WO2012169089A1 - 照明光学系、露光装置、デバイス製造方法、および偏光ユニット - Google Patents
照明光学系、露光装置、デバイス製造方法、および偏光ユニット Download PDFInfo
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- WO2012169089A1 WO2012169089A1 PCT/JP2011/077200 JP2011077200W WO2012169089A1 WO 2012169089 A1 WO2012169089 A1 WO 2012169089A1 JP 2011077200 W JP2011077200 W JP 2011077200W WO 2012169089 A1 WO2012169089 A1 WO 2012169089A1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Definitions
- the present invention relates to an illumination optical system, an exposure apparatus, a device manufacturing method, and a polarization unit.
- a secondary light source (generally an illumination pupil), which is a substantial surface light source composed of a number of light sources, passes through a fly-eye lens as an optical integrator.
- a predetermined light intensity distribution the light intensity distribution in the illumination pupil is referred to as “pupil intensity distribution”.
- the illumination pupil is a position where the illumination surface becomes the Fourier transform plane of the illumination pupil by the action of the optical system between the illumination pupil and the illumination surface (a mask or a wafer in the case of an exposure apparatus). Defined.
- the mask on which a predetermined pattern is formed is illuminated in a superimposed manner.
- the light transmitted through the mask forms an image on the wafer via the projection optical system, and the mask pattern is projected and exposed (transferred) onto the wafer.
- the pattern formed on the mask is miniaturized, and it is indispensable to obtain a uniform illuminance distribution on the wafer in order to accurately transfer the fine pattern onto the wafer.
- annular or multipolar secondary light source (pupil intensity distribution) is applied to the illumination pupil at the rear focal plane of the fly-eye lens or in the vicinity thereof by the action of an aperture stop with a wave plate disposed immediately after the fly-eye lens. ), And a light beam passing through the secondary light source is set to a linear polarization state whose polarization direction is the circumferential direction (hereinafter referred to as “circumferential polarization state” for short).
- circumferential polarization state for short.
- the present invention has been made in view of the above-described problems, and an object thereof is to provide an illumination optical system having a high degree of freedom with respect to changing the polarization state.
- the present invention also provides an exposure apparatus and a device manufacturing device that can accurately transfer a fine pattern to a photosensitive substrate under an appropriate illumination condition using an illumination optical system having a high degree of freedom in changing the polarization state. It aims to provide a method.
- a spatial light modulator having a plurality of optical elements arranged in a predetermined plane and individually controlled, and variably forming a light intensity distribution in the illumination pupil of the illumination optical system;
- An optical path of the illumination optical system is disposed at a position optically conjugate with the predetermined surface, and includes a part of the first partial light beam and a second partial light beam different from the first partial light beam.
- the polarizing unit provides an illumination optical system that changes a ratio of a cross-sectional area of the first partial light beam and the second partial light beam in a cross section of an emitted light beam emitted from the polarizing unit.
- an exposure apparatus comprising the illumination optical system of the first embodiment for illuminating a predetermined pattern, and exposing the predetermined pattern onto a photosensitive substrate.
- the exposure apparatus of the second embodiment exposing the predetermined pattern to the photosensitive substrate; Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate; And processing the surface of the photosensitive substrate through the mask layer.
- a device manufacturing method is provided.
- the polarization unit emits by changing the polarization state of a part of the incident light flux having a rectangular cross section, A first surface disposed on the first surface along the cross-section of the incident light beam and changing the polarization state of the second partial light beam of the incident light beam without affecting the first partial light beam of the incident light beam.
- An optical element Arranged on the second surface along the cross-section of the incident light beam, the polarization state of at least a part of the third partial light beam out of the second partial light beam that has passed through the first optical element, and the first optical element.
- a second optical element that changes a polarization state of at least a part of the fourth partial light beam among the first partial light beams that are incident on the first partial light beam
- the first optical element includes a first edge extending in a third direction obliquely intersecting one side of the rectangular cross section of the incident light beam, and a second edge extending in a fourth direction different from the third direction.
- a polarizing unit is provided.
- FIG. 1 It is a figure which shows schematically the principal part structure of the illumination optical system of embodiment. It is a figure which shows schematically the structure of the exposure apparatus concerning embodiment. It is a figure explaining the structure and effect
- FIG. 31 is a diagram schematically showing a configuration of a polarization unit that converts incident linearly polarized light into circumferential linearly polarized light or radial linearly polarized light in FIG. 30.
- FIG. 1 is a diagram schematically illustrating a main configuration of an illumination optical system according to an embodiment.
- the XYZ coordinate system is set so that the direction along the optical axis AX of the illumination optical system is the Z axis.
- FIG. 1 light from a light source (not shown) reaches a spatial light modulator 3 having a plurality of mirror elements (not shown) arranged in a predetermined plane and controlled individually.
- the light reflected by the plurality of mirror elements of the spatial light modulator 3 enters the pupil plane 4 c of the relay optical system 4 through the front lens group 4 a of the relay optical system 4.
- FIGS. 1 it is assumed that the effective reflection region on the array surface (predetermined surface) of the spatial light modulator 3 is divided into four partial regions R01, R02, R03, and R04. Only the light from the partial regions R01 and R04 will be described.
- Light from the plurality of mirror elements located in the partial region R01 of the spatial light modulator 3 is guided to the pair of pupil regions R1a and R1b on the pupil plane 4c via the front lens group 4a, and the pupil regions R1a, R1a, Light intensity distributions P1a and P1b are formed in R1b.
- light from a plurality of mirror elements located in the partial region R04 of the spatial light modulator 3 is guided to the pair of pupil regions R4a and R4b on the pupil plane 4c via the front lens group 4a, and the pupil region Light intensity distributions P4a and P4b are formed in R4a and R4b.
- the light from the pupil plane 4 c passes through the rear lens group 4 b of the relay optical system 4 and reaches a region 3 f in a plane optically conjugate with the arrangement plane of the spatial light modulator 3 with respect to the relay optical system 4.
- An optical rotation member 51 that rotates the polarization direction of incident linearly polarized light by 45 degrees and an optical rotation member 52 that rotates the polarization direction of incident linearly polarized light by 90 degrees are disposed on the conjugate plane.
- the region 3f is divided into four partial regions R11 to R14 that are optically conjugate with the partial regions R01 to R04 of the spatial light modulator 3, and the optical rotation member 51 is located in the partial regions R12 and R13.
- the optical rotation member 52 is located in the partial regions R13 and R14.
- the light from the pair of pupil regions R4a and R4b out of the light from the pupil surface 4c reaches the partial region R14 in the region 3f, and its polarization direction is rotated by 90 degrees through the optical rotation member 52.
- the polarization direction of the light from the spatial light modulator 3 is Y-direction linearly polarized light having the polarization direction in the Y direction
- the polarization direction of the light from the pair of pupil regions R4a and R4b that has passed through the optical rotation member 52 is X-direction linearly polarized light having a polarization direction in the X direction.
- the light from the pair of pupil regions R4a and R4b which is linearly polarized in the X direction, is guided to the pair of pupil regions R14a and R14b on the pupil surface 7a optically conjugate with the pupil surface 4c via the relay optical system 6. Accordingly, light intensity distributions P14a and P14b are formed in the pupil regions R14a and R14b.
- light from the pair of pupil regions R1a and R1b among the light from the pupil surface 4c reaches the partial region R11 in the region 3f. Since the optical rotation members 51 and 52 are not located in this partial region, and the polarization direction of the light from the spatial light modulator 3 is Y-direction linearly polarized light having the polarization direction in the Y direction, it has passed through the partial region R11. The polarization direction of light from the pair of pupil regions R1a and R1b remains Y-direction linearly polarized light.
- the light from the pair of pupil regions R1a and R1b that has passed through the partial region R11 is guided to the pair of pupil regions R11a and R11b on the pupil surface 7a through the relay optical system 6, and enters the pupil regions R11a and R11b.
- Light intensity distributions P11a and P11b of Y direction linearly polarized light are formed.
- the light from the light intensity distributions P11a, P11b, P14a, and P14b on the pupil plane 7a is condensed via a condenser optical system (not shown) to illuminate the irradiated surface.
- a condenser optical system not shown
- the optical rotatory members 51 and 52 on the region 3f in the plane optically conjugate with the arrangement surface of the spatial light modulator 3 are moved on the region 3f, the polarization of the light intensity distribution on the pupil plane 7a is polarized.
- the state can be changed to any polarization state.
- FIG. 2 is a view schematically showing a configuration of an exposure apparatus according to the embodiment.
- members having the same functions as those in the embodiment shown in FIG. 1 are denoted by the same reference numerals, and Z is aligned along the normal direction of the transfer surface (exposure surface) of the wafer W, which is a photosensitive substrate.
- the Y axis is set in the direction parallel to the paper surface of FIG. 2 in the transfer surface of the wafer W, and the X axis is set in the direction perpendicular to the paper surface of FIG.
- exposure light is supplied from the light source 1 in the exposure apparatus of the present embodiment.
- the light source 1 for example, an ArF excimer laser light source that supplies light with a wavelength of 193 nm, a KrF excimer laser light source that supplies light with a wavelength of 248 nm, or the like can be used.
- the exposure light (illumination light) emitted from the light source 1 is in a polarization state mainly composed of linearly polarized light.
- the polarization state mainly composed of linearly polarized light can be that the intensity of the linearly polarized light is 80% or more with respect to the overall intensity of exposure light (illumination light).
- the light emitted from the light source 1 in the + Z direction is reflected by the optical path bending mirror MR1 via the beam transmitter 2, and then enters the spatial light modulator 3.
- the light emitted in the + Z direction through the spatial light modulator 3 enters the relay optical system 4.
- the beam transmitter 2 guides the incident light beam from the light source 1 to the spatial light modulator 3 while converting it into a light beam having an appropriate size and shape, and changes the position of the light beam incident on the spatial light modulator 3. And a function of actively correcting the angular variation.
- the beam transmitting unit 2 may be configured not to convert the incident light beam from the light source 1 into a light beam having a cross section having an appropriate size and shape.
- the spatial light modulator 3 individually controls the postures of a plurality of mirror elements arranged in a predetermined plane and individually controlled based on a control signal from the control system CR. And a driving unit for driving. The configuration and operation of the spatial light modulator 3 will be described later.
- the light emitted from the spatial light modulator 3 enters the pupil plane 4 c of the relay optical system 4 via the front lens group 4 a of the relay optical system 4.
- the front lens group 4a has a front focal position that substantially coincides with the position of the array surface of the plurality of mirror elements of the spatial light modulator 3 (hereinafter referred to as "spatial light modulator array surface"), and its rear focal position is It is set to substantially coincide with the position of the pupil plane 4c.
- the light having passed through the spatial light modulator 3 variably forms a light intensity distribution according to the postures of the plurality of mirror elements on the pupil plane 4c.
- the light having a light intensity distribution formed on the pupil plane 4c is incident on the polarization unit 5 via the rear lens group 4b of the relay optical system 4.
- the polarization unit 5 is disposed at a position optically conjugate with the arrangement surface of the spatial light modulator 3, and emits while changing the polarization state of a part of the incident light beam. The configuration and operation of the polarization unit 5 will be described later.
- the light passing through the polarization unit 5 passes through the relay optical system 6, is reflected in the + Y direction by the optical path bending mirror MR 2, and enters the micro fly's eye lens (or fly eye lens) 7.
- the rear lens group 4b and the relay optical system 6 set the pupil plane 4c and the incident surface of the micro fly's eye lens 7 optically conjugate. Therefore, the light that has passed through the spatial light modulator 3 is light corresponding to the light intensity distribution formed on the pupil plane 4c on the incident surface of the micro fly's eye lens 7 disposed at a position optically conjugate with the pupil plane 4c. Form an intensity distribution.
- the micro fly's eye lens 7 is an optical element made up of a large number of micro lenses having positive refractive power, which are arranged vertically and horizontally and densely.
- the micro fly's eye lens 7 is configured by forming a micro lens group by etching a plane parallel plate. Has been.
- a micro fly's eye lens unlike a fly eye lens composed of lens elements isolated from each other, a large number of micro lenses (micro refractive surfaces) are integrally formed without being isolated from each other.
- the micro fly's eye lens is the same wavefront division type optical integrator as the fly's eye lens in that the lens elements are arranged vertically and horizontally.
- a rectangular minute refracting surface as a unit wavefront dividing surface in the micro fly's eye lens 7 is a rectangular shape similar to the shape of the illumination field to be formed on the mask M (and the shape of the exposure region to be formed on the wafer W). It is.
- a cylindrical micro fly's eye lens can be used as the micro fly's eye lens 7.
- the configuration and operation of the cylindrical micro fly's eye lens are disclosed in, for example, US Pat. No. 6,913,373.
- the light beam incident on the micro fly's eye lens 7 is two-dimensionally divided by a large number of microlenses, and the light intensity distribution on the rear focal plane or in the vicinity of the illumination pupil is almost the same as the light intensity distribution formed on the incident plane.
- a secondary light source substantially surface light source consisting of a large number of small light sources: pupil intensity distribution
- the light beam from the secondary light source formed on the illumination pupil immediately after the micro fly's eye lens 7 illuminates the mask blind 9 in a superimposed manner via the condenser optical system 8.
- a rectangular illumination field corresponding to the shape and focal length of the rectangular minute refractive surface of the micro fly's eye lens 7 is formed.
- an opening (light) having a shape corresponding to the secondary light source is located at or near the rear focal plane of the micro fly's eye lens 7, that is, at a position optically conjugate with an entrance pupil plane of the projection optical system PL described later.
- An illumination aperture stop having a transmission part may be arranged.
- the light beam that has passed through the rectangular opening (light transmitting portion) of the mask blind 9 is subjected to the light collecting action of the imaging optical system 10 and is -Z by the mirror MR3 disposed in the optical path of the imaging optical system 10. After being reflected in the direction, the mask M on which a predetermined pattern is formed is illuminated in a superimposed manner. That is, the imaging optical system 10 forms an image of the rectangular opening of the mask blind 9 on the mask M.
- the light beam transmitted through the mask M held on the mask stage MS forms an image of a mask pattern on the wafer (photosensitive substrate) W held on the wafer stage WS through the projection optical system PL.
- batch exposure or scan exposure is performed while the wafer stage WS is two-dimensionally driven and controlled in a plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL, and thus the wafer W is two-dimensionally driven and controlled.
- the pattern of the mask M is sequentially exposed in each exposure region of the wafer W.
- the Y direction in FIG. 2 can be set as the scan direction.
- the exposure apparatus of the present embodiment includes a first pupil intensity distribution measurement unit DTr that measures a pupil intensity distribution on the exit pupil plane of the illumination optical system based on light that passes through the illumination optical system (2 to 10), and a projection optical system.
- a second pupil intensity distribution measurement unit DTw that measures a pupil intensity distribution on the pupil plane of the projection optical system PL (an exit pupil plane of the projection optical system PL) based on light via the PL, and first and second pupil intensity distributions
- a control system CR that controls the spatial light modulator 3 based on the measurement result of at least one of the measurement units DTr and DTw and controls the overall operation of the exposure apparatus.
