DE60029857D1 - Lichtempfindliche Zusammensetzung und 1,3-dihydro-1-oxo-2H-Indenderivat - Google Patents

Lichtempfindliche Zusammensetzung und 1,3-dihydro-1-oxo-2H-Indenderivat

Info

Publication number
DE60029857D1
DE60029857D1 DE60029857T DE60029857T DE60029857D1 DE 60029857 D1 DE60029857 D1 DE 60029857D1 DE 60029857 T DE60029857 T DE 60029857T DE 60029857 T DE60029857 T DE 60029857T DE 60029857 D1 DE60029857 D1 DE 60029857D1
Authority
DE
Germany
Prior art keywords
dihydro
oxo
photosensitive composition
indene derivative
indene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60029857T
Other languages
English (en)
Other versions
DE60029857T2 (de
Inventor
Tadahiro Sorori
Yasubumi Murota
Koichi Kawamura
Kazuto Kunita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE60029857D1 publication Critical patent/DE60029857D1/de
Publication of DE60029857T2 publication Critical patent/DE60029857T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/02—Five-membered rings
    • C07D339/06—Five-membered rings having the hetero atoms in positions 1 and 3, e.g. cyclic dithiocarbonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/08—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D277/10—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62—Benzothiazoles
    • C07D277/64—Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/84—Naphthothiazoles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Indole Compounds (AREA)
DE60029857T 1999-03-09 2000-03-09 Lichtempfindliche Zusammensetzung und 1,3-dihydro-1-oxo-2H-Indenderivat Expired - Lifetime DE60029857T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6155999 1999-03-09
JP06155999A JP4130030B2 (ja) 1999-03-09 1999-03-09 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物

Publications (2)

Publication Number Publication Date
DE60029857D1 true DE60029857D1 (de) 2006-09-21
DE60029857T2 DE60029857T2 (de) 2007-03-08

Family

ID=13174602

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60029857T Expired - Lifetime DE60029857T2 (de) 1999-03-09 2000-03-09 Lichtempfindliche Zusammensetzung und 1,3-dihydro-1-oxo-2H-Indenderivat
DE60035138T Expired - Lifetime DE60035138T2 (de) 1999-03-09 2000-03-09 1,3-dihydro-1-oxo-2H-Indenderivat

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE60035138T Expired - Lifetime DE60035138T2 (de) 1999-03-09 2000-03-09 1,3-dihydro-1-oxo-2H-Indenderivat

Country Status (5)

