FR2558095B1 - Perfectionnements apportes aux tetes de travail des machines de polissage et analogues - Google Patents
Perfectionnements apportes aux tetes de travail des machines de polissage et analoguesInfo
- Publication number
- FR2558095B1 FR2558095B1 FR8404175A FR8404175A FR2558095B1 FR 2558095 B1 FR2558095 B1 FR 2558095B1 FR 8404175 A FR8404175 A FR 8404175A FR 8404175 A FR8404175 A FR 8404175A FR 2558095 B1 FR2558095 B1 FR 2558095B1
- Authority
- FR
- France
- Prior art keywords
- polishing machines
- working heads
- heads
- working
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8404175A FR2558095B1 (fr) | 1984-03-14 | 1984-03-14 | Perfectionnements apportes aux tetes de travail des machines de polissage et analogues |
EP85420047A EP0156746A1 (fr) | 1984-03-14 | 1985-03-13 | Perfectionnements apportés aux têtes de travail des machines de polissage et analogues |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8404175A FR2558095B1 (fr) | 1984-03-14 | 1984-03-14 | Perfectionnements apportes aux tetes de travail des machines de polissage et analogues |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2558095A1 FR2558095A1 (fr) | 1985-07-19 |
FR2558095B1 true FR2558095B1 (fr) | 1988-04-08 |
Family
ID=9302151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8404175A Expired FR2558095B1 (fr) | 1984-03-14 | 1984-03-14 | Perfectionnements apportes aux tetes de travail des machines de polissage et analogues |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0156746A1 (fr) |
FR (1) | FR2558095B1 (fr) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910009320B1 (ko) * | 1986-08-19 | 1991-11-09 | 미쓰비시 마테리알 가부시기가이샤 | 연마장치 |
DE69333322T2 (de) * | 1992-09-24 | 2004-09-30 | Ebara Corp. | Poliergerät |
USRE38878E1 (en) * | 1992-09-24 | 2005-11-15 | Ebara Corporation | Polishing apparatus |
US6024630A (en) * | 1995-06-09 | 2000-02-15 | Applied Materials, Inc. | Fluid-pressure regulated wafer polishing head |
US6036587A (en) | 1996-10-10 | 2000-03-14 | Applied Materials, Inc. | Carrier head with layer of conformable material for a chemical mechanical polishing system |
TW371635B (en) * | 1996-10-10 | 1999-10-11 | Applied Materials Inc | Carrier head with a layer conformable material for a chemical mechanical polishing system |
US6183354B1 (en) * | 1996-11-08 | 2001-02-06 | Applied Materials, Inc. | Carrier head with a flexible membrane for a chemical mechanical polishing system |
US6146259A (en) * | 1996-11-08 | 2000-11-14 | Applied Materials, Inc. | Carrier head with local pressure control for a chemical mechanical polishing apparatus |
US6398621B1 (en) | 1997-05-23 | 2002-06-04 | Applied Materials, Inc. | Carrier head with a substrate sensor |
US5957751A (en) * | 1997-05-23 | 1999-09-28 | Applied Materials, Inc. | Carrier head with a substrate detection mechanism for a chemical mechanical polishing system |
US5964653A (en) * | 1997-07-11 | 1999-10-12 | Applied Materials, Inc. | Carrier head with a flexible membrane for a chemical mechanical polishing system |
US5916015A (en) * | 1997-07-25 | 1999-06-29 | Speedfam Corporation | Wafer carrier for semiconductor wafer polishing machine |
US6080050A (en) | 1997-12-31 | 2000-06-27 | Applied Materials, Inc. | Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus |
US5993302A (en) * | 1997-12-31 | 1999-11-30 | Applied Materials, Inc. | Carrier head with a removable retaining ring for a chemical mechanical polishing apparatus |
JPH11262857A (ja) * | 1998-03-18 | 1999-09-28 | Rohm Co Ltd | 半導体ウェハの研磨装置 |
US6422927B1 (en) | 1998-12-30 | 2002-07-23 | Applied Materials, Inc. | Carrier head with controllable pressure and loading area for chemical mechanical polishing |
US6386947B2 (en) | 2000-02-29 | 2002-05-14 | Applied Materials, Inc. | Method and apparatus for detecting wafer slipouts |
US6722965B2 (en) | 2000-07-11 | 2004-04-20 | Applied Materials Inc. | Carrier head with flexible membranes to provide controllable pressure and loading area |
US7198561B2 (en) | 2000-07-25 | 2007-04-03 | Applied Materials, Inc. | Flexible membrane for multi-chamber carrier head |
US6857945B1 (en) | 2000-07-25 | 2005-02-22 | Applied Materials, Inc. | Multi-chamber carrier head with a flexible membrane |
US7497767B2 (en) | 2000-09-08 | 2009-03-03 | Applied Materials, Inc. | Vibration damping during chemical mechanical polishing |
US7255637B2 (en) | 2000-09-08 | 2007-08-14 | Applied Materials, Inc. | Carrier head vibration damping |
US6676497B1 (en) | 2000-09-08 | 2004-01-13 | Applied Materials Inc. | Vibration damping in a chemical mechanical polishing system |
US6848980B2 (en) | 2001-10-10 | 2005-02-01 | Applied Materials, Inc. | Vibration damping in a carrier head |
US6739958B2 (en) | 2002-03-19 | 2004-05-25 | Applied Materials Inc. | Carrier head with a vibration reduction feature for a chemical mechanical polishing system |
US7255771B2 (en) | 2004-03-26 | 2007-08-14 | Applied Materials, Inc. | Multiple zone carrier head with flexible membrane |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1653108A (en) * | 1926-04-29 | 1927-12-20 | Koenig Otto Alfred | Surfacing machine |
US1840254A (en) * | 1929-06-27 | 1932-01-05 | Fischman & Sons I | Polishing apparatus |
US2189472A (en) * | 1937-09-27 | 1940-02-06 | Edward G Peterson | Buffing device |
US2323962A (en) * | 1941-07-25 | 1943-07-13 | George W Williams | Sanding and buffing tool |
DE1029699B (de) * | 1954-06-30 | 1958-05-08 | Fritz Graupner | Vorrichtung zum Planschleifen von Steinplatten, insbesondere Terrazzoplatten |
US2860496A (en) * | 1955-04-13 | 1958-11-18 | Berne Tocci Guilbert | Ring oscillator |
US2781617A (en) * | 1955-05-27 | 1957-02-19 | Jerry J Lines | Swivel sander |
US3053063A (en) * | 1960-08-03 | 1962-09-11 | Flexan Corp | Abrading disc mount |
DE1677168A1 (de) * | 1967-03-09 | 1971-04-29 | Franke Gmbh Edelstahlerzeugnis | Schleif- und Poliervorrichtung |
US3553907A (en) * | 1967-06-07 | 1971-01-12 | Litton Industries Inc | Grinding machine for ring-like workpieces |
US3499641A (en) * | 1967-10-02 | 1970-03-10 | Collins Radio Co | Fluid pressure actuated diaphragm workpiece clamping device |
FR2239089A6 (en) * | 1973-07-24 | 1975-02-21 | Zeitlin Leo | Polishing or grinding machine - inflatable pneumatic or hydraulic cushion to oppose rotation of guide |
US4373991A (en) * | 1982-01-28 | 1983-02-15 | Western Electric Company, Inc. | Methods and apparatus for polishing a semiconductor wafer |
-
1984
- 1984-03-14 FR FR8404175A patent/FR2558095B1/fr not_active Expired
-
1985
- 1985-03-13 EP EP85420047A patent/EP0156746A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP0156746A1 (fr) | 1985-10-02 |
FR2558095A1 (fr) | 1985-07-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
ST | Notification of lapse |