DE69501865T2 - Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte - Google Patents

Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte

Info

Publication number
DE69501865T2
DE69501865T2 DE69501865T DE69501865T DE69501865T2 DE 69501865 T2 DE69501865 T2 DE 69501865T2 DE 69501865 T DE69501865 T DE 69501865T DE 69501865 T DE69501865 T DE 69501865T DE 69501865 T2 DE69501865 T2 DE 69501865T2
Authority
DE
Germany
Prior art keywords
printing plate
lithographic printing
photopolymerizable composition
photosensitive lithographic
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69501865T
Other languages
English (en)
Other versions
DE69501865D1 (de
Inventor
Hideki Nagasaka
Toshiyuki Urano
Akihisa Murata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa NV
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP01517295A external-priority patent/JP3424368B2/ja
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE69501865D1 publication Critical patent/DE69501865D1/de
Publication of DE69501865T2 publication Critical patent/DE69501865T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
DE69501865T 1994-09-05 1995-09-01 Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte Expired - Lifetime DE69501865T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP21126994 1994-09-05
JP21127094 1994-09-05
JP22708794 1994-09-21
JP01517295A JP3424368B2 (ja) 1995-02-01 1995-02-01 光重合性組成物

Publications (2)

Publication Number Publication Date
DE69501865D1 DE69501865D1 (de) 1998-04-30
DE69501865T2 true DE69501865T2 (de) 1998-10-15

Family

ID=27456337

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501865T Expired - Lifetime DE69501865T2 (de) 1994-09-05 1995-09-01 Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte

Country Status (3)

Country Link
US (1) US5738974A (de)
EP (1) EP0704764B1 (de)
DE (1) DE69501865T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3441246B2 (ja) * 1995-06-07 2003-08-25 富士写真フイルム株式会社 光重合性組成物
JP3470253B2 (ja) * 1996-07-24 2003-11-25 コニカミノルタホールディングス株式会社 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法
US5939148A (en) * 1996-09-13 1999-08-17 Kansai Paint Co., Ltd. Visible laser-curable composition
DE59802875D1 (de) * 1997-06-30 2002-03-14 Siemens Ag Initiatoren für die kationische Polymerisation
DE19729067A1 (de) 1997-07-08 1999-01-14 Agfa Gevaert Ag Infrarot-bebilderbares Aufzeichnungsmaterial und daraus hergestellte Offsetdruckplatte
TW468091B (en) * 1997-09-05 2001-12-11 Kansai Paint Co Ltd Visible light-sensitive compositions and pattern formation process
DE19739299A1 (de) * 1997-09-08 1999-03-11 Agfa Gevaert Ag Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck
US6114092A (en) * 1997-09-29 2000-09-05 Kansai Paint Co., Ltd. Photosensitive resin compositions for photoresist
US6093518A (en) * 1998-02-09 2000-07-25 Kansai Paint Co., Ltd. Visible laser-curable composition
US6153356A (en) * 1998-08-17 2000-11-28 Mitsubishi Chemical Corporation Photopolymerizable composition, photopolymerizable lithographic printing plate and process for forming an image
US6232038B1 (en) 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
AU1455000A (en) * 1998-10-28 2000-05-15 Merck & Co., Inc. Stabilization of the reagent dimethyl titanocene
EP1739484B1 (de) * 2000-04-19 2011-08-24 AGFA Graphics NV Lichtempfindliche lithografische Druckplatte und Verfahren zur Herstellung einer Druckplatte
FR2825268B1 (fr) * 2001-05-31 2004-09-17 Oreal Composition cosmetique comprenant des particules de carbonate de calcium et des agents de conditionnement
JP2003021901A (ja) * 2001-07-05 2003-01-24 Fuji Photo Film Co Ltd 感光性平版印刷版の光重合方法
ATE373657T1 (de) * 2001-10-19 2007-10-15 Merck & Co Inc Androgen-rezeptor-modulatoren und verwendungsverfahren dafür
JP3969109B2 (ja) 2002-02-08 2007-09-05 コニカミノルタホールディングス株式会社 感光性平版印刷版及びその記録方法
US6855482B2 (en) * 2002-04-09 2005-02-15 Day International, Inc. Liquid transfer articles and method for producing the same using digital imaging photopolymerization
JP2006189604A (ja) * 2005-01-06 2006-07-20 Konica Minolta Medical & Graphic Inc 光重合性組成物、感光性平版印刷版材料および平版印刷版の製造方法
US7348131B2 (en) * 2005-07-05 2008-03-25 Gary Ganghui Teng Laser sensitive lithographic printing plate having a darker aluminum substrate
WO2008076916A2 (en) * 2006-12-15 2008-06-26 Molecular Devices Corporation Thallium-sensitive agents and methods of using the same

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR7700555A (pt) 1976-02-02 1977-10-04 Eastman Kodak Co Composicao fotossensivel e respectivo elemento fotografic
US4162162A (en) 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
JPS54151024A (en) 1978-05-18 1979-11-27 Fuji Photo Film Co Ltd Photopolymerizable composition
US4268667A (en) 1980-04-21 1981-05-19 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions
JPS5815503A (ja) 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS5829803A (ja) 1981-08-17 1983-02-22 Mitsubishi Chem Ind Ltd 光重合性組成物
JPH0230322B2 (ja) 1981-09-04 1990-07-05 Mitsubishi Chem Ind Hikarijugoseisoseibutsu
JPS5956403A (ja) 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS59140203A (ja) 1983-02-01 1984-08-11 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
US4590287A (en) 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
JPS59189340A (ja) 1983-04-13 1984-10-26 Nippon Oil & Fats Co Ltd 高感度光重合開始剤組成物
JPS6088005A (ja) 1983-10-21 1985-05-17 Agency Of Ind Science & Technol 光硬化樹脂組成物
US4713401A (en) 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
US4736032A (en) 1985-12-30 1988-04-05 Eastman Kodak Company Benzopyrano[6,7,8-i,j]quinolizine-11-one lasing dyes and intermediates for their preparation
JPS6322110A (ja) * 1986-07-14 1988-01-29 ヤンマー農機株式会社 収穫機
EP0277915B1 (de) 1987-02-02 1991-09-04 Ciba-Geigy Ag Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
CA2032630C (en) * 1989-12-28 1996-04-23 Ichiro Yoshihara Visible radiation sensitive composition
JP2930403B2 (ja) * 1989-12-28 1999-08-03 関西ペイント株式会社 感光性組成物
JPH089644B2 (ja) * 1990-02-19 1996-01-31 三菱レイヨン株式会社 光重合性組成物
DE4007428A1 (de) 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH0426154A (ja) 1990-05-21 1992-01-29 Murata Mfg Co Ltd 半導体装置における抵抗形成方法
JPH04184344A (ja) * 1990-11-19 1992-07-01 Toyobo Co Ltd 光重合性組成物
US5322762A (en) * 1992-04-13 1994-06-21 Mitsubishi Rayon Co., Ltd. Photopolymerizable composition
JPH05289335A (ja) * 1992-04-13 1993-11-05 Mitsubishi Rayon Co Ltd 光重合性組成物
JP2750336B2 (ja) * 1992-08-05 1998-05-13 株式会社日本感光色素研究所 光重合開始系増感色素
JP3187569B2 (ja) * 1992-11-10 2001-07-11 東京応化工業株式会社 感光性樹脂組成物及びこれを用いたｐｓ版
JP3301154B2 (ja) * 1993-04-12 2002-07-15 三菱化学株式会社 光重合性組成物及び感光材料

Also Published As

Publication number Publication date
EP0704764B1 (de) 1998-03-25
EP0704764A1 (de) 1996-04-03
DE69501865D1 (de) 1998-04-30
US5738974A (en) 1998-04-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AGFA GRAPHICS N.V., MORTSEL, BE