EP1359008B1 - Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression - Google Patents

Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression Download PDF

Info

Publication number
EP1359008B1
EP1359008B1 EP20020100424 EP02100424A EP1359008B1 EP 1359008 B1 EP1359008 B1 EP 1359008B1 EP 20020100424 EP20020100424 EP 20020100424 EP 02100424 A EP02100424 A EP 02100424A EP 1359008 B1 EP1359008 B1 EP 1359008B1
Authority
EP
European Patent Office
Prior art keywords
meth
acrylate
mixture
weight
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP20020100424
Other languages
German (de)
English (en)
Other versions
EP1359008A1 (fr
Inventor
Willi - Kurt c/o AGFA-GEVAERT Gries
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Agfa Gevaert AG
Original Assignee
Agfa Gevaert NV
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV, Agfa Gevaert AG filed Critical Agfa Gevaert NV
Priority to DE50204080T priority Critical patent/DE50204080D1/de
Priority to EP20020100424 priority patent/EP1359008B1/fr
Priority to US10/425,158 priority patent/US7314699B2/en
Priority to JP2003125528A priority patent/JP2003344997A/ja
Publication of EP1359008A1 publication Critical patent/EP1359008A1/fr
Application granted granted Critical
Publication of EP1359008B1 publication Critical patent/EP1359008B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/12—Developable by an organic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/264—Polyesters; Polycarbonates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/266—Polyurethanes; Polyureas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
    • B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black

Definitions

  • the invention relates to a radiation-sensitive (photopolymerizable) mixture with a polymeric binder, a radically photopolymerizable component, a Infrared absorber and a triazine. It continues to apply Recording material with a support and a radiation-sensitive Layer.
  • a mixture of the type mentioned is already in EP-A 0 369 645. It comprises a free-radically polymerizable Monomer and a soluble therein photoinitiator system, the trihalomethyl-substituted 1,3,5-triazine, a sensitizer for the triazine and an electron-donor compound with a Oxidation potential of greater than zero and less than that of 1,4-dimethoxy-benzene contains.
  • Sensitizers are coumarin, Xanthene, acridine, thiazole, thiazine, oxazine, azine, aminoketone, Methine and polymethine dyes, porphyrins, aminotriarylmethanes, Called merocyanines, squarylium and pyridinium dyes. you are sensitive especially to radiation in the range of 350 to 700 nm. For radiation in the near IR range (700 to 1200 nm) is the Sensitivity, however, only low.
  • EP-A 0 315 988 is a photopolymerizable Mixture disclosed for radiation in the range of 600 to 700 nm is sensitive. It comprises a polymerizable, ethylenic unsaturated compound, a radical generator and a substituted one 2-phenyl-2H-naphtho [6,5,4-a, m, n] thioxanthene-1,3-dione or a substituted 3-alkoxy-2-phenyl-naphtho [6,5,4-a, m, n] thioxanthen-1-one as a sensitizer.
  • the subject of EP-A-0 441 524 is one upon irradiation crosslinking composition with a polymer to which mono-, di- or trihalomethyl-substituted [1,3,5] triazine residues via a Bridge group are covalently bonded.
  • the base polymer may be made a variety of polymers are selected.
  • a polyamide a polyester, a polyurethane, a Polysiloxane, a phenolic resin, a polystyrene, a polyacrylate, a Polyacrylic acid, a polyacrylamide, a polyacrylonitrile, a Polyethylene, a polybutadiene, polyvinylpyrrolidone, polycaprolactone, Gelatin, starch or a polysaccharide.
  • EP-A 0 563 925 is a photopolymerizable mixture discloses a radically polymerizable monomer substituted 2-phenyl-4-halomethyl (or 4,6-bis-halomethyl) - [1,3,5] triazine and a compound known as Sensitizer for the triazine. The mixture is used for the production of negative-working printing plates.
  • a directly imageable recording material for the production of planographic printing plates is described in EP-A 1,106,381. It comprises an electrochemically roughened carrier of a special aluminum alloy and a photosensitive layer, an IR absorber and a water-insoluble, but alkali-soluble contains polymeric binder.
  • a photosensitive layer comprises a monomer with one or more polymerisable, substituted acrylate group (s) or derivatives thereof and a Photopolymerization initiator contains.
  • a Photopolymerization initiator contains.
  • Preferred initiators are aromatic ketones, aromatic onium salts, organic peroxides, Hexaarylbiimidazole, borates, metallocenes and compounds with Carbon-halogen bonds. The latter also count optionally further substituted [1,3,5] triazines with Trihalogenmethyl Reliefn.
  • the photosensitive layer may be next to it Sensitizer dyes included.
  • On the photosensitive Layer may additionally be a polyvinyl alcohol layer.
  • a major disadvantage of this recording material is in that the monomers are synthetically difficult to access and thus are correspondingly expensive. Furthermore, the reactivity and so that the photosensitivity of the layer is reduced.
  • EP-A-1 176 007 and EP-A-1 162 078 describe a radiation-sensitive A mixture comprising a free-radically polymerizable (meth) acrylate monomer having at least two (Meth) acrylate groups and at least one photooxidizable group, a Radical initiator, an IR-absorbing heptamethine cyanine dye, and an organic contains polymeric binder.
  • the radical initiator absorbs near infrared radiation.
  • Heptamethine cyanine dye contains and acrylate and / or Methacrylate monomers having at least one photooxidizable group.
  • the subject of the present invention is accordingly a radiation-sensitive mixture containing a radical polymerizable acrylate or methacrylate monomer and / or oligomer with at least two acrylate and / or meth-acrylate groups and at least one photooxidizable group, a photoinitiator, an IR absorbing dye and an organic polymer Contains binder, and characterized in that the IR-absorbing Dye is a heptamethine cyanine dye, that the mixture is sensitive to the near infrared region, and the photoinitiator does not absorb this radiation.
  • heptamethine cyanine dyes in which 3 Methine carbon atoms part of a 5- to 7-membered isocyclic or heterocyclic ring.
  • the name "Heptamethine cyanine dyes” includes amphoteric as well as ionic Connections.
  • the aromatic end groups in the dyes are preferably indole or indolium groups, to which, if appropriate still more rings, especially carbocyclic rings, fused could be.
  • the binder can be made from a whole range of organic Be selected polymers. Also mixtures of different binders can be used. Suitable examples are chlorinated Polyalkylenes (especially chlorinated polyethylene and chlorinated Polypropylene), poly (meth) acrylic acid alkyl ester or alkenyl ester (in particular polymethyl (meth) acrylate, polyethyl (meth) acrylate, Polybutyl (meth) acrylate, polyisobutyl (meth) acrylate, Polyhexyl (meth) acrylate, poly [(2-ethyl-hexyl) - (meth) acrylate] and Poly [allyl (meth) acrylate]), copolymers of (meth) acrylic acid alkyl esters or alkenyl esters with other copolymerisable Monomers (in particular with (meth) acrylonitrile, vinyl chloride, Vinylidene chloride, styrene and / or butadiene), poly
  • binders which Contain carboxy groups, particularly suitable. That's in particular Copolymers containing units of ⁇ , ⁇ -unsaturated carboxylic acids or Dicarboxylic acids (preferably acrylic acid, methacrylic acid, crotonic acid, Vinylacetic acid, maleic acid or itaconic acid).
  • copolymers with units of (meth) acrylic acid and Units of alkyl (meth) acrylates, allyl methacrylates and / or (Meth) acrylonitrile, as well as copolymers with units of Crotonic acid and units of alkyl (meth) acrylates and / or (Meth) acrylonitrile, and finally vinylacetic acid / alkyl (meth) acrylate copolymers.
  • copolymers with Units of maleic anhydride or maleic acid monoalkyl esters are also suitable.
  • copolymers with units Maleic anhydride and styrene, substituted styrenes, unsaturated ethers or esters or unsaturated aliphatic ones Hydrocarbons, as well as those obtainable from such copolymers Esterification.
  • products from the Reaction of hydroxyl-containing polymers with intramolecular Dicarboxylic anhydrides arise.
  • copolymers here are polymers with units of at least 2 different Monomers are understood, including terpolymers and higher Copolymers. Also useful are polymers in which groups with acidic hydrogen atoms occur, part or all of them with activated isocyanates is reacted.
  • (meth) acrylic acid is related to the present invention for "acrylic acid and / or methacrylic acid”. The same applies to (meth) acrylonitrile, - (meth) acrylate, (meth) acrylamide, etc.
  • the organic polymers used as binders have in general, a mean molecular weight Mw of 600 to 200,000, preferably 1,000 to 100,000. Preference is furthermore given to polymers which an acid number between 10 and 250, preferably from 20 to 200, or a hydroxyl number of 50 to 750, preferably 100 to 500, exhibit.
  • the proportion of binder (s) is generally 10 to 90 wt .-%, preferably 20 to 80 wt .-%, each based on the total weight the non-volatile components of the radiation-sensitive Mixture.
  • the radically polymerizable acrylate or methacrylate compound with at least one photooxidizable group For example, a connection with a primary, secondary and in particular tertiary amino group.
  • urea group is meant in context with the present invention, a group of the formula> N-CO-N ⁇ be understood, in which the valencies on the nitrogen atoms with Hydrogen atoms or hydrocarbon radicals are saturated (It should not have more than one valence on each of them Nitrogen atoms are saturated with a hydrogen atom). It is but also possible that a valence on a nitrogen atom the Binding to a carbamoyl group (i.e., a -CO-NH group) producing a biuret structure.
  • Aryl radicals R are generally mono- or binuclear, but preferably mononuclear. They may be substituted by (C 1 -C 5 ) alkyl or (C 1 -C 5 ) alkoxy groups. When R 1 and R 2 are alkyl or alkoxy groups, they preferably contain 1 to 5 carbon atoms. R 3 is preferably a hydrogen atom or a methyl group.
  • X 1 is preferably a straight-chain or branched aliphatic and / or cycloaliphatic radical having preferably 4 to 10 carbon atoms.
  • X 2 comprises in a preferred embodiment 2 to 15 carbon atoms.
  • X 2 is a saturated, straight-chain or branched aliphatic and / or cycloaliphatic radical having this number of carbon atoms. Up to 5 methylene groups in these radicals may be replaced by oxygen atoms.
  • X 2 consists of pure hydrocarbon chains, the radical generally comprises 2 to 12, preferably 2 to 6 carbon atoms. X 2 may also be a cycloaliphatic group having 5 to 10 carbon atoms, in particular a cyclohexanediyl group.
  • the saturated heterocyclic ring formed by D 1 , D 2 and the two nitrogen atoms generally comprises 5 to 10 ring members, in particular 6 ring members.
  • the heterocyclic ring is preferably a piperazine and the radical derived therefrom is a piperazine-1,4-diyl radical.
  • the moiety E in a preferred embodiment is an alkanediyl group, usually comprising about 2 to 6 carbon atoms.
  • the bivalent 5- to 7-membered, saturated, isocyclic group E is preferably a cyclohexanediyl, in particular a cyclohexane-1,4-diyl group.
  • the divalent isocyclic aromatic group E is preferably an ortho, meta or para-phenylene group.
  • the divalent 5- or 6-membered aromatic heterocyclic group E preferably contains nitrogen and / or sulfur atoms in the heterocyclic ring.
  • c is preferably 1, ie each of the radicals in the square bracket generally contains only one polymerisable group, in particular only one (meth) acryloyloxy group.
  • Hydroxyalkylamines are diethanolamine, triethanolamine, tris- (2-hydroxy-propyl) -amine, Tris (2-hydroxybutyl) amine and alkyl bishydroxyalkyl amines.
  • Hydroxy-containing esters are preferably hydroxyethyl (meth) acrylate, Hydroxypropyl (meth) acrylate and hydroxyisopropyl (meth) acrylate used.
  • the compounds of formula II are analogous to those of Formula I prepared, instead of from reaction products Hydroxyalkyl acrylates or alkacrylates and diisocyanates the corresponding acrylic acid or alkacrylic acid glycidester used become. Such compounds and processes for their preparation are otherwise disclosed in EP-A 0 316 706.
  • X 1 , R 3 , a and b in the formula IV have the abovementioned meaning;
  • X 2 represents a divalent hydrocarbon group in which up to 5 methylene groups may be replaced by oxygen atoms.
  • the running number a in this formula is preferably 0 or 1;
  • i is preferably a number from 2 to 10.
  • polymerizable compounds with photooxidizable groups are also reaction products of mono- or diisocyanates with polyhydric alcohols in which all or part of the Hydroxy groups are esterified with (meth) acrylic acid suitable. Preference is given to products as they result from the implementation of Hydroxyalkyl (meth) acrylates with diisocyanates arise.
  • Such Monomers are known and, for example, in DE-A 28 22 190 or DE-A 20 64 079 described.
  • the mixture according to the invention can moreover photopolymerizable acrylate and / or alkacrylate compounds with 2 or more, preferably 3 to 6, acrylate and / or alkacrylate, especially methacrylate groups.
  • This multifunctional Compounds act as crosslinkers.
  • Preferred crosslinkers are (Meth) acrylates of saturated aliphatic or alicyclic, trihydric or polyhydric alcohols, such as alkanediols (especially Ethylene glycol and propylene glycol), bis-phenol-A, trimethylolethane, Trimethylolpropane, pentamethylolpropane, pentaerythritol or Dipentaerythritol.
  • ethoxylated and propoxylated trimethylolpropane tri (meth) acrylate ditrimethylolpropane tetra (meth) acrylate, Tris (2-hydroxyethyl) -isocyanurattri (meth) acrylate or glycerol tri (meth) acrylate.
  • Proportion of crosslinking acrylate and / or Alkacrylate compounds are generally up to 20% by weight, preferably 5 to 15 wt .-%, each based on the total weight of non-volatile constituents of the radiation-sensitive mixture.
  • the proportion of all photopolymerizable monomers or oligomers is generally from 10 to 85% by weight, preferably from 20 to 75% by weight, in each case based on the total weight of the non-volatile Components of the radiation-sensitive mixture. There are generally at least 40% by weight of the photopolymerizable monomers and / or oligomers such with photooxidizable groups.
  • the proportion of heptamethine cyanine dye is general 0.01 to 10.0 wt .-%, preferably 0.5 to 8.0 wt .-%, each based on the total weight of the nonvolatile constituents of the photopolymerizable mixture.
  • Photoinitiators are known per se.
  • Well suited are triazine compounds with at least one photocleavable Trihalogenmethyl devis, in particular a trichloro or Tribromomethyl.
  • the trihalomethyl groups can thereby directly, via a conjugated double bond or via a chain of conjugated double bonds to an aromatic carbocyclic or heterocyclic ring.
  • Such compounds are for example in DE 2 718 259, EP-A 0 137 452 and in EP-A 0 563,925. Basically absorb the used Triazines do not use the radiation used for imaging.
  • Trihalogenmethyltriazine can be used, whose Own absorption is below 300 nm. Such materials are particularly preferred, because thereby the photoreactivity towards the usual interior lighting is reduced.
  • usable Trihalomethyltriazines are, for example, those which are (saturated) aliphatic substituents or unsaturated substituents with only a few extended mesomeric ⁇ -electron systems contain.
  • Proportion of photoinitiator (s) is generally from 0.1 to 20 wt .-%, preferably 1.0 to 10 wt .-%, each based on the total weight the non-volatile constituents of the photopolymerizable Mixture.
  • predispersed phthalocyanine pigments serve primarily for coloring the mixture and the layers produced with it. Their share is generally about 1 to 20 wt .-%, preferably about 2 to 14 wt .-%.
  • Particularly suitable Pre-dispersed phthalocyanine pigments are described in DE-A 199 15 717 and DE-A 199 33 139 discloses. Preferred are in particular metal-free phthalocyanine pigments.
  • additives that inhibit thermally induced polymerization, hydrogen donors, Dyes, colored and colorless pigments, color formers, Filter dyes, indicator dyes, plasticizers and / or Chain transfer agent.
  • additives are suitably selected those that do not absorb the imagewise acting radiation.
  • the radiation-sensitive mixture is useful in a dissolved or dispersed organic solvent and the solution or Dispersion applied as a thin film on the support.
  • the Can be applied by pouring, spraying, dipping, by applying with the help of rollers or similar, known in the art Procedure done. After drying in this way Receive recording material from which, for example Printing forms for high-pressure, planographic, gravure or screen printing let produce. It can also be a material that makes up Relief copies (for example for the production of texts in Braille), single copies, Gerbordinate, Pigmentmul or similar to produce image-structured products.
  • the mixture according to the invention is also suitable for the production of ⁇ tmreservagen, for example, in the production of Printed circuit boards or name tags can be used, as well as for molding. However, it is preferably used for Production of photoresist layers and printing plates.
  • the present invention is accordingly also a Recording material for the production of printing plates with a Carrier and a layer of the invention photopolymerizable mixture.
  • carrier material for printing plates are films, tapes or plates made of metal (in particular made of aluminum or an aluminum alloy, steel, zinc or Copper) or plastic (especially polyester - specifically Polyethylene terephthalate or cellulose acetate), for screen printing media also perlon gauze.
  • metal in particular made of aluminum or an aluminum alloy, steel, zinc or Copper
  • plastic especially polyester - specifically Polyethylene terephthalate or cellulose acetate
  • screen printing media also perlon gauze.
  • the preferred one Support for offset printing plates is made of aluminum or an Al alloy and is electrochemically roughened on its surface, then anodized, optionally also with a hydrophilicizing agent (for example Polyvinylphosphonic acid).
  • the IR laser sources familiar to the person skilled in the art between 700 and 1200 nm are used for imagewise radiation. Preference is given to laser diodes which emit in the NIR range.
  • the novel recording material has a particularly high imaging performance and is therefore particularly suitable for digital imaging with NIR laser beams. In the subsequent development process is then differentiated exactly between non-image areas and image locations, so that the dot gain is surprisingly significantly reduced. Even small negative fonts are therefore still clearly reproduced. At the same time, the material has a very high sensitivity in the NIR wavelength range.
  • the radiation-sensitive layer It is practically essential to protect the radiation-sensitive layer from atmospheric oxygen during NIR-induced polymerization. This is most easily achieved by a covering layer which is impermeable to oxygen or only slightly permeable ("poorly permeable” means a permeability of not more than 100 cm 3 O 2 / m 2 * d * bar, determined in accordance with DIN 53 380 at 23 ° C. ) applied to the radiation-sensitive layer.
  • the cover layer may be self-supporting and be stripped before the subsequent development step. It then consists for example of a laminated polyester film. Also, overcoats of a material that is soluble or dispersible (at least in the uncured areas) in the developer liquid may be used.
  • Suitable materials for a cover layer which is completely soluble in aqueous alkaline developers are, for example, polyvinyl alcohol, polyvinylpyrrolidone, polyphosphates, sugars, etc.
  • the thickness of the cover layer is generally 0.1 to 10 .mu.m, preferably 1 to 5 .mu.m.
  • the printing plate thus obtained was imaged with a CREO Trendsetter 3244T (2400 dpi), heated for 1 min at 100 ° C and then with an aqueous-alkaline developer (Agfa EN 231C) at 28 ° C at a flow rate of 1 m / min. (Agfa VSP85).
  • the indicated sensitivity corresponded to that laser energy in the image plane which was required to make a 50% field formed of 1x1 and 8x8 pixels appear bright. The value determined in this way was 18 mJ / cm 2 .

