JPS50151997A - - Google Patents
Info
- Publication number
- JPS50151997A JPS50151997A JP5211175A JP5211175A JPS50151997A JP S50151997 A JPS50151997 A JP S50151997A JP 5211175 A JP5211175 A JP 5211175A JP 5211175 A JP5211175 A JP 5211175A JP S50151997 A JPS50151997 A JP S50151997A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46637474A | 1974-05-02 | 1974-05-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50151997A true JPS50151997A (en) | 1975-12-06 |
| JPS5214278B2 JPS5214278B2 (en) | 1977-04-20 |
Family
ID=23851510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5211175A Expired JPS5214278B2 (en) | 1974-05-02 | 1975-05-01 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5214278B2 (en) |
| BE (1) | BE828670A (en) |
| DE (3) | DE2559833C2 (en) |
| FR (1) | FR2269551B1 (en) |
| GB (2) | GB1516512A (en) |
Cited By (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5453181A (en) * | 1977-09-14 | 1979-04-26 | Gen Electric | Photoopolymerization initiator |
| JPS5495686A (en) * | 1977-08-05 | 1979-07-28 | Gen Electric | Photocurable composition and curing method |
| JPS61261365A (en) * | 1985-05-14 | 1986-11-19 | Nippon Oil Co Ltd | Photo-curable coating composition |
| EP0503774A2 (en) * | 1991-02-16 | 1992-09-16 | Canon Kabushiki Kaisha | Optical recording medium |
| US5399596A (en) * | 1988-03-03 | 1995-03-21 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
| US5981616A (en) * | 1996-12-13 | 1999-11-09 | Dsm N.V. | Photo-curable resin composition used for photo fabication of three-dimensional objects |
| US6013714A (en) * | 1996-09-20 | 2000-01-11 | Dsm N.V. | Resin composition and fibrous material forming mold |
| US6096796A (en) * | 1996-12-10 | 2000-08-01 | Dsm N.V. | Photo-curable resin composition |
| US6127085A (en) * | 1996-10-14 | 2000-10-03 | Dsm N.V. | Photo-curable resin composition |
| US6313188B1 (en) | 1996-09-19 | 2001-11-06 | Nippon Soda Co., Ltd. | Photocationically polymerizable composition comprising a polycyclic aromatic compound |
| EP1348727A2 (en) | 2002-03-29 | 2003-10-01 | Brother Kogyo Kabushiki Kaisha | Image-receiving layer composition and overcoat layer composition for ink-jet recording |
| US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
| JP2005055864A (en) * | 2003-07-22 | 2005-03-03 | Fuji Photo Film Co Ltd | Stimulus-sensitive composition, compound and pattern formation method using the stimulus-sensitive composition |
| US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
| JP2008112186A (en) * | 2002-02-13 | 2008-05-15 | Fujifilm Corp | Negative resist composition for electron beam, euv or x-ray and pattern forming method using the same |
| EP1983023A1 (en) | 2007-02-02 | 2008-10-22 | JSR Corporation | Radiation-curable composition, composite and manufacturing method thereof |
| WO2009136482A1 (en) * | 2008-05-06 | 2009-11-12 | サンアプロ株式会社 | Phosphonium salt, photoacid generator, photo-curable composition, and cured product of the photo-curable composition |
| WO2010095385A1 (en) | 2009-02-20 | 2010-08-26 | サンアプロ株式会社 | Sulfonium salt, photo-acid generator, and photosensitive resin composition |
| WO2011040531A1 (en) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device |
| WO2011132702A1 (en) | 2010-04-22 | 2011-10-27 | 日立化成工業株式会社 | Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device |
| EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
| WO2014136900A1 (en) | 2013-03-08 | 2014-09-12 | 日立化成株式会社 | Ionic-compound-containing treatment solution, organic electronic element, and method for manufacturing organic electronic element |
| WO2015001804A1 (en) | 2013-07-05 | 2015-01-08 | サンアプロ株式会社 | Photoacid generator, and resin composition for photolithography |
| KR20150071026A (en) | 2012-10-18 | 2015-06-25 | 산아프로 가부시키가이샤 | Sulfonium salt, photoacid generator, curable composition, and resist composition |
| KR20150092176A (en) | 2012-12-07 | 2015-08-12 | 디에스피 고쿄 후도 ＆ 케미카루 가부시키가이샤 | Novel sulfonium salt compound, method for producing same, and photoacid generator |
| EP2915843A1 (en) | 2014-03-05 | 2015-09-09 | Shin-Etsu Chemical Co., Ltd. | Radiation-curable silicone composition |
| KR20160089419A (en) | 2013-11-25 | 2016-07-27 | 와꼬 쥰야꾸 고교 가부시키가이샤 | Acid- and radical-generating agent and method for generating acid and radical |
| JPWO2015125745A1 (en) * | 2014-02-19 | 2017-03-30 | 日本化薬株式会社 | Novel compound, photoacid generator containing the compound, and photosensitive resin composition containing the photoacid generator |
| KR20170065560A (en) | 2014-09-26 | 2017-06-13 | 도쿄 오카 고교 가부시키가이샤 | Sulfonium salt, photoacid generator, and photosensitive composition |
