DE69740146D1 - Trägerplatte mit einer flexiblen Membran für eine chemisch-mechanische Poliervorrichtung - Google Patents

Trägerplatte mit einer flexiblen Membran für eine chemisch-mechanische Poliervorrichtung

Info

Publication number
DE69740146D1
DE69740146D1 DE69740146T DE69740146T DE69740146D1 DE 69740146 D1 DE69740146 D1 DE 69740146D1 DE 69740146 T DE69740146 T DE 69740146T DE 69740146 T DE69740146 T DE 69740146T DE 69740146 D1 DE69740146 D1 DE 69740146D1
Authority
DE
Germany
Prior art keywords
support plate
mechanical polishing
chemical mechanical
flexible membrane
polishing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69740146T
Other languages
English (en)
Inventor
Steven M Zuniga
Birang Manoocher
Hung Chen
Sen-Hou Ko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24997773&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69740146(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE69740146D1 publication Critical patent/DE69740146D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
DE69740146T 1996-11-08 1997-11-05 Trägerplatte mit einer flexiblen Membran für eine chemisch-mechanische Poliervorrichtung Expired - Lifetime DE69740146D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US74567996A 1996-11-08 1996-11-08
US08/861,260 US6183354B1 (en) 1996-11-08 1997-05-21 Carrier head with a flexible membrane for a chemical mechanical polishing system

Publications (1)

Publication Number Publication Date
DE69740146D1 true DE69740146D1 (de) 2011-04-21

Family

ID=24997773

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69740146T Expired - Lifetime DE69740146D1 (de) 1996-11-08 1997-11-05 Trägerplatte mit einer flexiblen Membran für eine chemisch-mechanische Poliervorrichtung
DE69739521T Expired - Lifetime DE69739521D1 (de) 1996-11-08 1997-11-05 Halterring für eine chemisch-mechanische Poliervorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69739521T Expired - Lifetime DE69739521D1 (de) 1996-11-08 1997-11-05 Halterring für eine chemisch-mechanische Poliervorrichtung

Country Status (7)

Country Link
US (5) US6183354B1 (de)
EP (3) EP1754571B1 (de)
JP (6) JP3439970B2 (de)
KR (1) KR100366425B1 (de)
DE (2) DE69740146D1 (de)
SG (2) SG87925A1 (de)
TW (1) TW344694B (de)

Families Citing this family (220)

* Cited by examiner, † Cited by third party
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US20050037698A1 (en) 2005-02-17
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US6857946B2 (en) 2005-02-22
US6540594B2 (en) 2003-04-01
US6386955B2 (en) 2002-05-14
TW344694B (en) 1998-11-11
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