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Claims (20)

  1. Mélange sensible au rayonnement qui contient un monomère et/ou un oligomère d'acrylate et/ou de méthacrylate apte à une polymérisation radicalaire comprenant au moins deux groupes acrylate et/ou méthacrylate et au moins un groupe photo-oxydable, un photo-initiateur, un colorant absorbant le rayonnement infrarouge et un liant polymère organique, caractérisé en ce que le colorant absorbant l'infrarouge est un colorant d'heptaméthine cyanine, en ce que le mélange manifeste une sensibilité pour le domaine de l'infrarouge proche, le photoinitiateur n'absorbant pas ce rayonnement.
  2. Mélange selon la revendication 1, caractérisé en ce que 3 atomes de carbone du groupe méthine dans la chaíne heptaméthine du colorant font partie d'un noyau isocyclique ou hétérocyclique pentagonal à heptagonal.
  3. Mélange selon la revendication 1 ou 2, caractérisé en ce que les deux groupes terminaux aromatiques dans les colorants d'heptaméthine cyanine représentent des groupes indole et/ou indolium auxquels peut être condensé le cas échéant encore au moins un noyau supplémentaire.
  4. Mélange selon une ou plusieurs des revendications 1 à 3, caractérisé en ce que le colorant d'heptaméthine cyanine répond à la formule V
    Figure 00380001
    dans laquelle
    R1 = R2 = H ou R1 et R2 représentent ensemble un groupe -CH=CH-CH=CH- où R1 forme, ensemble avec R2 un noyau hexagonal condensé ;
    R3 représente un groupe méthyle, un groupe éthyle, un groupe propyle ou un groupe butyle ;
    X représente un groupe -(CH2)3- ou un groupe -(CH2)2- ;
    Y représente
    Figure 00390001
    ou bien répond à la formule VI
    Figure 00390002
    dans laquelle
    R1 = R2 = H ou R1 et R2 représentent ensemble un groupe -CH=CH-CH=CH- où R1 forme, ensemble avec R2 un noyau hexagonal condensé ;
    R3 représente un groupe méthyle, un groupe éthyle, un groupe propyle ou un groupe butyle ;
    R4 représente un atome d'hydrogène, un atome de chloré,
    Figure 00390003
    X représente un groupe -(CH2)3- ou un groupe -(CH2)2- ;
    Y représente un groupe Br-, un groupe Cl-, un groupe I-, un groupe pTosO-, un groupe ClO4 -, un groupe BF4 - ou un groupe PF6 -.
  5. Mélange selon une ou plusieurs des revendications 1 à 4, caractérisé en ce que la fraction du colorant d'heptaméthine cyanine représente de 0,01 à 10 % en poids, de préférence de 0,5 à 8,0 % en poids, chaque fois rapportés au poids total des constituants non volatils du mélange.
  6. Mélange selon une ou plusieurs des revendications 1 à 5, caractérisé en ce que le monomère d'acrylate ou de méthacrylate apte à une polymérisation radicalaire contient deux groupes acrylate ou méthacrylate.
  7. Mélange selon revendication 6, caractérisé en ce que le groupe photo-oxydable dans le monomère ou le oligomère d'acrylate ou de méthacrylate apte à une polymérisation radicalaire est un groupe amino primaire, secondaire ou tertiaire, un groupe urée, un groupe thio et/ou un groupe uréthane.
  8. Mélange selon une ou plusieurs des revendications 1 à 7, caractérisé en ce que la fraction de tous les monomères ou de tous les oligomères photopolymérisables représente en général de 10 à 85 % en poids, de préférence de 20 à 75 % en poids, chaque fois rapportés au poids total des constituants non volatils du mélange.
  9. Mélange selon la revendication 8, caractérisé en ce que la fraction des monomères ou des oligomères photopolymérisables contenant des groupes photo-oxydables représente au moins 40 % en poids, rapportés au poids total de tous les monomères et/ou de tous les oligomères photopolymérisables.
  10. Mélange selon une ou plusieurs des revendications 1 à 9, caractérisé en ce que le photo-initiateur contient un composé de triazine comprenant au moins un groupe trihalogénométhyle apte à être clivé par voie photolytique, en particulier un groupe trichlorométhyle ou un groupe tribromométhyle.
  11. Mélange selon une ou plusieurs des revendications 1 à 10, caractérisé en ce que la fraction du ou des photo-initiateurs représente en général de 0,1 à 20 % en poids, de préférence de 1,0 à 10 % en poids, chaque fois rapportés au poids total des constituants non volatils du mélange.
  12. Mélange selon une ou plusieurs des revendications 1 à 11, caractérisé en ce qu'on met en oeuvre, à titre de liant, des polyalkylènes chlorés (en particulier du polyéthylène chloré et du polypropylène chloré), des esters alkyliques ou des esters alcényliques d'acide poly(méth)acrylique (en particulier le poly(méth)acrylate de méthyle, le poly(méth)acrylate d'éthyle, le poly(méth)acrylate de butyle, le poly(méth)acrylate d'isobutyle, le poly(méth)acrylate d'hexyle, le poly(méth)acrylate de 2-éthylhexyle et le poly(méth)acrylate d'allyle), des copolymères de (méth)acrylate d'alkyle/acide (méth)acrylique, des copolymères d'esters alkyliques ou d'esters alcényliques d'acide (méth)acrylique avec d'autres monomères copolymérisables (en particulier avec le (méth) acrylonitrile, le chlorure de vinyle, le chlorure de vinylidène, le styrène et/ou le butadiène), le chlorure de polyvinyle (PVC), des copolymères de chlorure de vinyle/acrylonitrile, le chlorure de polyvinylidène (PVDC), des copolymères de chlorure de vinylidène/acrylonitrile, l'acétate de polyvinyle, l'alcool polyvinylique, le polyacrylonitrile, des copolymères d'acrylonitrile/styrène, des copolymères de (méth)acrylamide/-(méth)acrylate d'alkyle, des terpolymères d'acrylonitrile/butadiène/-styrène (ABS), du poly-α-méthylstyrène, des polyamides, des polyuréthanes, des polyesters, de la méthylcellulose, de méthylcellulose, de l'acétylcellulose, du polystyrène, des hydroxy(alkyl en C1-C4)celluloses, de la carboxyméthylcellulose, du polyvinylformal et/ou du polyvinylbutyral, ainsi que des acides carboxyliques ou dicarboxyliques à insaturation α,β.
  13. Mélange selon une ou plusieurs des revendications 1 à 12, caractérisé en ce que le liant présente un poids moléculaire moyen Mw de 600 à 200.000, de préférence de 1000 à 100.000, et un indice d'acide entre 10 et 250, de préférence de 20 à 200, ou un indice d'hydroxyle de 50 à 750, de préférence de 100 à 500.
  14. Mélange selon une ou plusieurs des revendications 1 à 13, caractérisé en ce que la fraction du liant, respectivement des liants représente en général de 10 à 90 % en poids, de préférence de 20 à 80 % en poids, chaque fois rapportés au poids total des constituants non volatils du mélange.
  15. Matériau d'enregistrement pour la fabrication de clichés d'impression comprenant un support et une couche constituée du mélange photo-polymérisable selon une ou plusieurs de revendications 1 à 14.
  16. Matériau d'enregistrement selon la revendication 15, caractérisé en ce que le support est une feuille, une bande ou une plaque en matière synthétique ou en métal, de préférence en aluminium ou en un alliage d'aluminium comprenant une surface le cas échéant soumise à un traitement préalable de type mécanique, chimique et/ou électrochimique.
  17. Matériau d'enregistrement selon la revendication 15, caractérisé en ce que, sur la couche sensible au rayonnement, est disposé une couche de recouvrement imperméable ou seulement légèrement perméable à l'oxygène.
  18. Matériau d'enregistrement selon la revendication 17, caractérisé en ce que la couche de recouvrement est constituée d'alcool polyvinylique, de polyvinylpyrrolidone, de polyphosphates ou d'un sucre.
  19. Matériau d'enregistrement selon la revendication 17, caractérisé en ce que la couche de recouvrement présente une épaisseur de 0,1 à 10 µm, de préférence de 1 à 5 µm.
  20. Procédé pour la fabrication d'un cliché d'impression constitué du matériau d'enregistrement selon une ou plusieurs des revendications 15 à 19, caractérisé en ce qu'on expose le matériau d'enregistrement en forme d'image à des rayons laser infrarouge d'une longueur d'onde entre 700 et 1200 nm, avant de développer avec un solvant organique ou un mélange de solvants organiques ou avec une solution aqueuse-alcaline.
EP20020100424 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression Expired - Lifetime EP1359008B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE50204080T DE50204080D1 (de) 2002-04-29 2002-04-29 Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
EP20020100424 EP1359008B1 (fr) 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression
US10/425,158 US7314699B2 (en) 2002-04-29 2003-04-29 Radiation-sensitive mixture and recording material produced therewith
JP2003125528A JP2003344997A (ja) 2002-04-29 2003-04-30 放射線感受性混合物およびそれを用いて製造される記録材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20020100424 EP1359008B1 (fr) 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression

Publications (2)

Publication Number Publication Date
EP1359008A1 EP1359008A1 (fr) 2003-11-05
EP1359008B1 true EP1359008B1 (fr) 2005-08-31

Family

ID=28799725

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20020100424 Expired - Lifetime EP1359008B1 (fr) 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression

Country Status (3)

Country Link
EP (1) EP1359008B1 (fr)
JP (1) JP2003344997A (fr)
DE (1) DE50204080D1 (fr)

Families Citing this family (117)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7316891B2 (en) 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
DE102004011347A1 (de) 2004-03-05 2005-09-29 Basf Ag Druckfarben für den Offset- und/oder Hochdruck mit NIR-Absorbern sowie in Offset- und/oder Hochdruckfarben lösliche NIR-Absorber
ATE533089T1 (de) 2004-05-19 2011-11-15 Agfa Graphics Nv Verfahren zur herstellung einer fotopolymer- druckplatte
EP1614541A3 (fr) 2004-07-08 2006-06-07 Agfa-Gevaert Procédé pour la fabrication d'une plaque d'impression lithographique
DE102004058584A1 (de) * 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
DE602005012630D1 (de) 2005-11-18 2009-03-19 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
ATE497192T1 (de) 2005-11-18 2011-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788429B1 (fr) 2005-11-18 2009-03-18 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
EP1788431B1 (fr) 2005-11-18 2009-01-28 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
EP1788442B1 (fr) 2005-11-18 2010-07-28 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
DE602005013536D1 (de) 2005-11-18 2009-05-07 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
PL1788443T3 (pl) 2005-11-18 2014-12-31 Agfa Nv Sposób wytwarzania litograficznej płyty drukowej
EP1788435B1 (fr) 2005-11-21 2013-05-01 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
ES2324542T3 (es) 2005-11-21 2009-08-10 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
EP1788449A1 (fr) 2005-11-21 2007-05-23 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
ES2382371T3 (es) 2008-10-23 2012-06-07 Agfa Graphics N.V. Plancha de impresión litográfica
JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
JP2011148292A (ja) 2009-12-25 2011-08-04 Fujifilm Corp 平版印刷版原版及びその製版方法
EP2339402A1 (fr) 2009-12-28 2011-06-29 Fujifilm Corporation Précurseur de plaque d'impression lithographique et procédé de préparation de plaque d'impression lithographique
JP5322963B2 (ja) 2010-01-29 2013-10-23 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5346845B2 (ja) 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
CN102812402B (zh) 2010-03-19 2015-08-05 富士胶片株式会社 着色感光性组合物、平版印刷版原版和制版方法
WO2011122378A1 (fr) 2010-03-30 2011-10-06 富士フイルム株式会社 Procédé de production d'une plaque d'impression lithographique
CN102834779B (zh) 2010-03-31 2015-07-08 富士胶片株式会社 用于处理平版印刷版原版的显影液,通过使用显影液制备平版印刷版的方法和印刷方法
EP2383118B1 (fr) 2010-04-30 2013-10-16 Fujifilm Corporation Précurseur de plaque d'impression lithographique et procédé de fabrication de plaque correspondant
JP5572576B2 (ja) 2010-04-30 2014-08-13 富士フイルム株式会社 平版印刷版原版及びその製版方法
BR112013003865B1 (pt) 2010-08-27 2020-05-26 Fujifilm Corporation Precursor de placa de impressão litográfica do tipo revelação onpress e método de fabricar placa para realização de um processamento de revelação on-press por um método
JP2012073594A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP5789448B2 (ja) 2010-08-31 2015-10-07 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP5656784B2 (ja) 2010-09-24 2015-01-21 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、並びに平版印刷方法
JP5205505B2 (ja) 2010-12-28 2013-06-05 富士フイルム株式会社 平版印刷版原版及びその平版印刷方法
JP5205483B2 (ja) 2011-02-04 2013-06-05 富士フイルム株式会社 平版印刷版原版及び製版方法
JP5211187B2 (ja) 2011-02-28 2013-06-12 富士フイルム株式会社 平版印刷版原版及び製版方法
JP5244987B2 (ja) 2011-02-28 2013-07-24 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP5186574B2 (ja) 2011-02-28 2013-04-17 富士フイルム株式会社 平版印刷版原版及びその製版方法
EP3001249B1 (fr) 2011-02-28 2019-12-25 FUJIFILM Corporation Précurseurs de plaque d'impression lithographique et procédés de préparation de telles plaques
WO2012133382A1 (fr) 2011-03-28 2012-10-04 富士フイルム株式会社 Procédé de fabrication d'une plaque d'impression lithographique
JP5301015B2 (ja) 2011-07-25 2013-09-25 富士フイルム株式会社 感光性平版印刷版原版及び平版印刷版の作製方法
JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
BR112014002574A2 (pt) 2011-08-22 2019-12-17 Fujifilm Corp precursores de placa de impressão litográfica e processos para preparação de placas de impressão litográfica
JP5432960B2 (ja) 2011-08-24 2014-03-05 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5514781B2 (ja) 2011-08-31 2014-06-04 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作成方法
JP5401522B2 (ja) 2011-09-15 2014-01-29 富士フイルム株式会社 コーティング組成物、ならびに該組成物を用いた、画像形成材料、平版印刷版原版及び酸素遮断性フィルム
JP5732012B2 (ja) 2011-09-26 2015-06-10 富士フイルム株式会社 平版印刷版の製版方法
EP2762973B1 (fr) 2011-09-26 2017-11-29 Fujifilm Corporation Procédé de fabrication d'une plaque d'impression lithographique
JP5602195B2 (ja) 2011-09-27 2014-10-08 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5740275B2 (ja) 2011-09-30 2015-06-24 富士フイルム株式会社 機上現像型の平版印刷版原版を用いる印刷方法
JP5695267B2 (ja) 2012-02-20 2015-04-01 富士フイルム株式会社 製版処理廃液の濃縮方法およびリサイクル方法
CN104159976B (zh) 2012-02-23 2016-10-12 富士胶片株式会社 发色性组合物、发色性固化组合物、平版印刷版原版及制版方法、以及发色性化合物
US9329479B2 (en) 2012-06-05 2016-05-03 Agfa Graphics Nv Lithographic printing plate precusor
JP5786098B2 (ja) 2012-09-20 2015-09-30 富士フイルム株式会社 平版印刷版原版及び製版方法
EP2902214B1 (fr) 2012-09-26 2017-09-27 FUJIFILM Corporation Plaque lithographique présensibilisée et procédé de fabrication de plaque d'impression lithographique
CN104703809B (zh) 2012-09-26 2017-03-08 富士胶片株式会社 平版印刷版原版及制版方法
CN105190436A (zh) 2013-02-27 2015-12-23 富士胶片株式会社 红外线感光性显色组合物、红外线固化性显色组合物、平版印刷版原版和制版方法
EP3008517A1 (fr) 2013-06-14 2016-04-20 Agfa Graphics N.V. Précurseur de plaque d'impression lithographique
EP2883699B1 (fr) 2013-12-11 2017-05-03 Agfa Graphics Nv Précurseur de plaque d'impression lithographique et monomère
WO2015115598A1 (fr) 2014-01-31 2015-08-06 富士フイルム株式会社 Composition de révélation chromogène sensible aux infrarouges, plaque d'original d'impression lithographique, procédé de fabrication de plaque pour plaque d'impression lithographique, et révélateur chromogène sensible aux infrarouges
CN105960335B (zh) 2014-02-04 2020-12-11 富士胶片株式会社 平版印刷版原版及其制造方法、平版印刷版的制版方法以及印刷方法
EP2916171B1 (fr) 2014-03-03 2017-05-31 Agfa Graphics Nv Procédé pour réaliser un précurseur de plaque d'impression lithographique
CN108698426B (zh) 2016-02-29 2021-04-09 富士胶片株式会社 平版印刷版原版及平版印刷版的制版方法
BR112019009802B1 (pt) 2016-11-16 2022-12-13 Fujifilm Corporation Precursor de placa de impressão planográfica em prensa e método para fabricação de placa em prensa para placa de impressão planográfica
CN110268333A (zh) 2017-02-28 2019-09-20 富士胶片株式会社 平版印刷版的制作方法
BR112019017946B8 (pt) 2017-02-28 2023-03-21 Fujifilm Corp Métodos para produção de uma chapa de impressão litográfica do tipo revelação em máquina
