DE69032077T2 - Fotoresist für nahes U.V. - Google Patents

Fotoresist für nahes U.V.

Info

Publication number
DE69032077T2
DE69032077T2 DE69032077T DE69032077T DE69032077T2 DE 69032077 T2 DE69032077 T2 DE 69032077T2 DE 69032077 T DE69032077 T DE 69032077T DE 69032077 T DE69032077 T DE 69032077T DE 69032077 T2 DE69032077 T2 DE 69032077T2
Authority
DE
Germany
Prior art keywords
photoresist
close
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69032077T
Other languages
English (en)
Other versions
DE69032077D1 (de
Inventor
Angelo A Lamola
Gary Calabrese
Roger Sinta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Application granted granted Critical
Publication of DE69032077D1 publication Critical patent/DE69032077D1/de
Publication of DE69032077T2 publication Critical patent/DE69032077T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
DE69032077T 1989-10-17 1990-08-03 Fotoresist für nahes U.V. Expired - Fee Related DE69032077T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42262189A 1989-10-17 1989-10-17

Publications (2)

Publication Number Publication Date
DE69032077D1 DE69032077D1 (de) 1998-04-09
DE69032077T2 true DE69032077T2 (de) 1998-12-03

Family

ID=23675677

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69032077T Expired - Fee Related DE69032077T2 (de) 1989-10-17 1990-08-03 Fotoresist für nahes U.V.

Country Status (4)

Country Link
EP (1) EP0423446B1 (de)
JP (1) JP2848687B2 (de)
KR (1) KR910008487A (de)
DE (1) DE69032077T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5312715A (en) * 1991-03-04 1994-05-17 Shipley Company Inc. Light-sensitive composition and process
US5206116A (en) * 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
US5401607A (en) * 1991-04-17 1995-03-28 Polaroid Corporation Processes and compositions for photogeneration of acid
US5286599A (en) * 1991-09-26 1994-02-15 International Business Machines Corporation Base developable negative photoresist composition and use thereof
US6165697A (en) 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
US5286612A (en) * 1992-10-23 1994-02-15 Polaroid Corporation Process for generation of free superacid and for imaging, and imaging medium for use therein
US5334489A (en) * 1992-10-23 1994-08-02 Polaroid Corporation Process for generation of squaric acid and for imaging, and imaging medium for use therein
EP0801329B1 (de) * 1994-12-28 2002-03-27 Clariant Finance (BVI) Limited Strahlungsempfindliche zusammensetzung und daraus hergestelltes aufzeichnungsmedium
US5593812A (en) * 1995-02-17 1997-01-14 International Business Machines Corporation Photoresist having increased sensitivity and use thereof
JPH1165118A (ja) * 1997-08-15 1999-03-05 Nippon Telegr & Teleph Corp <Ntt> レジスト材料
JP3992550B2 (ja) * 2002-07-04 2007-10-17 國宏 市村 感活性エネルギー線樹脂組成物、感活性エネルギー線樹脂フィルム及び該フィルムを用いるパターン形成方法
JP4093938B2 (ja) * 2003-08-26 2008-06-04 松下電器産業株式会社 光情報記録媒体の原盤製造方法、パターン形成方法およびレジスト
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
WO2012067139A1 (ja) * 2010-11-16 2012-05-24 シャープ株式会社 化合物、電界効果トランジスタ及びその製造方法、太陽電池及びその製造方法、有機発光素子及びその製造方法、並びに組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
CN103709122B (zh) * 2013-11-29 2016-05-25 四川大学 用于治疗的抗肿瘤和抗真菌化合物
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN107532337A (zh) * 2015-04-22 2018-01-02 日产化学工业株式会社 感光性纤维及纤维图案的形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE395914A (de) * 1932-04-26
US3169868A (en) * 1962-04-16 1965-02-16 Eastman Kodak Co Light sensitive photoresist composition
US3595664A (en) * 1968-03-20 1971-07-27 Hughes Aircraft Co Photosensitive condensation polymers and the process of making same
FR1579538A (de) * 1968-03-26 1969-08-29
US4442197A (en) * 1982-01-11 1984-04-10 General Electric Company Photocurable compositions
JPS59147001A (ja) * 1983-02-07 1984-08-23 ゼネラル・エレクトリツク・カンパニイ 光硬化性組成物
EP0164248B1 (de) * 1984-06-01 1991-10-09 Rohm And Haas Company Lichtempfindliche Beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile Beschichtungen und Verfahren zur Herstellung von thermisch stabilen Polymerbildern
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
US5391465A (en) * 1989-06-20 1995-02-21 Rohm And Haas Company Method of using selected photoactive compounds in high resolution, acid hardening photoresists with near ultraviolet radiation wherein the photoresist comprise conventional deep UV photoacid generators

Also Published As

Publication number Publication date
EP0423446B1 (de) 1998-03-04
EP0423446A1 (de) 1991-04-24
DE69032077D1 (de) 1998-04-09
KR910008487A (ko) 1991-05-31
JPH03144650A (ja) 1991-06-20
JP2848687B2 (ja) 1999-01-20

Similar Documents

Publication Publication Date Title
ATE100685T1 (de) Woelbmechanik.
DE69020494T2 (de) Metrologie.
DE59009431D1 (de) Photoresist.
DE69015446T2 (de) Entwicklungsvorrichtungen für elektrofotografische Geräte.
DE69032077D1 (de) Fotoresist für nahes U.V.
NO902972L (no) Aktuator for verktoey.
FI921279A (fi) Amino-b-lyasenzyminhibitorer som deodoranter.
FI890803A (fi) Inmatningssystem foer braennluft i en aotervinningspanna.
FI900763A0 (fi) Tris-hydroximetyl-laegre alkanestrar som fettsurrogat.
FI892214A (fi) Kopparlegering foer anvaendning som motstaondssvetselektrod.
FI895483A0 (fi) Som slaglod anvaendbara kopparblandningar.
FI900940A0 (fi) Tryckt kretsskiva som foerhindrar elektromagnetisk interferens.
DE69023605T2 (de) Positive Fotolackzusammensetzung.
FI905238A0 (fi) Foerbraenningsmotor foer fartyg som transporterar foerbraenningsgas.
FI891419A0 (fi) Anordning i en gaengoeppningsanordning foer borrmaskineri.
FI895448A (fi) Antennsystem foer fordon.
FI905274A0 (fi) Katod som frigoer vaete.
NO895316L (no) Skrog for fartoey.
FI910281A0 (fi) Kopplingsarrangemang som bildar triangelpuls.
FI895906A0 (fi) Ledning speciellt foer medel- eller storspaenning.
ES1010709Y (es) Estuche portacassettes.
NO891222D0 (no) Element-sammenkoblingsmekanisme.
FI890264A0 (fi) Foerbaettringar i anslutning till baotskrov.
ES1011128Y (es) Caja-expositor para munecos.
FI895617A (fi) Hjaelpmedel som innehaoller pappersfiber.

Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee