HK1152109A1 - Illumination optical system and exposure apparatus - Google Patents

Illumination optical system and exposure apparatus

Info

Publication number
HK1152109A1
HK1152109A1 HK11106093.0A HK11106093A HK1152109A1 HK 1152109 A1 HK1152109 A1 HK 1152109A1 HK 11106093 A HK11106093 A HK 11106093A HK 1152109 A1 HK1152109 A1 HK 1152109A1
Authority
HK
Hong Kong
Prior art keywords
optical system
exposure apparatus
illumination optical
illumination
exposure
Prior art date
Application number
HK11106093.0A
Other languages
English (en)
Chinese (zh)
Inventor
Tanitsu Osamu
Tanaka Hirohisa
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1152109A1 publication Critical patent/HK1152109A1/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
HK11106093.0A 2008-05-28 2011-06-15 Illumination optical system and exposure apparatus HK1152109A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008138841 2008-05-28
PCT/JP2009/058802 WO2009145048A1 (ja) 2008-05-28 2009-05-12 空間光変調器の検査装置および検査方法、照明光学系、照明光学系の調整方法、露光装置、およびデバイス製造方法

Publications (1)

Publication Number Publication Date
HK1152109A1 true HK1152109A1 (en) 2012-02-17

Family

ID=41376933

Family Applications (2)

Application Number Title Priority Date Filing Date
HK11106093.0A HK1152109A1 (en) 2008-05-28 2011-06-15 Illumination optical system and exposure apparatus
HK16111988.3A HK1223680A1 (zh) 2008-05-28 2016-10-18 照明光學系統、照明方法、曝光裝置以及曝光方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK16111988.3A HK1223680A1 (zh) 2008-05-28 2016-10-18 照明光學系統、照明方法、曝光裝置以及曝光方法

Country Status (7)

Country Link
US (2) US8456624B2 (ko)
EP (1) EP2282188B1 (ko)
JP (2) JP5360057B2 (ko)
KR (1) KR101695034B1 (ko)
CN (2) CN101910817B (ko)
HK (2) HK1152109A1 (ko)
WO (1) WO2009145048A1 (ko)

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CN103345128B (zh) 2007-02-06 2017-04-12 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的照明系统
JP5549222B2 (ja) * 2009-12-28 2014-07-16 株式会社ニコン 空間光変調器、露光装置およびそれらの製造方法
JP5481400B2 (ja) * 2010-01-15 2014-04-23 株式会社日立ハイテクノロジーズ マイクロミラーデバイスの選別方法、マイクロミラーデバイス選別装置およびマスクレス露光装置
KR101970091B1 (ko) 2010-02-03 2019-08-13 가부시키가이샤 니콘 조명 광학 장치, 조명 방법, 및 노광 방법 및 장치
WO2012169090A1 (ja) * 2011-06-06 2012-12-13 株式会社ニコン 照明方法、照明光学装置、及び露光装置
CN104025257B (zh) 2011-10-24 2017-09-19 株式会社尼康 照明光学系统、曝光装置及组件制造方法
KR101890754B1 (ko) * 2012-01-25 2018-08-22 삼성전자 주식회사 공간 광변조기의 성능 측정 시스템
KR101338362B1 (ko) * 2012-03-09 2013-12-06 삼성전기주식회사 디지털 마이크로 미러 장치용 미러 불량 검출장치
KR101887054B1 (ko) * 2012-03-23 2018-08-09 삼성전자주식회사 적외선 검출 장치 및 이를 포함하는 가열 조리 장치
WO2014056513A1 (en) * 2012-10-08 2014-04-17 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
DE102013214459B4 (de) * 2013-07-24 2015-07-16 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage
CN103454073B (zh) * 2013-09-04 2016-01-13 上海大学 基于4f干涉系统测试空间光调制器调制性能的测试装置及方法
CN103837332B (zh) * 2014-03-24 2016-05-25 电子科技大学 一种基于正交移相共轭干涉仪方法的液晶型光学器件相位检测方法
KR101938723B1 (ko) 2014-09-25 2019-01-15 에이에스엠엘 네델란즈 비.브이. 조명 시스템
CN106922135B (zh) 2014-11-14 2020-07-14 株式会社尼康 造型装置及造型方法
CN111151750B (zh) 2014-11-14 2023-01-06 株式会社尼康 造形装置及造形方法
JP7014226B2 (ja) 2017-05-01 2022-02-01 株式会社ニコン 加工装置
JP6969163B2 (ja) * 2017-05-31 2021-11-24 株式会社ニコン 検査装置及び検査方法、露光装置及び露光方法、並びに、デバイス製造方法
JP6985907B2 (ja) * 2017-11-30 2021-12-22 株式会社小糸製作所 灯具ユニット

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