CN110366567A (zh) 2017-02-28 2019-10-22 富士胶片株式会社 固化性组合物、平版印刷版原版及平版印刷版的制作方法
JP6934939B2 (ja) 2017-05-31 2021-09-15 富士フイルム株式会社 平版印刷版原版、及び平版印刷版の作製方法
WO2018221134A1 (fr) 2017-05-31 2018-12-06 富士フイルム株式会社 Plaque originale d'impression lithographique, composition de résine pour fabrication de plaque originale d'impression lithographique, ainsi que procédé de fabrication de plaque d'impression lithographique
CN110730722B (zh) 2017-06-12 2021-08-31 富士胶片株式会社 平版印刷版原版、平版印刷版的制版方法、有机聚合物粒子及感光性树脂组合物
CN110809521B (zh) 2017-06-30 2022-01-07 富士胶片株式会社 平版印刷版原版及平版印刷版的制作方法
JP6621570B2 (ja) 2017-07-13 2019-12-18 富士フイルム株式会社 平版印刷版原版、及び、平版印刷版の作製方法
EP3431290B1 (fr) 2017-07-20 2021-09-08 Agfa Nv Précurseur de plaque d'impression lithographique
WO2019021828A1 (fr) 2017-07-25 2019-01-31 富士フイルム株式会社 Plaque originale pour plaque d'impression lithographique, procédé de fabrication de plaque d'impression lithographique, et composition de coloration
EP3441223B1 (fr) 2017-08-07 2024-02-21 Eco3 Bv Précurseur de plaque d'impression lithographique
EP3474073B1 (fr) 2017-10-17 2022-12-07 Agfa Offset Bv Methode pour la fabrication d'une plaque d'impression
CN111683820B (zh) 2018-01-31 2022-06-17 富士胶片株式会社 平版印刷版原版及平版印刷版的制作方法
WO2019179995A1 (fr) 2018-03-22 2019-09-26 Agfa Nv Précurseur de plaque d'impression lithographique
US11813838B2 (en) 2018-05-14 2023-11-14 Agfa Offset Bv Lithographic printing plate precursor
EP3587113B1 (fr) 2018-06-21 2023-01-04 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP3587112B1 (fr) 2018-06-21 2024-04-03 Eco3 Bv Précurseur de plaque d'impression lithographique
EP3831613B1 (fr) 2018-07-31 2023-09-06 FUJIFILM Corporation Précurseur de plaque d'impression planographique
EP3831614B1 (fr) 2018-07-31 2023-09-06 FUJIFILM Corporation Plaque originale de plaque d'impression planographique, corps stratifié de plaque originale de plaque d'impression planographique, procédé de fabrication de plaque pour plaque d'impression planographique, et procédé d'impression planographique
WO2020045586A1 (fr) 2018-08-31 2020-03-05 富士フイルム株式会社 Plaque originale d'impression à plat, procédé de fabrication d'une plaque d'impression à plat, procédé d'impression à plat et composition durcissable
EP3858636B1 (fr) 2018-09-28 2024-09-18 FUJIFILM Corporation Précurseur de plaque d'impression et procédé de fabrication de plaque d'impression
WO2020067374A1 (fr) 2018-09-28 2020-04-02 富士フイルム株式会社 Plaque originale pour impression, stratifié de plaque originale pour impression, procédé de fabrication de plaque d'impression et procédé d'impression
EP3637188A1 (fr) 2018-10-08 2020-04-15 Agfa Nv Précurseur de révélateur effervescent pour le traitement d'un précurseur de plaque d'impression lithographique
WO2020090996A1 (fr) 2018-10-31 2020-05-07 富士フイルム株式会社 Plaque originale de plaque d'impression lithographique, procédé de production de plaque d'impression lithographique et procédé d'impression lithographique
WO2020090995A1 (fr) 2018-10-31 2020-05-07 富士フイルム株式会社 Plaque originale de plaque d'impression lithographique, procédé de production de plaque d'impression lithographique et procédé d'impression lithographique
EP3650938A1 (fr) 2018-11-09 2020-05-13 Agfa Nv Précurseur de plaque d'impression lithographique
CN109814337A (zh) * 2019-01-25 2019-05-28 安徽强邦印刷材料有限公司 一种双涂层直接上机免处理ctp版
WO2020158287A1 (fr) 2019-01-31 2020-08-06 富士フイルム株式会社 Plaque originale de plaque d'impression lithographique, procédé de fabrication de plaque d'impression lithographique et procédé d'impression lithographique
CN113474178B (zh) 2019-01-31 2023-09-15 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
JP7351862B2 (ja) 2019-01-31 2023-09-27 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JPWO2020158139A1 (ja) 2019-01-31 2021-10-14 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7282886B2 (ja) 2019-06-28 2023-05-29 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7372324B2 (ja) 2019-06-28 2023-10-31 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JPWO2020262694A1 (fr) 2019-06-28 2020-12-30
CN114051598A (zh) 2019-06-28 2022-02-15 富士胶片株式会社 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法
EP3991983A4 (fr) 2019-06-28 2022-08-10 FUJIFILM Corporation Plaque originale pour plaque d'impression lithographique de type à développement sur presse, procédé de fabrication de plaque d'impression lithographique et procédé d'impression lithographique
CN114126889B (zh) 2019-06-28 2024-01-26 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
CN114051459B (zh) 2019-06-28 2024-07-23 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
CN114072290B (zh) 2019-06-28 2024-04-30 富士胶片株式会社 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法
WO2021065152A1 (fr) 2019-09-30 2021-04-08 富士フイルム株式会社 Plaque originale d'impression planographique, procédé de fabrication de plaque d'impression planographique, et procédé d'impression planographique
EP4039476A4 (fr) 2019-09-30 2023-05-03 FUJIFILM Corporation Plaque originale pour plaque d'impression lithographique, procédé de fabrication de plaque d'impression lithographique, et procédé d'impression lithographique
WO2021065278A1 (fr) 2019-09-30 2021-04-08 富士フイルム株式会社 Plaque originale pour plaque d'impression lithographique, procédé de fabrication de plaque d'impression lithographique, et procédé d'impression lithographique
EP3815900A1 (fr) 2019-10-31 2021-05-05 Agfa Nv Précurseur de plaque d'impression lithographique et procédé de fabrication de particules de résine hydrophobe
EP4082791A4 (fr) 2019-12-27 2023-06-21 FUJIFILM Corporation Procédé d'impression à plat
JP7397164B2 (ja) 2020-02-28 2023-12-12 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
EP3875271A1 (fr) 2020-03-04 2021-09-08 Agfa Nv Précurseur de plaque d'impression lithographique
EP3892469B1 (fr) 2020-04-10 2023-11-08 Eco3 Bv Plaque d'impression lithographique
EP3922462B1 (fr) 2020-06-08 2023-03-01 Agfa Offset Bv Précurseur de plaque d'impression photopolymère lithographique ayant une meilleure stabilité à la lumière du jour
CN116601006A (zh) 2020-12-16 2023-08-15 爱克发胶印有限公司 平版印刷机印活准备方法
EP4269122A4 (fr) 2020-12-25 2024-05-22 FUJIFILM Corporation Stratifié de plaque d'origine de plaque d'impression lithographique négative et procédé de fabrication de plaque d'impression lithographique négative
EP4035897A1 (fr) 2021-01-28 2022-08-03 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP4129682A1 (fr) 2021-08-05 2023-02-08 Agfa Offset Bv Précurseur de plaque d'impression lithographique
JPWO2023032868A1 (fr) 2021-08-31 2023-03-09
EP4223534A1 (fr) 2022-02-07 2023-08-09 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP4239411A1 (fr) 2022-03-04 2023-09-06 Eco3 Bv Appareil et procédé de traitement d'un précurseur de plaque d'impression lithographique
EP4382306A1 (fr) 2022-12-08 2024-06-12 Eco3 Bv Procédé de préparation de presse d'impression lithographique

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2718259C2 (de) 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
DE3337024A1 (de) 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPH01126302A (ja) 1987-11-10 1989-05-18 Nippon Paint Co Ltd 光重合性組成物
US5117636A (en) 1990-02-05 1992-06-02 General Electric Company Low nox emission in gas turbine system
JPH05281728A (ja) 1992-04-01 1993-10-29 Fuji Photo Film Co Ltd 光重合性組成物
DE19915717A1 (de) 1999-04-08 2000-10-12 Agfa Gevaert Ag Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht
DE19933139A1 (de) 1999-07-19 2001-01-25 Agfa Gevaert Ag Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
JP4037015B2 (ja) 1999-09-22 2008-01-23 富士フイルム株式会社 光重合性組成物、画像形成材料及び平版印刷版用版材
US6638686B2 (en) 1999-12-09 2003-10-28 Fuji Photo Film Co., Ltd. Planographic printing plate
JP4335416B2 (ja) * 2000-06-06 2009-09-30 富士フイルム株式会社 画像形成材料及び赤外線吸収色素
JP4156784B2 (ja) * 2000-07-25 2008-09-24 富士フイルム株式会社 ネガ型画像記録材料及び画像形成方法
JP4253432B2 (ja) * 2000-11-01 2009-04-15 富士フイルム株式会社 平版印刷版用原版
JP4319363B2 (ja) * 2001-01-15 2009-08-26 富士フイルム株式会社 ネガ型画像記録材料

