DE3851921T2 - Photopolymerisierbare Zusammensetzung. - Google Patents

Photopolymerisierbare Zusammensetzung.

Info

Publication number
DE3851921T2
DE3851921T2 DE3851921T DE3851921T DE3851921T2 DE 3851921 T2 DE3851921 T2 DE 3851921T2 DE 3851921 T DE3851921 T DE 3851921T DE 3851921 T DE3851921 T DE 3851921T DE 3851921 T2 DE3851921 T2 DE 3851921T2
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3851921T
Other languages
English (en)
Other versions
DE3851921D1 (de
Inventor
Hideki Nagasaka
Katsuko Ohta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Application granted granted Critical
Publication of DE3851921D1 publication Critical patent/DE3851921D1/de
Publication of DE3851921T2 publication Critical patent/DE3851921T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
DE3851921T 1987-07-21 1988-07-18 Photopolymerisierbare Zusammensetzung. Expired - Fee Related DE3851921T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP18131787 1987-07-21
JP4901788 1988-03-02
JP63145037A JP2538992B2 (ja) 1987-07-21 1988-06-13 光重合性組成物

Publications (2)

Publication Number Publication Date
DE3851921D1 DE3851921D1 (de) 1994-12-01
DE3851921T2 true DE3851921T2 (de) 1995-05-24

Family

ID=27293490

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3851921T Expired - Fee Related DE3851921T2 (de) 1987-07-21 1988-07-18 Photopolymerisierbare Zusammensetzung.

Country Status (5)

Country Link
US (1) US4966830A (de)
EP (1) EP0300410B1 (de)
JP (1) JP2538992B2 (de)
AU (1) AU603235B2 (de)
DE (1) DE3851921T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JP3070184B2 (ja) * 1991-10-18 2000-07-24 三菱化学株式会社 光重合性組成物及び感光材料
US5236808A (en) * 1992-04-13 1993-08-17 E. I. Du Pont De Nemours And Company Visible photosensitizers for photopolymerizable compositions
US5484927A (en) * 1992-04-13 1996-01-16 E. I. Du Pont De Nemours And Company Visible dye photosensitizers derived from tropinone
EP0780731B1 (de) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
US20020064728A1 (en) 1996-09-05 2002-05-30 Weed Gregory C. Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes
DE69831774T2 (de) * 1997-07-03 2006-07-13 E.I. Dupont De Nemours And Co., Wilmington Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren
US7830472B2 (en) 2004-04-26 2010-11-09 Mitsubishi Chemical Corporation Blue color composition for color filter, color filter, and color image display device
JP2006071916A (ja) * 2004-09-01 2006-03-16 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
US8632937B2 (en) * 2006-02-08 2014-01-21 Eastman Kodak Company UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
CN101024920A (zh) * 2006-02-21 2007-08-29 罗门哈斯公司 处理过的制品及其制造和使用方法
WO2007123183A1 (ja) 2006-04-19 2007-11-01 Mitsubishi Chemical Corporation カラー画像表示装置
CN101501579A (zh) 2006-09-05 2009-08-05 三菱化学株式会社 体积全息光记录介质、体积全息记录层形成用组合物、体积全息记录材料及体积全息光记录方法
WO2008050835A1 (en) 2006-10-25 2008-05-02 Mitsubishi Chemical Corporation Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material
KR101559603B1 (ko) 2008-02-07 2015-10-12 미쓰비시 가가꾸 가부시키가이샤 반도체 발광 장치, 백라이트, 컬러 화상 표시 장치, 및 그들에 사용하는 형광체
CN104447681B (zh) * 2013-09-17 2018-05-01 北京大学 用于治疗癌症的化合物及其制备方法和用途
EP3147335A1 (de) 2015-09-23 2017-03-29 BYK-Chemie GmbH Farbmittelzusammensetzungen mit netz- und/oder dispergiermittel mit geringer aminzahl

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4162162A (en) * 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
CA1143081A (en) * 1979-01-17 1983-03-15 Kazumasa Kamada Coating composition and process for producing synthetic resin moldings by using the same
DE3164954D1 (en) * 1980-03-04 1984-08-30 Mitsubishi Rayon Co Coating composition and process for preparing synthetic resin shaped articles by using same
JPS56141309A (en) * 1980-04-03 1981-11-05 Mitsubishi Rayon Co Ltd Coating composition and preparation of synthetic resin molded article using the same
JPS5721401A (en) * 1980-07-14 1982-02-04 Mitsubishi Chem Ind Ltd Photopolymerizable composition
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPH0230321B2 (ja) * 1981-07-28 1990-07-05 Mitsubishi Chem Ind Hikarijugoseisoseibutsu
US4454218A (en) * 1982-09-13 1984-06-12 E. I. Du Pont De Nemours And Company N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
DE3464921D1 (en) * 1983-05-02 1987-08-27 Du Pont Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
GB8525027D0 (en) * 1985-10-10 1985-11-13 Autotype Int Ltd Water soluble photoinitiators
CA1308852C (en) * 1987-01-22 1992-10-13 Masami Kawabata Photopolymerizable composition

Also Published As

Publication number Publication date
EP0300410B1 (de) 1994-10-26
AU603235B2 (en) 1990-11-08
EP0300410A2 (de) 1989-01-25
US4966830A (en) 1990-10-30
EP0300410A3 (en) 1990-12-05
JP2538992B2 (ja) 1996-10-02
DE3851921D1 (de) 1994-12-01
JPH0269A (ja) 1990-01-05
AU1913988A (en) 1989-01-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee