DE69924817D1 - Farbfilter und Verfahren zu seiner Herstellung - Google Patents

Farbfilter und Verfahren zu seiner Herstellung

Info

Publication number
DE69924817D1
DE69924817D1 DE69924817T DE69924817T DE69924817D1 DE 69924817 D1 DE69924817 D1 DE 69924817D1 DE 69924817 T DE69924817 T DE 69924817T DE 69924817 T DE69924817 T DE 69924817T DE 69924817 D1 DE69924817 D1 DE 69924817D1
Authority
DE
Germany
Prior art keywords
production
color filter
color
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69924817T
Other languages
English (en)
Other versions
DE69924817T2 (de
Inventor
Masato Okabe
Hironori Kobayashi
Manabu Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE69924817D1 publication Critical patent/DE69924817D1/de
Publication of DE69924817T2 publication Critical patent/DE69924817T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/09—Ink jet technology used for manufacturing optical filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
DE69924817T 1998-12-09 1999-12-08 Farbfilter und Verfahren zu seiner Herstellung Expired - Lifetime DE69924817T2 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP35043198 1998-12-09
JP35043198 1998-12-09
JP216799 1999-01-07
JP216799 1999-01-07
JP18229799 1999-06-28
JP18229799 1999-06-28
JP28151999 1999-10-01
JP28151999A JP3529306B2 (ja) 1998-12-09 1999-10-01 カラーフィルタおよびその製造方法

Publications (2)

Publication Number Publication Date
DE69924817D1 true DE69924817D1 (de) 2005-05-25
DE69924817T2 DE69924817T2 (de) 2006-03-02

Family

ID=27453564

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69924817T Expired - Lifetime DE69924817T2 (de) 1998-12-09 1999-12-08 Farbfilter und Verfahren zu seiner Herstellung
DE69943249T Expired - Lifetime DE69943249D1 (de) 1998-12-09 1999-12-08 Farbfilter und Verfahren zu seiner Herstellung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69943249T Expired - Lifetime DE69943249D1 (de) 1998-12-09 1999-12-08 Farbfilter und Verfahren zu seiner Herstellung

Country Status (5)

Country Link
US (4) US6450635B1 (de)
EP (2) EP1521106B1 (de)
JP (1) JP3529306B2 (de)
DE (2) DE69924817T2 (de)
TW (1) TW530165B (de)

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DE69841947D1 (de) * 1997-08-08 2010-11-25 Dainippon Printing Co Ltd Verfahren zur Herstellung einer Linse
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US6815125B1 (en) * 1999-06-30 2004-11-09 Dai Nippon Printing Co., Ltd. Color filter and process for producing the same
KR20010085420A (ko) 2000-02-23 2001-09-07 기타지마 요시토시 전계발광소자와 그 제조방법
JP2002040231A (ja) * 2000-07-31 2002-02-06 Dainippon Printing Co Ltd カラーフィルタおよびその製造方法
JP2002040230A (ja) * 2000-07-31 2002-02-06 Dainippon Printing Co Ltd カラーフィルタおよびその製造法
JP2002107528A (ja) * 2000-09-29 2002-04-10 Dainippon Printing Co Ltd カラーフィルタの製造方法
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JP4236081B2 (ja) * 2001-10-16 2009-03-11 大日本印刷株式会社 パターン形成体の製造方法
JP4149161B2 (ja) 2001-12-06 2008-09-10 大日本印刷株式会社 パターン形成体の製造方法およびパターン製造装置
JP4010394B2 (ja) * 2001-12-14 2007-11-21 大日本印刷株式会社 エレクトロルミネッセント素子
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JP4402440B2 (ja) * 2003-12-03 2010-01-20 大日本印刷株式会社 カラーフィルタおよびカラーフィルタの製造方法
JP4459682B2 (ja) * 2004-03-31 2010-04-28 大日本印刷株式会社 カラーフィルタの製造方法
JP4560324B2 (ja) 2004-04-07 2010-10-13 大日本印刷株式会社 パターン形成体の製造方法
JP4672292B2 (ja) * 2004-06-18 2011-04-20 旭化成ケミカルズ株式会社 光触媒組成物
JP2006010883A (ja) * 2004-06-23 2006-01-12 Dainippon Printing Co Ltd カラーフィルタおよびその製造方法
JP4512429B2 (ja) * 2004-06-23 2010-07-28 住友化学株式会社 カラーフィルタの製造方法
JP4736377B2 (ja) * 2004-08-25 2011-07-27 大日本印刷株式会社 位相差制御層を有するカラーフィルタ及びその製造方法
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JP5256820B2 (ja) * 2008-03-31 2013-08-07 大日本印刷株式会社 真空紫外光によるパターン形成体の製造方法
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JP4985829B2 (ja) * 2010-06-25 2012-07-25 大日本印刷株式会社 カラーフィルタの製造方法
CN104122748A (zh) * 2013-04-28 2014-10-29 北京京东方光电科技有限公司 蓝色光阻组合物、其制备方法、彩色滤光片和显示器件
KR101883541B1 (ko) * 2013-06-17 2018-07-30 도판 인사츠 가부시키가이샤 표시 장치용 기판 및 이것을 사용한 표시 장치
JP2015029031A (ja) * 2013-07-02 2015-02-12 株式会社リコー 配線基板、及び配線基板の製造方法
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CN104898320B (zh) * 2015-06-05 2017-12-05 南京中电熊猫液晶显示科技有限公司 一种彩膜基板的制造方法
US10199546B2 (en) * 2016-04-05 2019-02-05 X-Celeprint Limited Color-filter device
US10008483B2 (en) 2016-04-05 2018-06-26 X-Celeprint Limited Micro-transfer printed LED and color filter structure
KR102605471B1 (ko) * 2016-06-30 2023-11-23 엘지전자 주식회사 반도체 발광소자를 이용한 디스플레이 장치
KR102413500B1 (ko) * 2017-05-17 2022-06-24 애플 인크. 측방향 누설이 감소된 유기 발광 다이오드 디스플레이
CN107390419A (zh) * 2017-07-31 2017-11-24 京东方科技集团股份有限公司 彩膜基板的制备方法及喷墨打印装置
JP7216522B2 (ja) * 2017-11-16 2023-02-01 住友化学株式会社 青色硬化性樹脂組成物、青色カラーフィルタ及びそれを含む表示装置
CN207817366U (zh) 2018-02-12 2018-09-04 京东方科技集团股份有限公司 一种彩膜基板、显示面板及显示装置
CN109786431B (zh) * 2019-02-25 2021-10-22 京东方科技集团股份有限公司 显示基板及其制备方法、和显示装置
US11249397B2 (en) 2019-11-22 2022-02-15 Canon Kabushiki Kaisha Method of forming a cured layer by controlling drop spreading
CN113325626B (zh) * 2021-05-20 2022-06-10 Tcl华星光电技术有限公司 液晶显示屏及其制作方法

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US6554420B2 (en) 2003-04-29
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US6848782B2 (en) 2005-02-01
JP2001074928A (ja) 2001-03-23
JP3529306B2 (ja) 2004-05-24
US20030164871A1 (en) 2003-09-04
EP1521106A1 (de) 2005-04-06
EP1008873B1 (de) 2005-04-20
DE69943249D1 (de) 2011-04-14
US6450635B1 (en) 2002-09-17
US20020126194A1 (en) 2002-09-12
EP1521106B1 (de) 2011-03-02
EP1008873A1 (de) 2000-06-14
TW530165B (en) 2003-05-01

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