Also Published As

Publication number Publication date
JP2003344997A (ja) 2003-12-03
DE50204080D1 (de) 2005-10-06
EP1359008A1 (fr) 2003-11-05

Similar Documents

Publication Publication Date Title
EP1359008B1 (fr) Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression
DE10250626B4 (de) Lichtempfindliche Zusammensetzung
EP0332044B1 (fr) Composés hétérocycliques contenant des groupes 4,6-bis-trichlométhyl-s-triazin-2-yles, procédé pour leur préparation et mélange photosensible les contenant
DE19940921A1 (de) Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial
DE19906823C2 (de) IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten
DE602005005058T2 (de) Bebilderbares element mit lösungsmittelbeständigem polymerem bindemittel
DE10103964B4 (de) Lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Relief-Bildes unter Verwendung dieser Zusammensetzung
DE10255667B4 (de) Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
DE69612687T2 (de) Sensibilisierte fotopolymerisierbare Zusammensetzungen und ihre Verwendung in lithographischen Druckplatten
EP0316706B1 (fr) Composés polymérisables et mélange polymérisable par radiation les contenant
DE3822909C2 (de) Photopolymerisierbares Gemisch
DE69418918T2 (de) Durch Wasser entwickelbares infrarotempfindliches photographisches Element
DE60127089T2 (de) Negativ arbeitende licht- oder wärmeempfindliche lithographische Druckplatte
DE60127043T2 (de) Negativ-Aufzeichnungsmaterial und Bebilderungsverfahren
DE69014913T2 (de) Lichtempfindliche Zusammensetzung.
DE60213728T2 (de) Bildaufzeichnungsmedium
DE69817345T2 (de) Digitale druckplatte mit einer thermischen maske
DE60304889T2 (de) Heterosubstituierte arylessigsäure-co-initiatoren für ir-empfindliche zusammensetzungen
EP0364735A1 (fr) Mélange photopolymérisable et matériau d'enregistrement fabriqué à partir de celui-ci
EP0321828B1 (fr) Mélange photopolymérisable et matériau d'enregistrement fabriqué à partir de celui-ci
US20070059638A1 (en) Photosensitive resin composition
DE3928825A1 (de) Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
CN101479663A (zh) 负性工作辐射-敏感性组合物和可成像组件
EP0354475A2 (fr) Matériel pour l'enregistrement photopolymérisable
US20070059637A1 (en) Photosensitive resin composition

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Extension state: AL LT LV MK RO SI

17P Request for examination filed

Effective date: 20040506

AKX Designation fees paid

Designated state(s): DE FR GB

17Q First examination report despatched

Effective date: 20040621

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

RTI1 Title (correction)

Free format text: RADIATION-SENSITIVE MIXTURE, RECORDING MATERIAL USING THIS MIXTURE, AND METHOD FOR PREPARING A PRINTING PLATE

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REF Corresponds to:

Ref document number: 50204080

Country of ref document: DE

Date of ref document: 20051006

Kind code of ref document: P

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20060601

REG Reference to a national code

Ref country code: GB

Ref legal event code: 732E

REG Reference to a national code

Ref country code: FR

Ref legal event code: TP

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 15

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 16

REG Reference to a national code

Ref country code: DE

Ref legal event code: R081

Ref document number: 50204080

Country of ref document: DE

Owner name: AGFA NV, BE

Free format text: FORMER OWNER: AGFA GRAPHICS N.V., MORTSEL, BE

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 17

REG Reference to a national code

Ref country code: FR

Ref legal event code: CD

Owner name: AGFA NV, BE

Effective date: 20180628

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20200210

Year of fee payment: 19

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20200210

Year of fee payment: 19

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20200211

Year of fee payment: 19

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 50204080

Country of ref document: DE

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20210429

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211103

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210429

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210430