SE0100336L - Adresseringsmetod och apparat som använder densamma tekniskt område - Google Patents
Adresseringsmetod och apparat som använder densamma tekniskt områdeInfo
- Publication number
- SE0100336L SE0100336L SE0100336A SE0100336A SE0100336L SE 0100336 L SE0100336 L SE 0100336L SE 0100336 A SE0100336 A SE 0100336A SE 0100336 A SE0100336 A SE 0100336A SE 0100336 L SE0100336 L SE 0100336L
- Authority
- SE
- Sweden
- Prior art keywords
- movable micro
- potential
- deltat
- addressed
- same technical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0100336A SE0100336L (sv) | 2001-02-05 | 2001-02-05 | Adresseringsmetod och apparat som använder densamma tekniskt område |
US10/467,184 US6885493B2 (en) | 2001-02-05 | 2002-01-28 | Method and a device for reducing hysteresis or imprinting in a movable micro-element |
PCT/SE2002/000142 WO2002063371A1 (en) | 2001-02-05 | 2002-01-28 | A method and a device for reducing hysteresis or imprinting in a movable micro-element |
JP2002563057A JP2004520618A (ja) | 2001-02-05 | 2002-01-28 | 可動マイクロ素子におけるヒステリシス又は履歴効果を減少させるための方法と装置 |
EP02710598A EP1364246A1 (en) | 2001-02-05 | 2002-01-28 | A method and a device for reducing hysteresis or imprinting in a movable micro-element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0100336A SE0100336L (sv) | 2001-02-05 | 2001-02-05 | Adresseringsmetod och apparat som använder densamma tekniskt område |
Publications (2)
Publication Number | Publication Date |
---|---|
SE0100336D0 SE0100336D0 (sv) | 2001-02-05 |
SE0100336L true SE0100336L (sv) | 2002-08-06 |
Family
ID=20282834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0100336A SE0100336L (sv) | 2001-02-05 | 2001-02-05 | Adresseringsmetod och apparat som använder densamma tekniskt område |
Country Status (5)
Country | Link |
---|---|
US (1) | US6885493B2 (sv) |
EP (1) | EP1364246A1 (sv) |
JP (1) | JP2004520618A (sv) |
SE (1) | SE0100336L (sv) |
WO (1) | WO2002063371A1 (sv) |
Families Citing this family (72)
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WO2004005998A1 (en) * | 2002-07-04 | 2004-01-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and apparatus for controlling deformable actuators |
SE0300240D0 (sv) * | 2003-01-31 | 2003-01-31 | Micronic Laser Systems Ab | SLM addressing method |
KR101484435B1 (ko) * | 2003-04-09 | 2015-01-19 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
US7410736B2 (en) | 2003-09-30 | 2008-08-12 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
US6876440B1 (en) | 2003-09-30 | 2005-04-05 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
US7023526B2 (en) | 2003-09-30 | 2006-04-04 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation |
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US20050151949A1 (en) * | 2004-01-08 | 2005-07-14 | Lsi Logic Corporation | Process and apparatus for applying apodization to maskless optical direct write lithography processes |
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US7471443B2 (en) * | 2004-03-02 | 2008-12-30 | Hewlett-Packard Development Company, L.P. | Piezoelectric flexures for light modulator |
US7072090B2 (en) * | 2004-04-22 | 2006-07-04 | Micronic Laser Systems Ab | Addressing of an SLM |
US7215459B2 (en) * | 2004-08-25 | 2007-05-08 | Reflectivity, Inc. | Micromirror devices with in-plane deformable hinge |
US6980349B1 (en) * | 2004-08-25 | 2005-12-27 | Reflectivity, Inc | Micromirrors with novel mirror plates |
US7092143B2 (en) * | 2004-10-19 | 2006-08-15 | Reflectivity, Inc | Micromirror array device and a method for making the same |
US7274502B2 (en) * | 2004-12-22 | 2007-09-25 | Asml Holding N.V. | System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks |
US7242515B2 (en) * | 2004-12-22 | 2007-07-10 | Texas Instruments Incorporated | Structure and method for reducing thermal stresses on a torsional hinged device |
TWI453795B (zh) * | 2005-01-21 | 2014-09-21 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
WO2006100780A1 (ja) * | 2005-03-24 | 2006-09-28 | Olympus Corporation | リペア方法及びその装置 |
US7466476B2 (en) * | 2006-08-02 | 2008-12-16 | Texas Instruments Incorporated | Sloped cantilever beam electrode for a MEMS device |
US7349146B1 (en) * | 2006-08-29 | 2008-03-25 | Texas Instruments Incorporated | System and method for hinge memory mitigation |
US8619378B2 (en) * | 2010-11-15 | 2013-12-31 | DigitalOptics Corporation MEMS | Rotational comb drive Z-stage |
US8768157B2 (en) | 2011-09-28 | 2014-07-01 | DigitalOptics Corporation MEMS | Multiple degree of freedom actuator |
US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
US20090091730A1 (en) * | 2007-10-03 | 2009-04-09 | Nikon Corporation | Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
SG185313A1 (en) * | 2007-10-16 | 2012-11-29 | Nikon Corp | Illumination optical system, exposure apparatus, and device manufacturing method |
CN101681123B (zh) | 2007-10-16 | 2013-06-12 | 株式会社尼康 | 照明光学系统、曝光装置以及元件制造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
JP2010004008A (ja) * | 2007-10-31 | 2010-01-07 | Nikon Corp | 光学ユニット、照明光学装置、露光装置、露光方法、およびデバイス製造方法 |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
EP2209135A4 (en) * | 2007-11-06 | 2011-06-08 | Nikon Corp | OPTICAL LIGHTING DEVICE AND EXPOSURE DEVICE |
JP5418230B2 (ja) | 2007-11-06 | 2014-02-19 | 株式会社ニコン | 露光方法、及び露光装置 |
JP5326259B2 (ja) | 2007-11-08 | 2013-10-30 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
KR20100105649A (ko) | 2007-12-17 | 2010-09-29 | 가부시키가이샤 니콘 | 공간 광 변조 유닛, 조명 광학계, 노광 장치, 및 디바이스 제조 방법 |
TW200929333A (en) | 2007-12-17 | 2009-07-01 | Nikon Corp | Illumination optical system, exposure apparatus, and device manufacturing method |
WO2009125511A1 (ja) | 2008-04-11 | 2009-10-15 | 株式会社ニコン | 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 |
WO2009145048A1 (ja) | 2008-05-28 | 2009-12-03 | 株式会社ニコン | 空間光変調器の検査装置および検査方法、照明光学系、照明光学系の調整方法、露光装置、およびデバイス製造方法 |
WO2010024106A1 (ja) * | 2008-08-28 | 2010-03-04 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
US20110037962A1 (en) | 2009-08-17 | 2011-02-17 | Nikon Corporation | Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method |
JP5598733B2 (ja) | 2009-12-23 | 2014-10-01 | 株式会社ニコン | 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 |
KR20120116329A (ko) | 2010-02-20 | 2012-10-22 | 가부시키가이샤 니콘 | 광원 최적화 방법, 노광 방법, 디바이스 제조 방법, 프로그램, 노광 장치, 리소그래피 시스템, 광원 평가 방법 및 광원 변조 방법 |
US20110205519A1 (en) * | 2010-02-25 | 2011-08-25 | Nikon Corporation | Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method |
WO2012043497A1 (ja) | 2010-09-27 | 2012-04-05 | 株式会社ニコン | 空間光変調器の駆動方法、露光用パターンの生成方法、並びに露光方法及び装置 |
US9352962B2 (en) | 2010-11-15 | 2016-05-31 | DigitalOptics Corporation MEMS | MEMS isolation structures |
US8521017B2 (en) | 2010-11-15 | 2013-08-27 | DigitalOptics Corporation MEMS | MEMS actuator alignment |
US8430580B2 (en) | 2010-11-15 | 2013-04-30 | DigitalOptics Corporation MEMS | Rotationally deployed actuators |
US9061883B2 (en) | 2010-11-15 | 2015-06-23 | DigitalOptics Corporation MEMS | Actuator motion control features |
US8547627B2 (en) | 2010-11-15 | 2013-10-01 | DigitalOptics Corporation MEMS | Electrical routing |
US8608393B2 (en) | 2010-11-15 | 2013-12-17 | DigitalOptics Corporation MEMS | Capillary actuator deployment |
US9052567B2 (en) | 2010-11-15 | 2015-06-09 | DigitalOptics Corporation MEMS | Actuator inside of motion control |
US9019390B2 (en) | 2011-09-28 | 2015-04-28 | DigitalOptics Corporation MEMS | Optical image stabilization using tangentially actuated MEMS devices |
US8803256B2 (en) | 2010-11-15 | 2014-08-12 | DigitalOptics Corporation MEMS | Linearly deployed actuators |
US9515579B2 (en) | 2010-11-15 | 2016-12-06 | Digitaloptics Corporation | MEMS electrical contact systems and methods |
US8947797B2 (en) | 2010-11-15 | 2015-02-03 | DigitalOptics Corporation MEMS | Miniature MEMS actuator assemblies |
US8605375B2 (en) | 2010-11-15 | 2013-12-10 | DigitalOptics Corporation MEMS | Mounting flexure contacts |
US8941192B2 (en) | 2010-11-15 | 2015-01-27 | DigitalOptics Corporation MEMS | MEMS actuator device deployment |
US8637961B2 (en) | 2010-11-15 | 2014-01-28 | DigitalOptics Corporation MEMS | MEMS actuator device |
US8337103B2 (en) | 2010-11-15 | 2012-12-25 | DigitalOptics Corporation MEMS | Long hinge actuator snubbing |
US8604663B2 (en) | 2010-11-15 | 2013-12-10 | DigitalOptics Corporation MEMS | Motion controlled actuator |
US8884381B2 (en) | 2010-11-15 | 2014-11-11 | DigitalOptics Corporation MEMS | Guard trench |
US8358925B2 (en) | 2010-11-15 | 2013-01-22 | DigitalOptics Corporation MEMS | Lens barrel with MEMS actuators |
US10120283B2 (en) | 2011-06-06 | 2018-11-06 | Nikon Corporation | Illumination method, illumination optical device, and exposure device |
WO2012169089A1 (ja) | 2011-06-07 | 2012-12-13 | 株式会社ニコン | 照明光学系、露光装置、デバイス製造方法、および偏光ユニット |
TWI684788B (zh) | 2011-06-13 | 2020-02-11 | 日商尼康股份有限公司 | 照明光學系統、曝光裝置以及元件製造方法 |
US8855476B2 (en) | 2011-09-28 | 2014-10-07 | DigitalOptics Corporation MEMS | MEMS-based optical image stabilization |
US8616791B2 (en) | 2011-09-28 | 2013-12-31 | DigitalOptics Corporation MEMS | Rotationally deployed actuator devices |
JP6120001B2 (ja) | 2011-10-24 | 2017-04-26 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
EP2806451B1 (en) * | 2012-01-18 | 2023-01-25 | Nikon Corporation | Drive method for spatial light modulator, method for generating pattern for exposure, and exposure method and device |
CN108107685B (zh) | 2012-05-02 | 2021-01-15 | 株式会社尼康 | 曝光装置、曝光方法、器件制造方法及评价方法 |
JP2015099306A (ja) * | 2013-11-20 | 2015-05-28 | 株式会社リコー | 光偏向装置、光偏向アレー及びその駆動方法、並びに光学システム、画像投影表示装置、及び画像形成装置 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5096279A (en) * | 1984-08-31 | 1992-03-17 | Texas Instruments Incorporated | Spatial light modulator and method |
US4954789A (en) * | 1989-09-28 | 1990-09-04 | Texas Instruments Incorporated | Spatial light modulator |
US5142405A (en) * | 1990-06-29 | 1992-08-25 | Texas Instruments Incorporated | Bistable dmd addressing circuit and method |
US5526688A (en) * | 1990-10-12 | 1996-06-18 | Texas Instruments Incorporated | Digital flexure beam accelerometer and method |
US5231388A (en) * | 1991-12-17 | 1993-07-27 | Texas Instruments Incorporated | Color display system using spatial light modulators |
US5285196A (en) * | 1992-10-15 | 1994-02-08 | Texas Instruments Incorporated | Bistable DMD addressing method |
EP0657760A1 (en) * | 1993-09-15 | 1995-06-14 | Texas Instruments Incorporated | Image simulation and projection system |
US5444566A (en) * | 1994-03-07 | 1995-08-22 | Texas Instruments Incorporated | Optimized electronic operation of digital micromirror devices |
US5650881A (en) * | 1994-11-02 | 1997-07-22 | Texas Instruments Incorporated | Support post architecture for micromechanical devices |
US5629794A (en) * | 1995-05-31 | 1997-05-13 | Texas Instruments Incorporated | Spatial light modulator having an analog beam for steering light |
US5768007A (en) * | 1995-09-11 | 1998-06-16 | Texas Instruments Incorporated | Phase matched reset for digital micro-mirror device |
JPH09164727A (ja) * | 1995-12-13 | 1997-06-24 | Fuji Photo Film Co Ltd | カラープリンタ |
JPH09319008A (ja) * | 1996-05-29 | 1997-12-12 | Fuji Photo Film Co Ltd | 画像形成装置 |
US5912758A (en) * | 1996-09-11 | 1999-06-15 | Texas Instruments Incorporated | Bipolar reset for spatial light modulators |
US5706123A (en) * | 1996-09-27 | 1998-01-06 | Texas Instruments Incorporated | Switched control signals for digital micro-mirror device with split reset |
US6195196B1 (en) * | 1998-03-13 | 2001-02-27 | Fuji Photo Film Co., Ltd. | Array-type exposing device and flat type display incorporating light modulator and driving method thereof |
US6084235A (en) * | 1998-05-27 | 2000-07-04 | Texas Instruments Incorporated | Self aligning color wheel index signal |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6285490B1 (en) * | 1998-12-30 | 2001-09-04 | Texas Instruments Incorporated | High yield spring-ring micromirror |
SE0200788D0 (sv) | 2002-03-15 | 2002-03-15 | Micronic Laser Systems Ab | Method using a movable micro-element |
SE0200787D0 (sv) | 2002-03-15 | 2002-03-15 | Micronic Laser Systems Ab | Improved addressing method |
-
2001
- 2001-02-05 SE SE0100336A patent/SE0100336L/sv unknown
-
2002
- 2002-01-28 WO PCT/SE2002/000142 patent/WO2002063371A1/en active Application Filing
- 2002-01-28 EP EP02710598A patent/EP1364246A1/en not_active Ceased
- 2002-01-28 JP JP2002563057A patent/JP2004520618A/ja active Pending
- 2002-01-28 US US10/467,184 patent/US6885493B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
SE0100336D0 (sv) | 2001-02-05 |
JP2004520618A (ja) | 2004-07-08 |
US6885493B2 (en) | 2005-04-26 |
WO2002063371A1 (en) | 2002-08-15 |
US20040150868A1 (en) | 2004-08-05 |
EP1364246A1 (en) | 2003-11-26 |
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