| KR20170080574A (en) | 2014-11-07 | 2017-07-10 | 산아프로 가부시키가이샤 | Sulfonate compound, photoacid generator, and photolithographic resin composition |
| KR20180048561A (en) | 2015-09-03 | 2018-05-10 | 산아프로 가부시키가이샤 | Curable composition and cured article using same |
| KR20190017757A (en) | 2016-06-09 | 2019-02-20 | 산아프로 가부시키가이샤 | Sulfonium salt, photoacid generator, curing composition and resist composition |
| KR20190022447A (en) | 2016-06-29 | 2019-03-06 | 산아프로 가부시키가이샤 | A sulfonium salt, a photoacid generator, a photocurable composition, and a cured product thereof |
| KR20190037230A (en) | 2016-07-28 | 2019-04-05 | 산아프로 가부시키가이샤 | A sulfonium salt, a heat or photoacid generator, a heat or photocurable composition, and a cured product thereof |
| KR20190091436A (en) | 2016-12-12 | 2019-08-06 | 산아프로 가부시키가이샤 | Photoacid Generator and Resin Composition for Photolithography |
| WO2020145043A1 (en) | 2019-01-10 | 2020-07-16 | サンアプロ株式会社 | Sulfonium salt, photoacid generator, curable composition and resist composition |
| KR20210092713A (en) | 2018-11-22 | 2021-07-26 | 산아프로 가부시키가이샤 | Photoacid generator and resin composition for photolithography |
| WO2021186846A1 (en) | 2020-03-17 | 2021-09-23 | サンアプロ株式会社 | Sulfonium salt, photoacid generator, curable composition, and resist composition |
| US11926581B2 (en) | 2018-05-25 | 2024-03-12 | San-Apro Limited | Sulfonium salt, photoacid generator, curable composition, and resist composition |
Families Citing this family (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| AU517415B2 (en) * | 1976-07-09 | 1981-07-30 | General Electric Company | Curable polymer composition |
| US4108747A (en) * | 1976-07-14 | 1978-08-22 | General Electric Company | Curable compositions and method for curing such compositions |
| US4090936A (en) | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
| US4101513A (en) * | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| US4102687A (en) * | 1977-02-14 | 1978-07-25 | General Electric Company | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| US4246298A (en) * | 1979-03-14 | 1981-01-20 | American Can Company | Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application |
| US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4319974A (en) | 1980-04-21 | 1982-03-16 | General Electric Company | UV Curable compositions and substrates treated therewith |
| US4387216A (en) | 1981-05-06 | 1983-06-07 | Ciba-Geigy Corporation | Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants |
| DE3135636A1 (en) | 1981-09-09 | 1983-03-17 | Basf Ag, 6700 Ludwigshafen | CURABLE EPOXY RESINS |
| GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
| JPS61190524A (en) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | Energy ray-curable composition |
| JPS61242615A (en) * | 1985-04-18 | 1986-10-28 | Nippon Air Filter Kk | Process and device for collecting dust |
| DE3604580A1 (en) * | 1986-02-14 | 1987-08-20 | Basf Ag | CURABLE MIXTURES CONTAINING N-SULFONYLAMINOSULFONIUM SALTS AS CATIONICALLY EFFECTIVE CATALYSTS |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US4882201A (en) * | 1988-03-21 | 1989-11-21 | General Electric Company | Non-toxic aryl onium salts, UV curable coating compositions and food packaging use |
| US4871786A (en) * | 1988-10-03 | 1989-10-03 | Minnesota Mining And Manufacturing Company | Organic fluoride sources |
| US5047568A (en) * | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
| DE3902114A1 (en) * | 1989-01-25 | 1990-08-02 | Basf Ag | RADIATION-SENSITIVE, ETHYLENICALLY UNSATURATED, COPOLYMERIZABLE SULFONIUM SALTS AND METHOD FOR THE PRODUCTION THEREOF |
| JPH0347573A (en) * | 1989-07-12 | 1991-02-28 | Ishigaki Kiko Kk | Method and apparatus for classifying fine powder |
| DE69029104T2 (en) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxanes and positive working resist |
| DE3933420C1 (en) * | 1989-10-06 | 1991-03-07 | Th. Goldschmidt Ag, 4300 Essen, De | |
| JP2697937B2 (en) * | 1989-12-15 | 1998-01-19 | キヤノン株式会社 | Active energy ray-curable resin composition |
| KR960000980B1 (en) * | 1990-03-27 | 1996-01-15 | 가부시기가이샤 히다찌 세이사꾸쇼 | Adhesive agent for substrate of electroless plating printed |
| US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
| DE4027437C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds. |
| DE4027438C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp. |
| US5166126A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Color filter array element with protective overcoat layer and method of forming same |
| US5166125A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Method of forming color filter array element with patternable overcoat layer |
| DE4219376A1 (en) * | 1992-06-12 | 1993-12-16 | Wacker Chemie Gmbh | Sulfonium salts and process for their preparation |
| GB9309275D0 (en) * | 1993-05-05 | 1993-06-16 | Smith & Nephew | Orthopaedic material |
| US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
| JP3442176B2 (en) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | Photopolymerizable composition |
| JP4130030B2 (en) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound |
| FR2794126B1 (en) * | 1999-05-26 | 2003-07-18 | Gemplus Card Int | NOVEL ADHESIVE AND CONDUCTIVE COMPOSITION, CONNECTION METHOD, METHOD FOR CONSTITUTING ELECTRICAL OR ELECTRONIC COMPONENTS, USE OF SUCH COMPOSITION, CONDUCTIVE ELEMENT |
| DK1481973T3 (en) | 2002-03-04 | 2009-03-30 | Wako Pure Chem Ind Ltd | Heterocycle compound-bearing-onium salts |
| JP4452572B2 (en) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | Photosensitive composition and image recording method using the same |
| EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JP4474317B2 (en) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
| JP2006335826A (en) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | Ink composition for inkjet recording and method for manufacturing planographic printing plate using the same |
| JP2007254454A (en) * | 2006-02-23 | 2007-10-04 | Fujifilm Corp | Sulfonium salt, curable composition, ink composition, inkjet-recording method, printed matter, method for producing lithographic printing plate, and lithographic printing plate |
| JP5276264B2 (en) | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND METHOD FOR PRODUCING A lithographic printing plate |
| EP1955858B1 (en) | 2007-02-06 | 2014-06-18 | FUJIFILM Corporation | Ink-jet recording method and device |
| US8240808B2 (en) | 2007-02-07 | 2012-08-14 | Fujifilm Corporation | Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method |
| JP5227521B2 (en) | 2007-02-26 | 2013-07-03 | 富士フイルム株式会社 | Ink composition, ink jet recording method, printed matter, and ink set |
| JP5224699B2 (en) | 2007-03-01 | 2013-07-03 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed material, method for producing lithographic printing plate, and lithographic printing plate |
| JP5306681B2 (en) | 2007-03-30 | 2013-10-02 | 富士フイルム株式会社 | Polymerizable compound, polymer, ink composition, printed matter, and inkjet recording method |
| JP5243072B2 (en) | 2007-03-30 | 2013-07-24 | 富士フイルム株式会社 | Ink composition, and image recording method and image recorded material using the same |
| JP5265165B2 (en) | 2007-09-28 | 2013-08-14 | 富士フイルム株式会社 | Coating apparatus and ink jet recording apparatus using the same |
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| JP2010180330A (en) | 2009-02-05 | 2010-08-19 | Fujifilm Corp | Non-aqueous ink, ink set, method for recording image, device for recording image, and recorded matter |
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| WO2013172407A1 (en) | 2012-05-18 | 2013-11-21 | シーメット株式会社 | Resin composition for optical stereolithography |
| JP5980702B2 (en) | 2013-03-07 | 2016-08-31 | 富士フイルム株式会社 | INKJET INK COMPOSITION, INKJET RECORDING METHOD, AND MOLDED PRINTED PRODUCTION METHOD |
| JP5939644B2 (en) | 2013-08-30 | 2016-06-22 | 富士フイルム株式会社 | Image forming method, in-mold molded product manufacturing method, and ink set |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
-
1975
- 1975-04-16 GB GB49978A patent/GB1516512A/en not_active Expired
- 1975-04-16 GB GB1570175A patent/GB1516511A/en not_active Expired
- 1975-04-26 DE DE19752559833 patent/DE2559833C2/en not_active Expired
- 1975-04-26 DE DE19752518652 patent/DE2518652C2/en not_active Expired
- 1975-04-26 DE DE19752559718 patent/DE2559718C2/en not_active Expired
- 1975-04-30 FR FR7513519A patent/FR2269551B1/fr not_active Expired
- 1975-05-01 JP JP5211175A patent/JPS5214278B2/ja not_active Expired
- 1975-05-02 BE BE156013A patent/BE828670A/en not_active IP Right Cessation
Cited By (58)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5495686A (en) * | 1977-08-05 | 1979-07-28 | Gen Electric | Photocurable composition and curing method |
| JPS55164204A (en) * | 1977-08-05 | 1980-12-20 | Gen Electric | Photoinitiator |
| JPS5453181A (en) * | 1977-09-14 | 1979-04-26 | Gen Electric | Photoopolymerization initiator |
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Also Published As
| Publication number | Publication date |
|---|---|
| DE2518652C2 (en) | 1983-05-11 |
| FR2269551A1 (en) | 1975-11-28 |
| DE2559718C2 (en) | 1983-08-04 |
| DE2559833C2 (en) | 1983-12-22 |
| DE2518652A1 (en) | 1975-11-06 |
| GB1516512A (en) | 1978-07-05 |
| FR2269551B1 (en) | 1978-09-01 |
| GB1516511A (en) | 1978-07-05 |
| BE828670A (en) | 1975-09-01 |
| JPS5214278B2 (en) | 1977-04-20 |
| DE2559718A1 (en) | 1977-08-18 |