Country Link
US (1) US6322950B1 (de)
EP (2) EP1035435B1 (de)
JP (1) JP4130030B2 (de)
AT (2) ATE364198T1 (de)
DE (2) DE60029857T2 (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0985683A1 (de) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Fotoempfindliche Zusammensetzung und Verfahren zur Herstellung einer Flachdruckplatte
US6686126B2 (en) 2000-07-14 2004-02-03 Fuji Photo Film Co., Ltd. Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate
JP4156784B2 (ja) * 2000-07-25 2008-09-24 富士フイルム株式会社 ネガ型画像記録材料及び画像形成方法
JP2002082429A (ja) * 2000-09-08 2002-03-22 Fuji Photo Film Co Ltd ネガ型画像記録材料
JP4230130B2 (ja) * 2001-07-04 2009-02-25 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
US6730151B2 (en) 2002-01-25 2004-05-04 Hewlett-Packard Development Company, L.P. Ink jet dye design
JP3969109B2 (ja) 2002-02-08 2007-09-05 コニカミノルタホールディングス株式会社 感光性平版印刷版及びその記録方法
JP2005523950A (ja) * 2002-04-26 2005-08-11 アルベマール・コーポレーシヨン 光開始重合における新規な種類のアミン共開始剤
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
JP4570857B2 (ja) 2003-03-31 2010-10-27 富士フイルム株式会社 感光性組成物及び平版印刷版原版
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
JP4469561B2 (ja) 2003-05-09 2010-05-26 富士フイルム株式会社 感光性組成物
EP1502941B1 (de) 2003-07-30 2015-12-23 FUJIFILM Corporation Bilderzeugungsverfahren und Entwickler
JP2005122113A (ja) * 2003-08-28 2005-05-12 Fuji Photo Film Co Ltd 光重合性組成物及び画像記録材料
KR101120963B1 (ko) * 2003-09-19 2012-03-13 후지필름 가부시키가이샤 염료함유 네가티브형 경화성 조성물, 컬러필터 및 그제조방법
CN1882879B (zh) 2003-09-22 2010-08-11 爱克发印艺公司 可光聚合的组合物
US7115352B2 (en) 2003-10-30 2006-10-03 Fuji Photo Film Co., Ltd. Method for forming images
US7144676B2 (en) 2004-02-06 2006-12-05 Rohm And Haas Electronic Materials Llc Imaging compositions and methods
US7977026B2 (en) 2004-02-06 2011-07-12 Rohm And Haas Electronic Materials Llc Imaging methods
US20050175941A1 (en) 2004-02-06 2005-08-11 Rohm And Hass Electronic Materials, L.L.C. Imaging composition and method
KR101125678B1 (ko) 2004-02-06 2012-03-28 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 개선된 이미지화 조성물 및 방법
US7270932B2 (en) * 2004-02-06 2007-09-18 Rohm And Haas Electronic Materials Llc Imaging composition and method
US7422837B2 (en) 2004-02-16 2008-09-09 Fujifilm Corporation Photosensitive composition
US7148182B2 (en) * 2004-04-27 2006-12-12 Hewlett-Packard Development Company, L.P. Multilayered color compositions and associated methods
JP4439327B2 (ja) 2004-04-30 2010-03-24 富士フイルム株式会社 平版印刷版用原版
JP4431453B2 (ja) * 2004-07-15 2010-03-17 富士フイルム株式会社 感光性組成物および平版印刷版原版
JP4452575B2 (ja) 2004-07-29 2010-04-21 富士フイルム株式会社 感光性組成物
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
JP4460986B2 (ja) 2004-09-24 2010-05-12 富士フイルム株式会社 平版印刷版の作製方法
US20060160016A1 (en) * 2004-10-12 2006-07-20 Presstek, Inc. Inkjet-imageable lithographic printing members and methods of preparing and imaging them
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
JP2006160836A (ja) 2004-12-03 2006-06-22 Fuji Photo Film Co Ltd 放射線の照射により硬化可能なインクジェット記録用インク及びこれを用いた平版印刷版作製方法
EP1701213A3 (de) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
US20070015087A1 (en) * 2005-07-13 2007-01-18 Fuji Photo Film Co., Ltd. Photosensitive composition
ES2333442T3 (es) 2005-08-26 2010-02-22 Agfa Graphics N.V. Precursor de placa de impresion fotopolimerico.
JP2007298538A (ja) * 2006-04-27 2007-11-15 Fujifilm Corp 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
WO2008145528A1 (en) 2007-05-25 2008-12-04 Agfa Graphics Nv A lithographic printing plate precursor
US8354216B2 (en) 2008-07-15 2013-01-15 Eastman Kodak Company Negative-working imaging elements and methods of use
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
EP2196851A1 (de) 2008-12-12 2010-06-16 Eastman Kodak Company Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält
US20100151385A1 (en) 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
CN106007360B (zh) * 2016-07-06 2018-12-21 江苏通鼎光棒有限公司 一种在线调整光纤预制棒准直度的机构及方法
CN114044796A (zh) * 2021-11-18 2022-02-15 鄂尔多斯应用技术学院 一种四取代烯丙基叠氮化合物的立体选择性合成方法

Family Cites Families (151)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2833827A (en) 1955-01-17 1958-05-06 Bayer Ag Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same
FR1241498A (fr) 1958-11-24 1960-09-16 Oxford Paper Co Cliché d'impression planographique
JPS475125B1 (de) 1963-05-23 1972-02-14
DE1246134B (de) 1964-10-23 1967-08-03 Asea Ab Schwerwasserkernreaktor
US3458311A (en) 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
DK125218B (da) 1967-11-09 1973-01-15 Kalle Ag Lysfølsomt optegnelsesmateriale og lysfølsom blanding til anvendelse ved fremstilling af materialet.
US3567453A (en) 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS4627481B1 (de) 1968-03-25 1971-08-10
CA933792A (en) 1968-10-09 1973-09-18 W. Heseltine Donald Photopolymerization
US3658662A (en) 1969-01-21 1972-04-25 Durolith Corp Corrosion resistant metallic plates particularly useful as support members for photo-lithographic plates and the like
US3615480A (en) 1969-02-24 1971-10-26 Du Pont Developer solutions for photopolymerized layers
DE2033769B2 (de) 1969-07-11 1980-02-21 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren
BE757124A (fr) 1969-10-09 1971-04-06 Kalle Ag Plaques d'impression a plat composee de feuilles
JPS4841708B1 (de) 1970-01-13 1973-12-07
DE2053683A1 (de) 1970-11-02 1972-05-10 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerisierbare Kopiermasse
DE2064079C2 (de) 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2064080C3 (de) 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
DE2064742C3 (de) 1970-12-31 1980-02-07 Hoechst Ag, 6000 Frankfurt Photopolymerisierbare Verbindungen
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
JPS5324989B2 (de) 1971-12-09 1978-07-24
JPS5230490B2 (de) 1972-03-21 1977-08-09
DE2242106A1 (de) 1972-08-26 1974-03-21 Agfa Gevaert Ag Lichtempfindliches photographisches material
JPS5333003B2 (de) 1972-12-07 1978-09-12
GB1416652A (en) 1973-04-26 1975-12-03 Siemens Ag Switching devices
JPS5026601A (de) 1973-07-09 1975-03-19
DE2361041C3 (de) 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2363806B2 (de) 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
GB1516512A (en) 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
GB1512982A (en) 1974-05-02 1978-06-01 Gen Electric Salts
GB1516351A (en) 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
JPS5311314B2 (de) 1974-09-25 1978-04-20
ZA757984B (en) 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
JPS5177401A (ja) 1974-12-26 1976-07-05 Fuji Photo Film Co Ltd Genzoekisoseibutsu
JPS5230503A (en) 1975-09-01 1977-03-08 Mitsubishi Chem Ind Method of making aluminium plate material for lithographic printing
JPS5258602A (en) 1975-11-06 1977-05-14 Nippon Keikinzoku Sougou Kenki Method of producing aluminium roughened surfaced plate for offset printing
DE2641100C2 (de) 1976-09-13 1987-02-26 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
JPS5344202A (en) 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
DE2718130C2 (de) 1977-04-23 1979-05-17 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf lichtempfindliches Aufzeichnungsmaterial
DE2718259C2 (de) 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
JPS5522759A (en) 1978-08-08 1980-02-18 Fuji Photo Film Co Ltd Developing method of positive type photosensitive lithographic printing plate
JPS5463902A (en) 1977-10-31 1979-05-23 Fuji Photo Film Co Ltd Method of making offset printing plate
JPS5492723A (en) 1977-12-30 1979-07-23 Somar Mfg Photosensitive material and use
US4181531A (en) 1978-04-07 1980-01-01 E. I. Du Pont De Nemours And Company Positive non-silver systems containing nitrofuryldihydropyridine
DE2822189A1 (de) 1978-05-20 1980-04-17 Hoechst Ag Photopolymerisierbares gemisch
DE2822190A1 (de) 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
JPS5549729A (en) 1978-10-06 1980-04-10 Nec Corp Data transfer system
JPS55118030A (en) 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5628893A (en) 1979-08-16 1981-03-23 Fuji Photo Film Co Ltd Carrier for lithography plate and manufacture of said carrier
JPS5613168A (en) 1979-07-16 1981-02-09 Tomoegawa Paper Co Ltd Lithographic plate making method by laser beam
DE2952698A1 (de) 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
DE2952697A1 (de) 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial
US4343891A (en) 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
DE3021599A1 (de) 1980-06-09 1981-12-24 Hoechst Ag, 6000 Frankfurt 2-(halogenmethyl-phenyl)-4-halogenoxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltende strahlungsempfindliche massen
DE3021590A1 (de) 1980-06-09 1981-12-17 Hoechst Ag, 6000 Frankfurt 4-halogen-5-(halogenmethyl-phenyl)-oxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltenden strahlungsempfindliche massen
ATE9811T1 (de) 1980-07-14 1984-10-15 Akzo N.V. Einen blockierten katalysator enthaltende waermehaertbare ueberzugszusammensetzung.
US4478967A (en) 1980-08-11 1984-10-23 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
JPS5753747A (ja) 1980-09-17 1982-03-30 Fuji Photo Film Co Ltd Hikarijugoseisoseibutsu
DE3036694A1 (de) 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch
US4371605A (en) 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
DE3048502A1 (de) 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3120052A1 (de) 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
US4431774A (en) 1981-09-14 1984-02-14 Ciba-Geigy Corporation Process for the curing of stoving lacquers
JPS5854341A (ja) 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd 現像方法および現像液
US4465506A (en) * 1981-12-17 1984-08-14 E. I. Dupont De Nemours And Company Herbicidal N-[heterocyclicaminocarbonyl]-1H-indene and tetrahydronaphthalene sulfonamides
US4510290A (en) 1982-01-11 1985-04-09 Ciba Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for the curing thereof
JPS595241A (ja) 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト 放射線重合可能な混合物
DE3223104A1 (de) 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
DE3364186D1 (en) 1982-08-09 1986-07-24 Akzo Nv Thermosetting coating composition containing a blocked acid as catalyst
JPS5944615A (ja) 1982-09-07 1984-03-13 Furuno Electric Co Ltd ジヤイロ装置
US4518676A (en) 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
JPS5953836A (ja) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5971048A (ja) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
US4450227A (en) 1982-10-25 1984-05-22 Minnesota Mining And Manufacturing Company Dispersed imaging systems with tetra (hydrocarbyl) borate salts
US4447521A (en) 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4590287A (en) 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
JPS59174831A (ja) 1983-03-24 1984-10-03 Fuji Photo Film Co Ltd 光重合性組成物
JPH0617991B2 (ja) 1983-06-22 1994-03-09 富士写真フイルム株式会社 光可溶化組成物
JPS6010247A (ja) 1983-06-29 1985-01-19 Fuji Photo Film Co Ltd 光可溶化組成物
DE3333450A1 (de) 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
DE3337024A1 (de) 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
GB8407466D0 (en) 1984-03-22 1984-05-02 Rieter Ag Maschf Yarn quality monitoring system
JPS60198538A (ja) 1984-03-22 1985-10-08 Toshiba Corp ポジ型レジスト材料
GB8413395D0 (en) 1984-05-25 1984-07-04 Ciba Geigy Ag Production of images
DE3421511A1 (de) 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
GB8420610D0 (en) * 1984-08-14 1984-09-19 Glaxo Group Ltd Chemical compounds
US4713401A (en) 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
JP2525568B2 (ja) 1985-01-18 1996-08-21 富士写真フイルム株式会社 光可溶化組成物
DE3660255D1 (en) 1985-04-12 1988-07-07 Ciba Geigy Ag Oxime sulphonates containing reactive groups
JPH067263B2 (ja) 1985-08-19 1994-01-26 富士写真フイルム株式会社 光可溶化組成物
JPH0766185B2 (ja) 1985-09-09 1995-07-19 富士写真フイルム株式会社 感光性組成物
DE3604580A1 (de) 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US4837124A (en) 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
AU599400B2 (en) 1986-08-01 1990-07-19 Ciba-Geigy Ag Titanocenes and their use
EP0256981B1 (de) 1986-08-01 1993-02-17 Ciba-Geigy Ag Titanocene und deren Verwendung
US4743530A (en) 1986-11-21 1988-05-10 Eastman Kodak Company Negative working photoresists responsive to longer wavelengths and novel coated articles
US4743528A (en) 1986-11-21 1988-05-10 Eastman Kodak Company Enhanced imaging composition containing an azinium activator
US4743531A (en) 1986-11-21 1988-05-10 Eastman Kodak Company Dye sensitized photographic imaging system
DE3642855C1 (de) 1986-12-16 1988-06-23 Du Pont Deutschland Lichtempfindliches Gemisch
US4760013A (en) 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
JPH0682188B2 (ja) 1987-03-19 1994-10-19 ザイトロニクス，インコーポレイテツド 紫外線被曝を可視化したフィルム及び紫外線被曝量測定部材
DE3710282A1 (de) 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710279A1 (de) 1987-03-28 1988-10-06 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
DE3710281A1 (de) 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPS63287947A (ja) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd 感光性組成物
JPS63287944A (ja) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd 感光性組成物
JPH07120041B2 (ja) 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPH07120042B2 (ja) 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
DE3721741A1 (de) 1987-07-01 1989-01-12 Basf Ag Strahlungsempfindliches gemisch fuer lichtempfindliche beschichtungsmaterialien
DE3721740A1 (de) 1987-07-01 1989-01-12 Basf Ag Sulfoniumsalze mit saeurelabilen gruppierungen
JP2582578B2 (ja) 1987-07-14 1997-02-19 日本化薬株式会社 感光性樹脂組成物
DE3738864A1 (de) 1987-11-16 1989-05-24 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
JPH0812424B2 (ja) 1987-11-19 1996-02-07 富士写真フイルム株式会社 感光性組成物
US5026625A (en) 1987-12-01 1991-06-25 Ciba-Geigy Corporation Titanocenes, the use thereof, and n-substituted fluoroanilines
US5008302A (en) 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
JPH01152109A (ja) 1987-12-09 1989-06-14 Toray Ind Inc 光重合性組成物
US4933377A (en) 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
US4885154A (en) 1988-03-01 1989-12-05 Alza Corporation Method for reducing sensitization or irritation in transdermal drug delivery and means therefor
JPH01271741A (ja) 1988-04-25 1989-10-30 Fuji Photo Film Co Ltd 感光性組成物
US5262276A (en) 1988-05-11 1993-11-16 Fuji Photo Film Co., Ltd. Light-sensitive compositions
DE3817424A1 (de) 1988-05-21 1989-11-23 Hoechst Ag Alkenylphosphon- und -phosphinsaeureester, verfahren zu ihrer herstellung und durch strahlung polymerisierbares gemisch, das diese verbindungen enthaelt
JP2757375B2 (ja) 1988-06-02 1998-05-25 東洋紡績株式会社 光重合性組成物
JPH0225850A (ja) 1988-07-15 1990-01-29 Hitachi Ltd 放射線感応性組成物およびそれを用いたパターン形成法
JPH0712004B2 (ja) 1988-10-19 1995-02-08 日本電装株式会社 コイル用ボビン
US5202221A (en) * 1988-11-11 1993-04-13 Fuji Photo Film Co., Ltd. Light-sensitive composition
CA2002873A1 (en) 1988-11-21 1990-05-21 Franklin Donald Saeva Onium salts and the use thereof as photoinitiators
JPH02150848A (ja) 1988-12-02 1990-06-11 Hitachi Ltd 光退色性放射線感応性組成物およびそれを用いたパターン形成法
DE3843205A1 (de) 1988-12-22 1990-06-28 Hoechst Ag Photopolymerisierbare verbindungen, diese enthaltendes photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial
EP0388343B1 (de) 1989-03-14 1996-07-17 International Business Machines Corporation Chemisch amplifizierter Photolack
JP2661671B2 (ja) 1989-03-20 1997-10-08 株式会社日立製作所 パタン形成材料とそれを用いたパタン形成方法
EP0401165B1 (de) 1989-06-01 1994-11-30 Ciba-Geigy Ag Neue sauerstoffhaltige Titanocene und deren Verwendung
EP0401166B1 (de) 1989-06-01 1995-02-22 Ciba-Geigy Ag Neue, stickstoffhaltige Titanocene und deren Verwendung
US5059512A (en) 1989-10-10 1991-10-22 International Business Machines Corporation Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
JP2777441B2 (ja) 1989-12-21 1998-07-16 東洋合成工業株式会社 感放射線樹脂組成物及び該感放射線樹脂組成物を用いたパターン形成方法
US5206317A (en) 1990-04-10 1993-04-27 E. I. Du Pont De Nemours And Company Resist material and process for use
US5212047A (en) 1990-04-10 1993-05-18 E. I. Du Pont De Nemours And Company Resist material and process for use
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
JP2632069B2 (ja) 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
US5102771A (en) 1990-11-26 1992-04-07 Minnesota Mining And Manufacturing Company Photosensitive materials
JPH04365048A (ja) 1991-06-12 1992-12-17 Fuji Photo Film Co Ltd 感光性組成物
JPH05281728A (ja) 1992-04-01 1993-10-29 Fuji Photo Film Co Ltd 光重合性組成物
TW237456B (de) 1992-04-09 1995-01-01 Ciba Geigy
WO1994018005A1 (en) 1993-02-09 1994-08-18 Agfa-Gevaert Naamloze Vennootschap Heat mode recording material and method for making a lithographic printing plate therewith
JPH0725921A (ja) * 1993-05-27 1995-01-27 Fuji Photo Film Co Ltd 光重合性組成物
JP3223222B2 (ja) 1993-12-03 2001-10-29 富士写真フイルム株式会社 感光性印刷版
US5609992A (en) * 1994-11-01 1997-03-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JP3442176B2 (ja) * 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
JP3589360B2 (ja) * 1995-03-22 2004-11-17 富士写真フイルム株式会社 感光性印刷版
JPH0980744A (ja) 1995-09-12 1997-03-28 Toray Ind Inc 感光性平版印刷版原版
JP3651713B2 (ja) 1996-02-29 2005-05-25 富士写真フイルム株式会社 光重合性組成物
JPH10116232A (ja) 1996-10-09 1998-05-06 Niigata Seimitsu Kk メモリシステム
JPH11171909A (ja) 1997-12-12 1999-06-29 Brother Ind Ltd 光重合性組成物及び記録用シート

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DE60035138T2 (de) 2008-02-07
EP1662318A1 (de) 2006-05-31
US6322950B1 (en) 2001-11-27
EP1662318B1 (de) 2007-06-06
ATE364198T1 (de) 2007-06-15
DE60029857T2 (de) 2007-03-08
JP4130030B2 (ja) 2008-08-06
EP1035435B1 (de) 2006-08-09
JP2000258910A (ja) 2000-09-22
ATE336029T1 (de) 2006-09-15
DE60035138D1 (de) 2007-07-19
EP1035435A2 (de) 2000-09-13

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