GB1516352A - Halonium salts - Google Patents

Halonium salts

Info

Publication number
GB1516352A
GB1516352A GB49878A GB49878A GB1516352A GB 1516352 A GB1516352 A GB 1516352A GB 49878 A GB49878 A GB 49878A GB 49878 A GB49878 A GB 49878A GB 1516352 A GB1516352 A GB 1516352A
Authority
GB
United Kingdom
Prior art keywords
halonium salts
halonium
salts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB49878A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1516352A publication Critical patent/GB1516352A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/66Arsenic compounds
    • C07F9/68Arsenic compounds without As—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/90Antimony compounds
    • C07F9/902Compounds without antimony-carbon linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Casings For Electric Apparatus (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB49878A 1974-05-02 1975-04-16 Halonium salts Expired GB1516352A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637574A 1974-05-02 1974-05-02

Publications (1)

Publication Number Publication Date
GB1516352A true GB1516352A (en) 1978-07-05

Family

ID=23851515

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1570475A Expired GB1516351A (en) 1974-05-02 1975-04-16 Curable epoxide compositions
GB49878A Expired GB1516352A (en) 1974-05-02 1975-04-16 Halonium salts

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB1570475A Expired GB1516351A (en) 1974-05-02 1975-04-16 Curable epoxide compositions

Country Status (5)

Country Link
JP (1) JPS5214277B2 (en)
BE (1) BE828669A (en)
DE (2) DE2518639C3 (en)
FR (1) FR2269552B1 (en)
GB (2) GB1516351A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4294746A (en) 1980-06-17 1981-10-13 Union Carbide Corporation Stabilizers for cycloaliphatic epoxide containing compositions
US4310469A (en) 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4849320A (en) * 1986-05-10 1989-07-18 Ciba-Geigy Corporation Method of forming images
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
WO2003074509A1 (en) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
US7101918B2 (en) 2001-11-06 2006-09-05 Wako Pure Chemical Industries, Ltd. Hybrid type onium salt
US7276541B2 (en) 2003-09-06 2007-10-02 Goldschmidt Ag Use of hydroxyl-functional polyalkylorganosiloxanes as solvents for cationic photoinitiators for use in radiation- curable silicones

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
GB2027435B (en) * 1977-12-16 1982-11-24 Gen Electric Curable resin compositions
DE2854011C2 (en) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Thermosetting composition and process for its manufacture
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
DE3029247C2 (en) * 1979-08-03 1996-04-11 Gen Electric UV-curable silicone coating compositions, process for their preparation and their use
DE3107087A1 (en) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "PHOTOPOLYMERIZABLE MIXTURES AND METHOD FOR PHOTOPOLYMERISATION OF CATIONICALLY POLYMERIZABLE COMPOUNDS"
US4351708A (en) 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
JPS5887348A (en) * 1981-11-20 1983-05-25 株式会社中川製作所 Winding roller
EP0094915B1 (en) * 1982-05-19 1987-01-21 Ciba-Geigy Ag Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
JPS59152922A (en) * 1983-02-18 1984-08-31 Mitsubishi Electric Corp Resin composition curable with high-energy radiation
ATE37242T1 (en) * 1984-02-10 1988-09-15 Ciba Geigy Ag PROCESS FOR PRODUCING A PROTECTIVE COATING OR A RELIEF IMAGE.
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
DE69029104T2 (en) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxanes and positive working resist
DE3933420C1 (en) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
DE4024661C1 (en) * 1990-08-03 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Tris:tri:fluoromethane:sulphonated complexes - prepd. by mixing boron tri:fluoro:methanesulphonate with onium salt in organic solvent
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE4110793C1 (en) * 1991-04-04 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Organo:polysiloxane - used as photoinitiator in cationically curable organo:polysiloxane compsn. esp. contg. epoxy¨ or vinyl¨ gps.
JPH0662692B2 (en) * 1991-10-30 1994-08-17 オーテックス株式会社 Photopolymerization initiator
DE4421623A1 (en) * 1994-06-21 1996-01-04 Thera Ges Fuer Patente Multi-component, cationically curing epoxy materials and their use as well as processes for producing hardened materials
JP3442176B2 (en) 1995-02-10 2003-09-02 富士写真フイルム株式会社 Photopolymerizable composition
DE19534594B4 (en) * 1995-09-19 2007-07-26 Delo Industrieklebstoffe Gmbh & Co. Kg Cationic curing, flexible epoxy resin compositions and their use for applying thin layers
JPH1087963A (en) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd Resin composition and mold for forming fibrous material
JP3786480B2 (en) * 1996-10-14 2006-06-14 Jsr株式会社 Photocurable resin composition
JP3626302B2 (en) * 1996-12-10 2005-03-09 Jsr株式会社 Photocurable resin composition
JP3765896B2 (en) * 1996-12-13 2006-04-12 Jsr株式会社 Photocurable resin composition for optical three-dimensional modeling
EP1020479B1 (en) 1999-01-16 2005-08-10 Goldschmidt GmbH Photoinitiators for cationic curing
JP4130030B2 (en) 1999-03-09 2008-08-06 富士フイルム株式会社 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound
JP2001106648A (en) * 1999-08-02 2001-04-17 Nippon Soda Co Ltd Photo-setting composition comprising iodonium salt compound
ATE269842T1 (en) 1999-08-02 2004-07-15 Nippon Soda Co PHOTOCLINKABLE COMPOSITIONS CONTAINING AN IODONIUM SALT COMPOUND
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
AU5649400A (en) 1999-09-21 2001-10-11 Goldschmidt Ag Photoinitiators containing urethane groups for cationic curing
US6756013B1 (en) * 2000-08-14 2004-06-29 Cornell Development Corporation, Llc Compositions of iodonium compounds and methods and uses thereof
JP2003073481A (en) 2001-09-06 2003-03-12 Brother Ind Ltd Active energy ray-curable composition, ink containing the same and printer using the ink
JP2003105077A (en) 2001-09-28 2003-04-09 Brother Ind Ltd Active energy ray-curable composition, ink containing the same, and printer using the ink
EP1348727A3 (en) 2002-03-29 2003-12-03 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
EP1630189A4 (en) * 2003-05-07 2011-06-22 Mitsui Chemicals Inc Cationically photopolymerizable resin composition and optical disk surface protection material
JP4452572B2 (en) 2004-07-06 2010-04-21 富士フイルム株式会社 Photosensitive composition and image recording method using the same
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (en) 2005-03-31 2010-06-02 富士フイルム株式会社 Preparation method of lithographic printing plate
JP2006335826A (en) 2005-05-31 2006-12-14 Fujifilm Holdings Corp Ink composition for inkjet recording and method for manufacturing planographic printing plate using the same
JP5276264B2 (en) 2006-07-03 2013-08-28 富士フイルム株式会社 INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND METHOD FOR PRODUCING A lithographic printing plate
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
EP1955858B1 (en) 2007-02-06 2014-06-18 FUJIFILM Corporation Ink-jet recording method and device
DE602008006279D1 (en) 2007-02-07 2011-06-01 Fujifilm Corp An ink jet recording apparatus having an ink jet printhead maintenance device and an ink jet printhead maintenance method
JP5224699B2 (en) 2007-03-01 2013-07-03 富士フイルム株式会社 Ink composition, inkjet recording method, printed material, method for producing lithographic printing plate, and lithographic printing plate
JP4898618B2 (en) 2007-09-28 2012-03-21 富士フイルム株式会社 Inkjet recording method
JP5265165B2 (en) 2007-09-28 2013-08-14 富士フイルム株式会社 Coating apparatus and ink jet recording apparatus using the same
JP5254632B2 (en) 2008-02-07 2013-08-07 富士フイルム株式会社 Ink composition, inkjet recording method, printed matter, and molded printed matter
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5583329B2 (en) 2008-03-11 2014-09-03 富士フイルム株式会社 Pigment composition, ink composition, printed matter, inkjet recording method, and polyallylamine derivative
JP4914862B2 (en) 2008-03-26 2012-04-11 富士フイルム株式会社 Inkjet recording method and inkjet recording apparatus
JP5350827B2 (en) 2009-02-09 2013-11-27 富士フイルム株式会社 Ink composition and inkjet recording method
JP5349095B2 (en) 2009-03-17 2013-11-20 富士フイルム株式会社 Ink composition and inkjet recording method
JP5530141B2 (en) 2009-09-29 2014-06-25 富士フイルム株式会社 Ink composition and inkjet recording method
JP5622564B2 (en) 2010-06-30 2014-11-12 富士フイルム株式会社 Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device
EP2644664B1 (en) 2012-03-29 2015-07-29 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
US9416220B2 (en) 2012-05-18 2016-08-16 Cmet Inc. Resin composition for optical stereolithography
JP5980702B2 (en) 2013-03-07 2016-08-31 富士フイルム株式会社 INKJET INK COMPOSITION, INKJET RECORDING METHOD, AND MOLDED PRINTED PRODUCTION METHOD
JP5939644B2 (en) 2013-08-30 2016-06-22 富士フイルム株式会社 Image forming method, in-mold molded product manufacturing method, and ink set
EP4077413A1 (en) 2019-12-18 2022-10-26 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4310469A (en) 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4294746A (en) 1980-06-17 1981-10-13 Union Carbide Corporation Stabilizers for cycloaliphatic epoxide containing compositions
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
US4935320A (en) * 1985-09-04 1990-06-19 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US4849320A (en) * 1986-05-10 1989-07-18 Ciba-Geigy Corporation Method of forming images
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
US7101918B2 (en) 2001-11-06 2006-09-05 Wako Pure Chemical Industries, Ltd. Hybrid type onium salt
WO2003074509A1 (en) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
US7318991B2 (en) 2002-03-04 2008-01-15 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
US7833691B2 (en) 2002-03-04 2010-11-16 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
US7276541B2 (en) 2003-09-06 2007-10-02 Goldschmidt Ag Use of hydroxyl-functional polyalkylorganosiloxanes as solvents for cationic photoinitiators for use in radiation- curable silicones

