US4256828A
(en)
*
|
1975-09-02 |
1981-03-17 |
Minnesota Mining And Manufacturing Company |
Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
|
AU517415B2
(en)
*
|
1976-07-09 |
1981-07-30 |
General Electric Company |
Curable polymer composition
|
US4108747A
(en)
*
|
1976-07-14 |
1978-08-22 |
General Electric Company |
Curable compositions and method for curing such compositions
|
US4090936A
(en)
|
1976-10-28 |
1978-05-23 |
Minnesota Mining And Manufacturing Company |
Photohardenable compositions
|
US4101513A
(en)
*
|
1977-02-02 |
1978-07-18 |
Minnesota Mining And Manufacturing Company |
Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
|
US4102687A
(en)
*
|
1977-02-14 |
1978-07-25 |
General Electric Company |
UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
|
GB1604954A
(en)
*
|
1977-08-05 |
1981-12-16 |
Gen Electric |
Photocurable compositions and method for curing
|
GB1604953A
(en)
*
|
1977-08-05 |
1981-12-16 |
Gen Electric |
Photocurable compositions and method for curing
|
GB1596000A
(en)
*
|
1977-09-14 |
1981-08-19 |
Gen Electric |
Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
|
US4246298A
(en)
*
|
1979-03-14 |
1981-01-20 |
American Can Company |
Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
|
US4299938A
(en)
*
|
1979-06-19 |
1981-11-10 |
Ciba-Geigy Corporation |
Photopolymerizable and thermally polymerizable compositions
|
US4319974A
(en)
*
|
1980-04-21 |
1982-03-16 |
General Electric Company |
UV Curable compositions and substrates treated therewith
|
US4387216A
(en)
|
1981-05-06 |
1983-06-07 |
Ciba-Geigy Corporation |
Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
|
DE3135636A1
(en)
|
1981-09-09 |
1983-03-17 |
Basf Ag, 6700 Ludwigshafen |
CURABLE EPOXY RESINS
|
GB2139369B
(en)
*
|
1983-05-06 |
1987-01-21 |
Sericol Group Ltd |
Photosensitive systems showing visible indication of exposure
|
JPS61190524A
(en)
*
|
1985-01-25 |
1986-08-25 |
Asahi Denka Kogyo Kk |
Energy ray-curable composition
|
JPS61242615A
(en)
*
|
1985-04-18 |
1986-10-28 |
Nippon Air Filter Kk |
Process and device for collecting dust
|
JPS61261365A
(en)
*
|
1985-05-14 |
1986-11-19 |
Nippon Oil Co Ltd |
Photo-curable coating composition
|
US4751138A
(en)
|
1986-08-11 |
1988-06-14 |
Minnesota Mining And Manufacturing Company |
Coated abrasive having radiation curable binder
|
US5399596A
(en)
*
|
1988-03-03 |
1995-03-21 |
Sanshin Kagaku Kogyo Co., Ltd. |
Polyfluoride sulfonium compounds and polymerization initiator thereof
|
US4882201A
(en)
*
|
1988-03-21 |
1989-11-21 |
General Electric Company |
Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
|
US4871786A
(en)
*
|
1988-10-03 |
1989-10-03 |
Minnesota Mining And Manufacturing Company |
Organic fluoride sources
|
US5047568A
(en)
*
|
1988-11-18 |
1991-09-10 |
International Business Machines Corporation |
Sulfonium salts and use and preparation thereof
|
DE3902114A1
(en)
*
|
1989-01-25 |
1990-08-02 |
Basf Ag |
RADIATION-SENSITIVE, ETHYLENICALLY UNSATURATED, COPOLYMERIZABLE SULFONIUM SALTS AND METHOD FOR THE PRODUCTION THEREOF
|
JPH0347573A
(en)
*
|
1989-07-12 |
1991-02-28 |
Ishigaki Kiko Kk |
Method and apparatus for classifying fine powder
|
DE69029104T2
(en)
|
1989-07-12 |
1997-03-20 |
Fuji Photo Film Co Ltd |
Polysiloxanes and positive working resist
|
DE3933420C1
(en)
*
|
1989-10-06 |
1991-03-07 |
Th. Goldschmidt Ag, 4300 Essen, De |
|
KR960000980B1
(en)
*
|
1990-03-27 |
1996-01-15 |
가부시기가이샤 히다찌 세이사꾸쇼 |
Adhesive agent for substrate of electroless plating printed
|
US5108859A
(en)
*
|
1990-04-16 |
1992-04-28 |
Eastman Kodak Company |
Photoelectrographic elements and imaging method
|
DE4027438C1
(en)
*
|
1990-08-30 |
1991-08-29 |
Th. Goldschmidt Ag, 4300 Essen, De |
Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
|
DE4027437C1
(en)
*
|
1990-08-30 |
1991-08-29 |
Th. Goldschmidt Ag, 4300 Essen, De |
Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
|
DE69219649T2
(en)
*
|
1991-02-16 |
1997-10-23 |
Canon Kk |
Optical recording medium
|
US5166125A
(en)
*
|
1992-02-19 |
1992-11-24 |
Eastman Kodak Company |
Method of forming color filter array element with patternable overcoat layer
|
US5166126A
(en)
*
|
1992-02-19 |
1992-11-24 |
Eastman Kodak Company |
Color filter array element with protective overcoat layer and method of forming same
|
DE4219376A1
(en)
*
|
1992-06-12 |
1993-12-16 |
Wacker Chemie Gmbh |
Sulfonium salts and process for their preparation
|
GB9309275D0
(en)
*
|
1993-05-05 |
1993-06-16 |
Smith & Nephew |
Orthopaedic material
|
US5502083A
(en)
*
|
1993-06-18 |
1996-03-26 |
Nippon Kayaku Kabushiki Kaisha |
Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
|
JP3442176B2
(en)
|
1995-02-10 |
2003-09-02 |
富士写真フイルム株式会社 |
Photopolymerizable composition
|
DE69731542T2
(en)
|
1996-09-19 |
2005-05-19 |
Nippon Soda Co. Ltd. |
PHOTOCATALYTIC COMPOSITION
|
JPH1087963A
(en)
*
|
1996-09-20 |
1998-04-07 |
Japan Synthetic Rubber Co Ltd |
Resin composition and mold for forming fibrous material
|
JP3786480B2
(en)
*
|
1996-10-14 |
2006-06-14 |
Jsr株式会社 |
Photocurable resin composition
|
JP3626302B2
(en)
*
|
1996-12-10 |
2005-03-09 |
Jsr株式会社 |
Photocurable resin composition
|
JP3765896B2
(en)
*
|
1996-12-13 |
2006-04-12 |
Jsr株式会社 |
Photocurable resin composition for optical three-dimensional modeling
|
JP4130030B2
(en)
|
1999-03-09 |
2008-08-06 |
富士フイルム株式会社 |
Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound
|
FR2794126B1
(en)
*
|
1999-05-26 |
2003-07-18 |
Gemplus Card Int |
NOVEL ADHESIVE AND CONDUCTIVE COMPOSITION, CONNECTION METHOD, METHOD FOR CONSTITUTING ELECTRICAL OR ELECTRONIC COMPONENTS, USE OF SUCH COMPOSITION, CONDUCTIVE ELEMENT
|
JP2003073481A
(en)
|
2001-09-06 |
2003-03-12 |
Brother Ind Ltd |
Active energy ray-curable composition, ink containing the same and printer using the ink
|
JP2003105077A
(en)
|
2001-09-28 |
2003-04-09 |
Brother Ind Ltd |
Active energy ray-curable composition, ink containing the same, and printer using the ink
|
JP4701231B2
(en)
*
|
2002-02-13 |
2011-06-15 |
富士フイルム株式会社 |
Negative resist composition for electron beam, EUV or X-ray and pattern forming method using the same
|
EP1348727A3
(en)
|
2002-03-29 |
2003-12-03 |
Brother Kogyo Kabushiki Kaisha |
Image-receiving layer composition and overcoat layer composition for ink-jet recording
|
JP4533639B2
(en)
*
|
2003-07-22 |
2010-09-01 |
富士フイルム株式会社 |
SENSITIVE COMPOSITION, COMPOUND, AND PATTERN FORMING METHOD USING THE SENSITIVE COMPOSITION
|
JP4452572B2
(en)
|
2004-07-06 |
2010-04-21 |
富士フイルム株式会社 |
Photosensitive composition and image recording method using the same
|
EP1701213A3
(en)
|
2005-03-08 |
2006-11-22 |
Fuji Photo Film Co., Ltd. |
Photosensitive composition
|
JP4474317B2
(en)
|
2005-03-31 |
2010-06-02 |
富士フイルム株式会社 |
Preparation method of lithographic printing plate
|
JP2006335826A
(en)
|
2005-05-31 |
2006-12-14 |
Fujifilm Holdings Corp |
Ink composition for inkjet recording and method for manufacturing planographic printing plate using the same
|
JP2007254454A
(en)
*
|
2006-02-23 |
2007-10-04 |
Fujifilm Corp |
Sulfonium salt, curable composition, ink composition, inkjet-recording method, printed matter, method for producing lithographic printing plate, and lithographic printing plate
|
JP5276264B2
(en)
|
2006-07-03 |
2013-08-28 |
富士フイルム株式会社 |
INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND METHOD FOR PRODUCING A lithographic printing plate
|
TW200838967A
(en)
|
2007-02-02 |
2008-10-01 |
Jsr Corp |
Composition for radiation-curable adhesive, composite, and method for producing the composite
|
US8541063B2
(en)
|
2007-02-06 |
2013-09-24 |
Fujifilm Corporation |
Undercoat solution, ink-jet recording method and ink-jet recording device
|
US8240808B2
(en)
|
2007-02-07 |
2012-08-14 |
Fujifilm Corporation |
Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
|
JP5227521B2
(en)
|
2007-02-26 |
2013-07-03 |
富士フイルム株式会社 |
Ink composition, ink jet recording method, printed matter, and ink set
|
JP5224699B2
(en)
|
2007-03-01 |
2013-07-03 |
富士フイルム株式会社 |
Ink composition, inkjet recording method, printed material, method for producing lithographic printing plate, and lithographic printing plate
|
JP5243072B2
(en)
|
2007-03-30 |
2013-07-24 |
富士フイルム株式会社 |
Ink composition, and image recording method and image recorded material using the same
|
JP5306681B2
(en)
|
2007-03-30 |
2013-10-02 |
富士フイルム株式会社 |
Polymerizable compound, polymer, ink composition, printed matter, and inkjet recording method
|
JP5227560B2
(en)
|
2007-09-28 |
2013-07-03 |
富士フイルム株式会社 |
Ink composition, inkjet recording method, printed matter, and method for producing molded printed matter
|
JP4898618B2
(en)
|
2007-09-28 |
2012-03-21 |
富士フイルム株式会社 |
Inkjet recording method
|
JP5265165B2
(en)
|
2007-09-28 |
2013-08-14 |
富士フイルム株式会社 |
Coating apparatus and ink jet recording apparatus using the same
|
JP5254632B2
(en)
|
2008-02-07 |
2013-08-07 |
富士フイルム株式会社 |
Ink composition, inkjet recording method, printed matter, and molded printed matter
|
US20090214797A1
(en)
|
2008-02-25 |
2009-08-27 |
Fujifilm Corporation |
Inkjet ink composition, and inkjet recording method and printed material employing same
|
JP5583329B2
(en)
|
2008-03-11 |
2014-09-03 |
富士フイルム株式会社 |
Pigment composition, ink composition, printed matter, inkjet recording method, and polyallylamine derivative
|
JP4914862B2
(en)
|
2008-03-26 |
2012-04-11 |
富士フイルム株式会社 |
Inkjet recording method and inkjet recording apparatus
|
JP5208573B2
(en)
*
|
2008-05-06 |
2013-06-12 |
サンアプロ株式会社 |
Sulfonium salt, photoacid generator, photocurable composition and cured product thereof
|
JP2010077228A
(en)
|
2008-09-25 |
2010-04-08 |
Fujifilm Corp |
Ink composition, inkjet recording method and printed material
|
JP2010180330A
(en)
|
2009-02-05 |
2010-08-19 |
Fujifilm Corp |
Non-aqueous ink, ink set, method for recording image, device for recording image, and recorded matter
|
JP5350827B2
(en)
|
2009-02-09 |
2013-11-27 |
富士フイルム株式会社 |
Ink composition and inkjet recording method
|
KR101700980B1
(en)
|
2009-02-20 |
2017-01-31 |
산아프로 가부시키가이샤 |
Sulfonium salt, photo-acid generator, and photosensitive resin composition
|
JP5349095B2
(en)
|
2009-03-17 |
2013-11-20 |
富士フイルム株式会社 |
Ink composition and inkjet recording method
|
JP5349097B2
(en)
|
2009-03-19 |
2013-11-20 |
富士フイルム株式会社 |
Ink composition, inkjet recording method, printed matter, and method for producing molded printed matter
|
JP5383289B2
(en)
|
2009-03-31 |
2014-01-08 |
富士フイルム株式会社 |
Ink composition, ink composition for inkjet, inkjet recording method, and printed matter by inkjet method
|
JP2010241948A
(en)
|
2009-04-06 |
2010-10-28 |
Shin-Etsu Chemical Co Ltd |
Radiation-curable silicone composition
|
JP5572026B2
(en)
|
2009-09-18 |
2014-08-13 |
富士フイルム株式会社 |
Ink composition and inkjet recording method
|
JP5530141B2
(en)
|
2009-09-29 |
2014-06-25 |
富士フイルム株式会社 |
Ink composition and inkjet recording method
|
EP2485290A4
(en)
|
2009-10-01 |
2013-03-06 |
Hitachi Chemical Co Ltd |
Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device
|
US10566105B2
(en)
|
2010-04-22 |
2020-02-18 |
Hitachi Chemical Company, Ltd. |
Method for producing charge transport film
|
JP5622564B2
(en)
|
2010-06-30 |
2014-11-12 |
富士フイルム株式会社 |
Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device
|
EP2644664B1
(en)
|
2012-03-29 |
2015-07-29 |
Fujifilm Corporation |
Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
|
WO2013172407A1
(en)
|
2012-05-18 |
2013-11-21 |
シーメット株式会社 |
Resin composition for optical stereolithography
|
WO2014061062A1
(en)
|
2012-10-18 |
2014-04-24 |
サンアプロ株式会社 |
Sulfonium salt, photoacid generator, curable composition, and resist composition
|
KR102047349B1
(en)
|
2012-12-07 |
2019-11-21 |
디에스피 고쿄 후도 & 케미카루 가부시키가이샤 |
Novel sulfonium salt compound, method for producing same, and photoacid generator
|
JP5980702B2
(en)
|
2013-03-07 |
2016-08-31 |
富士フイルム株式会社 |
INKJET INK COMPOSITION, INKJET RECORDING METHOD, AND MOLDED PRINTED PRODUCTION METHOD
|
WO2014136900A1
(en)
|
2013-03-08 |
2014-09-12 |
日立化成株式会社 |
Ionic-compound-containing treatment solution, organic electronic element, and method for manufacturing organic electronic element
|
EP3018182A4
(en)
|
2013-07-05 |
2016-12-07 |
San-Apro Ltd |
Photoacid generator, and resin composition for photolithography
|
JP5939644B2
(en)
|
2013-08-30 |
2016-06-22 |
富士フイルム株式会社 |
Image forming method, in-mold molded product manufacturing method, and ink set
|
JP6572771B2
(en)
|
2013-11-25 |
2019-09-11 |
富士フイルム和光純薬株式会社 |
Acid and radical generator, and acid and radical generating method
|
TWI623519B
(en)
*
|
2014-02-19 |
2018-05-11 |
日本化藥股份有限公司 |
Novel compound, photoacid generator containing the compound and photosensitive resin composition containing the photoacid generator
|
JP6195413B2
(en)
|
2014-03-05 |
2017-09-13 |
信越化学工業株式会社 |
Radiation curable silicone composition
|
TWI673258B
(en)
|
2014-09-26 |
2019-10-01 |
日商東京應化工業股份有限公司 |
Thiophene salt, photoacid generator, and photosensitive composition
|
US10450266B2
(en)
|
2014-11-07 |
2019-10-22 |
San-Apro Limited |
Sulfonate compound, photoacid generator, and resin composition for photolithography
|
JP6708382B2
(en)
|
2015-09-03 |
2020-06-10 |
サンアプロ株式会社 |
Curable composition and cured product using the same
|
JP6797911B2
(en)
|
2016-06-09 |
2020-12-09 |
サンアプロ株式会社 |
Sulfonium salt, photoacid generator, curable composition and resist composition
|
WO2018003470A1
(en)
|
2016-06-29 |
2018-01-04 |
サンアプロ株式会社 |
Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof
|
JP6902031B2
(en)
|
2016-07-28 |
2021-07-14 |
サンアプロ株式会社 |
Sulfonium salt, heat or photoacid generator, heat or photocurable composition and cured product thereof
|
JP6591699B2
(en)
|
2016-12-12 |
2019-10-16 |
サンアプロ株式会社 |
Photoacid generator and resin composition for photolithography
|
CN111788181B
(en)
|
2018-05-25 |
2023-01-17 |
三亚普罗股份有限公司 |
Sulfonium salt, photoacid generator, curable composition, and resist composition
|
JP7116669B2
(en)
|
2018-11-22 |
2022-08-10 |
サンアプロ株式会社 |
Photoacid generator and resin composition for photolithography
|
JP7444791B2
(en)
*
|
2019-01-10 |
2024-03-06 |
サンアプロ株式会社 |
Sulfonium salts, photoacid generators, curable compositions and resist compositions
|
US20230100642A1
(en)
|
2020-03-17 |
2023-03-30 |
San-Apro Ltd. |
Sulfonium salt, photoacid generator, curable composition, and resist composition
|