- the first pupil intensity distribution measurement unit DTr includes, for example, an imaging unit having a photoelectric conversion surface disposed at a position optically conjugate with the exit pupil position of the illumination optical system, and each point on the surface to be irradiated by the illumination optical system. Is monitored (pupil intensity distribution formed at the exit pupil position of the illumination optical system by light incident on each point).
- the second pupil intensity distribution measurement unit DTw includes an imaging unit having a photoelectric conversion surface arranged at a position optically conjugate with the pupil position of the projection optical system PL, for example, and includes each image plane of the projection optical system PL. The pupil intensity distribution related to the points (pupil intensity distribution formed by the light incident on each point at the pupil position of the projection optical system PL) is monitored.
- the secondary light source formed by the micro fly's eye lens 7 is used as a light source, and the mask M (and thus the wafer W) disposed on the irradiated surface of the illumination optical system is Koehler illuminated.
- the position where the secondary light source is formed is optically conjugate with the position of the aperture stop AS of the projection optical system PL, and the formation surface of the secondary light source can be called the illumination pupil plane of the illumination optical system.
- the image of the formation surface of the secondary light source can be called an exit pupil plane of the illumination optical system.
- the irradiated surface (the surface on which the mask M is disposed or the surface on which the wafer W is disposed when the illumination optical system including the projection optical system PL is considered) is optical with respect to the illumination pupil plane.
- the pupil intensity distribution is a light intensity distribution (luminance distribution) on the illumination pupil plane of the illumination optical system or a plane optically conjugate with the illumination pupil plane.
- the light intensity distribution on the incident surface of the micro fly's eye lens 7 and a surface optically conjugate with the incident surface can also be referred to as a pupil intensity distribution.
- the relay optical systems 4 and 6 and the micro fly's eye lens 7 are distributions that form a pupil intensity distribution in the illumination pupil immediately after the micro fly's eye lens 7 based on the light beam that has passed through the spatial light modulator 3.
- the forming optical system is configured.
- the spatial light modulator 3 includes a plurality of mirror elements 3a arranged in a predetermined plane, a base 3b holding the plurality of mirror elements 3a, and a cable (not shown) connected to the base 3b. ), And a drive unit 3c that individually controls and drives the postures of the plurality of mirror elements 3a.
- the attitude of the plurality of mirror elements 3a is changed by the action of the drive unit 3c that operates based on a command from the control system CR, and each mirror element 3a is set in a predetermined direction. .
- the spatial light modulator 3 includes a plurality of minute mirror elements 3 a arranged in a two-dimensional manner, and the spatial modulation according to the incident position of the incident light can be varied. Is applied and injected.
- the light beam L1 is incident on the mirror element SEa of the plurality of mirror elements 3a, and the light beam L2 is incident on the mirror element SEb different from the mirror element SEa.
- the light beam L3 is incident on a mirror element SEc different from the mirror elements SEa and SEb, and the light beam L4 is incident on a mirror element SEd different from the mirror elements SEa to SEc.
- the mirror elements SEa to SEd give spatial modulations set according to their positions to the lights L1 to L4.
- the front lens group 4a has an angle given to the emitted light by the plurality of mirror elements SEa to SEd of the spatial light modulator 3 on the pupil plane 4c which is a far field region (Fraunhofer diffraction region) of the spatial light modulator 3. Convert to position at.
- the light intensity distribution (pupil intensity distribution) of the secondary light source formed by the micro fly's eye lens 7 is the light intensity formed on the incident surface of the micro fly's eye lens 7 by the spatial light modulator 3 and the relay optical systems 4 and 6.
- the distribution corresponds to the distribution.
- the spatial light modulator 3 is a large number of minute reflecting elements regularly and two-dimensionally arranged along one plane with a planar reflecting surface as an upper surface.
- a movable multi-mirror including a mirror element 3a.
- Each mirror element 3a is movable, and the inclination of the reflection surface, that is, the inclination angle and the inclination direction of the reflection surface are independently controlled by the action of the drive unit 3c that operates based on a control signal from the control system CR.
- Each mirror element 3a can be rotated continuously or discretely by a desired rotation angle with two directions parallel to the reflecting surface and orthogonal to each other as rotation axes. That is, it is possible to two-dimensionally control the inclination of the reflecting surface of each mirror element 3a.
- each mirror element 3a When the reflecting surface of each mirror element 3a is discretely rotated, the rotation angle is set in a plurality of states (for example,..., -2.5 degrees, -2.0 degrees,... 0 degrees, +0.5 degrees) ... +2.5 degrees,.
- FIG. 4 shows the mirror element 3a having a square outer shape
- the outer shape of the mirror element 3a is not limited to a square.
- the shape can be arranged so that the gap between the mirror elements 3a is reduced (a shape that can be packed most closely). Further, from the viewpoint of light utilization efficiency, the interval between two adjacent mirror elements 3a can be minimized.
- the spatial light modulator 3 for example, a spatial light modulator that continuously changes the directions of a plurality of mirror elements 3a arranged two-dimensionally is used.
- a spatial light modulator for example, European Patent Publication No. 779530, US Pat. No. 5,867,302, US Pat. No. 6,480,320, US Pat. No. 6,600,591 U.S. Patent No. 6,733,144, U.S. Patent No. 6,900,915, U.S. Patent No. 7,095,546, U.S. Patent No. 7,295,726, U.S. Patent No. 7, No. 424,330, U.S. Pat. No. 7,567,375, U.S. Patent Publication No.
- the attitude of the plurality of mirror elements 3a is changed by the action of the drive unit 3c that operates according to the control signal from the control system CR, and each mirror element 3a is set in a predetermined direction.
- the light reflected at a predetermined angle by each of the plurality of mirror elements 3 a of the spatial light modulator 3 forms a desired pupil intensity distribution on the illumination pupil immediately after the micro fly's eye lens 7.
- the desired pupil intensity distribution is also formed at the (position).
- the spatial light modulator 3 variably forms a pupil intensity distribution in the illumination pupil immediately after the micro fly's eye lens 7.
- the polarization unit 5 is disposed at a position optically conjugate with the arrangement surface of the spatial light modulator 3. Therefore, the property of the incident light beam to the polarization unit 5 corresponds to the property of the incident light beam to the spatial light modulator 3.
- the polarization unit 5 has a parallel section of linearly polarized light (hereinafter referred to as “Y direction linearly polarized light”) having a rectangular cross section elongated in the X direction and polarized in the Y direction. It is assumed that a light beam enters. Therefore, a linearly polarized parallel light beam having a rectangular cross section elongated in the X direction and polarized in a direction parallel to the paper surface of FIG. 1 also enters the spatial light modulator 3.
- the polarization unit 5 is disposed so as to be adjacent to each other along the optical axis AX, and each of the polarization units 5 is movable along the X direction that is a direction along the cross section of the incident light.
- Members 51 and 52 and drive units DR51 and DR52 for moving the pair of optical rotation members 51 and 52 in the X direction are provided.
- the optical rotation members 51 and 52 have the form of a plane parallel plate, and are formed of a crystal material that is an optical material having optical activity, for example, quartz.
- the incident surfaces (and thus the exit surfaces) of the optical rotation members 51 and 52 are orthogonal to the optical axis AX, and the crystal optical axis thereof is substantially coincident with the direction of the optical axis AX (that is, substantially coincident with the Z direction as the traveling direction of incident light).
- the drive units DR51 and DR52 include an actuator for moving the optical rotation members 51 and 52 and an encoder for detecting the movement amount of the optical rotation members 51 and 52, and control signals from the control system CR. Based on this, the optical rotation members 51 and 52 are moved.
- the optical rotation members 51 and 52 have a rectangular outer shape having one side along the X direction and the other side along the Y direction.
- the optical rotation member 51; 52 has a pair of edges 51a, 51b; 52a, 52b along the Y direction.
- the optical rotation members 51 and 52 have different thicknesses, and thus have different polarization conversion characteristics.
- the optical rotation member 51 when Y-direction linearly polarized light having a polarization direction in the Y direction is incident on the optical rotation member 51, the Y direction is rotated by +45 degrees (45 degrees clockwise in the plane of FIG. 6). The thickness is set so as to emit linearly polarized light having a polarization direction in the direction.
- the optical rotatory member 52 disposed adjacent to the exit side of the optical rotatory member 51 has an X-direction linearly polarized light having a polarization direction in the X direction obtained by rotating the Y direction by +90 degrees when light in the Y-direction linearly polarized light is incident.
- the thickness is set so as to emit light.
- a parallel light beam F1 of Y-direction linearly polarized light having a rectangular cross section elongated in the X direction around the optical axis AX is incident on the polarization unit 5.
- the incident light beam F1 the light beam on the + X direction side from the edge 51b on the + X direction side of the optical rotation member 51, that is, the first partial light beam F11 having a rectangular cross section does not pass through the optical rotation members 51 and 52. Go to the relay optical system 6.
- the light beam defined by the + X direction side edge 51b of the optical rotation member 51 and the + X direction side edge 52b of the optical rotation member 52, that is, the second partial light beam F12 having a rectangular cross section adjacent to the first partial light beam F11 is obtained. Without going through the optical rotatory member 52, only the optical rotatory member 51 goes to the relay optical system 6.
- the light beam on the ⁇ X direction side of the optical rotation member 51 on the ⁇ X direction side, that is, the fourth partial light beam F14 having a rectangular cross section adjacent to the third partial light beam F13 does not pass through the optical rotation member 51. It goes to the relay optical system 6 only through the optical rotation member 52.
- the light beam F1 immediately after the polarization unit 5 is in a polarization state as shown in FIG. That is, since the first partial light beam F11 is not subjected to the optical rotation action of the optical rotation members 51 and 52, it remains Y-direction linearly polarized light. Since the second partial light beam F12 receives only the optical rotatory action of the optical rotation member 51, it becomes +45 degree obliquely linearly polarized light having a polarization direction in a direction obtained by rotating the Y direction by +45 degrees.
- the fourth partial light beam F14 receives only the optical rotation action of the optical rotation member 52, it becomes X-direction linearly polarized light having a polarization direction in the X direction obtained by rotating the Y direction by +90 degrees.
- the third partial light beam F13 sequentially receives the optical rotation action of the optical rotation member 51 and the optical rotation action of the optical rotation member 52.
- the third partial light beam F13 is a ⁇ 45 ° oblique linearly polarized light having a polarization direction in the direction rotated by + 90 ° from the direction rotated by + 45 ° in the Y direction, that is, the direction rotated by ⁇ 45 ° in the Y direction. become.
- the partial area R11 occupied by the first partial light beam F11 in the polarization unit 5 corresponds to a rectangular partial area R01 in the effective reflection area on the arrangement surface of the spatial light modulator 3, as shown in FIG.
- the partial areas R12, R13, R04 occupied by the partial light beams F12, F13, F14 correspond to the rectangular partial areas R02, R03, R04, respectively.
- a rectangular region R0 circumscribing the partial regions R01 to R04 on the arrangement surface of the spatial light modulator 3 corresponds to the region R1 occupied by the incident light beam F1 in the polarization unit 5.
- the postures of the plurality of mirror elements 3a belonging to the first mirror element group S01 located in the first partial region R01 are shown in FIG. ),
- the light passing through the first mirror element group S01 is controlled by the drive unit 3c so as to be guided to a pair of pupil regions R11a and R11b on the illumination pupil plane immediately after the micro fly's eye lens 7.
- the illumination pupil plane immediately after the micro fly's eye lens 7 is a plane optically conjugate with the pupil plane 4c of the relay optical system 4, and as a result, the optical Fourier of the arrangement plane of the spatial light modulator 3. It is a conversion surface.
- the pair of pupil regions R11a and R11b are regions that are spaced apart in the X direction with the optical axis AX interposed therebetween, for example.
- the posture of each of the plurality of mirror elements 3a belonging to the fourth mirror element group S04 located in the fourth partial region R04 is such that the light passing through the fourth mirror element group S04 is directed to a pair of pupil regions R14a and R14b on the illumination pupil plane. It is controlled by the drive part 3c so that it may be guide
- the pair of pupil regions R14a and R14b are regions that are spaced apart in the Z direction with the optical axis AX interposed therebetween, for example.
- Each of the plurality of mirror elements 3a belonging to the second mirror element group S02 located in the second partial region R02 and each of the plurality of mirror elements 3a belonging to the third mirror element group S03 located in the third partial region R03 Is driven by the drive unit 3c so that the light passing through the third and fourth mirror element groups S03 and S04 is guided to the pair of pupil regions R12a and R12b and the pair of pupil regions R13a and R13b on the illumination pupil plane. It is controlled.
- the pair of pupil regions R12a and R12b are regions that are spaced apart from each other in the direction of 45 degrees with the ⁇ X direction and the + Z direction with the optical axis AX interposed therebetween, for example.
- the pair of pupil regions R13a and R13b are regions that are spaced apart from each other in a direction that forms 45 degrees with the + X direction and the + Z direction with the optical axis AX interposed therebetween, for example.
- the spatial light modulator 3 applies, for example, eight circular substantial surface light sources P11a, P11b; P12a, to the illumination pupil immediately after the micro fly's eye lens 7 based on the parallel light flux having a rectangular cross section.
- An octupole pupil intensity distribution 21a composed of P12b; P13a, P13b; P14a, P14b is formed.
- the light that has passed through the first mirror element group S01 of the spatial light modulator 3 forms the surface light sources P11a and P11b that occupy the pupil regions R11a and R11b without passing through the optical rotation members 51 and 52 of the polarization unit 5. Since the light forming the pair of surface light sources P11a and P11b does not pass through the optical rotation members 51 and 52, it is Z-direction linearly polarized light (corresponding to Y-direction linearly polarized light in FIG. 7).
- the light that has passed through the fourth mirror element group S04 passes through only the optical rotation member 52 without passing through the optical rotation member 51, and forms surface light sources P14a and P14b that occupy the pupil regions R14a and R14b. Since the light that forms the pair of surface light sources P14a and P14b passes only through the optical rotation member 52, it is X-direction linearly polarized light (corresponding to X-direction linearly polarized light in FIG. 7).
- the light that has passed through the second mirror element group S02 passes through only the optical rotation member 51 without passing through the optical rotation member 52, and forms surface light sources P12a and P12b that occupy the pupil regions R12a and R12b. Since the light forming the pair of surface light sources P12a and P12b passes only through the optical rotatory member 51, +45 degrees oblique linearly polarized light having a polarization direction in the direction obtained by rotating the Z direction clockwise by +45 degrees on the paper surface of FIG. (Corresponding to +45 degree oblique direction linearly polarized light in FIG. 7).
- the light that has passed through the third mirror element group S03 forms surface light sources P13a and P13b occupying the pupil regions R13a and R13b through the optical rotation member 51 and the optical rotation member 52. Since the light forming the pair of surface light sources P13a and P13b passes through both the optical rotation members 51 and 52, it has a polarization direction in the direction obtained by rotating the Z direction clockwise by ⁇ 45 degrees on the paper surface of FIG. Degree linearly polarized light (corresponding to -45 degree obliquely linearly polarized light in FIG. 7).
- an octupole-shaped pupil intensity distribution 21 a in the circumferential direction is formed on the illumination pupil immediately after the micro fly's eye lens 7. Furthermore, the position of another illumination pupil optically conjugate with the illumination pupil immediately after the micro fly's eye lens 7, that is, the pupil position of the imaging optical system 10 and the pupil position of the projection optical system PL (the aperture stop AS is disposed). ), An octupole-shaped and circumferentially polarized pupil intensity distribution corresponding to the pupil intensity distribution 21a is also formed.
- the wafer W as the final irradiated surface is formed.
- the irradiated light becomes a polarization state mainly composed of s-polarized light.
- the s-polarized light is linearly polarized light having a polarization direction in a direction perpendicular to the incident surface (polarized light having an electric vector oscillating in a direction perpendicular to the incident surface).
- the incident surface is defined as a surface including the normal of the boundary surface at that point and the incident direction of light when the light reaches the boundary surface of the medium (irradiated surface: the surface of the wafer W).
- an octupole pupil intensity distribution 21b having a polarization distribution different from the octupole pupil intensity distribution 21a can be formed.
- the octupole pupil intensity distribution 21b is composed of, for example, eight circular substantially surface light sources P11a, P11b; P12a, P12b; P13a, P13b; P14a, P14b. It has a polarization distribution in which the polarization direction is rotated by 90 degrees compared to the pupil intensity distribution 21a.
- the posture of each of the plurality of mirror elements 3a belonging to the second mirror element group S02 located in the second partial region R02 is changed to the second mirror element.
- Each of the plurality of mirrors 3a belonging to the third mirror element group S03 is set so that the light having passed through the group S02 is guided to the pair of pupil regions R13a and R13b on the illumination pupil plane and located in the third partial region R03.
- the posture may be set so that the light passing through the third mirror element group S03 is guided to the pair of pupil regions R12a and R12b on the illumination pupil plane.
- the partial regions R11 and R12 occupied by the first and second partial light beams F11 and F12 are positioned so as to cover the optical rotation member 52, and X-direction linearly polarized light is incident on the polarization unit 5 (or the spatial light modulator 3).
- the pupil intensity distribution 21b shown in FIG. 9B can be formed.
- the technique for controlling the direction of polarization or the degree of polarization incident on the polarization unit 5 (or the spatial light modulator 3) refer to the polarization state switching unit disclosed in US Pat. No. 7,423,731. be able to.
- the spatial light modulator 3 having a large number of mirror elements 3a whose postures are individually controlled is used, the degree of freedom with respect to changing the shape (wide concept including size) of the pupil intensity distribution is high. .
- the pupil intensity in a ring-shaped and circumferentially polarized state on the illumination pupil immediately after the micro fly's eye lens 7 A distribution 22 can be formed.
- the light that has passed through the first mirror element group S01 is guided to a pair of arcuate pupil regions R21a and R21b that are spaced apart in the X direction across the optical axis AX on the illumination pupil plane, Substantially surface light sources P21a and P21b are formed.
- the light having passed through the fourth mirror element group S04 is guided to a pair of arcuate pupil regions R24a and R24b spaced in the Y direction across the optical axis AX to form substantial surface light sources P24a and P24b.
- the light that has passed through the second mirror element group S02 is guided to a pair of arcuate pupil regions R22a and R22b spaced apart in the direction of 45 degrees from the ⁇ X direction and the + Z direction across the optical axis AX.
- Surface light sources P22a and P22b are formed.
- the light that has passed through the third mirror element group S03 is guided to a pair of arcuate pupil regions R23a and R23b that are spaced by 45 degrees from the + X direction and the + Z direction across the optical axis AX.
- Surface light sources P23a and P23b are formed.
- the pupil regions R21a, R21b; R22a, R22b; R23a, R23b; R24a, R24b are arc-shaped regions obtained by dividing the annular region around the optical axis AX into eight in the circumferential direction.
- the pupil intensity distribution 22 in a ring-shaped and circumferentially polarized state composed of eight arc-shaped substantial surface light sources P21a, P21b; P22a, P22b; P23a, P23b; P24a, P24b is formed.
- the spatial light modulator 3 having a large number of mirror elements 3a whose postures are individually controlled is used, the degree of freedom regarding the change of the polarization state of the pupil intensity distribution is high.
- the illumination pupil immediately after the micro fly's eye lens 7 has an octupole and a pupil in a radially polarized state.
- An intensity distribution 23 can be formed.
- the light passing through the first mirror element group S01 forms the surface light sources P31a and P31b occupying the pupil regions R14a and R14b on the illumination pupil plane without passing through the optical rotation members 51 and 52. Since the light forming the pair of surface light sources P31a and P31b does not pass through the optical rotation members 51 and 52, it is Z-direction linearly polarized light.
- the light having passed through the fourth mirror element group S04 passes through only the optical rotation member 52 without passing through the optical rotation member 51, and forms surface light sources P34a and P34b occupying the pupil regions R11a and R11b. Since the light that forms the pair of surface light sources P34a and P34b passes only through the optical rotation member 52, it is X-direction linearly polarized light.
- the light that has passed through the second mirror element group S02 passes through only the optical rotation member 51 without passing through the optical rotation member 52, and forms surface light sources P32a and P32b that occupy the pupil regions R13a and R13b. Since the light forming the pair of surface light sources P13a and P13b passes only through the optical rotatory member 51, +45 degrees oblique linearly polarized light having a polarization direction in the direction obtained by rotating the Z direction clockwise by +45 degrees on the paper surface of FIG. It is.
- the light that has passed through the third mirror element group S03 forms surface light sources P33a and P33b that occupy the pupil regions R12a and R12b through the optical rotation member 51 and the optical rotation member 52. Since the light that forms the pair of surface light sources P33a and P33b passes through both the optical rotation members 51 and 52, it has a polarization direction in the direction obtained by rotating the Z direction clockwise by ⁇ 45 degrees on the paper surface of FIG. It is linearly polarized light with a diagonal direction.
- the pupil intensity distribution 23 in the form of octupole and radially polarized in the form of eight circular substantial surface light sources P31a, P31b; P32a, P32b; P33a, P33b; P34a, P34b is formed.
- the pupil intensity distribution in the radial direction in the annular direction is formed on the illumination pupil immediately after the micro fly's eye lens 7 simply by controlling the spatial light modulator 3 in accordance with a command from the control system CR. It can also be formed.
- the light irradiated on the wafer W as the final irradiated surface is a polarization state whose main component is p-polarization.
- p-polarized light is linearly polarized light having a polarization direction in a direction parallel to the incident surface defined as described above (polarized light whose electric vector is oscillating in a direction parallel to the incident surface). is there.
- the spatial light modulator 3 due to the action of the spatial light modulator 3, for example, among the eight surface light sources constituting the octupole pupil intensity distribution 21a, between the pair of surface light sources P11a and P11b, P12a and P12b, In the meantime, the light intensity can be relatively changed while maintaining the circumferential polarization state between P13a and P13b and between P14a and P14b.
- the action of the spatial light modulator 3 cannot relatively change the light intensity while maintaining the polarization state, for example, between the surface light source P11a and another surface light source other than the surface light source P11b.
- the intensity can be changed relatively. Specifically, when only the optical rotation member 51 is moved from the position shown in FIG. 6 to the + X direction side, the cross-sectional area of the first partial light beam F11 (the area of the partial region R11) decreases and the cross-sectional area of the second partial light beam F12. (Area of partial region R12) increases. As a result, the light intensity of the pair of surface light sources P11a and P11b can be decreased, and the light intensity of the pair of surface light sources P12a and P12b can be increased.
- the cross-sectional area of the second partial light beam F12 and the cross-sectional area of the fourth partial light beam F14 are reduced.
- the cross-sectional area of the partial light beam F11 and the cross-sectional area of the third partial light beam F13 increase.
- the light intensity of the pair of surface light sources P12a and P12b and the light intensity of the pair of surface light sources P14a and P14b are decreased, and the light intensity of the pair of surface light sources P11a and P11b and the light intensity of the pair of surface light sources P13a and P13b are reduced.
- the cross-sectional area of the second partial light beam F12 decreases and the cross-sectional area of the third partial light beam F13 increases.
- the light intensity of the pair of surface light sources P12a and P12b can be decreased, and the light intensity of the pair of surface light sources P13a and P13b can be increased.
- the cross-sectional area of the third partial light beam F13 decreases and the cross-sectional area of the second partial light beam F12 increases.
- the light intensity of the pair of surface light sources P13a and P13b can be reduced, and the light intensity of the pair of surface light sources P12a and P12b can be increased.
- the cross-sectional area of the first partial light beam F11, the cross-sectional area of the second partial light beam F12, and the third partial light beam F13 are cut off.
- the ratio between the area and the cross-sectional area of the fourth partial light beam F14 can be changed.
- the light intensity can be relatively changed between P14b while maintaining the circumferential polarization state.
- the annular pupil intensity distribution 22 and the octupole pupil intensity distribution 23 the light intensity can be relatively changed among a plurality of surface light sources while maintaining the polarization state.
- the polarization state of each surface light source constituting the pupil intensity distribution is set by the polarization unit 5 disposed at a position optically conjugate with the arrangement surface of the spatial light modulator 3.
- the polarization unit 5 disposed at a position optically conjugate with the arrangement surface of the spatial light modulator 3.
- the polarization unit 5 is arranged at a position defocused from a position optically conjugate with the arrangement surface of the spatial light modulator, the light traveling toward a specific surface light source passes through a polarization member (optical rotation member) that should pass therethrough.
- polarization member optical rotation member
- the polarization state of the specific surface light source deviates from the desired polarization state, and as a result, the pupil intensity It affects the polarization state of the distribution.
- the pupil intensity distribution is provided by the polarization unit 5 disposed at a position optically conjugate with the arrangement surface of the spatial light modulator 3 in the optical path closer to the irradiated surface than the spatial light modulator 3.
- the polarization state of each surface light source that constitutes is set.
- retardation a phase difference occurs between a pair of linearly polarized light components whose polarization directions are orthogonal to each other
- the subsequent optical system disposed in the illumination light path downstream (irradiated surface side) from the spatial light modulator 3. It is possible to reduce the occurrence of linearly polarized light in an oblique direction (a direction different from the X direction and the Z direction on the pupil plane (XZ plane) in FIG. 2) due to the elliptical polarization due to the phenomenon.
- Polarized light (obliquely polarized light) tends to be elliptically polarized.
- the illumination light path from the light source to the polarization unit 5 typically has longitudinal (Y direction in FIG. 2) linearly polarized light or lateral (X direction in FIG. 2) linearly polarized light that is not easily affected by retardation.
- Y direction in FIG. 2 linearly polarized light
- X direction in FIG. 2 linearly polarized light that is not easily affected by retardation.
- elliptical polarization of linearly polarized light in this optical path is less likely to occur.
- control system CR is, for example, a so-called workstation (or microcomputer) including a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM (Random Access Memory), and the like.
- the entire apparatus can be controlled in an integrated manner.
- the control system CR includes, for example, a storage device including a hard disk, an input device including a pointing device such as a keyboard and a mouse, a display device such as a CRT display (or liquid crystal display), a CD (compact disc), and a DVD (digital).
- a drive device for an information storage medium such as versatile disc, MO (magneto-optical disc), or FD (flexible disc) may be connected externally.
- a pupil intensity distribution (illumination light source shape) in which the imaging state of a projection image projected onto the wafer W by the projection optical system PL is optimal (for example, aberration or line width is within an allowable range) is stored in the storage device.
- Information corresponding to the illumination optical system, particularly control information of the mirror element of the spatial light modulator 3, and the like may be stored.
- the drive device may be set with an information storage medium (hereinafter referred to as a CD-ROM for convenience) in which a program for setting a pupil intensity distribution, which will be described later, is stored. These programs may be installed in the storage device.
- the control system CR reads these programs onto the memory as appropriate.
- the control system CR can control the spatial light modulator 3 and the polarization unit 5 by the following procedure, for example.
- the exposure apparatus of the embodiment forms a pupil intensity distribution 21c shown in FIG.
- the pupil intensity distribution 21c in FIG. 12 is composed of eight substantial surface light sources P11a and P11b; P12a and P12b; P13a and P13b; P14a and P14b, and the pair of surface light sources P11a and P11b is a Z-direction linearly polarized light and a pair.
- the surface light sources P14a and P14b are X-direction linearly polarized light, the pair of surface light sources P12a and P12b are -45 degree oblique linearly polarized light, and the pair of surface light sources P13a and P13b are +45 degree obliquely linearly polarized light.
- the surface light sources P12a, P12b and P13a, P13b have twice the light intensity as compared with the surface light sources P11a, P11b and P14a, P14b.
- the pupil intensity distribution can be expressed, for example, in a format (broadly defined bitmap format) in which the pupil plane is divided into a plurality of sections in a lattice shape and expressed as numerical values using the light intensity and polarization state of each section.
- a format concisely defined bitmap format
- N rays reflected by the individual mirror elements are appropriately combined to form M.
- a pupil intensity distribution (secondary light source) is formed (set) by appropriately superimposing N rays on M bright spots composed of M partitions. Is done.
- the controller CR reads information on the target pupil intensity distribution 21c from the storage device.
- how many light beams are required to form an intensity distribution for each polarization state as shown in FIGS. 13A to 13D, for example. Is calculated.
- 13A shows the pupil intensity distribution of the Z-direction linearly polarized light
- FIG. 13B shows the pupil intensity distribution of the X-direction linearly polarized light
- FIG. 13C shows the pupil intensity of the ⁇ 45 degree obliquely linearly polarized light
- FIG. 13D shows a pupil intensity distribution of +45 degrees obliquely linearly polarized light.
- the surface light sources P11a and P11b occupy 30 sections on the pupil plane, the surface light sources P14a and P14b occupy 12 sections on the pupil plane, and the surface light sources P12a and P12b and P13a and P13b respectively on the pupil plane. Occupies 4 sections.
- the surface light sources P12a, P12b and P13a, P13b are assumed to have twice the light intensity as compared with the surface light sources P11a, P11b, P14a, and P14b, one of the surface light sources P11a, P11b and P14a, P14b is used.
- the light from the 4096/116 35 mirror elements reaches the compartment. Further, light from 70 mirror elements reaches one section of the surface light sources P12a, P12b and P13a, P13b. It is assumed that the light from the 36 mirror elements that are the remainder of 4096/116 is guided outside the effective area of the optical system and does not contribute to the formation of the pupil intensity distribution.
- the control unit CR converts the plurality of mirror elements of the spatial light modulator 3 into the first mirror element group S01 composed of 2100 mirror elements, the second mirror element group S02 composed of 560 mirror elements, and the 560 elements. This is virtually divided into a third mirror element group S03 composed of mirror elements and a fourth mirror element group S04 composed of 840 mirror elements, and the partial areas R01 to R04 in which the respective mirror element groups S01 to S04 are located and these Partial areas R11 to R14 corresponding to the partial areas are set. Then, the controller CR drives the optical rotation members 51 and 52 of the polarization unit 5 to position the optical rotation member 51 in the partial regions R12 and R13 and position the optical rotation member 52 in the partial regions R13 and R14.
- the controller CR drives the mirror elements 3a of the first mirror element group S01 and the fourth mirror element group S04, and the light from the first mirror element group S01 is directed to the surface light sources P11a and P11b, and the fourth mirror. It sets so that the light from element part S04 may go to the surface light sources P14a and P14b. Then, the mirror elements 3a of the second mirror element group S02 and the third mirror element group S03 are driven so that the light from the second mirror element group S02 is directed to the surface light sources P12a and P12b and from the third mirror element group S03. It sets so that light may go to the surface light sources P13a and P13b.
- the pupil intensity distribution 21c of FIG. 12 can be formed by controlling the spatial light modulator 3 and the polarization unit 5 by the controller CR.
- the pair of optical rotatory members 51 and 52 is applied to the incident light flux F1 is shown.
- the optical rotation member 51 can be retracted from the optical path, and only the optical rotation member 52 can act on the incident light flux F1.
- the incident light beam F1 is divided into two partial light beams by the edge 52b of the optical rotation member 52.
- One partial light beam (corresponding to the partial light beam F11 + F12 in FIG. 6) is guided to the pupil regions R11a and R11b on the illumination pupil plane without passing through the optical rotation member 52, and is converted into the Z-direction linearly polarized light.
- Surface light sources P11a and P11b are formed.
- the other partial light beam (corresponding to the partial light beam F13 + F14 in FIG. 6) is guided to the pupil regions R14a and R14b on the illumination pupil plane through the optical rotation member 52 to form X-direction linearly polarized surface light sources P14a and P14b.
- a pupil intensity distribution 24 in the form of a quadrupole and circumferentially polarized light composed of, for example, four circular surface light sources P11a and P11b; P14a and P14b is formed on the illumination pupil immediately after the micro fly's eye lens 7. Is done.
- the present invention is not limited to this, and the center pole P1c is added to the octupole pupil intensity distribution 21a as shown in FIG. 15 simply by controlling the spatial light modulator 3 in accordance with a command from the control system CR.
- the nine-pole pupil intensity distribution 25 thus formed can be formed.
- a part of the first partial light beam F11, a part of the second partial light beam F12, a part of the third partial light beam F13, and a part of the fourth partial light beam F14 are, for example, on the illumination pupil plane. Is led to a circular pupil region R1c centered on the optical axis AX, thereby forming a substantially non-polarized surface light source P1c in which four linearly polarized light components are mixed.
- a 9-pole pupil intensity distribution 25 can be formed by attaching to the polarization unit 5 a non-polarizing element 53 that can be inserted into and removed from the illumination optical path.
- the non-polarizing element 53 can be inserted and removed at a position optically conjugate with the arrangement surface of the spatial light modulator 3 or in the vicinity thereof.
- the non-polarizing element 53 is made of, for example, a birefringent material such as quartz in order from the light incident side, and has a first deflection prism (wedge plate) having a thickness that varies depending on the light passing position, and quartz glass or the like.
- It can be composed of a second declination prism made of a non-birefringent material and functioning as a correction plate for returning the light beam bent by the declination action of the first declination prism.
- a depolarizer disclosed in US Pat. No. 7,423,731 can also be referred to.
- the incident light beam F1 the light beam on the + X direction side from the edge 51b of the optical rotatory member 51 and the first partial light beam F11 directed to the relay optical system 6 without passing through the non-polarization element 53
- the light is split into a fifth partial light beam F15 that passes through the polarizing element 53 and travels toward the relay optical system 6.
- the first partial light beam F11 is guided to the pupil regions R11a and R11b shown in FIG. 15 without passing through the optical rotation members 51 and 52 and the non-polarizing element 53, and forms surface light sources P11a and P11b of Z-direction linearly polarized light.
- the fifth partial light beam F15 is guided to the pupil region R1c shown in FIG. 15 only through the non-polarization element 53 without passing through the optical rotation members 51 and 52, and forms a non-polarized surface light source P1c.
- the optical rotation member 51 is retracted from the optical path and the optical rotation member 52 and the non-polarization element 53 are applied to the incident light flux F ⁇ b> 1, thereby producing a quadrupole pupil intensity distribution as shown in FIG. 17. It is also possible to form a pentapolar pupil intensity distribution 26 in which the center pole P1c in the non-polarized state is added to 24.
- the polarization unit 5 includes a pair of optical rotation members 51 and 52 that have a pair of edges 51a and 51b; 52a and 52b extending in the Y direction and are movable in the X direction.
- the ratio of the cross-sectional area of the first partial light beam F11, the cross-sectional area of the second partial light beam F12, the cross-sectional area of the third partial light beam F13, and the cross-sectional area of the fourth partial light beam F14 can be changed.
- the sectional areas of the partial light beams cannot be controlled independently of each other.
- FIG. 18 shows an example in which the cross-sectional areas of the partial light beams are controlled independently from each other using the polarization unit 5A including a pair of optical rotation members 51A and 52A having a trapezoidal outer shape.
- the optical rotation member 51A includes a first edge 51Aa extending in a direction obliquely intersecting with the Y direction in which one side of the rectangular cross section of the incident light beam F1 extends, and obliquely intersecting the Y direction. And a second edge 51Ab extending in a direction different from the direction in which the edge 51Aa extends.
- an optical rotation member 52A disposed adjacent to the exit side of the optical rotation member 51A has a first edge 52Aa extending in a direction obliquely intersecting the Y direction, and a direction extending obliquely intersecting the Y direction and the first edge 52Aa extending.
- a second edge 52Ab extending in a different direction.
- the optical rotatory members 51A and 52A can move in the X direction and the Y direction, and can move two-dimensionally along the cross section (XY plane) of the incident light beam F1.
- an optical rotation member 51A; 52A having edges 51Aa, 51Ab; 52Aa, 52Ab extending in a direction obliquely intersecting with the Y direction in which one side of the cross section of the incident light beam F1 extends along the cross section of the incident light beam F1.
- the cross-sectional area of the first partial light beam F11, the cross-sectional area of the second partial light beam F12, the cross-sectional area of the third partial light beam F13, and the cross-sectional area of the fourth partial light beam F14 are made independent of each other. Can be controlled.
- the degree of freedom regarding the relative change in the light intensity of each surface light source constituting the octupole pupil intensity distribution 21a can be further improved. According to this configuration, even when the light intensity distribution of the incident light beam F1 is non-uniform and changes over time, for example, the relative relationship of the light intensity of each surface light source constituting the octupole pupil intensity distribution 21a. Can be maintained in a desired relationship.
- FIG. 18 shows an example in which both of the pair of optical rotation members 51A and 52A constituting the polarization unit 5A have a trapezoidal outer shape.
- the present invention is not limited to this, and various forms are possible for the outer shape of the pair of optical rotation members constituting the polarization unit.
- an optical rotation member 52B instead of the optical rotation member 52A of FIG. 18, an optical rotation member 52B having a first edge 52Ba extending in the Y direction and a second edge 52Bb extending obliquely intersecting the Y direction is provided.
- a modification using the polarizing unit 5B is also possible.
- FIG. 20 instead of the optical rotation member 51A of FIG. 19, an optical rotation member 51B having a first edge 51Ba extending in the Y direction and a second edge 51Bb extending obliquely intersecting the Y direction is provided.
- a modification using the polarizing unit 5C is also possible.
- the parallel light flux along the optical axis AX is incident on the polarization unit 5, but actually it is incident obliquely with respect to the optical axis AX (with respect to the optical rotation members 51 and 52).
- the linearly polarized light perpendicularly incident on the optical rotatory member 51 or 52 formed of quartz changes only in the polarization direction while maintaining the linearly polarized state, but the linearly polarized light obliquely incident on the optical rotatory member 51 or 52 is obtained. Is elliptically polarized and emitted. This is because light obliquely incident on the optical rotatory member 51 or 52 travels obliquely with respect to the crystal optical axis of the crystal, and thus a phase difference is given.
- a first optical rotatory member 52R formed of a right-handed optically rotatory material (right crystal) is disposed adjacent to the emission side of the first optical rotatory member 52R.
- a configuration example using an optical rotation member 52C provided with a second optical rotation member 52L formed of a left-handed optical rotation material (left crystal) is also possible.
- the vertically polarized light perpendicularly incident on the first optical rotation member 52R is converted into obliquely polarized light, and then converted into laterally polarized light by the second optical rotation member 52L and emitted.
- the vertically polarized light obliquely incident on the first optical rotation member 52R is converted into elliptically polarized light, and then converted into laterally polarized light by the second optical rotation member 52L and emitted. That is, the light obliquely incident on the optical rotatory member 52C is also emitted from the optical rotatory member 52C in the same polarization state as the vertically incident light.
- the pupil of the relay optical system 4 that is an optical Fourier transform surface of the array surface of the spatial light modulator 3 It is also possible to arrange the phase difference providing member 11 that gives different phase differences to the incident light according to the incident position at or near the surface 4c.
- the incident position on the phase difference imparting member 11 is converted into the incident angle on the polarization unit 5 by the action of the rear lens group 4 b of the relay optical system 4.
- the amount of elliptical polarization changes according to the incident angle to the polarizing members 51 and 52.
- a phase difference that cancels (or compensates for) a change in the amount of elliptical polarization according to the incident angle in the polarization unit 5 is given in advance by the phase difference imparting member 11, so The incident light is also emitted from the polarization unit 5 in the same polarization state as the vertically incident light.
- a configuration in which the phase difference providing member 11 is arranged on the optical Fourier transform surface of the array surface of the spatial light modulator 3 in the optical path on the rear side of the polarization unit 5 is also possible.
- FIGS. 23A to 23C for example, instead of the optical rotation member 52, a first direction (here, the Y direction) in a plane (in the XY plane) orthogonal to the optical axis AX of the illumination optical system. ) And a half-wave plate 52D2 having an optical axis in the second direction in the plane (XY plane) orthogonal to the optical axis AX of the illumination optical system.
- a configuration for obtaining the polarization rotator 52D is also possible.
- FIG. 23B is an XY plan view of the half-wave plate 52D1
- FIG. 23C is an XY plan view of the half-wave plate 52D2.
- the second direction which is the direction of the optical axis of the half-wave plate 52D2 is an orientation rotated by an angle ⁇ with respect to the first direction.
- the operation of the half-wave plates 52D1 and 52D2 will be described using a Mueller matrix.
- the Mueller matrix is disclosed in, for example, the document "Edited By Michael Bass et al.: HANDBOOK OF OPTICS, Chapter 22: Polarimetry, pp. Yes.
- the Mueller matrix representing the polarization action of the half-wave plate 52D1 is represented by the following expression (1)
- the Mueller matrix representing the polarization action of the half-wave plate 52D2 is represented by the following expression (2).
- the Mueller matrix representing the polarization action of the optical element in which the half-wave plates 52D1 and 52D2 are combined is expressed by the following equation (3).
- a wave plate whose optical axis is oriented in a plane substantially orthogonal to the light incident direction is used instead of an optical rotator whose optical axis is oriented in the light incident direction. It is possible to secure a wide allowable incident angle range that can maintain the polarization modulation. Therefore, even if the luminous flux incident on the polarization unit 5 (polarization rotator 52D) has an angular distribution, it is possible to impart a polarization rotation action to all the light rays within the angular distribution without changing the ellipticity. As a result, it is easy to set each surface light source constituting the pupil intensity distribution to a desired polarization state.
- the optical rotatory members 51 and 52 adjacent to each other are arranged at positions optically conjugate with the arrangement surface of the spatial light modulator 3, but in reality, the pair of optical rotatory members 51 and 52 are arranged. They cannot be placed in the same position. Therefore, specifically, as shown in FIG. 24, a pair of optical rotation members 51 and 52 can be arranged with a position 3e optically conjugate with the array surface 3d of the spatial light modulator 3 interposed therebetween.
- the conjugate position 3e is defined as a point where the array surface 3d, the optically conjugate surface 3f, and the optical axis AX of the relay optical system 4 intersect.
- the surface 3f optically conjugate with the array surface 3d is inclined with respect to the surface orthogonal to the optical axis AX, like the array surface 3d.
- the inclination of the surface 3f with respect to the surface orthogonal to the optical axis AX decreases as the absolute value of the imaging magnification of the relay optical system 4 increases.
- the optical rotation member 51 is disposed along a surface PLN1 orthogonal to the optical axis AX at a position slightly ahead of the position 3e, and the optical rotation member 52 is a surface orthogonal to the optical axis AX at a position slightly rearward of the position 3e. Arranged along PLN2.
- the pair of optical rotation members 51 and 52 may be moved along the planes PLN1 and PLN2, respectively.
- a plane 3f conjugate with the array plane 3d of the spatial light modulator 3 You may move along a parallel surface.
- a pair of optical rotation members 51 and 52 are arranged along a plane parallel to the plane 3f conjugate with the array plane 3d of the spatial light modulator 3,
- the pair of optical rotation members 51 and 52 can be moved along a plane parallel to the conjugate plane 3f.
- the pair of optical rotation members 51 and 52 may be provided so as to be adjacent to each other in the direction along the illumination optical path and so as to sandwich the conjugate surface 3f.
- the pair of optical rotation members 51 and 52 constituting the polarization unit 5 are arranged adjacent to each other.
- the present invention is not limited to this, and a configuration in which a relay optical system is disposed between the optical rotation members 51 and 52 so that the optical rotation member 51 and the optical rotation member 52 are optically conjugate with each other is also possible.
- the optical rotation members 51 and 52 are made of quartz.
- the present invention is not limited to this, and the optical rotatory member can be formed using other appropriate optical material having optical rotatory power.
- the polarization unit 5 is composed of a pair of optical rotation members (optical elements) 51 and 52 formed of an optical material having optical activity.
- the present invention is not limited to this, and various forms are possible for the outer shape, number, arrangement, optical characteristics, and the like of the optical elements constituting the polarization unit.
- a polarization unit is configured using a wave plate that changes incident light into light of a predetermined polarization state, or a polarization unit is configured using a polarizer that selects and emits light of a predetermined polarization state from incident light. It is possible to do.
- a polarizing unit is configured using a polarizer, for example, light in a non-polarized state is incident.
- the polarizing unit 5D has the same outer shape as the optical rotatory member 51 of the polarizing unit 5 and is arranged in the same manner as the optical rotatory member 51, and the same as the optical rotatory member 52.
- a half-wave plate 55 having an outer shape and arranged in the same manner as the optical rotation member 52 is provided. That is, the half-wave plates 54 and 55 have a pair of edges 54a and 54b; 55a and 55b extending in the Y direction.
- the half-wave plate 54 has an optical axis in a direction obtained by rotating the Y direction clockwise by +22.5 degrees in the standard state, and thus has a polarization conversion characteristic similar to that of the optical rotation member 51.
- the half-wave plate 55 In its standard state, has an optical axis in a direction obtained by rotating the Y direction clockwise by +45 degrees, and thus has a polarization conversion characteristic similar to that of the optical rotation member 52.
- the half-wave plates 54 and 55 can move in the X direction and the Y direction, and as a result, can move two-dimensionally along the cross section (XY plane) of the incident light beam F1. Furthermore, the half-wave plates 54 and 55 can be rotated along the cross section (XY plane) of the incident light beam F1, and thus the direction of the optical axis can be adjusted.
- the polarization unit 5D configured using the pair of wave plates 54 and 55 exhibits the same function as the polarization unit 5 including the pair of optical rotation members 51 and 52.
- the polarization of each surface light source constituting the octupole pupil intensity distribution 21a is changed by changing the direction of the optical axis of the half-wave plates 54 and 55. The state can be adjusted.
- the polarization unit 5E has the same outer shape as the optical rotation member 51A of the polarization unit 5A and is arranged in the same manner as the optical rotation member 51A, and the same as the optical rotation member 52A.
- a half-wave plate 55A having an outer shape and arranged in the same manner as the optical rotation member 52A is provided. That is, the half-wave plates 54A and 55A have edges 54Aa and 54Ab; 55Aa and 55Ab extending in a direction obliquely intersecting the Y direction in which one side of the cross section of the incident light beam F1 extends.
- the half-wave plate 54A has an optical axis in a direction obtained by rotating the Y direction clockwise by +22.5 degrees in the standard state, and thus has a polarization conversion characteristic similar to that of the optical rotation member 51A.
- the half-wave plate 55A In its standard state, has an optical axis in a direction obtained by rotating the Y direction clockwise by +45 degrees, and thus has a polarization conversion characteristic similar to that of the optical rotation member 52A.
- the half-wave plates 54A and 55A can move in the X direction and the Y direction, and can move two-dimensionally along the cross section (XY plane) of the incident light beam F1. Furthermore, the half-wave plates 54A and 55A can rotate along the cross section (XY plane) of the incident light beam F1, and as a result, the direction of the optical axis can be adjusted.
- the polarizing unit 5E configured using the pair of wave plates 54A and 55A exhibits the same function as the polarizing unit 5A including the pair of optical rotation members 51A and 52A.
- the polarization unit 5E unlike the polarization unit 5A, by changing the direction of the optical axes of the half-wave plates 54A and 55A, for example, the polarization of each surface light source constituting the octupole-shaped pupil intensity distribution 21a. The state can be adjusted.
- the polarization unit 5 is arranged at a position conjugate with the arrangement surface of the plurality of mirror elements 3 a of the spatial light modulator 3 in the optical path closer to the irradiated surface than the spatial light modulator 3. .
- the present invention is not limited to this, and the polarization unit 5 is disposed at a position conjugate with the arrangement surface of the plurality of mirror elements 3 a of the spatial light modulator 3 in the optical path on the light source side of the spatial light modulator 3. You can also
- FIG. 29 shows an optical path from the light amount uniformizing element 12 that receives light from the light source 1 to the pupil plane 4c of the relay optical system 4 that is an optical Fourier transform plane of the array plane of the spatial light modulator 3.
- FIG. 2 can be referred to for the configuration other than the optical path shown in FIG. Members having the same functions as those of the above-described embodiment and modification are given the same reference numerals.
- light from a light source enters the light quantity uniformizing element 12 and is divided into wavefronts.
- Each light beam that has been wavefront-divided by the light quantity uniformizing element 12 is emitted from the light quantity uniformizing element 12 at a predetermined divergence angle, and passes through a condenser optical system 13 having a front focal position on the arrangement surface 12a of the light quantity uniformizing element 12.
- the rear focal plane 12b of the condenser optical system 12 is illuminated in a superimposed manner.
- An illumination field having a substantially uniform illuminance distribution is formed on the surface 12b, and an image of the illumination field is formed on the spatial light modulator 3 by the relay optical system 40.
- the relay optical system 40 optically conjugates the surface 12b and the spatial light modulator 3.
- the relay optical system 40 forms a position 3e conjugate with the array surface 3d of the plurality of mirror elements 3a of the spatial light modulator 3 in the optical path on the light source side of the spatial light modulator 3.
- the position 3e optically conjugate with the arrangement surface 3d of the spatial light modulator 3 is located on the surface 12b where the illumination field is formed by the light quantity uniformizing element 12 and the condenser optical system 13.
- a wavefront splitting element such as a refractive array element such as a fly-eye lens, a reflective array element, or a diffractive array element can be used.
- the pair of optical rotation members 51 and 52 of the polarization unit 5 are arranged at a position 3e conjugate with the arrangement surface 3d of the spatial light modulator 3, and a plurality of mirror elements 3a of the spatial light modulator 3 are provided.
- a light beam having a different polarization state can be supplied to each of the mirror element groups.
- the polarization state of the light beam supplied to each mirror element group is each made into a desired polarization state. Therefore, the polarization state of each surface light source can be set to a desired polarization state. Also in the example of FIG.
- the polarization unit 5 is disposed at a position conjugate with the arrangement surface of the plurality of mirror elements 3 a of the spatial light modulator 3, but the polarization unit 5 and the spatial light modulator 3 It is also possible to use in combination with a polarization unit 14 that is arranged on the optical Fourier transform surface of the array surface of the plurality of mirror elements 3a and converts incident linearly polarized light into circumferential linearly polarized light or radial linearly polarized light. .
- a description will be given with reference to FIGS.
- FIG. 30 shows an optical path from the light source 1 to the micro fly's eye lens 7, and FIG. 2 can be referred to for a configuration other than the optical path shown in FIG.
- Members having the same functions as those of the above-described embodiment and modification are given the same reference numerals.
- 30 is different from the example shown in FIG. 2 in that the incident linearly polarized light is circulated at the position of the pupil plane 4c of the relay optical system 4 which is the optical Fourier transform plane of the array plane of the spatial light modulator 3.
- FIG. This is a point in which a polarization unit 14 for converting to directional linearly polarized light or radial linearly polarized light is disposed.
- the polarization unit 14 has a circular (or annular) outer shape centered on the optical axis AX, and is obtained by dividing the light into eight parts along the circumferential direction of the circle. It has divided areas 14a to 14h.
- the polarizing unit 14 is made of a crystal material that is an optical material having optical activity, such as quartz. In a state where the polarization unit 14 is positioned in the illumination optical path, the incident surface and the exit surface of the polarization unit 14 are orthogonal to the optical axis AX, and the crystal optical axis thereof is substantially coincident with the direction of the optical axis AX (that is, incident light And substantially coincides with the Z direction, which is the traveling direction).
- the thicknesses of the divided regions 14a and 14e in the optical axis AX direction are set such that, for example, when linearly polarized light having a polarization direction in the Y direction is incident on the polarization unit 14, the Y direction is +90 degrees +180 around the Z axis. It is set to emit linearly polarized light having a polarization direction in the direction rotated by xn degrees (n is an integer), that is, the X direction.
- the thickness of the divided regions 14b and 14f in the optical axis AX direction is set such that, for example, when linearly polarized light having a polarization direction in the Y direction is incident on the polarization unit 14, the Y direction is +135 degrees + 180 ⁇ around the Z axis. It is set to emit linearly polarized light having a polarization direction in a direction rotated by n degrees (n is an integer), that is, a direction in which the Y direction is rotated by ⁇ 45 degrees around the Z axis.
- the thickness of the divided regions 14c and 14g in the direction of the optical axis AX is, for example, when linearly polarized light having a polarization direction in the Y direction is incident on the polarization unit 14, +180 degrees + 180 ⁇ n degrees in the Y direction around the Z axis. It is set to emit linearly polarized light having a polarization direction in the direction rotated by (n is an integer), that is, the Y direction.
- the thicknesses of the divided regions 14d and 14h in the direction of the optical axis AX are, for example, when the linearly polarized light having the polarization direction in the Y direction is incident on the polarization unit 14, +45 degrees + 180 ⁇ It is set to emit linearly polarized light having a polarization direction in a direction rotated by n degrees (n is an integer), that is, a direction in which the Y direction is rotated by +45 degrees around the Z axis.
- the polarization direction of the light reaching the spatial light modulator 3 from the light source 1 is linearly polarized light having the polarization direction in the Y direction, and the inclination of the plurality of mirror elements 3a of the spatial light modulator 3 is the pupil.
- the polarization state of the light intensity distribution via the polarization unit 14 is a circumferential linear polarization state centered on the optical axis AX.
- the illuminating pupil plane immediately after the micro fly's eye lens 7 also has eight poles in the circumferential linear polarization state. A light intensity distribution is formed.
- the polarization unit 5 is an optical rotation member that rotates the polarization direction of incident linearly polarized light by +90 degrees + 180 ⁇ n degrees (n is an integer) about the optical axis.
- the surface light sources P12a and 12b; P13a and P13b are formed in the octupole-shaped light intensity distribution formed on the illumination pupil plane immediately after the micro fly's eye lens 7.
- surface light sources P11a, P11b; , P14b is a linearly polarized light in the circumferential direction, and surface light sources P12a, 12b; P13a, P13b are polarized in a radial direction linearly polarized light.
- the polarization unit 14 that forms the circumferential linearly polarized light on the illumination pupil plane and the polarization unit 5 that is arranged at a position conjugate with the array plane of the plurality of mirror elements 3a of the spatial light modulator 3 are combined.
- the polarization state can be changed with a high degree of freedom.
- FIGS. 30 and 31 can be combined with any one of the above-described embodiment and modification examples.
- FIG. 32 the embodiment shown in FIG. 2 and the modification shown in FIG. 29 are combined and the conjugate position in the light path on the irradiated surface side of the spatial light modulator 3 and the light source side are combined.
- a configuration in which the polarization unit is arranged at both the conjugate position in the optical path is also possible.
- the spatial light modulator having a plurality of mirror elements that are two-dimensionally arranged and individually controlled the directions (angle: inclination) of the plurality of two-dimensionally arranged reflecting surfaces are individually set.
- a controllable spatial light modulator is used.
- the present invention is not limited to this.
- a spatial light modulator that can individually control the height (position) of a plurality of two-dimensionally arranged reflecting surfaces can be used.
- the spatial light modulator disclosed in FIG. 1d of US Pat. No. 5,312,513 and US Pat. No. 6,885,493 can be used.
- spatial light modulators by forming a two-dimensional height distribution, an action similar to that of the diffractive surface can be given to incident light.
- the spatial light modulator having a plurality of reflection surfaces arranged two-dimensionally as described above is modified in accordance with the disclosure of, for example, US Pat. No. 6,891,655 and US Patent Publication No. 2005/0095749. May be.
- the spatial light modulator 3 includes a plurality of mirror elements 3a that are two-dimensionally arranged in a predetermined plane.
- the present invention is not limited to this, and the spatial light modulator 3 is arranged in a predetermined plane and individually. It is also possible to use a transmissive spatial light modulator including a plurality of transmissive optical elements controlled by the above.
- variable pattern forming apparatus that forms a predetermined pattern based on predetermined electronic data can be used instead of a mask.
- a spatial light modulation element including a plurality of reflection elements driven based on predetermined electronic data can be used.
- An exposure apparatus using a spatial light modulator is disclosed, for example, in US Patent Publication No. 2007/0296936.
- a transmissive spatial light modulator may be used, or a self-luminous image display element may be used.
- the optical rotation members 51 and 52 rotate the polarization direction of the incident linearly polarized light by 45 degrees and 90 degrees, respectively, but the rotation angle of the polarization direction is limited to 45 degrees and 90 degrees. Not.
- the optical rotation member 51 only needs to rotate the polarization direction of the incident linearly polarized light by 45 degrees + 180 ⁇ n degrees (n is an integer), and may be, for example, 225 degrees, 405 degrees, or the like.
- the optical rotatory member 52 only needs to rotate the polarization direction of incident linearly polarized light by 90 degrees + 180 ⁇ n degrees (n is an integer), and may be, for example, 270 degrees, 450 degrees, or the like.
- the optical rotatory member 51 only needs to rotate the polarization direction of the incident linearly polarized light by j degrees + 180 ⁇ n degrees (j is a real number, n is an integer), and the optical rotatory member 52 is the polarization of the incident linearly polarized light. It is sufficient if the direction is rotated by k degrees + 180 ⁇ n degrees (k is a real number, n is an integer).
- the number of optical rotation members or phase members (typically wave plates) as movable polarization rotation members constituting the polarization unit 5 may be any number.
- the polarization unit 5F includes three polarization rotation members 51F, 52F, and 56F that can move in the X direction in the drawing.
- each of the polarization rotation members 51F, 52F, and 56F rotates the polarization direction of the incident linearly polarized light by 135 degrees.
- These polarization rotation members 51F, 52F, and 56F may be constituted by an optical rotation member or a wave plate, or may be the wave plate shown in FIG.
- FIG. 33A when the linearly polarized light incident on the polarization unit 5F is Y-direction linearly polarized light, the first partial light beam F11 does not pass through any of the polarization rotation members 51F, 52F, and 56F, and the polarization unit.
- the second partial light beam F12 passes through the polarization rotation member 51F and becomes +135 degrees obliquely linearly polarized light immediately after the polarization unit 5F.
- the third partial light beam F13 passes through the polarization rotation members 51F and 52F and becomes +270 degree direction linearly polarized light (X direction linearly polarized light) immediately after the polarization unit 5F.
- the fourth partial light beam F14 passes through the polarization rotation members 51F, 52F, and 56F, and becomes +405 degrees obliquely linearly polarized light immediately after the polarization unit 5F.
- the polarization unit 5G is composed of three polarization rotation members 51G, 52G, and 56G that can move in the X direction in the figure.
- each of the polarization rotation members 51G and 56G rotates the polarization direction of the incident linearly polarized light by 90 degrees
- the polarization rotation member 52G rotates the polarization direction of the incident linearly polarized light by 135 degrees.
- These polarization rotation members 51G, 52G, and 56G may be constituted by an optical rotation member or a wave plate, or may be the wave plate shown in FIG. In FIG.
- the first partial light beam F11 does not pass through any of the polarization rotation members 51G, 52G, and 56G, and the polarization unit. It remains Y-direction linearly polarized light immediately after 5G.
- the second partial light beam F12 passes through the polarization rotation member 51G and becomes linearly polarized in the X direction immediately after the polarization unit 5G.
- the third partial light beam F13 passes through the polarization rotation members 51G and 52G and becomes +225 degree obliquely linearly polarized light immediately after the polarization unit 5G.
- the fourth partial light beam F14 passes through the polarization rotation members 51G, 52G, and 56G and becomes +315 degrees obliquely linearly polarized light immediately after the polarization unit 5G.
- the polarization rotation members 51G, 52G, and 56G may be inserted into the illumination optical path.
- a polarization rotating member 57 that rotates the polarization direction of the incident linearly polarized light by 22.5 degrees + 180 degrees ⁇ n degrees (n is an integer) is provided. It may be provided.
- members having the same functions as those in the configuration of FIG. 34 are provided.
- the linearly polarized light incident on the polarization unit 5G is Y-direction linearly polarized light
- the fifth partial light beam F15 passes through the polarization rotating member 57 and is polarized. Immediately after the unit 5G, it becomes +22.5 degrees obliquely linearly polarized light.
- the sixth partial light beam F16 passes through the polarization rotation members 51G and 57, and becomes +112.5 degrees obliquely linearly polarized light immediately after the polarization unit 5G.
- the seventh partial light beam F17 passes through the polarization rotation members 51G, 52G, and 57 and becomes +247.5 degrees obliquely linearly polarized light immediately after the polarization unit 5G.
- the eighth partial light beam F18 passes through the polarization rotation members 51G, 52G, 56G, and 57, and becomes +337.5 degrees obliquely linearly polarized light immediately after the polarization unit 5G.
- the polarization rotation member 57 can move in the direction (Y direction) orthogonal to the movement direction (X direction) of the polarization rotation members 51G, 52G, and 56G.
- the sectional area ratio between the partial light beam F11 and the fifth partial light beam F15, the sectional area ratio between the second partial light beam F12 and the sixth partial light beam F16, the sectional area ratio between the third partial light beam F13 and the seventh partial light beam F17, The cross-sectional area ratio between the fourth partial light beam F14 and the eighth partial light beam F18 can be changed.
- the polarization rotating member 57 may also be moved in the X direction in the figure.
- the illumination optical path on the irradiated surface side of the polarizing unit is for reducing the influence of the retardation caused by the optical system on the irradiated surface side of the polarizing unit.
- a phase modulation member may be arranged.
- FIG. 35 is a view showing an example in which such a phase modulation member 15 is arranged in the illumination optical path on the irradiated surface side with respect to the polarization unit 5, and the same members as those having the same functions as those in the embodiment of FIG.
- symbol is attached
- the phase modulation member 15 is a wave plate extending over the entire cross section of the illumination optical path and having a uniform thickness, and its optical axis is set in the Y direction (or X direction).
- the optical axis of the wave plate constituting the phase modulation member 15 is the polarization direction of p-polarized light or s-polarized light with respect to the reflecting surfaces of the plane reflecting mirrors MR2 and MR3 in the optical system on the irradiated surface side with respect to the polarizing unit 5. Is set to a direction corresponding to the polarization direction.
- a subsequent optical system an optical system disposed between the polarization unit 5 and the reticle R or the wafer W, particularly a plane
- the longitudinally polarized light (Y-direction linearly polarized light) and the laterally polarized light (X-direction linearly polarized light) from the polarization unit 5 are hardly subjected to phase modulation by the phase modulation member 15 and from the phase modulation member 15.
- the polarization direction of the light flux is substantially maintained.
- the obliquely polarized light beam from the polarization unit 5 is subjected to phase modulation by the phase modulation member 15, and becomes an elliptically polarized light beam that substantially cancels the elliptical polarization of the obliquely polarized light by the subsequent optical system.
- the degree of polarization of the elliptically polarized light beam depends on the thickness of the wave plate constituting the phase modulation member 15.
- phase modulation member 15 is not limited to the position immediately after the polarization unit 5, and can be disposed at any position as long as the illumination light path is closer to the irradiated surface than the polarization unit 5. Note that when the illumination is performed using only the X-direction linearly polarized light and the Y-direction linearly polarized light, the phase modulation member may be retracted from the illumination optical path.
- the exposure apparatus of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done.
- various optical systems are adjusted to achieve optical accuracy
- various mechanical systems are adjusted to achieve mechanical accuracy
- various electrical systems are Adjustments are made to achieve electrical accuracy.
- the assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus.
- the exposure apparatus may be manufactured in a clean room where the temperature, cleanliness, etc. are controlled.
- FIG. 36 is a flowchart showing a manufacturing process of a semiconductor device.
- a metal film is vapor-deposited on a wafer W to be a semiconductor device substrate (step S40), and a photoresist, which is a photosensitive material, is applied on the vapor-deposited metal film.
- Step S42 the pattern formed on the mask (reticle) M is transferred to each shot area on the wafer W (step S44: exposure process), and the wafer W after the transfer is completed.
- Development that is, development of the photoresist to which the pattern has been transferred (step S46: development process).
- step S48 processing step.
- the resist pattern is a photoresist layer in which unevenness having a shape corresponding to the pattern transferred by the projection exposure apparatus of the above-described embodiment is generated, and the recess penetrates the photoresist layer. It is.
- the surface of the wafer W is processed through this resist pattern.
- the processing performed in step S48 includes, for example, at least one of etching of the surface of the wafer W or film formation of a metal film or the like.
- the projection exposure apparatus of the above-described embodiment performs pattern transfer using the wafer W coated with the photoresist as the photosensitive substrate, that is, the plate P.
- FIG. 37 is a flowchart showing a manufacturing process of a liquid crystal device such as a liquid crystal display element.
- a pattern forming process step S50
- a color filter forming process step S52
- a cell assembling process step S54
- a module assembling process step S56
- a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with a photoresist as the plate P using the projection exposure apparatus of the above-described embodiment.
- the pattern forming step includes an exposure step of transferring the pattern to the photoresist layer using the projection exposure apparatus of the above-described embodiment, and development of the plate P on which the pattern is transferred, that is, development of the photoresist layer on the glass substrate. And a developing step for generating a photoresist layer having a shape corresponding to the pattern, and a processing step for processing the surface of the glass substrate through the developed photoresist layer.
- a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix or three R, G, and B
- a color filter is formed by arranging a plurality of stripe filter sets in the horizontal scanning direction.
- a liquid crystal panel liquid crystal cell
- a liquid crystal panel is assembled using the glass substrate on which the predetermined pattern is formed in step S50 and the color filter formed in step S52.
- a liquid crystal panel is formed by injecting liquid crystal between a glass substrate and a color filter.
- various components such as an electric circuit and a backlight for performing the display operation of the liquid crystal panel are attached to the liquid crystal panel assembled in step S54.
- the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor device, for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display, It can also be widely applied to an exposure apparatus for manufacturing various devices such as an image sensor (CCD or the like), a micromachine, a thin film magnetic head, and a DNA chip. Furthermore, the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithography process.
- an exposure apparatus for manufacturing a semiconductor device for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display
- various devices such as an image sensor (CCD or the like), a micromachine, a thin film magnetic head, and a DNA chip.
- the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask,
- ArF excimer laser light (wavelength: 193 nm) or KrF excimer laser light (wavelength: 248 nm) is used as the exposure light.
- the present invention is not limited to this, and other appropriate laser light sources are used.
- F 2 laser light source that supplies laser light with a wavelength of 157 nm
- pulse laser light source such as Ar 2 laser (output wavelength 126 nm), Kr 2 laser (output wavelength 146 nm), g-line (wavelength 436 nm), harmonic of YAG laser
- the present invention can also be applied to a generator or the like, an ultrahigh pressure mercury lamp that emits bright lines such as i-line (wavelength 365 nm), and the like.
- a single wavelength laser beam in the infrared region or in the visible region oscillated from a DFB semiconductor laser or fiber laser as vacuum ultraviolet light For example, a harmonic which is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium) and wavelength-converted into ultraviolet light using a nonlinear optical crystal may be used.
- a so-called immersion method is applied in which the optical path between the projection optical system and the photosensitive substrate is filled with a medium (typically liquid) having a refractive index larger than 1.1. You may do it.
- a technique for filling the liquid in the optical path between the projection optical system and the photosensitive substrate a technique for locally filling the liquid as disclosed in International Publication No. WO99 / 49504, a special technique, A method of moving a stage holding a substrate to be exposed as disclosed in Kaihei 6-124873 in a liquid tank, or a predetermined stage on a stage as disclosed in Japanese Patent Laid-Open No. 10-303114. A method of forming a liquid tank having a depth and holding the substrate therein can be employed.
- the teachings of WO99 / 49504, JP-A-6-124873 and JP-A-10-303114 are incorporated by reference.
- the projection optical system of the exposure apparatus may be not only a reduction system but also an equal magnification and an enlargement system, and the projection optical system is not only a refraction system but also a reflection system or a catadioptric system.
- the projected image may be either an inverted image or an erect image.
- an exposure apparatus (lithography system) that forms a line-and-space pattern on a wafer W by forming interference fringes on the wafer W. Can be applied.
- two reticle patterns are synthesized on a wafer via a projection optical system, and 1 on the wafer by one scanning exposure.
- the present invention can be applied to an exposure apparatus that performs double exposure of two shot areas almost simultaneously.
- the object on which the pattern is to be formed is not limited to the wafer, but may be another object such as a glass plate, a ceramic substrate, a film member, or a mask blank. good.
- the present invention is applied to the illumination optical system that illuminates the mask (or wafer) in the exposure apparatus.
- the present invention can also be applied to a general illumination optical system that illuminates the irradiation surface.
- Applicants define aspects / features / elements of disclosed embodiments, actions of disclosed embodiments, or functions of disclosed embodiments, and / or aspects / features /
- a definitive verb such as “is”, “are”, “does”, “has”, or “include”
- other definitive verbs eg., “generate”, “cause”, “sample”, “read”, “notify”, etc.
- verbal nouns eg, “generate,” “ Used “,” taking “,” keeping “,” manufacturing “,” determining “,” measuring “or” calculating "). Any such defining word or phrase etc.
- any disclosed embodiment of a claim or any particular aspect / feature / element of any particular disclosed embodiment of the claim Unless otherwise expressly and specifically indicated that the applicant believes that the invention is considered to be one and only way to implement all the aspects / features / elements described in such claims Is any disclosed aspect / feature / element of any disclosed embodiment of the claimed content of this patent application, or any description of the entire embodiment, which is claimed in the claim or any aspect / feature / element of it.
- the illumination optical system for illuminating the illuminated surface with light from a light source, A spatial light modulator having a plurality of optical elements arranged in a predetermined plane and individually controlled, and variably forming a light intensity distribution in the illumination pupil of the illumination optical system; A polarization unit that is arranged at a position optically conjugate with the predetermined surface in the optical path of the illumination optical system and emits light by changing a polarization state of a part of the incident light flux.
- Characteristic illumination optical system 2.
- the polarization unit is configured to change a polarization state of a second partial light beam different from the first partial light beam of the incident light beam without affecting the first partial light beam of the incident light beam.
- the first optical element is disposed on a first surface along a cross section of the incident light beam, and a cross-sectional area of the first partial light beam passing through the first surface and the second portion passing through the first surface. 4.
- the illumination optical system according to claim 3 wherein the illumination optical system is configured to be movable along the first surface in order to change a ratio with a cross-sectional area of the light beam. 5.
- the first optical element has a pair of edges extending in a first direction parallel to one side of a rectangular cross section of the incident light beam, and moves in a second direction orthogonal to the first direction.
- the illumination optical system according to claim 3 or 4 wherein the illumination optical system is possible.
- the first optical element includes a first edge extending in a third direction obliquely intersecting one side of the rectangular cross section of the incident light beam, and a second edge extending in a fourth direction different from the third direction. 5.
- the polarization unit includes a polarization state of at least a part of the third partial light beam out of the second partial light beam that has passed through the first optical element, and the first light incident without passing through the first optical element.
- the second optical element is disposed on a second surface along a cross section of the incident light beam, and a cross-sectional area of the third partial light beam passing through the second surface and the fourth portion passing through the second surface.
- the second optical element has a pair of edges extending in a first direction parallel to one side of a rectangular cross section of the incident light beam, and moves in a second direction orthogonal to the first direction.
- the second optical element includes a third edge extending in a fifth direction obliquely intersecting one side of the rectangular cross section of the incident light beam, and a fourth edge extending in a sixth direction different from the fifth direction. 10.
- the optical rotatory member includes: a first optical rotatory member formed of a clockwise optically rotatory material; and a second optical rotatory member formed of a counterclockwise optically rotatory material disposed adjacent to the first optically rotatory member.
- the illumination optical system according to claim 13 further comprising an illumination optical system.
- a phase difference imparting member that gives a different phase difference to incident light according to an incident position is disposed on the optical Fourier transform surface of the predetermined surface. Lighting optics.
- At least one of the first optical element and the second optical element includes a wave plate that changes incident light into light having a predetermined polarization state.
- the wave plate has a first wave plate having an optical axis along a first direction in a plane along the cross section of the incident light beam, and the first direction in a plane along the cross section of the incident light beam.
- At least one of the first optical element and the second optical element includes a polarizer that selects and emits light having a predetermined polarization state from incident light.
- the illumination optical system according to any one of the above.
- the predetermined surface on which the plurality of optical elements of the spatial light modulator are disposed is inclined with respect to the optical axis orthogonal plane of the relay optical system, 26.
- the device according to claim 23, wherein the first optical element is configured to be movable in a direction along a surface optically conjugate with the predetermined surface with respect to the relay optical system.
- a second relay optical system that is arranged between the first optical element and the second optical element and optically conjugates the first optical element and the second optical element.
- the spatial light modulator includes a plurality of mirror elements that are two-dimensionally arranged in the predetermined plane, and a drive unit that individually controls and drives the postures of the plurality of mirror elements.
- the illumination optical system according to any one of claims 1 to 30. 32.
- a group of mirror elements located in a first region on the predetermined surface of the plurality of mirror elements is defined as a first mirror element group, and is different from the first region of the plurality of mirror elements.
- the drive unit is configured such that the light passing through the first mirror element group is on the optical Fourier transform surface of the predetermined surface.
- the first mirror element group is controlled and driven so as to be guided to the first pupil area, and the light passing through the second mirror element group is guided to the second pupil area on the optical Fourier transform plane of the predetermined plane.
- 34 The illumination optical system according to claim 33, wherein the first pupil region and the second pupil region are different regions.
- the polarization unit includes: a first optical element that changes a polarization state of the second partial light beam that has passed through the second mirror element group without affecting the first partial light beam that has passed through the first mirror element group.
- 36. The illumination optical system according to any one of claims 33 to 35, comprising: 37.
- the illuminance uniformity that is arranged in the optical path closer to the light source than the conjugate position and that improves the illuminance uniformity in a plane including the conjugate position than the illuminance uniformity in the cross section of the incident light beam. 38.
- the illumination optical system according to claim 37 further comprising an optical system.
- a wavefront splitting optical system that is disposed in an optical path closer to the light source than the conjugate position and that splits an incident light beam into a wavefront and superimposes it on a surface including the conjugate position.
- the illumination optical system according to claim 37. 40. It is used in combination with a projection optical system that forms a surface optically conjugate with the irradiated surface, and the illumination pupil is at a position optically conjugate with an aperture stop of the projection optical system.
- An exposure apparatus comprising the illumination optical system according to any one of claims 1 to 40 for illuminating a predetermined pattern, and exposing the predetermined pattern onto a photosensitive substrate.
- the exposure apparatus according to claim 41 further comprising a projection optical system that forms an image of the predetermined pattern on the photosensitive substrate.
- 43 Using the exposure apparatus according to claim 41 or 42, exposing the predetermined pattern onto the photosensitive substrate; Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate; Processing the surface of the photosensitive substrate through the mask layer.
- a device manufacturing method comprising: 44.
- a polarization unit that changes the polarization state of a part of the incident light flux having a rectangular cross section and emits the light
- a first surface disposed on the first surface along the cross-section of the incident light beam and changing the polarization state of the second partial light beam of the incident light beam without affecting the first partial light beam of the incident light beam.
- An optical element Arranged on the second surface along the cross-section of the incident light beam, the polarization state of at least a part of the third partial light beam out of the second partial light beam that has passed through the first optical element, and the first optical element.
- a second optical element that changes a polarization state of at least a part of the fourth partial light beam among the first partial light beams that are incident on the first partial light beam
- the first optical element includes a first edge extending in a third direction obliquely intersecting one side of the rectangular cross section of the incident light beam, and a second edge extending in a fourth direction different from the third direction.
- a polarizing unit comprising: 45. At least one of the first optical element and the second optical element includes a cross-sectional area of the first partial light beam, a cross-sectional area of the second partial light beam, a cross-sectional area of the third partial light beam, and the first optical element. 45.
- the polarizing unit according to claim 44 wherein the polarizing unit is configured to be movable along the first surface or the second surface in order to change a ratio with a cross-sectional area of the four partial light beams.
- 46. The polarization unit according to claim 44, wherein the fourth direction in which the second edge of the first optical element extends is a direction obliquely intersecting the one side.
- 47. The second optical element includes a third edge extending in a fifth direction obliquely intersecting one side of the rectangular cross section of the incident light beam, and a fourth edge extending in a sixth direction different from the fifth direction. 47.
- the polarization unit according to claim 44 further comprising an edge and capable of moving two-dimensionally along the second surface.
- At least one of the first optical element and the second optical element has an optical rotatory member formed of an optical material having optical rotatory power.
- At least one of the first optical element and the second optical element includes a wave plate that changes incident light into light having a predetermined polarization state.
- At least one of the first optical element and the second optical element includes a polarizer that selects and emits light having a predetermined polarization state from incident light.
- the polarizing unit according to any one of the above.
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
所定面内に配列されて個別に制御される複数の光学要素を有し、前記照明光学系の照明瞳に光強度分布を可変的に形成する空間光変調器と、
前記照明光学系の光路中において前記所定面と光学的に共役な位置に配置されて、入射光束のうちの一部の第1部分光束と該第1部分光束とは異なる第2部分光束との偏光状態が互いに異なるように射出する偏光ユニットとを備え、
前記偏光ユニットは、前記偏光ユニットから射出される射出光束の断面における前記第1部分光束と前記第2部分光束との断面積の比を変更することを特徴とする照明光学系を提供する。
前記所定のパターンが転写された前記感光性基板を現像し、前記所定のパターンに対応する形状のマスク層を前記感光性基板の表面に形成することと、
前記マスク層を介して前記感光性基板の表面を加工することと、を含むことを特徴とするデバイス製造方法を提供する。
前記入射光束の断面に沿った第1面に配置され、前記入射光束のうちの第1部分光束に作用を及ぼすことなく、前記入射光束のうちの第2部分光束の偏光状態を変化させる第1光学素子と、
前記入射光束の断面に沿った第2面に配置され、前記第1光学素子を経た前記第2部分光束のうちの少なくとも一部の第3部分光束の偏光状態、および前記第1光学素子を経ることなく入射する前記第1部分光束のうちの少なくとも一部の第4部分光束の偏光状態を変化させる第2光学素子とを備え、
前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第3方向に延びる第1エッジと、前記第3方向とは異なる第4方向に延びる第2エッジとを有することを特徴とする偏光ユニットを提供する。
請求項1 光源からの光により被照射面を照明する照明光学系において、
所定面内に配列されて個別に制御される複数の光学要素を有し、前記照明光学系の照明瞳に光強度分布を可変的に形成する空間光変調器と、
前記照明光学系の光路中において前記所定面と光学的に共役な位置に配置されて、入射光束のうちの一部の光束の偏光状態を変化させて射出する偏光ユニットとを備えていることを特徴とする照明光学系。
請求項2 前記偏光ユニットは、前記空間光変調器よりも前記被照射面側の光路中における前記共役な位置に配置されることを特徴とする請求項1に記載の照明光学系。
請求項3 前記偏光ユニットは、前記入射光束のうちの第1部分光束に作用を及ぼすことなく、前記入射光束のうちの前記第1部分光束とは異なる第2部分光束の偏光状態を変化させる第1光学素子を有することを特徴とする請求項1または2に記載の照明光学系。
請求項4 前記第1光学素子は、前記入射光束の断面に沿った第1面に配置され、前記第1面を経た前記第1部分光束の断面積と前記第1面を経た前記第2部分光束の断面積との比を変化させるために、前記第1面に沿って移動可能に構成されていることを特徴とする請求項3に記載の照明光学系。
請求項5 前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と平行な第1方向に延びる一対のエッジを有し、且つ前記第1方向と直交する第2方向に移動可能であることを特徴とする請求項3または4に記載の照明光学系。
請求項6 前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第3方向に延びる第1エッジと、前記第3方向とは異なる第4方向に延びる第2エッジとを有し、且つ前記入射光束の断面に沿って二次元的に移動可能であることを特徴とする請求項3または4に記載の照明光学系。
請求項7 前記第1光学素子の前記第2エッジが延びる前記第4方向は、前記一方の辺と斜め交差する方向であることを特徴とする請求項6に記載の照明光学系。
請求項8 前記偏光ユニットは、前記第1光学素子を経た前記第2部分光束のうちの少なくとも一部の第3部分光束の偏光状態、および前記第1光学素子を経ることなく入射する前記第1部分光束のうちの少なくとも一部の第4部分光束の偏光状態を変化させる第2光学素子を有することを特徴とする請求項3乃至7のいずれか1項に記載の照明光学系。
請求項9 前記第2光学素子は、前記入射光束の断面に沿った第2面に配置され、前記第2面を経た前記第3部分光束の断面積と前記第2面を経た前記第4部分光束の断面積との比を変化させるために、前記第2面に沿って移動可能に構成されていることを特徴とする請求項8に記載の照明光学系。
請求項10 前記第2光学素子は、前記入射光束の矩形状の断面の一方の辺と平行な第1方向に延びる一対のエッジを有し、且つ前記第1方向と直交する第2方向に移動可能であることを特徴とする請求項8または9に記載の照明光学系。
請求項11 前記第2光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第5方向に延びる第3エッジと、前記第5方向とは異なる第6方向に延びる第4エッジとを有し、且つ前記入射光束の断面に沿って二次元的に移動可能であることを特徴とする請求項8または9に記載の照明光学系。
請求項12 前記第2光学素子の前記第4エッジが延びる前記第6方向は、前記一方の辺と斜め交差する方向であることを特徴とする請求項11に記載の照明光学系。
請求項13 前記第1光学素子は、旋光性を有する光学材料により形成された旋光部材を有することを特徴とする請求項3乃至12のいずれか1項に記載の照明光学系。
請求項14 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、旋光性を有する光学材料により形成された旋光部材を有することを特徴とする請求項8乃至13のいずれか1項に記載の照明光学系。
請求項15 前記旋光部材は、右回り旋光性材料で形成された第1旋光部材と、該第1旋光部材と隣接して配置されて左回り旋光性材料から形成された第2旋光部材とを備えていることを特徴とする請求項13または14に記載の照明光学系。
請求項16 前記所定面の光学的なフーリエ変換面には、入射位置に応じて異なる位相差を入射光に与える位相差付与部材が配置されていることを特徴とする請求項14または15に記載の照明光学系。
請求項17 前記第1光学素子は、入射光を所定の偏光状態の光に変化させる波長板を有することを特徴とする請求項3乃至16のいずれか1項に記載の照明光学系。
請求項18 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光を所定の偏光状態の光に変化させる波長板を有することを特徴とする請求項8乃至17のいずれか1項に記載の照明光学系。
請求項19 前記波長板は、前記入射光束の断面に沿って回転可能であることを特徴とする請求項17または18に記載の照明光学系。
請求項20 前記波長板は、前記入射光束の断面に沿った面内における第1方向に沿った光学軸を持つ第1波長板と、前記入射光束の断面に沿った面内において前記第1方向とは異なる第2方向に沿った光学軸を持つ第2波長板とを備えていることを特徴とする請求項18または19に記載の照明光学系。
請求項21 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光から所定の偏光状態の光を選択して射出する偏光子を有することを特徴とする請求項8乃至20のいずれか1項に記載の照明光学系。
請求項22 前記第1光学素子と前記第2光学素子とは互いに隣接して配置されていることを特徴とする請求項8乃至21のいずれか1項に記載の照明光学系。
請求項23 前記所定面と前記所定面と共役な位置との間に配置されたリレー光学系をさらに備えていることを特徴とする請求項1乃至22に記載の照明光学系。
請求項24 前記第1光学素子と前記第2光学素子とは、前記所定面と光学的に共役な位置を挟んで配置されることを特徴とする請求項23に記載の照明光学系。
請求項25 前記所定面と光学的に共役な位置は、前記リレー光学系の光軸上の位置であることを特徴とする請求項23または24に記載の照明光学系。
請求項26 前記空間光変調器の前記複数の光学要素が配置される前記所定面は、前記リレー光学系の光軸直交面に対して傾斜しており、
前記第1光学素子は、前記リレー光学系に関して前記所定面と光学的に共役な面に沿った方向に移動可能に構成されていることを特徴とする請求項23乃至25のいずれか1項に記載の照明光学系。
請求項27 前記第1光学素子と前記第2光学素子との間に配置されて、前記第1光学素子と前記第2光学素子とを互いに光学的に共役にする第2リレー光学系を備えていることを特徴とする請求項8乃至21のいずれか1項に記載の照明光学系。
請求項28 前記偏光ユニットは、照明光路に対して挿脱自在な非偏光化素子を有することを特徴とする請求項1乃至27のいずれか1項に記載の照明光学系。
請求項29 前記非偏光化素子は、前記照明光路中の前記所定面と光学的に共役な位置または該位置の近傍において挿脱自在であることを特徴とする請求項28に記載の照明光学系。
請求項30 オプティカルインテグレータを備え、
前記偏光ユニットは、前記空間光変調器と前記オプティカルインテグレータとの間の光路中に配置されていることを特徴とする請求項1乃至29のいずれか1項に記載の照明光学系。
請求項31 前記空間光変調器は、前記所定面内で二次元的に配列された複数のミラー要素と、該複数のミラー要素の姿勢を個別に制御駆動する駆動部とを有することを特徴とする請求項1乃至30のいずれか1項に記載の照明光学系。
請求項32 前記駆動部は、前記複数のミラー要素の向きを連続的または離散的に変化させることを特徴とする請求項31に記載の照明光学系。
請求項33 前記複数のミラー要素のうちの前記所定面上の第1領域に位置するミラー要素の群を第1ミラー要素群とし、前記複数のミラー要素のうちの前記第1領域とは異なる前記所定面上の第2領域に位置するミラー要素の群を第2ミラー要素群とするとき、前記駆動部は、前記第1ミラー要素群を経た光が前記所定面の光学的なフーリエ変換面上の第1瞳領域へ導かれるように前記第1ミラー要素群を制御駆動し、且つ前記第2ミラー要素群を経た光が前記所定面の光学的なフーリエ変換面上の第2瞳領域へ導かれるように前記第2ミラー要素群を制御駆動することを特徴とする請求項31または32に記載の照明光学系。
請求項34 前記第1瞳領域と前記第2瞳領域とは異なる領域であることを特徴とする請求項33に記載の照明光学系。
請求項35 前記第1瞳領域と前記第2瞳領域とは一部が重複することを特徴とする請求項33または34に記載の照明光学系。
請求項36 前記偏光ユニットは、前記第1ミラー要素群を経た第1部分光束に作用を及ぼすことなく、前記第2ミラー要素群を経た第2部分光束の偏光状態を変化させる第1光学素子を有することを特徴とする請求項33乃至35のいずれか1項に記載の照明光学系。
