TW200302507A - Stage device and exposure device - Google Patents

Stage device and exposure device Download PDF

Info

Publication number
TW200302507A
TW200302507A TW091134591A TW91134591A TW200302507A TW 200302507 A TW200302507 A TW 200302507A TW 091134591 A TW091134591 A TW 091134591A TW 91134591 A TW91134591 A TW 91134591A TW 200302507 A TW200302507 A TW 200302507A
Authority
TW
Taiwan
Prior art keywords
device
base
stator
motor
supporting unit
Prior art date
Application number
TW091134591A
Inventor
Arai Dai
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002011806 priority Critical
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200302507A publication Critical patent/TW200302507A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
    • G03F7/70833Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression

Abstract

A stator of a motor is separately and independently arranged from a base. Under the circumstance, a reaction force process is implemented without reducing the pushing force and the anti-vibratility of a motor and without damaging the motor. The device comprises a movable stage body A that is movably supported by a base 22 having a moving surface, and a first driving device for driving the stage body 1A that has a stator 65 and a movable element 64A which is located at the stage body 1A. The device further comprises a supporting unit 7 has the stator 65 installed thereon and is separately arranged from the base 22. The unlock device 45 frees the independence of the supporting unit 7 according to a relative displacement between the base 22 and the supporting unit 7 in a first direction that is substantially perpendicular to the moving surface.
TW091134591A 2002-01-21 2002-11-28 Stage device and exposure device TW200302507A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002011806 2002-01-21

Publications (1)

Publication Number Publication Date
TW200302507A true TW200302507A (en) 2003-08-01

Family

ID=27606021

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091134591A TW200302507A (en) 2002-01-21 2002-11-28 Stage device and exposure device

Country Status (3)

Country Link
JP (1) JPWO2003063212A1 (en)
TW (1) TW200302507A (en)
WO (1) WO2003063212A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI384340B (en) * 2008-04-15 2013-02-01 Ind Tech Res Inst Manufacturing apparatus
US10203603B2 (en) 2016-05-31 2019-02-12 Boe Technology Group Co., Ltd. Substrate supporting structure and exposure machine

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532824B1 (en) 2003-04-09 2015-07-01 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI519819B (en) 2003-11-20 2016-02-01 尼康股份有限公司 Light beam converter, optical illuminating apparatus, exposure device, and exposure method
TWI505329B (en) 2004-02-06 2015-10-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
EP1746637B1 (en) 2004-04-09 2012-06-20 Nikon Corporation Drive method for mobile body, stage device, and exposure device
JP2006086442A (en) * 2004-09-17 2006-03-30 Nikon Corp Stage device and exposure device
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus and device manufacturing method
SG10201602750RA (en) 2007-10-16 2016-05-30 Nikon Corp Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
CN101681123B (en) 2007-10-16 2013-06-12 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN101910817B (en) 2008-05-28 2016-03-09 株式会社尼康 An illumination optical system, exposure apparatus and device manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001023896A (en) * 1999-07-13 2001-01-26 Nikon Corp Stage device and aligner
JP2001297960A (en) * 2000-04-11 2001-10-26 Nikon Corp Stage device and projection aligner
JP2001345256A (en) * 2000-06-01 2001-12-14 Nikon Corp Stage device and aligner

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI384340B (en) * 2008-04-15 2013-02-01 Ind Tech Res Inst Manufacturing apparatus
US10203603B2 (en) 2016-05-31 2019-02-12 Boe Technology Group Co., Ltd. Substrate supporting structure and exposure machine

Also Published As

Publication number Publication date
WO2003063212A1 (en) 2003-07-31
JPWO2003063212A1 (en) 2005-05-26

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