Also Published As

Publication number Publication date
GB1516351A (en) 1978-07-05
BE828669A (en) 1975-09-01
JPS50151996A (en) 1975-12-06
DE2518639C3 (en) 1979-05-23
DE2518639B2 (en) 1978-07-13
DE2559879C2 (en) 1982-03-04
FR2269552A1 (en) 1975-11-28
FR2269552B1 (en) 1978-09-01
DE2518639A1 (en) 1975-11-06
JPS5214277B2 (en) 1977-04-20

Similar Documents

Publication Publication Date Title
GB1516352A (en) Halonium salts
GB1516512A (en) Chalcogenium salts
AU498365B2 (en) Salts ofs-adenosilmethionine
PH14161A (en) Thiazolylacetamido compounds
GB1516331A (en) Aminotetralol compounds
ZA757892B (en) Thiazolylacetamido compounds
GB1517972A (en) 6-methyl-8alpha-cyanomethylergoline i
AU8172875A (en) Amins salts
AU7073874A (en) Cassette
IL48557A0 (en) Substituted ureido-compounds
US3992538A (en) Substituted o-acyl-acrylaldoximes
MY8200111A (en) Tetrazolethiomethylcephalosporin compounds
ZA752007B (en) Substituted triphenylethylenes
JPS5146494A (en) Entojono kaitenkensakukogu o shoshita kensaku kenmasochi
JPS5129945A (en) Hikarihenchoki o mochiita konshokuho
IL47587A0 (en) Substituted 1-sulfonylbenzimidazoles
PH14544A (en) Substituted tetrahydrobenzothiophenes
AU7835575A (en) Substituted diaminoguanidines
JPS5123683A (en) Densen keeburuno setsuzokubu aruiha tanmatsubu
IL47350A0 (en) Substituted phenylmercapto-benzimidizoles
AU8293175A (en) Substituted hydroxyphenyl-piperidones
JPS5117588A (en) Densen keeburu
JPS5153005A (en) Koshino datsubokuhoho
JPS5119802A (en) Koshino shoriho
ZA754845B (en) Salts

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940416