請求項37 前記偏光ユニットは、前記空間光変調器よりも前記光源側の光路中における前記共役な位置に配置されることを特徴とする請求項1乃至36のいずれか1項に記載の照明光学系。
請求項38 前記共役な位置よりも前記光源側の光路中に配置されて、前記共役な位置を含む面内の照度均一性を、入射光束の断面内の照度均一性よりも向上させる照度均一化光学系を備えていることを特徴とする請求項37に記載の照明光学系。
請求項39 前記共役な位置よりも前記光源側の光路中に配置されて、入射光束を波面分割して前記共役な位置を含む面に重畳させる波面分割光学系を備えていることを特徴とする請求項37に記載の照明光学系。
請求項40 前記被照射面と光学的に共役な面を形成する投影光学系と組み合わせて用いられ、前記照明瞳は前記投影光学系の開口絞りと光学的に共役な位置であることを特徴とする請求項1乃至39のいずれか1項に記載の照明光学系。
請求項41 所定のパターンを照明するための請求項1乃至40のいずれか1項に記載の照明光学系を備え、前記所定のパターンを感光性基板に露光することを特徴とする露光装置。
請求項42 前記所定のパターンの像を前記感光性基板上に形成する投影光学系を備えていることを特徴とする請求項41に記載の露光装置。
請求項43 請求項41または42に記載の露光装置を用いて、前記所定のパターンを前記感光性基板に露光することと、
前記所定のパターンが転写された前記感光性基板を現像し、前記所定のパターンに対応する形状のマスク層を前記感光性基板の表面に形成することと、
前記マスク層を介して前記感光性基板の表面を加工することと、を含むことを特徴とするデバイス製造方法。
請求項44 矩形状の断面を持つ入射光束のうちの一部の光束の偏光状態を変化させて射出する偏光ユニットであって、
前記入射光束の断面に沿った第1面に配置され、前記入射光束のうちの第1部分光束に作用を及ぼすことなく、前記入射光束のうちの第2部分光束の偏光状態を変化させる第1光学素子と、
前記入射光束の断面に沿った第2面に配置され、前記第1光学素子を経た前記第2部分光束のうちの少なくとも一部の第3部分光束の偏光状態、および前記第1光学素子を経ることなく入射する前記第1部分光束のうちの少なくとも一部の第4部分光束の偏光状態を変化させる第2光学素子とを備え、
前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第3方向に延びる第1エッジと、前記第3方向とは異なる第4方向に延びる第2エッジとを有することを特徴とする偏光ユニット。
請求項45 前記第1光学素子および前記第2光学素子のうちに少なくとも一方は、前記第1部分光束の断面積と前記第2部分光束の断面積と前記第3部分光束の断面積と前記第4部分光束の断面積との比を変化させるために、前記第1面または前記第2面に沿って移動可能に構成されていることを特徴とする請求項44に記載の偏光ユニット。
請求項46 前記第1光学素子の前記第2エッジが延びる前記第4方向は、前記一方の辺と斜め交差する方向であることを特徴とする請求項44または45に記載の偏光ユニット。
請求項47 前記第2光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第5方向に延びる第3エッジと、前記第5方向とは異なる第6方向に延びる第4エッジとを有し、且つ前記第2面に沿って二次元的に移動可能であることを特徴とする請求項44乃至46のいずれか1項に記載の偏光ユニット。
請求項48 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、旋光性を有する光学材料により形成された旋光部材を有することを特徴とする請求項44乃至47のいずれか1項に記載の偏光ユニット。
請求項49 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光を所定の偏光状態の光に変化させる波長板を有することを特徴とする請求項44乃至48のいずれか1項に記載の偏光ユニット。
請求項50 前記波長板は、前記入射光束の断面に沿って回転可能であることを特徴とする請求項49に記載の偏光ユニット。
請求項51 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光から所定の偏光状態の光を選択して射出する偏光子を有することを特徴とする請求項44乃至50のいずれか1項に記載の偏光ユニット。
2 ビーム送光部
3 空間光変調器
4,6 リレー光学系
5 偏光ユニット
51,52 旋光部材
53 非偏光化素子
7 マイクロフライアイレンズ
8 コンデンサー光学系
9 マスクブラインド
10 結像光学系
DTr,DTw 瞳強度分布計測部
CR 制御系
M マスク
MS マスクステージ
PL 投影光学系
W ウェハ
WS ウェハステージ
Claims (55)
- 光源からの光により被照射面を照明する照明光学系において、
所定面内に配列されて個別に制御される複数の光学要素を有し、前記照明光学系の照明瞳に光強度分布を可変的に形成する空間光変調器と、
前記照明光学系の光路中において前記所定面と光学的に共役な位置に配置されて、入射光束のうちの一部の第1部分光束と該第1部分光束とは異なる第2部分光束との偏光状態が互いに異なるように射出する偏光ユニットとを備え、
前記偏光ユニットは、前記偏光ユニットから射出される射出光束の断面における前記第1部分光束と前記第2部分光束との断面積の比を変更することを特徴とする照明光学系。 - 前記偏光ユニットは、前記空間光変調器よりも前記被照射面側の光路中における前記共役な位置に配置されることを特徴とする請求項1に記載の照明光学系。
- 前記偏光ユニットの前記光源側の光路には、直線偏光を主成分とする偏光状態の光が通過することを特徴とする請求項2に記載の照明光学系。
- 前記直線偏光の偏光方向は、前記空間光変調器の配列面よりも光源側における光軸と前記空間光変調器の配列面よりも照射面側における光軸とを含む面に沿った方向、または該含む面と直交する方向であることを特徴とする請求項3に記載の照明光学系。
- 前記偏光ユニットは、前記入射光束のうちの第1部分光束に作用を及ぼすことなく、前記入射光束のうちの前記第1部分光束とは異なる第2部分光束の偏光状態を変化させる第1光学素子を有することを特徴とする請求項1乃至4のいずれか1項に記載の照明光学系。
- 前記第1光学素子は、前記入射光束の断面に沿った第1面に配置され、前記第1面を経た前記第1部分光束の断面積と前記第1面を経た前記第2部分光束の断面積との比を変化させるために、前記第1面に沿って移動可能に構成されていることを特徴とする請求項5に記載の照明光学系。
- 前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と平行な第1方向に延びる一対のエッジを有し、且つ前記第1方向と直交する第2方向に移動可能であることを特徴とする請求項5または6に記載の照明光学系。
- 前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第3方向に延びる第1エッジと、前記第3方向とは異なる第4方向に延びる第2エッジとを有し、且つ前記入射光束の断面に沿って二次元的に移動可能であることを特徴とする請求項5または6に記載の照明光学系。
- 前記第1光学素子の前記第2エッジが延びる前記第4方向は、前記一方の辺と斜め交差する方向であることを特徴とする請求項8に記載の照明光学系。
- 前記偏光ユニットは、前記第1光学素子を経た前記第2部分光束のうちの少なくとも一部の第3部分光束の偏光状態、および前記第1光学素子を経ることなく入射する前記第1部分光束のうちの少なくとも一部の第4部分光束の偏光状態を変化させる第2光学素子を有することを特徴とする請求項5乃至9のいずれか1項に記載の照明光学系。
- 前記第2光学素子は、前記入射光束の断面に沿った第2面に配置され、前記第2面を経た前記第3部分光束の断面積と前記第2面を経た前記第4部分光束の断面積との比を変化させるために、前記第2面に沿って移動可能に構成されていることを特徴とする請求項10に記載の照明光学系。
- 前記第2光学素子は、前記入射光束の矩形状の断面の一方の辺と平行な第1方向に延びる一対のエッジを有し、且つ前記第1方向と直交する第2方向に移動可能であることを特徴とする請求項10または11に記載の照明光学系。
- 前記第2光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第5方向に延びる第3エッジと、前記第5方向とは異なる第6方向に延びる第4エッジとを有し、且つ前記入射光束の断面に沿って二次元的に移動可能であることを特徴とする請求項10または11に記載の照明光学系。
- 前記第2光学素子の前記第4エッジが延びる前記第6方向は、前記一方の辺と斜め交差する方向であることを特徴とする請求項13に記載の照明光学系。
- 前記第1光学素子は、入射する直線偏光の偏光方向を所定の角度だけ回転させて射出する偏光回転部材を有することを特徴とする請求項5乃至14のいずれか1項に記載の照明光学系。
- 前記第1光学素子は、旋光性を有する光学材料により形成された旋光部材を有することを特徴とする請求項5乃至15のいずれか1項に記載の照明光学系。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射する直線偏光の偏光方向を所定の角度だけ回転させて射出する偏光回転部材を有することを特徴とする請求項10乃至16のいずれか1項に記載の照明光学系。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、旋光性を有する光学材料により形成された旋光部材を有することを特徴とする請求項10乃至17のいずれか1項に記載の照明光学系。
- 前記旋光部材は、右回り旋光性材料で形成された第1旋光部材と、該第1旋光部材と隣接して配置されて左回り旋光性材料から形成された第2旋光部材とを備えていることを特徴とする請求項16または18に記載の照明光学系。
- 前記所定面の光学的なフーリエ変換面には、入射位置に応じて異なる位相差を入射光に与える位相差付与部材が配置されていることを特徴とする請求項18または19に記載の照明光学系。
- 前記第1光学素子は、入射光を所定の偏光状態の光に変化させる波長板を有することを特徴とする請求項5乃至20のいずれか1項に記載の照明光学系。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光を所定の偏光状態の光に変化させる波長板を有することを特徴とする請求項10乃至21のいずれか1項に記載の照明光学系。
- 前記波長板は、前記入射光束の断面に沿って回転可能であることを特徴とする請求項21または22に記載の照明光学系。
- 前記波長板は、前記入射光束の断面に沿った面内における第1方向に沿った光学軸を持つ第1波長板と、前記入射光束の断面に沿った面内において前記第1方向とは異なる第2方向に沿った光学軸を持つ第2波長板とを備えていることを特徴とする請求項22または23に記載の照明光学系。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光から所定の偏光状態の光を選択して射出する偏光子を有することを特徴とする請求項10乃至24のいずれか1項に記載の照明光学系。
- 前記第1光学素子と前記第2光学素子とは互いに隣接して配置されていることを特徴とする請求項10乃至25のいずれか1項に記載の照明光学系。
- 前記所定面と前記所定面と共役な位置との間に配置されたリレー光学系をさらに備えていることを特徴とする請求項1乃至26に記載の照明光学系。
- 前記第1光学素子と前記第2光学素子とは、前記所定面と光学的に共役な位置を挟んで配置されることを特徴とする請求項27に記載の照明光学系。
- 前記所定面と光学的に共役な位置は、前記リレー光学系の光軸上の位置であることを特徴とする請求項27または28に記載の照明光学系。
- 前記空間光変調器の前記複数の光学要素が配置される前記所定面は、前記リレー光学系の光軸直交面に対して傾斜しており、
前記第1光学素子は、前記リレー光学系に関して前記所定面と光学的に共役な面に沿った方向に移動可能に構成されていることを特徴とする請求項27乃至29のいずれか1項に記載の照明光学系。 - 前記第1光学素子と前記第2光学素子との間に配置されて、前記第1光学素子と前記第2光学素子とを互いに光学的に共役にする第2リレー光学系を備えていることを特徴とする請求項10乃至25のいずれか1項に記載の照明光学系。
- 前記偏光ユニットは、照明光路に対して挿脱自在な非偏光化素子を有することを特徴とする請求項1乃至31のいずれか1項に記載の照明光学系。
- 前記非偏光化素子は、前記照明光路中の前記所定面と光学的に共役な位置または該位置の近傍において挿脱自在であることを特徴とする請求項32に記載の照明光学系。
- オプティカルインテグレータを備え、
前記偏光ユニットは、前記空間光変調器と前記オプティカルインテグレータとの間の光路中に配置されていることを特徴とする請求項1乃至33のいずれか1項に記載の照明光学系。 - 前記空間光変調器は、前記所定面内で二次元的に配列された複数のミラー要素と、該複数のミラー要素の姿勢を個別に制御駆動する駆動部とを有することを特徴とする請求項1乃至34のいずれか1項に記載の照明光学系。
- 前記駆動部は、前記複数のミラー要素の向きを連続的または離散的に変化させることを特徴とする請求項35に記載の照明光学系。
- 前記複数のミラー要素のうちの前記所定面上の第1領域に位置するミラー要素の群を第1ミラー要素群とし、前記複数のミラー要素のうちの前記第1領域とは異なる前記所定面上の第2領域に位置するミラー要素の群を第2ミラー要素群とするとき、前記駆動部は、前記第1ミラー要素群を経た光が前記所定面の光学的なフーリエ変換面上の第1瞳領域へ導かれるように前記第1ミラー要素群を制御駆動し、且つ前記第2ミラー要素群を経た光が前記所定面の光学的なフーリエ変換面上の第2瞳領域へ導かれるように前記第2ミラー要素群を制御駆動することを特徴とする請求項35または36に記載の照明光学系。
- 前記第1瞳領域と前記第2瞳領域とは異なる領域であることを特徴とする請求項37に記載の照明光学系。
- 前記第1瞳領域と前記第2瞳領域とは一部が重複することを特徴とする請求項37または38に記載の照明光学系。
- 前記偏光ユニットは、前記第1ミラー要素群を経た第1部分光束に作用を及ぼすことなく、前記第2ミラー要素群を経た第2部分光束の偏光状態を変化させる第1光学素子を有することを特徴とする請求項37乃至39のいずれか1項に記載の照明光学系。
- 前記偏光ユニットは、前記空間光変調器よりも前記光源側の光路中における前記共役な位置に配置されることを特徴とする請求項1乃至40のいずれか1項に記載の照明光学系。
- 前記共役な位置よりも前記光源側の光路中に配置されて、前記共役な位置を含む面内の照度均一性を、入射光束の断面内の照度均一性よりも向上させる照度均一化光学系を備えていることを特徴とする請求項41に記載の照明光学系。
- 前記共役な位置よりも前記光源側の光路中に配置されて、入射光束を波面分割して前記共役な位置を含む面に重畳させる波面分割光学系を備えていることを特徴とする請求項41に記載の照明光学系。
- 前記被照射面と光学的に共役な面を形成する投影光学系と組み合わせて用いられ、前記照明瞳は前記投影光学系の開口絞りと光学的に共役な位置であることを特徴とする請求項1乃至43のいずれか1項に記載の照明光学系。
- 所定のパターンを照明するための請求項1乃至44のいずれか1項に記載の照明光学系を備え、前記所定のパターンを感光性基板に露光することを特徴とする露光装置。
- 前記所定のパターンの像を前記感光性基板上に形成する投影光学系を備えていることを特徴とする請求項45に記載の露光装置。
- 請求項45または46に記載の露光装置を用いて、前記所定のパターンを前記感光性基板に露光することと、
前記所定のパターンが転写された前記感光性基板を現像し、前記所定のパターンに対応する形状のマスク層を前記感光性基板の表面に形成することと、
前記マスク層を介して前記感光性基板の表面を加工することと、を含むことを特徴とするデバイス製造方法。 - 矩形状の断面を持つ入射光束のうちの一部の光束の偏光状態を変化させて射出する偏光ユニットであって、
前記入射光束の断面に沿った第1面に配置され、前記入射光束のうちの第1部分光束に作用を及ぼすことなく、前記入射光束のうちの第2部分光束の偏光状態を変化させる第1光学素子と、
前記入射光束の断面に沿った第2面に配置され、前記第1光学素子を経た前記第2部分光束のうちの少なくとも一部の第3部分光束の偏光状態、および前記第1光学素子を経ることなく入射する前記第1部分光束のうちの少なくとも一部の第4部分光束の偏光状態を変化させる第2光学素子とを備え、
前記第1光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第3方向に延びる第1エッジと、前記第3方向とは異なる第4方向に延びる第2エッジとを有することを特徴とする偏光ユニット。 - 前記第1光学素子および前記第2光学素子のうちに少なくとも一方は、前記第1部分光束の断面積と前記第2部分光束の断面積と前記第3部分光束の断面積と前記第4部分光束の断面積との比を変化させるために、前記第1面または前記第2面に沿って移動可能に構成されていることを特徴とする請求項48に記載の偏光ユニット。
- 前記第1光学素子の前記第2エッジが延びる前記第4方向は、前記一方の辺と斜め交差する方向であることを特徴とする請求項48または49に記載の偏光ユニット。
- 前記第2光学素子は、前記入射光束の矩形状の断面の一方の辺と斜め交差する第5方向に延びる第3エッジと、前記第5方向とは異なる第6方向に延びる第4エッジとを有し、且つ前記第2面に沿って二次元的に移動可能であることを特徴とする請求項48乃至50のいずれか1項に記載の偏光ユニット。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、旋光性を有する光学材料により形成された旋光部材を有することを特徴とする請求項48乃至51のいずれか1項に記載の偏光ユニット。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光を所定の偏光状態の光に変化させる波長板を有することを特徴とする請求項48乃至52のいずれか1項に記載の偏光ユニット。
- 前記波長板は、前記入射光束の断面に沿って回転可能であることを特徴とする請求項53に記載の偏光ユニット。
- 前記第1光学素子および前記第2光学素子のうちの少なくとも一方は、入射光から所定の偏光状態の光を選択して射出する偏光子を有することを特徴とする請求項46乃至52のいずれか1項に記載の偏光ユニット。
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