IL75373A - Photosensitive coating compositions,thermally stable coatings prepared from them and the use of such coatings in forming thermally stable polymer images - Google Patents

Photosensitive coating compositions,thermally stable coatings prepared from them and the use of such coatings in forming thermally stable polymer images

Info

Publication number
IL75373A
IL75373A IL75373A IL7537385A IL75373A IL 75373 A IL75373 A IL 75373A IL 75373 A IL75373 A IL 75373A IL 7537385 A IL7537385 A IL 7537385A IL 75373 A IL75373 A IL 75373A
Authority
IL
Israel
Prior art keywords
thermally stable
coatings
images
coating compositions
photosensitive coating
Prior art date
Application number
IL75373A
Other languages
English (en)
Other versions
IL75373A0 (en
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24469821&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IL75373(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of IL75373A0 publication Critical patent/IL75373A0/xx
Publication of IL75373A publication Critical patent/IL75373A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cosmetics (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
  • Paper (AREA)
  • Materials For Medical Uses (AREA)
  • Dental Preparations (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
IL75373A 1984-06-01 1985-05-31 Photosensitive coating compositions,thermally stable coatings prepared from them and the use of such coatings in forming thermally stable polymer images IL75373A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61651884A 1984-06-01 1984-06-01

Publications (2)

Publication Number Publication Date
IL75373A0 IL75373A0 (en) 1985-09-29
IL75373A true IL75373A (en) 1990-06-10

Family

ID=24469821

Family Applications (1)

Application Number Title Priority Date Filing Date
IL75373A IL75373A (en) 1984-06-01 1985-05-31 Photosensitive coating compositions,thermally stable coatings prepared from them and the use of such coatings in forming thermally stable polymer images

Country Status (18)

Country Link
EP (1) EP0164248B1 (ja)
JP (1) JPS60263143A (ja)
KR (1) KR920005773B1 (ja)
AT (1) ATE68272T1 (ja)
AU (1) AU595160B2 (ja)
BR (1) BR8502638A (ja)
CA (1) CA1283799C (ja)
DE (1) DE3584316D1 (ja)
DK (1) DK241885A (ja)
FI (1) FI84942C (ja)
HK (1) HK17492A (ja)
IE (1) IE57143B1 (ja)
IL (1) IL75373A (ja)
MX (1) MX170270B (ja)
MY (1) MY103545A (ja)
NO (1) NO173574C (ja)
SG (1) SG108091G (ja)
ZA (1) ZA854172B (ja)

Families Citing this family (136)

* Cited by examiner, † Cited by third party
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CN101930173B (zh) 2009-06-22 2014-05-14 罗门哈斯电子材料有限公司 光致酸产生剂和其光致抗蚀剂
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FI84942B (fi) 1991-10-31
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ATE68272T1 (de) 1991-10-15
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MX170270B (es) 1993-08-11
AU595160B2 (en) 1990-03-29
IL75373A0 (en) 1985-09-29
DK241885D0 (da) 1985-05-30
EP0164248A2 (en) 1985-12-11
DE3584316D1 (de) 1991-11-14
CA1283799C (en) 1991-05-07
ZA854172B (en) 1986-07-30
FI852190L (fi) 1985-12-02
IE57143B1 (en) 1992-05-06
FI84942C (fi) 1992-02-10
FI852190A0 (fi) 1985-05-31
NO173574B (no) 1993-09-20
EP0164248A3 (en) 1987-06-03
AU4325185A (en) 1985-12-05
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SG108091G (en) 1992-04-16
DK241885A (da) 1985-12-02
EP0164248B1 (en) 1991-10-09
NO852154L (no) 1985-12-02
JPS60263143A (ja) 1985-12-26
NO173574C (no) 1993-12-29
MY103545A (en) 1993-07-31
KR860000330A (ko) 1986-01-28

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