DE 3850159 D1 DE3850159 D1 DE 3850159D1 DE 3850159 T DE3850159 T DE 3850159T DE 3850159 T DE3850159 T DE 3850159T DE 3850159 D1 DE3850159 D1 DE 3850159D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure device
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62074617A JP2685179B2 (ja) | 1987-03-27 | 1987-03-27 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3850159D1 true DE3850159D1 (de) | 1994-07-21 |
DE3850159T2 DE3850159T2 (de) | 1995-01-12 |
Family
ID=13552315
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19883850159 Expired - Fee Related DE3850159T2 (de) | 1987-03-27 | 1988-03-25 | Belichtungsvorrichtung. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0284414B1 (de) |
JP (1) | JP2685179B2 (de) |
DE (1) | DE3850159T2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3915868C2 (de) * | 1989-05-16 | 1996-09-12 | Zeiss Carl Fa | UV-taugliches Trockenobjektiv für Mikroskope |
DE4219205A1 (de) * | 1992-06-12 | 1993-12-16 | Leica Mikroskopie & Syst | Verfahren zur Herstellung von UV-Mikroskop - Trockenobjektiven und nach diesem Verfahren hergestellte Mikroskopobjektive |
DE19633128A1 (de) * | 1996-08-16 | 1998-02-19 | Zeiss Carl Fa | Achromatisches Linsensystem für Ultraviolettstrahlen mit Germaniumdioxid-Glas |
AU9763998A (en) * | 1997-11-11 | 1999-05-31 | Nikon Corporation | Photomask, aberration correcting plate, exposure device and method of producing microdevice |
CN109116532B (zh) * | 2018-10-17 | 2024-06-18 | 舜宇光学(中山)有限公司 | 变焦镜头 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60141628A (ja) * | 1983-12-27 | 1985-07-26 | Dainichi Nippon Cables Ltd | フツ素ド−プ石英ガラスの製法 |
US4653903A (en) * | 1984-01-24 | 1987-03-31 | Canon Kabushiki Kaisha | Exposure apparatus |
JPS61202436A (ja) * | 1985-03-06 | 1986-09-08 | Canon Inc | 露光装置 |
JPH057601A (ja) * | 1991-07-02 | 1993-01-19 | Unitika Ltd | 歯科用咬合印象採得方法 |
JP3289316B2 (ja) * | 1992-06-19 | 2002-06-04 | ソニー株式会社 | 浮上型磁気ヘッド装置 |
-
1987
- 1987-03-27 JP JP62074617A patent/JP2685179B2/ja not_active Expired - Fee Related
-
1988
- 1988-03-25 EP EP19880302671 patent/EP0284414B1/de not_active Expired - Lifetime
- 1988-03-25 DE DE19883850159 patent/DE3850159T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS63240501A (ja) | 1988-10-06 |
DE3850159T2 (de) | 1995-01-12 |
EP0284414B1 (de) | 1994-06-15 |
EP0284414A2 (de) | 1988-09-28 |
EP0284414A3 (en) | 1990-10-10 |
JP2685179B2 (ja) | 1997-12-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |