EP1359008A1 - Mélange photosensible et matériau pour l'enregistrement utilisant ce mélange - Google Patents

Mélange photosensible et matériau pour l'enregistrement utilisant ce mélange Download PDF

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Publication number
EP1359008A1
EP1359008A1 EP02100424A EP02100424A EP1359008A1 EP 1359008 A1 EP1359008 A1 EP 1359008A1 EP 02100424 A EP02100424 A EP 02100424A EP 02100424 A EP02100424 A EP 02100424A EP 1359008 A1 EP1359008 A1 EP 1359008A1
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EP
European Patent Office
Prior art keywords
meth
acrylate
mixture
mixture according
weight
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EP02100424A
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German (de)
English (en)
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EP1359008B1 (fr
Inventor
Willi - Kurt c/o AGFA-GEVAERT Gries
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Agfa Gevaert NV
Agfa Gevaert AG
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Agfa Gevaert NV
Agfa Gevaert AG
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Priority to DE50204080T priority Critical patent/DE50204080D1/de
Priority to EP20020100424 priority patent/EP1359008B1/fr
Priority to US10/425,158 priority patent/US7314699B2/en
Priority to JP2003125528A priority patent/JP2003344997A/ja
Publication of EP1359008A1 publication Critical patent/EP1359008A1/fr
Application granted granted Critical
Publication of EP1359008B1 publication Critical patent/EP1359008B1/fr
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/12Developable by an organic solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/264Polyesters; Polycarbonates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/266Polyurethanes; Polyureas
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/46Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
    • B41M5/465Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black

Definitions

  • the invention relates to a radiation sensitive (photopolymerizable) mixture with a polymeric binder, a radically photopolymerizable component, one Infrared absorber and a triazine. It continues to affect one Recording material with a support and a radiation-sensitive Layer.
  • a mixture of the type mentioned is already in EP-A 0 369 645. It includes a radically polymerizable one Monomer and a photoinitiator system soluble therein, the trihalomethyl-substituted 1,3,5-triazine, a sensitizer for the triazine and an electron donor compound with a Oxidation potential greater than zero and less than that of 1,4-dimethoxy-benzene contains.
  • sensitizers are coumarin, Xanthene, acridine, thiazole, thiazine, oxazine, azine, aminoketone, Methine and polymethine dyes, porphyrins, aminotriarylmethanes, Merocyanines, squarylium and pyridinium dyes called. they are particularly sensitive to radiation in the range from 350 to 700 nm. For radiation in the near IR range (700 to 1200 nm) is the Sensitivity, on the other hand, is only slight.
  • EP-A 0 315 988 also describes a photopolymerizable one Mixture disclosed that for radiation in the range of 600 to 700 nm is sensitive. It includes a polymerizable, ethylenic unsaturated compound, a radical generator and a substituted one 2-phenyl-2H-naphtho [6,5,4-a, m, n] thioxanthene-1,3-dione or a substituted 3-alkoxy-2-phenyl-naphtho [6,5,4-a, m, n] thioxanthen-1-one as a sensitizer.
  • EP-A 0 441 542 relates to radiation crosslinking composition with a polymer to which mono-, dioder trihalomethyl-substituted [1,3,5] triazine residues via a Bridge group are covalently bound.
  • the base polymer can be made from a variety of polymers can be selected. It can for example a polyamide, a polyester, a polyurethane Polysiloxane, a phenolic resin, a polystyrene, a polyacrylate, a Polyacrylic acid, a polyacrylamide, a polyacrylonitrile Polyethylene, a polybutadiene, polyvinylpyrrolidone, polycaprolactone, Gelatin, starch or a polysaccharide.
  • EP-A 0 563 925 describes a photopolymerizable mixture discloses a radically polymerizable monomer substituted 2-phenyl-4-halomethyl (or 4,6-bishalogenmethyl) - [1,3,5] triazine as well as a connection that as Sensitizer for the triazine acts. The mixture will used for the production of negative working printing plates.
  • a directly imageable recording material for production of planographic printing plates is described in EP-A 1 106 381. It comprises an electrochemically roughened carrier from a special aluminum alloy and a light-sensitive layer, which is an IR absorber and a water-insoluble but alkali-soluble contains polymeric binder.
  • a photosensitive layer comprises the a monomer with one or more polymerizable, substituted acrylate group / s or derivatives thereof and one Contains photopolymerization initiator.
  • Preferred initiators are aromatic ketones, aromatic onium salts, organic peroxides, Hexaarylbiimidazoles, borates, metallocenes and compounds with Carbon-halogen bonds.
  • the latter also include optionally further substituted [1,3,5] triazines with trihalomethyl groups.
  • the light-sensitive layer can also Sensitizer dyes included.
  • On the photosensitive Layer can also be a polyvinyl alcohol layer.
  • the task is solved with a radiation sensitive Mixture that absorbs in the range of 700 to 1,200 nm Contains heptamethine cyanine dye and acrylate and / or Methacrylate monomers with at least one photooxidizable group.
  • the present invention accordingly relates to radiation sensitive mixture which is a radical polymerizable acrylate or methacrylate monomer and / or oligomer with at least two acrylate and / or meth-acrylate groups and at least one photooxidizable group, a photoinitiator, an IR absorbing dye and an organic polymer Contains binders, and is characterized in that the IR-absorbing Dye is a heptamethine cyanine dye.
  • Heptamethine cyanine dyes are preferred in which 3 Methine carbon atoms part of a 5- to 7-membered isocyclic or heterocyclic ring.
  • the label "Heptamethine cyanine dyes” includes amphoteric as well as ionic Connections.
  • the aromatic end groups in the dyes are preferred indole or indolium groups to which, if appropriate other rings, in particular carbocyclic rings, fused could be.
  • the binder can be selected from a whole range of organic polymers. Mixtures of different binders can also be used. For example, chlorinated polyalkylenes (in particular chlorinated polyethylene and chlorinated polypropylene), poly (meth) acrylic acid alkyl esters or alkenyl esters (in particular polymethyl (meth) acrylate, polyethyl (meth) acrylate, polybutyl (meth) acrylate, polyisobutyl (meth) acrylate, Polyhexyl (meth) acrylate, poly [(2-ethylhexyl) - (meth) acrylate] and poly [allyl (meth) acrylate]), copolymers of (meth) acrylic acid alkyl esters or alkenyl esters with other copolymerizable monomers (in particular with (meth ) acrylonitrile, vinyl chloride, vinylidene chloride, styrene and / or butadiene), polyviny
  • binders are the Contain carboxy groups, particularly suitable. That is in particular Copolymers with units from ⁇ , ⁇ -unsaturated carboxylic acids or Dicarboxylic acids (preferably acrylic acid, methacrylic acid, crotonic acid, Vinyl acetic acid, maleic acid or itaconic acid).
  • copolymers with units of (meth) acrylic acid and Units from alkyl (meth) acrylates, allyl methacrylates and / or (Meth) acrylonitrile as well as copolymers with units Crotonic acid and units from alkyl (meth) acrylates and / or (Meth) acrylonitrile, finally also vinyl acetic acid / Alkyl (meth) acrylate copolymers.
  • copolymers with units Maleic anhydride and styrene, substituted styrenes, unsaturated ethers or esters or unsaturated aliphatic Hydrocarbons, as well as those obtainable from such copolymers Esterification.
  • products that come from the Implementation of hydroxyl-containing polymers with intramolecular ones Dicarboxylic anhydrides arise.
  • copolymers here are polymers with units of at least 2 different Monomers are understood, including terpolymers and higher Copolymers. Polymers in which groups with acidic hydrogen atoms occur, some or all of which have activated isocyanates is implemented.
  • Polymers with aliphatic or aromatic sulfonyl isocyanates or phosphinic acid isocyanates are well suited finally also polymers with aliphatic or aromatic Hydroxy groups, for example copolymers with units Hydroxyalkyl (meth) acrylates, from allyl alcohol, from hydroxystyrene or from vinyl alcohol, and epoxy resins, if one wear a sufficient number of free OH groups.
  • (meth) acrylic acid is related to the present invention for "acrylic acid and / or methacrylic acid”. The same applies to (meth) acrylonitrile, - (meth) acrylate, - (meth) acrylamide etc.
  • the organic polymers used as binders generally an average molecular weight Mw of 600 to 200,000, preferably 1,000 to 100,000. Also preferred are polymers that an acid number between 10 and 250, preferably from 20 to 200, or a hydroxyl number from 50 to 750, preferably from 100 to 500, exhibit.
  • the proportion of binder (s) is generally 10 to 90% by weight. %, preferably 20 to 80 wt .-%, each based on the total weight of the non-volatile components of the radiation-sensitive Mixture.
  • a group is said to be related with the present invention a group of the formula> N-CO-N ⁇ are understood, in which the valences on the nitrogen atoms with Hydrogen atoms or hydrocarbon residues are saturated (there should be no more than one valence on each of the two Nitrogen atoms must be saturated with a hydrogen atom). It is however, it is also possible that a valence on a nitrogen atom Binding to a carbamoyl group (i.e. a -CO-NH group) produces so that a biuret structure is created.
  • Aryl radicals R are generally mononuclear or dinuclear, but preferably mononuclear. They can be substituted by (C 1 -C 5 ) alkyl or (C 1 -C 5 ) alkoxy groups. If R 1 and R 2 are alkyl or alkoxy groups, then they preferably contain 1 to 5 carbon atoms. R 3 is preferably a hydrogen atom or a methyl group.
  • X 1 is preferably a straight-chain or branched aliphatic and / or cycloaliphatic radical with preferably 4 to 10 carbon atoms. In a preferred embodiment, X 2 comprises 2 to 15 carbon atoms.
  • X 2 is a saturated, straight-chain or branched aliphatic and / or cycloaliphatic radical with this number of carbon atoms. Up to 5 methylene groups in these residues can be replaced by oxygen atoms.
  • X 2 consists of pure hydrocarbon chains, the rest generally comprises 2 to 12, preferably 2 to 6, carbon atoms.
  • X 2 can also be a cycloaliphatic group with 5 to 10 carbon atoms, in particular a cyclohexanediyl group.
  • the saturated heterocyclic ring formed by D 1 , D 2 and the two nitrogen atoms generally comprises 5 to 10 ring members, in particular 6 ring members.
  • the heterocyclic ring is accordingly preferably a piperazine and the radical derived therefrom is a piperazine-1,4-diyl radical.
  • the radical E is an alkanediyl group which usually comprises about 2 to 6 carbon atoms.
  • the divalent 5- to 7-membered, saturated, isocyclic group E is preferably a cyclohexanediyl, in particular a cyclohexane-1,4-diyl group.
  • the divalent, isocyclic, aromatic group E is preferably an ortho-, meta- or para-phenylene group.
  • the divalent 5- or 6-membered aromatic heterocyclic group E preferably contains nitrogen and / or sulfur atoms in the heterocyclic ring.
  • c is preferably 1, ie each of the radicals in the square bracket generally contains only one polymerizable group, in particular only one (meth) acryloyloxy group.
  • hydroxyalkylamines used as starting materials are diethanolamine, triethanolamine, tris- (2-hydroxypropyl) amine, Tris (2-hydroxy-butyl) amine and alkyl bis-hydroxyalkyl amines.
  • esters containing are preferably hydroxyethyl (meth) acrylate, Hydroxypropyl (meth) acrylate and hydroxyisopropyl (meth) acrylate used.
  • the compounds of formula II are analogous to those of Formula I prepared, being instead of reaction products Hydroxy-alkyl acrylates or alkacrylates and diisocyanates corresponding acrylic acid or alkacrylic acid glycide ester used become. Such compounds and processes for their preparation are otherwise disclosed in EP-A 0 316 706.
  • X 1 , R 3 , a and b have the meaning given above in formula IV;
  • X 2 represents a divalent hydrocarbon group in which up to 5 methylene groups can be replaced by oxygen atoms.
  • the running number a is preferably 0 or 1;
  • i is preferably a number from 2 to 10.
  • polymerizable compounds with photooxidizable groups are also reaction products of mono- or diisocyanates polyhydric alcohols in which all or part of the Hydroxy groups are esterified with (meth) acrylic acid. Products such as those resulting from the implementation of Hydroxyalkyl (meth) acrylates with diisocyanates are formed.
  • Such Monomers are known and for example in DE-A 28 22 190 or DE-A 20 64 079 described.
  • the mixture according to the invention can moreover photopolymerizable acrylate and / or alkacrylate compounds with 2 or more, preferably 3 to 6, acrylate and / or alkacrylate, in particular contain methacrylate groups.
  • These multifunctional Connections act as crosslinkers.
  • Preferred crosslinkers are (Meth) acrylates of saturated aliphatic or alicyclic, trihydric or polyhydric alcohols, such as alkanediols (specifically Ethylene glycol and propylene glycol), bis-phenol-A, trimethylolethane, Trimethylolpropane, pentamethylolpropane, pentaerythritol or Dipentaerythritol.
  • ethoxylated and propoxylated trimethylolpropane tri (meth) acrylate ditrimethylolpropane tetra (meth) acrylate, Tris (2-hydroxyethyl) -isocyanurattri (meth) acrylate or glycerol tri (meth) acrylate.
  • the Proportion of cross-linking acrylic and / or Alkacrylate compounds are generally up to 20% by weight, preferred 5 to 15 wt .-%, each based on the total weight of the non-volatile components of the radiation-sensitive mixture.
  • the proportion of all photopolymerizable monomers or oligomers is generally 10 to 85% by weight, preferably 20 to 75% by weight, each based on the total weight of the non-volatile Components of the radiation sensitive mixture.
  • the heptamethine cyanine dye preferably corresponds to one of the general formulas V or VI.
  • R 3 methyl, ethyl, propyl or butyl
  • R 4 H, Cl
  • X - (CH 2 ) 3 - or - (CH 2 ) 2 -
  • Y Br - , Cl - , I - , pTosO - , ClO 4 - , BF 4 - or PF 6 -
  • the proportion of the heptamethine cyanine dye is general 0.01 to 10.0% by weight, preferably 0.5 to 8.0% by weight, in each case based on the total weight of the non-volatile components of the photopolymerizable mixture.
  • Triazine compounds are well suited with at least one photolytically cleavable Trihalomethyl group, especially a trichloro or Tribromomethyl.
  • the trihalomethyl groups can directly, via a conjugated double bond or via a chain of conjugated double bonds to an aromatic carbocyclic or heterocyclic ring.
  • Compounds are preferred with a triazine base on the 2 Trihalomethyl groups are bound. Such connections are for example in DE 2 718 259, EP-A 0 137 452 and in EP-A 0 563,925. Basically absorb the used Triazine is not the radiation used for imaging.
  • Trihalomethyltriazines can also be used, the Self absorption is below 300 nm. Such materials are particularly preferred, because the photoreactivity compared to the usual interior lighting is reduced.
  • usable Trihalomethyltriazines are, for example, those which (saturated) aliphatic substituents or unsaturated substituents with only slightly extended es electron systems capable of mesomerization contain. Connections to other frameworks, for example Phenyl-trihalomethyl-sulfones (especially phenyl-tribromomethylsulfone) and phenyl-trihalogen-methyl-ketones, which are in the shorter-wave Absorb UV range can in principle also be used.
  • the proportion of photoinitiator (s) is generally 0.1 to 20% by weight. preferably 1.0 to 10% by weight, in each case based on the total weight of the non-volatile components of the photopolymerizable Mixture.
  • any pre-dispersed phthalocyanine pigments present primarily serve to color the mixture and the layers created with it. Their proportion is generally about 1 to 20 wt .-%, preferably about 2 to 14 wt .-%.
  • Particularly suitable predispersed phthalocyanine pigments are described in DE-A 199 15 717 and DE-A 199 33 139. Are preferred especially metal-free phthalocyanine pigments.
  • additives that inhibit thermally induced polymerization, hydrogen donors, Dyes, colored and colorless pigments, color formers, Filter dyes, indicator dyes, plasticizers and / or Chain transfer agent.
  • additives that inhibit thermally induced polymerization, hydrogen donors, Dyes, colored and colorless pigments, color formers, Filter dyes, indicator dyes, plasticizers and / or Chain transfer agent.
  • Appropriately chosen additives are those which do not absorb the radiation acting on the image.
  • the radiation-sensitive mixture is appropriately in one organic solvents dissolved or dispersed and the solution or Dispersion applied to the carrier as a thin film.
  • the Can be applied by pouring, spraying, dipping, applying with the help of rollers or similar, known to those skilled in the art Procedure. After drying, this is a Obtain recording material from which, for example Printing forms for high pressure, planographic printing, gravure printing or screen printing have it made. It can also be a material that is made up of Relief copies (e.g. for the production of texts in Braille), single copies, tanned images, pigment images or similar Have products structured according to the image.
  • the Mixture according to the invention is also suitable for the production of Etching reserves, for example in the manufacture of PCBs or name tags can be used, as well as for molding etching. However, it is preferably used for Production of photoresist layers and printing plates.
  • the present invention accordingly also relates to Recording material for the production of printing plates with a Carrier and a layer of the invention photopolymerizable mixture.
  • a carrier material for printing plates are suitable foils, tapes or plates made of metal (in particular Made of aluminum or an aluminum alloy, steel, zinc or Copper) or plastic (especially polyester - especially Polyethylene terephthalate or cellulose acetate), for screen printing supports also pearl gauze.
  • the surface of the Carrier of a mechanical, chemical and / or electrochemical To undergo pretreatment to ensure adhesion between the wearer and radiation-sensitive layer to adjust optimally or to achieve that the surface of the support acting imagewise Radiation less reflected (anti-halation).
  • the preferred Carrier for offset printing plates is made of aluminum or an Al alloy and is electrochemically roughened on its surface, then anodized, if necessary also with a hydrophilizing agents (for example Polyvinylphosphonic acid) has been treated.
  • the IR laser sources between 700 and 1200 nm familiar to the person skilled in the art are used for imagewise irradiation. Laser diodes which emit in the NIR range are preferred.
  • the recording material according to the invention has a particularly high imaging performance and is therefore particularly suitable for digital imaging with NIR laser beams. In the subsequent development process, a distinction is then made precisely between non-image areas and image areas, so that the dot gain is surprisingly significantly reduced. Even small negative fonts are therefore clearly reproduced. At the same time, the material has a very high sensitivity in the NIR wavelength range.
  • the cover layer can be self-supporting and removed before the subsequent development step. It then consists, for example, of a laminated polyester film. Cover layers made of a material which is soluble or dispersible in the developer liquid (at least in the non-hardened areas) can also be used.
  • Suitable materials for a top layer which is completely soluble in aqueous alkaline developers are, for example, polyvinyl alcohol, polyvinyl pyrrolidone, polyphosphates, sugar, etc.
  • the thickness of the top layer is generally 0.1 to 10 ⁇ m, preferably 1 to 5 ⁇ m.
  • the further processing of the imagewise irradiated Recording materials are made according to the generally accepted and Methods known to those skilled in the art. This can be done imagewise before developing irradiated material can still be reheated for better To achieve networking in the irradiated areas.
  • organic solvents or mixtures of organic Solvents are used, but preferred are aqueous alkaline Solutions with a pH of 8 to 14, especially from 9 to 13, up to about 20 wt.%, Preferably up to about 15 wt. %, of water-miscible organic solvents.
  • the Developers can also use wetting agents, dyes, salts and / or contain other additives.
  • the printing plate thus obtained was imaged with a CREO Trendsetter 3244T (2400 dpi), heated to 100 ° C. for 1 min and then with an aqueous alkaline developer (Agfa EN 231C) at 28 ° C. at a throughput speed of 1 m / min. (Agfa VSP85) developed.
  • the sensitivity indicated corresponded to the laser energy in the image plane that was required to make a 50% field formed from 1x1 and 8x8 pixels appear equally bright. The value determined in this way was 18 mJ / cm 2 .
  • compositions, layer weights and specific plate sensitivity used are listed in Table 1: component Examples 2 V1 V2 V3 V4 Gt Gt Gt Gt Gt A 6,900 6,904 6,904 6,904 6,904 B 3,770 - - - - C - 3,270 - - - D - - 3,270 - - e - - - 3,270 - F - - - - 3,270 G 0.163 0.163 0.163 0.163 0.163 H 6,870 6.869 6.869 6.869 6.869 6.869 6.869 6.869 6.869 I 0.408 0.408 0.408 0.408 0.408 0.408 J 0,007 0,007 0,007 0,007 K 0,680 0.679 0.679 0.679 0.679 L 20.48 20.98 20.98 20.98 20.98 M 40.72 40.72 40.72 40.72 40.72 40.72 40.72 Layer weight [g / m 2 ] 1.60 1.
  • composition used The composition used, the layer weights and the specific plate sensitivities are listed in Table 2: component Examples 4 5 6 7 8 Gt Gt Gt Gt Gt A 6,430 6,430 6,430 8,090 8.110 B 0,095 - - - - C - 0,095 - - - D - - 0,101 - - e - - - 0.130 - F - - - - 0,120 G 3,310 3,310 3,310 4,170 4,170 H 6,390 6,290 6,160 7,760 7,760 I 0,238 0,238 0,238 0,238 0,300 0,300 J 0,018 0,018 0,018 0,020 0,020 K 0,600 0,600 0,600 0,760 0,760 L 17.67 17.67 17,98 51.04 51.02 M 35.35 35.35 35.48 77.74 77.74 Layer weight [g / m 2 ] 1.50 1.50 1.66 1.10 1.10 Energy value [mJ / cm 2 ] 28 38 61 43 57

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP20020100424 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression Expired - Lifetime EP1359008B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE50204080T DE50204080D1 (de) 2002-04-29 2002-04-29 Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
EP20020100424 EP1359008B1 (fr) 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression
US10/425,158 US7314699B2 (en) 2002-04-29 2003-04-29 Radiation-sensitive mixture and recording material produced therewith
JP2003125528A JP2003344997A (ja) 2002-04-29 2003-04-30 放射線感受性混合物およびそれを用いて製造される記録材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20020100424 EP1359008B1 (fr) 2002-04-29 2002-04-29 Mélange photosensible, matériau pour l'enregistrement utilisant ce mélange, et procédé pour la fabrication d'une plaque d'impression

Publications (2)

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EP1359008A1 true EP1359008A1 (fr) 2003-11-05
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WO2005085372A1 (fr) * 2004-03-05 2005-09-15 Basf Aktiengesellschaft Encres d'impression destinees a l'impression offset et/ou en relief contenant des absorbeurs de spectre en proche infrarouge et absorbeurs de spectre en proche infrarouge solubles dans des encres d'impression offset et/ou en relief
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Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2718259A1 (de) 1977-04-25 1978-11-02 Hoechst Ag Strahlungsempfindliche kopiermasse
EP0137452A1 (fr) 1983-10-12 1985-04-17 Hoechst Aktiengesellschaft Composés sensibles à la lumière contenant des groupes trichlorométhyles, procédé pour leur préparation et mélange contenant les composés sensibles à la lumière
EP0315988A2 (fr) 1987-11-10 1989-05-17 Nippon Paint Co., Ltd. Composition photopolymérisable
EP0441542A1 (fr) 1990-02-05 1991-08-14 General Electric Company Chambre de combustion et méthode de combustion de carburant
EP0563925A1 (fr) 1992-04-01 1993-10-06 Fuji Photo Film Co., Ltd. Composition photopolymérisable
DE19915717A1 (de) 1999-04-08 2000-10-12 Agfa Gevaert Ag Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht
DE19933139A1 (de) 1999-07-19 2001-01-25 Agfa Gevaert Ag Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
EP1091247A2 (fr) 1999-09-22 2001-04-11 Fuji Photo Film Co., Ltd. Composition photopolymérisable
EP1106381A1 (fr) 1999-12-09 2001-06-13 Fuji Photo Film Co., Ltd. Précurseur de plaque d'impression planographique
EP1162078A2 (fr) * 2000-06-06 2001-12-12 Fuji Photo Film Co., Ltd. Matériau pour l'enregistrement d'images et absorbeur d'infrarouge
EP1176007A2 (fr) * 2000-07-25 2002-01-30 Fuji Photo Film Co., Ltd. Matériau d'enregistrement négatif et procédé de formation d'image
EP1203660A1 (fr) * 2000-11-01 2002-05-08 Fuji Photo Film Co., Ltd. Précurseur de plaque d'impression lithographique
EP1223196A2 (fr) * 2001-01-15 2002-07-17 Fuji Photo Film Co., Ltd. Matériau négatif d' enregistrement d' image et colorant cyanine

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2718259A1 (de) 1977-04-25 1978-11-02 Hoechst Ag Strahlungsempfindliche kopiermasse
EP0137452A1 (fr) 1983-10-12 1985-04-17 Hoechst Aktiengesellschaft Composés sensibles à la lumière contenant des groupes trichlorométhyles, procédé pour leur préparation et mélange contenant les composés sensibles à la lumière
EP0315988A2 (fr) 1987-11-10 1989-05-17 Nippon Paint Co., Ltd. Composition photopolymérisable
EP0441542A1 (fr) 1990-02-05 1991-08-14 General Electric Company Chambre de combustion et méthode de combustion de carburant
EP0563925A1 (fr) 1992-04-01 1993-10-06 Fuji Photo Film Co., Ltd. Composition photopolymérisable
DE19915717A1 (de) 1999-04-08 2000-10-12 Agfa Gevaert Ag Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht
DE19933139A1 (de) 1999-07-19 2001-01-25 Agfa Gevaert Ag Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
EP1091247A2 (fr) 1999-09-22 2001-04-11 Fuji Photo Film Co., Ltd. Composition photopolymérisable
EP1106381A1 (fr) 1999-12-09 2001-06-13 Fuji Photo Film Co., Ltd. Précurseur de plaque d'impression planographique
EP1162078A2 (fr) * 2000-06-06 2001-12-12 Fuji Photo Film Co., Ltd. Matériau pour l'enregistrement d'images et absorbeur d'infrarouge
EP1176007A2 (fr) * 2000-07-25 2002-01-30 Fuji Photo Film Co., Ltd. Matériau d'enregistrement négatif et procédé de formation d'image
EP1203660A1 (fr) * 2000-11-01 2002-05-08 Fuji Photo Film Co., Ltd. Précurseur de plaque d'impression lithographique
EP1223196A2 (fr) * 2001-01-15 2002-07-17 Fuji Photo Film Co., Ltd. Matériau négatif d' enregistrement d' image et colorant cyanine

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